X‐ray photoelectron spectroscopy and the pattern recognition method—their application to surface studies in CoPd alloys

In the present work, polycrystalline CoPd alloys in varying range of bulk atomic percent composition (Co30Pd70, Co50Pd50 and Co70Pd30) are investigated by means of X‐ray photoelectron spectroscopy (XPS). The results of conventional XPS quantitative multiline (ML) approach are compared to the results obtained on the basis of XPS lines shape analysis, where the selected XPS or X‐ray induced Auger electron (XAES) transitions, are processed using the pattern recognition method known as the fuzzy k‐nearest neighbour (fkNN) rule. The fkNN rule is applied to the following spectra line shapes: Pd MNV, Co 2p, Co LMM, Pd 3d and valence band, analysing electrons in a varying range of selected kinetic energies. Both methods showed the surface segregation of Pd in Co30Pd70 and Co50Pd50 alloys. The results of the ML, the binding energy shift (ΔBE) analysis and the fkNN rule remained in agreement. Discrepancies in quantitative results obtained using different approaches are discussed within the accuracy of the applied methods, differences due to mean escape depth (MED) of electrons in considered transitions, their depth distribution function, the sensitivity of electron transition line shape on the environmental change (weaker effect for the inner shell transitions, and stronger effect for the outer shell transitions and Auger electron spectroscopy (AES) electrons transitions) and the non‐uniform depth profile concentrations. Copyright © 2005 John Wiley & Sons, Ltd.     

Quantitative surface analysis by X-ray photoelectron spectroscopy and X-ray excited auger electron spectroscopy

It is shown that X-ray excited KLL Auger electron spectra allow it to describe measured signal strengths similarly to X-ray photoelectron signals, thus offering valuable information on the quantitative surface composition of a solid sample. The principal equation and corresponding fundamental parameters are discussed. As a result Auger spectra of C, N, O, F, and Na can be easily used in a multiline approach for quantitative analysis. LMM and MNN spectra give rise to more problems, due to their more complicated structure, uncertainties with regard to the background and the influence of Coster-Kronig transitions. These problems are overcome by the use of empirical ratios of the strongest lines of 2p/LMM or 3d/MNN. Since these ratios are independent of sample composition, they allow it to transform the Auger signal into the corresponding photoelectron signal, provided that a standard sample has been measured. Thus a true additional information is obtained and moreover difficulties in cases of photoelectron spectra with overlapping lines from other chemical elements can be overcome.Dedicated to Professor Günther Tölg on the occasion of his 60th birthday     

Investigation of surface and thermogravimetric characteristics of carbon-coated iron nanopowder

Demand for high-density press and sinter components is increasing day by day. Of the different ways to improve the sinter density, the addition of nanopowder to the conventional micrometer-sized metal powder is an effective solution. The present investigation is aimed at studying the surface chemistry of iron nanopowder coated with graphitic carbon, which is intended to be mixed with the conventional iron powder. For this purpose, iron nanopowder in the size range of 30 nm to submicron (less than 1 micron) was investigated using thermogravimetry at different temperatures: 400°C, 600°C, 800°C, 1000°C, and 1350°C. The X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and high-resolution scanning electron microscopy (HR-SEM) were used for characterizing the powder as well as samples sintered at different temperatures. The presence of iron, oxygen, carbon, chromium, and zinc were observed on the surface of the nanopowder. Iron was present in oxide state, although a small metallic iron peak at 707 eV was also observed in the XPS spectra obtained from the surface indicating the oxide scale to be maximum of about 5 nm in thickness. For the sample treated at 600°C, presence of manganese was observed on the surface. Thermogravimetry results showed a two-step mass loss with a total mass loss of 4 wt.% when heated to 1350°C where the first step corresponds to the surface oxide reduction.     

Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 – Surface chemical analysis – Auger electron spectroscopy and X‐ray photoelectron spectroscopy – Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials by Auger electron spectroscopy (AES) and X‐ray photoelectron spectroscopy (XPS). This article provides a brief summary of this International Standard. Copyright © 2005 John Wiley & Sons, Ltd.     

Monte Carlo simulation of full energy spectrum of electrons emitted from silicon in Auger electron spectroscopy

A Monte Carlo simulation including surface excitation, Auger electron‐ and secondary electron production has been performed to calculate the energy spectrum of electrons emitted from silicon in Auger electron spectroscopy (AES), covering the full energy range from the elastic peak down to the true‐secondary‐electron peak. The work aims to provide a more comprehensive understanding of the experimental AES spectrum by integrating the up‐to‐date knowledge of electron scattering and electronic excitation near the solid surface region. The Monte Carlo simulation model of beam–sample interaction includes the atomic ionization and relaxation for Auger electron production with Casnati's ionization cross section, surface plasmon excitation and bulk plasmon excitation as well as other bulk electronic excitation for inelastic scattering of electrons (including primary electrons, Auger electrons and secondary electrons) through a dielectric functional approach, cascade secondary electron production in electron inelastic scattering events, and electron elastic scattering with use of Mott's cross section. The simulated energy spectrum for Si sample describes very well the experimental AES EN(E) spectrum measured with a cylindrical mirror analyzer for primary energies ranging from 500 eV to 3000 eV. Surface excitation is found to affect strongly the loss peak shape and the intensities of the elastic peak and Auger peak, and weakly the low energy backscattering background, but it has less effect to high energy backscattering background and the Auger electron peak shape. Copyright © 2014 John Wiley & Sons, Ltd.     

X-ray photoelectron spectra and Auger studies of the surface oxidation of cobalt

Surface oxidation of Co has been investigated at different temperatures in the 300–600 K range at oxygen exposures upto 10⁶ L by XPES and AES techniques. In the XPES, both the valence band and core level bands have been employed to monitor the oxidation while in the AES, metal Auger intensity ratios as well as O(KLL)/Co(L₂₃M₄₅M₄₅) ratios have been examined. Only CoO is formed on the surface at high oxygen exposures at and above 500 K. Communication No. 62 from the Solid State and Structural Chemistry Unit.     

Copper passivity and its breakdown in sodium bicarbonate solutions: A scanning electron microscopy and x-ray photoelectron and auger spectroscopy study

Effect of bicarbonate ions on the copper passivity and its local breakdown is studied by cyclic voltammetry, Auger spectroscopy, x-ray photoelectron spectroscopy, and scanning electron microscopy. Comparing data for solutions with various sodium bicarbonate concentrations shows copper to undergo pitting in 0.02 M NaHCO₃, whereas it remains stably passive in 0.10 M NaHCO₃. Independent studies suggest that carbonates play a protective role in stabilization of the oxide-hydroxide passive film on copper.     

Interpretation of Auger depth profiles of thin SiC layers on Si

Silicon carbide thin films, prepared by carbonization of Si-wafers are analysed by Auger depth profiling. The influence of atomic mixing is simulated with a Monte Carlo model. By using mixing simulations the dependence of the two mixing parameters (width of the mixing zone and recoil depth) on ion beam energy, incidence angle and ion mass can be calculated. For comparison of the simulated data with Auger measurements an Auger electron escape depth correction is necessary. The simulated and -corrected data of several layer structures show good qualitative agreement with Auger depth profiles of thin carbonized SiC-layers.Dedicated to Professor Dr. rer. nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthday     

Segregation and Stability in Surface Alloys: PdxRu1−x/Ru(0001) and PtxRu1−x/Ru(0001)

The stability of PdRu/Ru(0001) and PtRu/Ru(0001) surface alloys and the tendency for surface segregation of Pd and Pt subsurface guest metals in these surface alloys is studied by scanning tunneling microscopy (STM) and Auger electron spectroscopy (AES). Atomic resolution STM imaging and AES measurements reveal that upon overgrowing the surface alloys with a 1–2 monolayer Ru film and subsequent annealing to the temperatures required for initial surface alloy formation, the Ru‐covered Pd (Pt) atoms float back to the outermost layer. The lateral distribution of these species is also essentially identical to that of the initial surface alloys, before overgrowth by Ru. In combination, this clearly demonstrates that the surface alloys represent stable surface configurations, metastable only towards entropically favored bulk dissolution, and that there is a distinct driving force for surface segregation of these species. Consequences of these data on the mechanism for surface alloy formation are discussed.     

The diffusion of Pt in BST films on Pt/Ti/SiO2/Si substrate by sol-gel method

Barium strontium titanate (Ba_0.65Sr_0.35TiO₃) ferroelectric thin films have been prepared by sol-gel method on Pt/Ti/SiO₂/Si substrate. The X-ray diffraction (XRD) pattern indicated that the films were a polycrystalline perovskite structure and the atomic force microscope (AFM) image showed that the crystallite size and the root mean square roughness (RMS) were 90 nm and 3.6 nm, respectively. The X-ray photoelectron spectrum (XPS) images showed that Pt consisting in BST thin films was the metallic state, and the Auger electron spectroscopy (AES) analysed the Pt concentration in different depth profiles of BST thin films. The result displayed that the Pt diffusion in BST thin film is divided into two regions: near the BST/Pt interface, the diffusion type was volume diffusion, and far from the interface correspondingly, the diffusion type became grain boundary diffusion. In this paper, the previous researcher’s result was used to verify our conclusion.     

XPS and XAES analysis of copper,arsenic and sulfur chemical state in enargites

Enargite, a copper arsenic sulfide with the formula Cu₃AsS₄ is of environmental concern due to its potential to release toxic arsenic species. The oxidation and dissolution of enargite are governed by the composition and chemical state of the outermost surface layer. Qualitative and quantitative analysis of the enargite surface can be initially obtained on the basis of X‐ray photoelectron spectroscopy (XPS) binding energy and intensity data. However, a more precise determination of the chemical state of the principal elements of enargite (copper, arsenic and sulfur) in the altered surface layer and in the bulk of the mineral requires a combined analysis based on XPS photoelectron lines and the corresponding X‐ray excited Auger lines. On the basis of results obtained on natural and synthetic enargite samples and on standards of sulfides and oxides, the Auger parameter α′ of different compounds was calculated and the Wagner chemical state plots were drawn for arsenic, copper and sulfur. Arsenic in enargite is found to be in a chemical environment similar to that of arsenides or elemental arsenic, whereas copper in enargite is in a chemical state that corresponds to copper sulfide, Cu₂S, for all samples irrespective of surface treatment (natural or freshly cleaved). Only sulfur changed from a chemical state similar to that of copper or iron sulfide in freshly cleaved samples to another state in natural enargite in the as‐received state. Thus, it is the sulfur atom at the surface of enargite that is most susceptible to changes in the enargite surface state and composition. A more detailed interpretation of this behavior, based on differences in the initial and final state effects, is proposed here. The concept of Auger parameter and chemical state plot, used here for the first time for investigating enargite, has proved to be a method to unambiguously assign the chemical state of the principal elements copper, arsenic and sulfur in these minerals. Copyright © 2006 John Wiley & Sons, Ltd.     

俄歇化学位移及其在表面化学上的应用

从俄歇电子激发过程讨论了化学位移和元素化合价以及电负性的关系, 提供了常用元素在不同化合物中的俄歇电子动能及化学位移数据, 运用俄歇化学位移研究了氧在锌表面的吸附和初始氧化反应, Ti/SiO_2的界面固相反应机理以及摩擦过程中润滑膜的组成和结构.     

Automatic spike correction using UNIFIT 2020

The improvement of the software UNIFIT 2020 from an analysis processing software for photoelectron spectroscopy (XPS) only to a powerful tool for XPS, Auger electron spectroscopy (AES), X-ray absorption spectroscopy (XAS), and Raman spectroscopy requires new additional programme routines. Particularly, the implementation of the analysis of Raman spectra needs a well-working automatic spike correction. The application of the modified discrete Laplace operator method allows for a perfect localization and correction of the spikes and finally a successful peak fit of the spectra. The theoretical basis is described. Test spectra allow for the evaluation of the presented method. A comparison of the original and spike-corrected real measurements demonstrates the high quality of the method used.     

Recent progress in quantitative and high spatial resolution AES

Progress in high resolution Auger electron spectroscopy (HR-AES or scanning Auger microscopy, SAM) during the past few years is characterized by the use of efficient field emission electron sources, parallel detection capabilities and improved data acquisition, storage and processing, thus enhancing spatial resolution (to about 10 nm), signal to noise figure and quantification of elements in different chemical bonding states, e.g. by routinely using factor analysis. Optimized ion sputtering facilities, particularly sample rotation, enable depth profiling with high, depth independent resolution. The basic features of SAM are discussed with respect to EPMA (electron probe micro-analysis), emphasizing fundamental limitations and future developments.     

On the use of AES data analysis to determine local enrichments of conversion coating elements at intermetallic particles on rolled Al

In this paper, the behaviour of the industrial applied Ti/Zr conversion coating (CC) pretreatment on rolled automotive aluminium samples (AA5182) is analysed. Due to its nanometre lateral and depth resolution, Auger electron spectroscopy (AES) is used to analyse the CC distribution at surface cathodic intermetallic particles. As a result of its high surface sensitivity, the AES technique is very susceptible to differences in the top contamination layer thickness. It is demonstrated that AES point measurements performed on aluminium model samples coated with 1.5 and 3 nm of Ti (oxide) layer cannot differentiate the two-layer thicknesses if a difference in the top contamination thickness is not taken into account. A data analysis methodology is introduced, based on the ratio of normalized peak areas (enrichment ratios), to eliminate the effect of the contamination layer thickness. The experimental validation of the methodology is performed on the model samples, demonstrating errors of 2% on the enrichment ratios on similar samples with different contamination layer thicknesses, while the conventional spectra quantification results in errors of 49%. The methodology is also theoretically substantiated within certain constraints. By the use of the AES methodology, an enriched Ti and Zr deposition is confirmed at the cathodic intermetallic particles at the surface of the industrial no-rinse CC sprayed automotive aluminium sheet samples.     

The angle-resolved self-ratio technique for surface depth profile investigations by XFS,EMA, XPS and AES

The angle-resolved self-ratio (AR/SR) technique is a non-destructive, low-damage measuring technique in which the intensity I of an excited, analyte-characteristic radiation is measured as a function of the take-off angle from the surface plane for the purpose of obtaining quantitative depth information about the chosen analyte from the gradient dI/d. The depth information may be any of the following: the type of depth profile, the centroid depth of this profile, the thickness of a uniform overlayer, the stoichiometry of a uniform overlayer, the thickness of a uniform buried layer, and others. The AR/SR technique is one of a number of variants of the angle-resolved technique which is particularly suited for practical application because this mode combines an acceptable measuring effort with a simplicity and transparency of evaluation (by use of analytical formulae) not available with other procedures. The capabilities and limitations of the AR/SR technique in particular are reviewed, with special reference to four methods with which the technique has found application, viz. X-ray fluorescence spectrometry (XFS), electron microbeam analysis (EMA), X-ray photoelectron spectrometry (XPS) and Auger electron spectrometry (AES). Emphasis is placed on the role assigned to AR/SR/XFS and AR/SR/EMA in certification of ion-implanted reference materials.Invited lecture at 15th Colloquium on Materials Analysis, Wien, May 27–29, 1991     

Interlaboratory study comparing analyses of simulated angle‐resolved X‐ray photoelectron spectroscopy data

An interlaboratory study has been conducted to determine the following: (i) the similarities and differences of film thicknesses and composition profiles obtained from analyses of simulated angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) data by different analysts using different algorithms for data analysis, and (ii) the effects of two assumptions commonly made in data‐analysis algorithms for ARXPS on derived film thicknesses and composition profiles. The analyzed data were generated by the National Institute of Standards and Technology Database for the Simulation of Electron Spectra for Surface Analysis, (SESSA) which provides a simple way to study the influence of the aforementioned effects on compositional depth profile reconstruction. Sets of simulated ARXPS data were produced for thin films of SiO₂, SiON, HfO₂, and HfON of varying thicknesses on a Si substrate. For some HfON films, the N concentration varied with depth. Eleven groups participated in the round robin study. The majority (eight) employed a commercial ARXPS instrument in which the angular distribution is measured for a fixed sample geometry, in contrast to conventional ARXPS in which the sample is tilted for angular variation. The average deviations between the reported average depth, film thickness, and amount of material typically varied between 20% and 30% but were considerably larger, between 30% and 80%, for some cases. The average errors were generally larger for simulations that included elastic scattering and the finite analyzer‐acceptance angle (realistic conditions) than those for simulations that neglected elastic scattering and the finite analyzer‐acceptance angle (simplified conditions). The retrieved N depth profiles were quantitatively different from the true depth profiles and showed substantial variability among the group of members who used the same instrument and analysis software. Copyright © 2014 John Wiley & Sons, Ltd.     

On the use of elastic peak electron spectroscopy (EPES) to measure the H content of hydrogenated amorphous carbon films

Quasi‐elastic scattering of 1–2 keV electrons is considered with respect to measuring the H content in hydrogenated amorphous carbon (a‐C:H) materials. Interest in the technique lies in the fact that H cannot be typically detected by electron spectroscopic means (AES or XPS for instance). The feasibility of the approach is demonstrated and a quantification procedure is proposed. At the same time however, limitations of the technique (electron stimulated H desorption, low intensity of the H related signal and its spectral interference with the π‐plasmon peak) are discussed. Copyright © 2008 John Wiley & Sons, Ltd.     

二价钇配位化合物的ESCA的表征

本文用钇的3P_(1/2)和3P(3/2)的间距及3P能级的半高宽(FWHM)的变化以及￥4s能级的多重分裂确定了新合成的有机金属化合物的价态。在铝靶上,利用轫致辐射诱导的俄歇谱,对高动能的YL_3M_(45)M_(45)峰(大约1737eV)进行了研究,进一步验证了钇的价态。这与X射线衍射的结果相互补充。     

Analysis of the antitarnish film on a tin surface by x-ray photoelectron spectroscopy and Auger electron spectroscopy

A corrosion-resistant complex film formed in ethylenediaminetetra(methylidenephosphonic acid) (EDTMP) solution was determined by x-ray photoelectron spectroscopy and Auger electron spectroscopy to consist of 48.0% O, 11.7% Sn, 7.7% N, 22.1% C and 10.5% P. From the differences in the binding energies of Sn, N and O before and after film formation and the RPO^2?₃ and SnN vibrations in the Raman spectrum of the film, it was deduced that N and O in EDTMP were coordinated with Sn in the film.