316L不锈钢表面预氧化处理的抑焦效果研究

为了抑制金属表面的催化结焦,本文系统研究了预氧化处理对316L不锈钢表面元素迁移、相组成和微观结构的影响,并通过环己烷常压高温裂解实验探讨了预氧化处理对表面结焦的影响。实验结果表明,随着氧化温度的升高,金属基体中元素迁移加剧,金属表面Mn、Cr元素含量逐渐增加,Fe、Ni元素含量逐渐减少,金属表面的颗粒逐渐长大,氧化温度为900℃时,金属表面形成一层厚度约为2.5μm的致密氧化膜;随着氧化温度的升高,金属表面结焦量逐渐降低,丝状焦炭逐渐减少,900℃氧化后的试样表面几乎没有丝状焦碳生成,焦炭的石墨化程度较低,结焦抑制率达到78%。     

溅射AlY涂层对不锈钢热腐蚀性能的影响

采用直流磁控溅射法在1Cr18Ni9Ti奥氏体不锈钢表面制备Al Y涂层,并对部分涂层进行600℃真空扩散退火和预氧化处理,研究了不锈钢和具有不同状态Al Y涂层的不锈钢的热腐蚀行为。结果表明:不锈钢以及涂层试样的腐蚀动力学近似服从抛物线规律;24 h腐蚀后,不锈钢试样增重最大,涂层试样增重比不锈钢试样小,三种涂层试样中,增重从大到小依次是:未处理的涂层试样、真空扩散退火试样及预氧化试样。不锈钢在Na2SO4盐膜下腐蚀24 h后,形成了以Cr2O3和Ni O为主,及少量Fe2O3的氧化膜;在不锈钢表面溅射Al Y涂层并经过适当的预处理,促进了表面Al2O3及Cr2O3保护膜的形成,抑制了基体金属的氧化,提高了不锈钢的热腐蚀抗力。     

TiNi合金表面原位热氧化膜的结构与光电性能的研究

采用AFM、XRD和EDS等手段,对TiNi合金在空气中、400—800℃下形成的氧化膜组织结构进行了分析,并对TiNi合金表面原位热氧化膜的光电性能进行了研究.结果表明,TiNi合金在空气中氧化原位形成的氧化膜的结构主要为金红石型二氧化钛,不同温度下生长的氧化膜存在择优取向;随着氧化温度的升高,所制备的TiO2/TiNi电极的稳态光电流和开路光电压随氧化温度的升高先增大后减小,在700℃所制备的TiO2/TiNi电极的稳态光电流最大.     

聚邻氨基酚/Ni2+修饰碳糊电极的制备及其对葡萄糖的电催化氧化

以循环伏安法在碳糊电极(CPE)表面上修饰聚邻氨基酚膜(P-OAP),再以浸泡吸附法在此膜中嵌入金属离子Ni2 ,制成Ni/P-OAP/CPE。该电极在0.09mol/LNaOH溶液中通过90圈扫描活化后,在-0.15至0.65V区间出现一对峰形良好且稳定的氧化还原峰。循环伏安实验发现,Ni/P-OAP/CPE对葡萄糖的电氧化有良好的催化特性,催化活性受薄膜的厚度、薄膜中Ni2 的浓度、电极的活化时间以及电解液组成的影响。实验结果表明:该电极是一种良好的无酶葡萄糖传感器。     

铝阳极氧化膜在中性NaCl溶液中的亚稳态点蚀研究

使用动电位极化法,电化学噪声和扫描电镜技术研究了工业纯铝L2经不同电流密度阳极氧化和不同方法封闭后于1mol/LNaCl中性溶液中的腐蚀行为.结果表明,阳极氧化能大大提高L2的耐蚀性,但当氧化膜较薄或氧化膜经长时间在溶液中浸泡后,试样表面仍能发生亚稳态点蚀,并在极化曲线上出现电流振荡和电位振荡.扫描电镜观察则表明,这些亚稳态点蚀孔径一般小于10μm,主要产生在膜中的金属间化合物周围.若氧化膜厚度增加或使用沸水和重铬酸盐封闭,均可有效地抑制亚稳态点蚀的发生.     

稀土微合金化5Cr21Mn9Ni4N钢高温氧化行为

研究了稀土微合金化5Cr21Mn9Ni4N钢在700-900℃范围内的抗氧化性能。结果表明：在700～900℃范围内，5Cr21Mn9Ni4N钢中加入0．2％（质量分数）稀土后，均使氧化指数n增大，氧化速率常数kp减小，氧化激活能增大，稀土的加入没有改变耐热钢氧化膜的相组成，而是改善了氧化膜的结构，提高了氧化膜的热稳定性和粘附性，从而提高了耐热钢的高温抗氧化性能。随着氧化温度的升高，耐热钢氧化膜组成从锰的氧化物为主向铁的氧化物占较大比重转变，致密度和抗剥落性下降，氧化膜中铁的氧化物大量出现和氧化膜疏松是抗氧化性能降低的主要原因。     

六硼化镧于800及1000℃时在空气中的氧化作用

1.用称重、化学分析、X射线相分析等方法研究六硼化镧于800及1000°在空气中的氧化作用。2.在试验中采用酸洗除氧化膜方法求得真实氧化量、结果表明以原试样单位表面积计的氧化量(μ)随温度、时间的增加而增加。3.生成物之一氧化硼在试验条件下将部分挥发。由于氧化硼挥发速度的差(己廾)导致800°与1000°时生成的氧化膜之组成有所不同,而试样在各温度下不同的重量变化系氧化增重和氧化硼挥发而减重两因素加合的结果。     

Y2O3薄膜处理对3Cr25Ni7N合金的抗高温氧化性能的影响

采用电沉积-热解法在3Cr25Ni7N合金表面制备了Y2O3薄膜,并研究了薄膜处理对合金在1000℃空气中的抗高温氧化性能的影响。氧化动力学曲线、SEM及XRD分析结果表明,Y2O3薄膜处理使合金表面氧化膜以尖晶石结构为主,氧化膜致密,有效地抑制了Cr2O3的挥发反应,且氧化膜与基体的附着性好,因此合金在高温下的抗氧化性能得到提高,这与氧化钇薄膜在较低温度下抗高温氧化性能提高的机制是不同的。在不同温度下,Y2O3薄膜处理均可以有效提高合金的抗高温氧化性能。     

SiC表面Ni沉积超疏水膜层的形成机理

前期采用环境友好方法制备的改性碳化硅颗粒,经较长时间放置,发现其由亲水性转变为超疏水性,接触角为156°。为解释这一新的现象,采用扫描电子显微镜、能谱、(高分辨)透射电子显微镜、X射线光电子能谱(XPS)对原粉碳化硅、改性后碳化硅及久置碳化硅进行了测试与分析。结果显示：改性后碳化硅经较长时间放置,表面胞状颗粒增大并出现凸起物,粗糙度增加,存在类似于荷叶的微纳米结构。改性后颗粒的主要成分为Ni、Si、O,其中凸起处Ni、O元素的含量明显高于凹陷处。Ni颗粒表面出现清晰的膜层,膜层厚度为2~3 nm,但结晶度偏低。XPS测试结果显示金属镍的特征峰正向移动近4eV,与镍的氧化态特征峰相一致,从而解释了颗粒表面形态发生细小改变,自发形成超疏水膜层的机理。     

SiC表面Ni沉积超疏水膜层的形成机理

前期采用环境友好方法制备的改性碳化硅颗粒,经较长时间放置,发现其由亲水性转变为超疏水性,接触角为156°。为解释这一新的现象,采用扫描电子显微镜、能谱、(高分辨)透射电子显微镜、X射线光电子能谱(XPS)对原粉碳化硅、改性后碳化硅及久置碳化硅进行了测试与分析。结果显示：改性后碳化硅经较长时间放置,表面胞状颗粒增大并出现凸起物,粗糙度增加,存在类似于荷叶的微纳米结构。改性后颗粒的主要成分为Ni、Si、O,其中凸起处Ni、O元素的含量明显高于凹陷处。Ni颗粒表面出现清晰的膜层,膜层厚度为2～3 nm,但结晶度偏低。XPS测试结果显示金属镍的特征峰正向移动近4 eV,与镍的氧化态特征峰相一致,从而解释了颗粒表面形态发生细小改变,自发形成超疏水膜层的机理。     

Model of electrochromic and related phenomena in tungsten oxide thin films

We have developed a model of electrochromic and related phenomena in tungsten oxide thin films based on the assumption that the constitution of such films is heterogeneous and built up of nanosized particles, pores and adsorbed substances (mainly water). It is discussed why a high-efficiency reversible blue colour is observed in amorphous tungsten oxide films (α-WO₃ films) as well as why such porous thin films with polycrystalline or amorphous constitution and with a variety of particle properties can be easily obtained by a physical vapour deposition process in a low-pressure atmosphere in the presence of water. A substrate temperature in the range 450–550 K corresponds to some plateau on the water desorption curves which divided physically adsorbed water from chemically adsorbed water. Two types of structural units based on tetrahedrally and octahedrally coordinated tungsten ions have the main role in the formation of the film constitution. The tetrahedral structural units have a glass-forming function, but the octahedral ones have a modification function. From the electrochemistry point of view, the internal multiphase interfaces in such films are distributed multiphase electrodes. The adsorbed water together with defects of the oxide particles provide reagents for reversible coloration reactions in the film. The colour centres can be induced thermally (oxygen nonstoichiometry) or electrically (injected ions) or by radiation (photoinjected hydrogen). The electrochromism and related phenomenon of α-WO₃ films can be directly related to ion insertion/extraction processes controlled by external forces. Electronic Publication     

Surface analysis and corrosion resistance of new nickel base thin film alloys

Electroless Zn–Ni–P thin films were deposited on low carbon steel from an alkaline non‐cyanide aqueous electrolyte. The newly developed ternary alloys structure and microstructure investigations were carried out via X‐ray diffraction and SEM. Chemical composition of the coatings was investigated via energy dispersive spectroscopy. Polarization tests were used to study the corrosion properties of the coatings in a 3.5 wt.% NaCl solution. The results confirmed the high corrosion resistance of Zn–Ni–P alloy plated steel sheet. The surface analysis of the thin film samples before and after corrosion was performed by XPS. The incorporation of Zn in Ni–P thin film is proven for all initial samples to be as a mixture of zinc and zinc oxide, while nickel exists in +2 and +3 oxidized states. A passive film of a mixture of oxide and hydroxide of zinc and nickel forms on the surface and prevents the Zn–Ni–P thin films from corrosion. Copyright © 2014 John Wiley & Sons, Ltd.     

Thickness dependence of the structural,mechanical and electrical properties of Ni films deposited on polyimide by ion beam‐assisted deposition (IBAD)

Ni thin films with different thicknesses were deposited on pre‐treated polyimide substrates by ion beam‐assisted deposition. Dependence of structural, mechanical and electrical properties of the Ni films on their thickness was investigated. The results showed a clear correlation between film properties and film thickness. The inter‐diffusion at the interface regions of the films with different deposition time were demonstrated by transmission electron microscopy and X‐ray photoelectron spectroscopy. With increasing film thickness, surface roughness of the Ni films firstly decreased and then increased, while the grain size gradually increased. Residual stress of the Ni thin films decreased with increasing Ni film thickness up to 202 nm and then slightly increased as the film thickness further increased. Resistivity decreased, and temperature coefficient of resistivity (TCR) increased with increasing film thickness due to the enhancement of crystallization degree and the increase in grain size. The decrease in surface roughness and residual stress also contributed to the decrease of resistivity and the increase of TCR of the films. An optimal film thickness is suggested, which yielded a relatively high TCR value and low levels of both surface roughness and residual stress. Copyright © 2012 John Wiley & Sons, Ltd.     

Magnetron formation of Ni/YSZ anodes of solid oxide fuel cells

Physico-chemical and structural properties of nanocomposite NiO/ZrO₂:Y₂O₃ (NiO/YSZ) films applied using the reactive magnetron deposition technique are studied for application as anodes of solid oxide fuel cells. The effect of oxygen consumption and magnetron power on the discharge parameters is determined to find the optimum conditions of reactive deposition. The conditions for deposition of NiO/YSZ films, under which the deposition rate is maximum (12 μm/h), are found and the volume content of Ni is within the range of 40–50%. Ni-YSZ films reduced in a hydrogen atmosphere at the temperature of 800°C have a nanoporous structure. However, massive nickel agglomerates are formed in the course of reduction on the film surface; their amount grows at an increase in Ni content in the film. Solid oxide fuel cells with YSZ supporting electrolyte and a LaSrMnO₃ cathode are manufactured to study electrochemical properties of NiO/YSZ films. It is shown that fuel cells with a nanocomposite NiO/YSZ anode applied using a magnetron sputtering technique have the maximum power density twice higher than in the case of fuel cells with an anode formed using the high-temperature sintering technique owing to a more developed gas-anode-electrolyte three-phase boundary.     

负偏压下Ag@AgBr/Ni膜电极光电催化降解罗丹明B的性能和机理

用电化学方法制备Ag@AgBr/Ni表面等离子体薄膜电极,以扫描电子显微镜（SEM）、X射线衍射（XRD）和紫外-可见漫反射光谱（UV-Vis DRS）对薄膜的表面形貌、晶相结构、光吸收特性进行了表征,在负偏压和可见光作用下,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用电化学技术和向溶液中加入活性物种捕获剂的方法对薄膜光电催化降解机理进行了探索。结果表明：最佳工艺下制备的Ag@AgBr/Ni膜电极是由表面沉积纳米Ag的纳米晶AgBr颗粒构成的薄膜,具有显著的表面等离子共振效应。薄膜具有优异的光电催化活性和良好的催化稳定性,在最佳负偏压和可见光照射下反应12 min,薄膜光电催化罗丹明B（c=5 mg·L^-1）的降解率是多孔TiO₂（P25）/ITO纳米薄膜的10.2倍。相对于未加偏压的光催化,降解率提高了2.0倍;在保持薄膜光催化活性基本不变的前提下可循环使用5次。电极表面纳米Ag粒子的等离子体共振对于光阴极反应（价带反应）的活化作用是光电催化活性提高的重要原因。提出了负偏压下Ag@AgBr/Ni表面等离子体薄膜光电催化降解罗丹明B的反应机理。     

负偏压下Ag@AgBr/Ni膜电极光电催化降解罗丹明B的性能和机理

用电化学方法制备Ag@Ag Br/Ni表面等离子体薄膜电极,以扫描电子显微镜(SEM)、X射线衍射(XRD)和紫外-可见漫反射光谱(UV-Vis DRS)对薄膜的表面形貌、晶相结构、光吸收特性进行了表征,在负偏压和可见光作用下,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用电化学技术和向溶液中加入活性物种捕获剂的方法对薄膜光电催化降解机理进行了探索。结果表明:最佳工艺下制备的Ag@Ag Br/Ni膜电极是由表面沉积纳米Ag的纳米晶Ag Br颗粒构成的薄膜,具有显著的表面等离子共振效应。薄膜具有优异的光电催化活性和良好的催化稳定性,在最佳负偏压和可见光照射下反应12 min,薄膜光电催化罗丹明B(c=5 mg·L~(-1))的降解率是多孔Ti O2(P25)/ITO纳米薄膜的10.2倍。相对于未加偏压的光催化,降解率提高了2.0倍;在保持薄膜光催化活性基本不变的前提下可循环使用5次。电极表面纳米Ag粒子的等离子体共振对于光阴极反应(导带反应)的活化作用是光电催化活性提高的重要原因。提出了负偏压下Ag@Ag Br/Ni表面等离子体薄膜光电催化降解罗丹明B的反应机理。     

Thermal and optical properties of newly synthesized dicholesteryl esters with a phenylene oxide link in the normal and solidified cholesteric phases

A series of liquid crystalline compounds with a central phenylene oxide group to which two cholesteryl groups are attached via two alkanoate spacers has been synthesized and investigated. All the compounds except the one with ethanoate spacers showed a cholesteric phase as a single mesophase. The phase transition temperatures, the corresponding enthalpy changes and the wavelengths of selective reflection associated with the cholesteric phases showed a strong odd-even effect as a function of the spacer length. By rapid cooling of the compounds from the cholesteric phase to 0°C, solid films maintaining a cholesteric molecular order were obtained. At room temperature, the solid film showed stable cholesteric colours controlled by changing the temperature at which the rapid cooling was begun. Heating the cholesteric solid film of the compound with hexanoate spacers gave two forms of crystals above 80°C, whose ratio changed depending on the colour of the starting solid films. This result suggests the existence of two conformational isomers in the liquid crystalline state. Since it is possible repeatedly to fix stable red, green and blue colours by thermal treatment of this compound, we may apply it to a rewritable full colour recording in the thermal mode.     

Thermal and optical properties of newly synthesized dicholesteryl esters with a phenylene oxide link in the normal and solidified cholesteric phases

A series of liquid crystalline compounds with a central phenylene oxide group to which two cholesteryl groups are attached via two alkanoate spacers has been synthesized and investigated. All the compounds except the one with ethanoate spacers showed a cholesteric phase as a single mesophase. The phase transition temperatures, the corresponding enthalpy changes and the wavelengths of selective reflection associated with the cholesteric phases showed a strong odd-even effect as a function of the spacer length. By rapid cooling of the compounds from the cholesteric phase to 0°C, solid films maintaining a cholesteric molecular order were obtained. At room temperature, the solid film showed stable cholesteric colours controlled by changing the temperature at which the rapid cooling was begun. Heating the cholesteric solid film of the compound with hexanoate spacers gave two forms of crystals above 80°C, whose ratio changed depending on the colour of the starting solid films. This result suggests the existence of two conformational isomers in the liquid crystalline state. Since it is possible repeatedly to fix stable red, green and blue colours by thermal treatment of this compound, we may apply it to a rewritable full colour recording in the thermal mode.     

Influence du pH sur les proprietes chimiques et structurales des films d'oxyde formes sur l'acier 316L et les alliages 600 et 690 dans les milieux aqueux a haute temperature

Influence of pH on the chemical and structural properties of the oxide films formed on 316L stainless steel, alloy 600 and alloy 690 in high temperature aqueous environments. The oxide films formed on 316L stainless steel, alloy 600 and alloy 690 at 320°C in high temperature aqueous environments of different pH have been examined by glow discharge optical spectroscopy, scanning electron microscopy, atomic force microscopy and capacitance measurements. The analytical study reveals that the films formed at pH 5 are mainly composed of chromium oxides. When the pH increases the chromium concentration decreases and those of the other two elements (Ni and Fe) tend to increase. The films formed at pH 5 on 316L stainless steel and alloy 600 are thick and powder-like. The film formed at the same pH on alloy 690 is thin and is composed of a compact protective inner layer and a less-compact outer layer formed by crystals of mixed iron-nickel-chromium oxides. The morphological appearance of the thick films and that of the thin films is very different. However, equivalent morphologies can be observed for the relatively thin duplex films formed at pH8 and pH9.5 on the 316L stainless steel and nickel-base alloys. The evolution of the chemical composition of the films is accompanied by important changes from the point of view of their semiconductivity.     

Effects of deposition temperature and annealing temperature on the morphology and electrochemical capacitance of Ni(OH)2 thin films

In this paper, we report 3D nickel (II) hydroxide thin films with porous nanostructures prepared on Ni foam by direct current electrodeposition from aqueous solution of Ni(NO₃)₂ through basic chemicals. The effect of deposition temperature on Ni(OH)₂ thin film morphology is examined by field emission scanning electron microscopy, which is found to have significant influence on capacitance performance of Ni(OH)₂ thin films. Moreover, the effect of annealing temperature on electrochemical capacitance and long-time stability of Ni(OH)₂ thin films is investigated. An optimum-specific capacitance value of 2,447?farads?g^?1 is obtained for Ni(OH)₂ thin film deposited at 20?°C and annealed at 100?°C.