| TiNi合金表面原位热氧化膜的结构与光电性能的研究 |
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| 引用本文： | 王改田,涂江平,张文魁,张博,袁永锋,黄辉,甘永平.TiNi合金表面原位热氧化膜的结构与光电性能的研究[J].影像科学与光化学,2005,23(3). |
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| 作者姓名： | 王改田 涂江平 张文魁 张博 袁永锋 黄辉 甘永平 |
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| 作者单位： | 浙江大学,材料系,浙江,杭州,310027;浙江工业大学,化学与材料学院,浙江,杭州,310032 |
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| 摘 要： | 采用AFM、XRD和EDS等手段,对TiNi合金在空气中、400—800℃下形成的氧化膜组织结构进行了分析,并对TiNi合金表面原位热氧化膜的光电性能进行了研究.结果表明,TiNi合金在空气中氧化原位形成的氧化膜的结构主要为金红石型二氧化钛,不同温度下生长的氧化膜存在择优取向;随着氧化温度的升高,所制备的TiO2/TiNi电极的稳态光电流和开路光电压随氧化温度的升高先增大后减小,在700℃所制备的TiO2/TiNi电极的稳态光电流最大.
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| 关 键 词： | TiNi合金 TiO2 原位热氧化 光电响应 |
Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface |
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| WANG Gai-tian,TU Jiang-ping,ZHANG Wen-kui,ZHANG Bo,YUAN Yong-feng,HUANG Hui,GAN Yong-ping.Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface[J].Imaging Science and Photochemistry,2005,23(3). |
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| Authors: | WANG Gai-tian TU Jiang-ping ZHANG Wen-kui ZHANG Bo YUAN Yong-feng HUANG Hui GAN Yong-ping |
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| Abstract: | The preparation, structure and photoelectric properties of titanium oxide films formed by in-situ direct thermally oxidation of TiNi alloys were investigated by AFM ,XRD, EDS and photocurrent response. The results showed that the films is rutile TiO2, and its crystal orentation is dependent on the thermal oxidation temperature. With increasing the oxidation temperature, the photocurrent and open-circuit voltage of TiO2/TiNi electrode first increased, and then decreased. when the oxidation temperature was 700 ℃, the photocurrent of TiO2/TiNi electrode was the highest. |
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| Keywords: | TiNi alloy titanium oxide in-situ thermal oxidation photocurrent response |
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