1-取代-顺式-1,2-环己二醇单磺酸酯类酸增殖剂的合成和性质研究

用过氧化氢氧化烯烃得到顺式邻环己二醇,继而和对甲苯磺酰氯反应得到两种1-取代-顺式-1,2-环己二醇单磺酸酯.以溴酚兰作指示剂,用作者自己的方法定量测定了它们在聚乙二醇膜层中的酸解性能.结果表明,在光产酸剂所产酸作用下,在加热条件下这些化合物发生分解并产酸.这两个磺酸酯的储存稳定性不是很好,在极性溶剂作用下易分解,限制了它们在化学增幅型成像材料中的应用.     

一种适用于193nm光刻胶的硫盐光产酸剂的制备与性质

制备了一种阳离子含有萘基,阴离子分别为对 甲苯磺酸、甲磺酸及三氟甲磺酸的硫盐.它们有高的热解温度和在常用有机溶剂中较好的溶解性.测定了此类光产酸剂在水溶液及聚乙二醇固体膜层中的紫外吸收特性.结果表明,阴离子不含苯基时,在193nm处有很好的透明性.考察了其在低压汞灯照射下的光解性质,在254nm附近的吸收峰随光解进行迅速减弱.此类光产酸剂适用于氟化氩激光(193nm)等的化学增幅型光致抗蚀剂.     

酸增殖剂研究进展

本文综述了能有效提高化学增幅抗蚀剂体系感度的各种类型酸增殖剂及其酸增殖机理.对某些常用于光致抗蚀剂中的酸增殖剂的特性作了介绍.并对它们的应用前景、现存问题和改进方向进行了简单讨论和介绍.     

含碘鎓盐光产酸剂和增感染料的化学增幅型i-线正性光致抗蚀剂

4,4’-二甲苯基三氟甲磺酸碘鎓盐可以被染料增感,在365 nm光照时分解产酸.尽管产生的酸与染料的胺基发生作用,依然能在后烘过程中催化缩醛聚合物酸敏基团的分解,但需要稍高的后烘温度和稍长的后烘时间.基于此,本文将酚醛树脂、缩醛聚合物、碘鎓盐产酸剂和染料组成了一种新型的化学增幅型i-线正性光致抗蚀剂材料,在曝光量为10...     

磺酸肟酯类光产酸剂的制备及性能研究

本文合成了4种磺酸肟酯类非离子型光产酸剂,用核磁氢谱确认了产物结构,并测试了其热稳定性、紫外吸收特性及产酸效率.结果表明,合成的4种磺酸肟酯类光产酸剂在350-450 nm和深紫外区(DUV,248 nm)都有很好的吸收,在420 nm波段曝光下,(5-对三氟甲基苯磺酸酯亚胺-5H-噻吩-2-亚胺)-苯乙腈(P-2)产酸率最高,可达0.96;(5-对甲基苯磺酸酯亚胺-5H-噻吩-2-亚胺)-苯乙腈(P-1)在365 nm和420 nm两个波段下,均有较高的产酸率.利用实时红外(RT-IR)研究了相同浓度下4种光产酸剂对乙烯基醚化合物引发的光聚合动力学,同时研究了光产酸剂浓度对光聚合反应的影响,发现产酸剂浓度为2%时,光照30 s乙烯基醚化合物的双键转化率(DC%)即能达到80%.     

硫鎓盐产酸剂的合成及其产酸效率

合成了6种适用于248 nm光致抗蚀剂的硫鎓盐产酸剂,其中吩噻(噁)体系的产酸剂为自行设计合成. 利用IR、H NMR、UV等测试技术进行了结构表征和紫外吸收测定,各化合物的最大紫外吸收在250～285 nm之间,吸收域较宽,适用性较强.同时,利用酸敏染料罗丹明B遇酸异构变色的特点,使用紫外!可见分光光度计定量检测了6种产酸剂在乙腈溶剂中的产酸效率,其中硫杂蒽酮系列的产酸剂产酸性能最好. 最后使用荧光追踪法研究了溶剂极性对产酸效率的影响,发现产酸剂的产酸性能同溶剂的选取密切相关,随着溶剂极性的减小,产酸效率随之降低. 对6种硫鎓盐的产酸效率检测结果可以为产酸剂进一步用于248 nm光致抗蚀剂配方提供详细的参考.     

新型锍鎓盐类光生酸剂的合成及产酸性能研究

成功合成了两种新型锍鎓盐类光生酸剂,其结构经¹1HNMR和MS分析确认,并对其基本物性及在405、365nm光下乙腈溶液中的分解及产酸性能进行了研究,通过计算得出了分解及产酸量子产率.结果表明,两种化合物有较高的热分解温度和在常用有机溶剂中有较好的溶解性;在405nm光源下,4-(9′-苯基蒽基)苯基三氟甲磺酸锍鎓盐(PAGS1)和4-(4′-N,N-二乙基-1′-苯乙烯基)苯基三氟甲磺酸锍鎓盐(PAGS2)的分解量子产率分别为10%和15%,产酸量子产率为8.1%和13%;但在365nm光源下,分解及产酸量子产率均很低,说明两种光生酸剂对于405nm波长的光较敏感,适宜作为405nm光源下的光生酸剂.     

光产碱反应及其应用

光产酸剂作为光引发剂具有良好的引发效果，广泛应用于高分子领域，但使用光产酸剂会引起基材的腐蚀，而光产碱剂则无此弊病，故引起许多学者的兴趣。主要综述了光产碱剂和光产碱的类型、光化学反应机理及其应用。     

双光子技术在光生酸剂中的应用研究

自2000年以来,双光子技术开始应用于光生酸剂体系中,并取得了一定的研究进展。双光子技术在光生酸剂中的应用主要有两种情况:一是单分子体系,即光生酸剂分子本身具有较高的双光子吸收截面,可以在双光子激发下产生光酸;二是双分子体系,由具有较高吸收截面的敏化剂分子和光生酸剂分子组成,通过分子间电子转移的方式产生光酸。本文就这一类具有特殊光学性质的有机分子体系的构成及其应用进行了综述,介绍了不同类型的可以利用双光子技术的光生酸剂体系,总结了双光子技术在光生酸剂发展中面临的一些关键问题,展望了双光子技术在光生酸剂中的发展方向。     

酸分解高分子的新进展

本文综述了80年代酸分解高分子的进展,并对其作了详细分类。以其不同的结构特征阐明了它们的酸解机理。本文还对酸解高分子用于成像材料、特别是化学增幅抗蚀剂的前景作了展望。     

Methacrylic silicon-containing tercopolymers for chemically amplified resists

Tercopolymers of methyl methacrylate with methacrylic acid and dimethylphenyl (methyldiphenyl)silyl methacrylates are synthesized and investigated as components of chemically amplified resistive formulations with sulfonium and iodonium salts as photoacid generators for UV lithography in the 254-nm range. The surface behavior and the kinetics of dissolution of resistive films in an aqueous solution of tetraethylammonium hydroxide in relation to the concentration of onium salts and the temperatures of postapply and postexposure bakes are studied. The introduction of sulfonium salt into the resistive formulation brings about an increase in the solubility of unexposed films, thereby erasing the difference in dissolution rates of exposed and unexposed areas of a resist and preventing image formation. The iodonium salt plays the role of an inhibitor for dissolution of unexposed films of both copolymers, which makes it possible to obtain a high-contrast positive image in resists.     

Enhanced dissolution of copolymers bearing photobase- or photoacid-generating groups in polar solvents by photochemical formation of ionic pairs

Solubility changes in the irradiation of copolymers bearing photoacid- or photobase-generating groups and low molecular weight photobase generators (PBGs) or photoacid generators (PAGs) were investigated. Copolymers bearing acyloxyimino (AOI) groups were used as those generating pendant amino groups photochemically. Copolymers bearing o-nitrobenzyloxycarbonyl and imino sulfonate groups were used as those generating carboxy and sulfo groups, respectively. The solubility of copolymers bearing AOI groups into polar solvents was enhanced by added PAGs such as β-keto sulfones or imino sulfonates after irradiation. A similar enhancement was observed in copolymers bearing o-nitrobenzyloxycarbonyl groups in the presence of PBGs such as oxime esters or o-nitrobenzyl carbamates. These results showed that the formation of acid–base pairs on irradiation was effective for dissolution into polar solvents. Copolymers bearing imino sulfonate groups showed a high solubility, and no such enhancement was observed by PBG. Films of copolymers bearing β-keto sulfone groups became insoluble because of crosslinking. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 1708–1715, 2001     

Synthesis and photopolymerization of monomers bearing isopropenylphenoxy groups

The synthesis of a series of monomers containing isopropenylphenoxy groups was carried out. On irradiation with UV light in the presence of onium salt photoacid generators, these monomers undergo a chain extension reaction consisting of a dimerization followed by a Friedel-Crafts ring closure which results in the formation of polymers with indane groups in the backbone. Aryl imide-containing monomers bearing isopropenylphenoxy groups were also shown to undergo facile photoinduced cationic polymerization. The resulting polymers displayed excellent thermal stability. © 1995 John Wiley & Sons, Inc.     

Photochemistry of naphthalimide photoacid generators

The photophysical properties of a series of 1,8-naphthalimide photoacid generators were studied by steady state fluorescence and phosphorescence spectroscopy. Emission and excitation anisotropies, triplet quantum yields in polar and nonpolar solvent and photoacid generation were evaluated. The singlet excited state exhibits a low polarity and is strongly deactivated by an efficient intersystem crossing process. In protic solvent, a homolytic singlet cleavage of the N-O bond occurs and leads to the acid production. The existence of a triplet state close to the singlet state was clearly evidenced. The presence of close singlet excited states is supported by fluorescence anisotropy and picosecond laser spectroscopy experiments. Results of DFT calculations well confirm the experimental contentions and yield important information about the cleavage process involved in such compounds.     

Efficient Self‐Contained Photoacid Generator System Based on Photochromic Terarylenes

A series of highly sensitive neutral photoacid generators (PAGs) based on photochromic terarylenes was prepared. Like the example presented herein, these compounds show a subsequent thermal elimination of a Brønsted acid after a light‐triggered 6π‐electrocyclization, concomitant with the hexatriene aromatization. A novel type of molecular systems was developed, in which one thiazolyl moiety was replaced by a thienyl group. Depending on the solvents and on the nature of the acid source, the quantum yield (QY) for acid generation could reach up to 0.6. Comparative studies on the acid source clearly showed that aromatic leaving groups tend to extinguish the molecular system photoefficiency. A second type was also prepared, in which the nature of the hetero‐aromatic rings were identical to our previous example, but their sequence was modified. Therefore, a second level of improvement was achieved in nonpolar solvents, pushing the QY value up to 0.7. Finally, we demonstrated the mesylic acid‐releasing PAG as a photocatalyst in a chemically amplified positive resist system.     

Photochemistry of N‐Arylsulfonimides: An Easily Available Class of Nonionic Photoacid Generators (PAGs)

The photochemical behavior of differently substituted N‐arylsulfonimides was investigated. Homolysis of the S?N bond took place as the exclusive path from the singlet state to afford both N‐arylsulfonamides and photo‐Fries adducts, the amount of which depended on reaction conditions and aromatic substituents. Sulfinic and sulfonic acids were released upon irradiation under deaerated and oxygenated conditions, respectively. The nature of the excited states and intermediates involved were proved by laser flash photolysis and EPR experiments. These results highlighted the potential of such compounds as nonionic photoacid generators able to photorelease up to two equivalents of a strong acid for each mole of substrate.     

Deep UV photoresists based on poly(dl-tert-butyl fumarate)

Poly(di-tert-butyl fumarate) was prepared and evaluated as a potential candidate as a deep UV photoresist. Although this polymer displayed excellent sensitivity, the polymer was found to exhibit poor dry etch resistance. Copolymers of di-tert-butyl fumarate with either allyltrimethylsilane or styrene, and an onium salt as a photoacid generator were synthesized and subsequently evaluated using a 248-nm KrF excimer laser step-and-repeat system (stepper). At 248 nm, the absorbance of ～ 1 μm thick resist films was only 0.156-0.211. The sensitivities of these resists were 1-4 mJ/cm². The dry etch resistance of these photoresists was comparable to that of conventional positive photoresists based on novolac resins. © 1995 John Wiley & Sons, Inc.     

三嗪类化合物的合成及其产酸性能研究

合成了一系列的三嗪类光生酸剂1a—1e,确定了它们的结构,并对1e在乙腈溶剂中365和405nm光下的曝光分解产酸性能进行了初步的定量研究.结果表明,在测定浓度范围内分解量子产率和产酸量子产率基本上都不随浓度的变化而变化,在405nm光下比在365nm光下有更高的分解和产酸量子效率.有关这类化合物的光生酸性能与曝光波长的关系正在进一步研究中.     

Substituted 2-nitrobenzyltrichloroacetate esters for photodirected oligonucleotide detritylation in solid films

Oligonucleotide microarray fabrication by chemical synthesis using photoacid generators in solid films could have advantages over existing methods, but has not matched the accuracy of conventional synthesis where detritylation is performed with acid solutions. To address this problem, we explored the kinetics and equilibria of nucleoside detritylation in solid films, using trichloroacetic acid (TCA) generated by photolysis from its esters with substituted 2-nitrobenzyl alcohols. We synthesised 25 such esters, all alpha-phenyl substituted, and assessed their potential as solid film photoacid generators. They included sets with (i) mono- or dimethoxy-, (ii) 5-halo-, (iii) alkyl- or aryl-substituted 5-amino-, or (iv) 5-aryl-substituents in the 2-nitro- or 2,6-dinitrobenzyl ring. Absorption maxima of their UV spectra ranged from 230 to 410 nm, with quantum yields at 365 nm from < 0.01 to nearly 1.0. The esters formed optically clear solid films on glass slides without added polymer. Kinetics of intrafilm photoacid generation, proton activity changes and detritylation were measured in situ. The most effective esters for light sensitivity and detritylation were 5-chloro-, 5-bromo-, 4,5-dimethoxy-, and 4- or 5-aryl-substituted 2,6-dinitrobenzyl esters. Photoacid-induced increases in proton activity and detritylation were severely inhibited by polymers containing electronegative heteroatoms, but not by polymers lacking them. In solid films, intrafilm detritylation with photogenerated TCA was fast, but stopped at an equilibrium well short of completion. Both experiment and theory emphasise the inadequacy of attempting to force detritylation with high intrafilm acid activity.