Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion–Molecule Reactions of Interest to PECVD of α-Si:H Films

Plasma Chemistry and Plasma Processing - The mechanisms and kinetics for the thermal decomposition of SiH2+ and SiH3+ ions, and related reverse reactions involving their ion fragments have been...     

Special Issue of Plasma Chemistry and Plasma Processing Scale-Up of Plasma Reactors for Bio,Chemical, Environmental,Materials, and Energy Applications

Plasma Chemistry and Plasma Processing -     

Mg2+和Fe3+对反相微乳体系中胆红素钙形成的影响

在反相微乳体系中制备了一系列胆红素配合物,采用红外光谱、ICP-AES和Zeta电位进行了相关的测试与表征。结果表明:铁、镁离子与钙离子共同与胆红素发生了配位作用,且促进了体系中胆红素钙的生成;铁、镁离子的加入导致了胆红素配合物颗粒在水分散体系中的稳定性降低,易聚集。     

Atmospheric Pressure Non-thermal Plasma for Air Purification: Ions and Ionic Reactions Induced by dc+ Corona Discharges in Air Contaminated with Acetone and Methanol

Plasma Chemistry and Plasma Processing - Atmospheric pressure mass spectrometry (APCI-MS) was used to investigate the positive ions in air containing acetone (A), methanol (M) and mixtures thereof...     

Grid-Assisted Co-Sputtering Method: Background,Advancement, and Prospect

Plasma Chemistry and Plasma Processing - In this paper, the incorporation of auxiliary grids/electrodes into the design of the sputtering method is scrutinized by studying the impact of factors...     

Improvement of Seed Germination Rate,Agronomic Traits,Enzymatic Activity and Nutritional Composition of Bread Wheat (Triticum aestivum) Using Low-Frequency Glow Discharge Plasma

Plasma Chemistry and Plasma Processing - Plasma agriculture is an emerging field. In this report, we studied the effect of medium pressure (~?10 torr) low-frequency...     

Treatment of Pea Seeds with Plasma Activated Water to Enhance Germination,Plant Growth,and Plant Composition

Plasma Chemistry and Plasma Processing - The present study has been carried to investigate the interaction and effect of plasma activated water (PAW) on pea seeds. PAW is produced with the...     

Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 + Ion and Related Reverse Ion–Molecule Reactions of Interest to PECVD of a-Si:H Films

Plasma Chemistry and Plasma Processing - The thermal unimolecular decomposition of SiH4 + ion and its related reverse reactions, SiH3 + + H and SiH2 + + H2, have...     

NO Oxidation with NaClO,NaClO2, and NaClO3 Solution Using Electron Beam and a One Stage Absorption System

Plasma Chemistry and Plasma Processing - The reduction of high concentrations of NOX and SO2 has been studied for the simulation of NOX and SO2 removal from off-gases generated by diesel engines in...     

Stimulating Effects of Plasma Activated Water on Growth,Biochemical Activity,Nutritional Composition and Yield of Potato (Solanum tuberosum L.)

Plasma Chemistry and Plasma Processing - Atmospheric pressure multi-tube air bubble discharge plasma was generated with 0.5–10 kV, 0.05–5 kHz bipolar power supply...     

Underwater Electrical Discharges: Temperature,Density and Basic Instability Features with Different Anode Materials

Plasma Chemistry and Plasma Processing - Plasma temperature, density and arc dynamics have been investigated in underwater arc discharges under different anodic environments. Distinct differences...     

Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries

Plasma Chemistry and Plasma Processing - The comparative study of SiC and SiO2 etching kinetics as well as the evaluation of SiC etching mechanisms in CF4?+?Ar, Cl2?+?Ar and...     

Erratum: “Studies on Gas Purification by a Pulsed Microwave Discharge at 2.46 GHz in Mixtures of N2/NO/O2 at Atmospheric Pressure” [Plasma Chemistry and Plasma Processing,Vol. 21, No. 2, 2001]

Plasma Chemistry and Plasma Processing -     

Enhanced Adhesion Properties,Structure and Sintering Mechanism of Hydroxyapatite Coatings Obtained by Plasma Jet Deposition

Plasma Chemistry and Plasma Processing - Hydroxyapatite (HA) coatings were deposited on high purity titanium substrate by atmospheric plasma spraying (APS) with high electric energy input....     

Special Issue: Papers by Plenary and Invited Lecturers at the 24th International Symposium on Plasma Chemistry (ISPC 24), 9–14 June 2019, Naples,Italy

Plasma Chemistry and Plasma Processing -     

Quantum-Chemical and Theoretical Kinetics Studies on the Gas-Phase Unimolecular Decomposition Reaction of Sulfur Hexafluoride,SF6

Plasma Chemistry and Plasma Processing - The aim of this study is to calculate the unimolecular rate coefficients for the unimolecular decomposition reaction of the industrially important molecule,...     

Modeling of Thermogasdynamics and Thermal Processes of Volatile Halides of Elements of III,IV and VI Groups in Thermal Plasma of RF-IC Discharge at Atmospheric Pressure

Plasma Chemistry and Plasma Processing - A mathematical model has been proposed and verified, based on the combination of thermodynamic calculations of equilibrium plasma and CFD-modeling of the...     

Effects of Dielectric Barrier Discharge Plasma on Physicochemical Characteristics,Mechanical Properties and Biocompatibility of Silk/PVA Nanofibers

Plasma Chemistry and Plasma Processing - This work reports an investigation of the discharge characteristics of atmospheric dielectric barrier discharge (DBD) plasma in terms of I-V curves and...     

Plasma activated water: the next generation eco-friendly stimulant for enhancing plant seed germination,vigor and increased enzyme activity,a study on black gram (Vigna mungo L.)

Plasma Chemistry and Plasma Processing - Chemical fertilization in agriculture is threatening to the ecosystem. Therefore, the use of eco-friendly stimulant for crop revolution is highly desirable....     

Gas-phase kinetic measurements of the ligation of Ni+, Cu+, Ni(pyrrole)1,2+ and Cu(pyrrole)1,2+ with CO2, D2O, NH3 and NO

The rate and equilibrium kinetics of the reactions of the biologically important metal species M(+), M(+)(pyrrole) and M(+)(pyrrole)(2) (M = Ni, Cu) have been investigated with the biological gases CO(2), D(2)O, NH(3) and NO in the gas phase at 295 +/- 2 K in helium buffer-gas at a pressure of 0.35 +/- 0.01 Torr. The measurements were taken with an Inductively Coupled Plasma/Selected-Ion Flow Tube (ICP/SIFT) tandem mass spectrometer. Only ligation was observed for the reactions of bare Ni(+) and Cu(+) with CO(2), D(2)O and NH(3) with rates consistent with the known strengths of the resulting ligand-metal bonds. Both metal cations appeared to be oxidized and produce N(2)O in interesting reactions that are second order in NO. One pyrrole ligand was observed to increase the rate of ligation by as much as a factor of 100 and to switch off the oxidation with NO. Equilibrium was achieved for the ligation of CO(2), D(2)O and NO to both Ni(+)(pyrrole) and Cu(+)(pyrrole), and so it was possible to determine absolute values for the standard free energies of ligation. No ligand substitution was observed with M(+)(pyrrole). M(+)(pyrrole)(2) was observed to be generally unreactive towards the small molecules investigated: a notable exception is ammonia. Very fast ligand substitution reactions were observed for reactions of M(+)(pyrrole)(2) with NH(2).