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Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries |
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| Authors: | Lee Byung Jun Efremov Alexander Lee Junmyung Kwon Kwang-Ho |
| Institution: | 1.Dept. of Control and Instrumentation Engineering, Korea University, Sejong, 339-700, South Korea ;2.Dept. of Electronic Devices & Materials Technology, State University of Chemistry & Technology, 7 Sheremetevsky av., Ivanovo, Russia, 153000 ; |
| Abstract: | Plasma Chemistry and Plasma Processing - The comparative study of SiC and SiO2 etching kinetics as well as the evaluation of SiC etching mechanisms in CF4?+?Ar, Cl2?+?Ar and... |
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