基于螺旋刻划方法的KDP晶体临界切削厚度研究

为了取得贴近切削加工的临界切削厚度,本文提出了一种采用金刚石刀具对KDP晶体进行螺旋刻划、基于所得刻槽微观形貌特征参数计算临界切削厚度的新方法;分析了切削速度和材料各向异性对临界切削厚度的影响;通过切削实验验证所得临界切削厚度.结果表明,晶体材料的各向异性对临界切削厚度有显著影响;在低速切削范围内,切削速度对临界切削厚度影响不显著;基于所得临界切削厚度选择切削参数,实现了KDP晶体全晶向延性域切削,取得了表面粗糙度为2.57 nm(Ra)的超光滑表面.     

基于声发射的单晶SiC材料去除机理研究

根据声发射理论,采用金刚石刀具在自动划痕仪上进行SiC单晶塑脆转换的临界条件实验,建立了SiC划痕实验过程中的声发射(AE)信号模型,利用扫描电镜(SEM)观察SiC单晶的表面形貌.结果表明,SiC划痕过程中也存在着明显的声发射Kaiser效应点,表面的划痕和切屑也表明该单晶材料同其它典型硬脆材料如玻璃和硅类似,材料去除存在着塑性到脆性的转换过程,同时分析了划痕过程中的微细粉末状碎屑的产生机理和刀具角度与塑脆转换的关系.     

玻璃陶瓷车削表面形成机制及实验研究

以玻璃陶瓷为加工对象,通过单因素车削实验研究了硬脆性材料车削机理,分析了车削深度、车削速度和进给速度对表面粗糙度的影响规律.已加工表面质量观测结果表明,随着切削深度的增加,刀具与工件挤压作用增强,表面损伤加重;随着切削速度的增加,刀具与工件作用时间减小,裂纹扩展缩短,表面破坏减弱;将切削过程分为挤压与切削两个阶段,随着进给速度的增加,在挤压阶段刀尖和工件的接触区域产生更深层裂纹,切削阶段材料崩碎加剧.测量已加工表面粗糙度,结果表明:粗糙度随切削深度和进给速度增加而增加,随切削速度增加而减小.     

SiC单晶片研磨机理及试验

SiC因其优良的物理机械性能而广泛应用于大功率器件以及IC领域.但其高的硬度和脆性导致其加工过程非常困难.本文分析了SiC单晶在研磨过程中的材料去除机理,讨论了塑性去除时磨粒的临界切削深度,建立了塑性条件下的材料去除模型.采用不同粒度的金刚石磨粒对SiC晶片进行研磨实验,验证了理论模型的正确性,结果表明在塑性模式下的材料去除能获得良好的表面形貌和较低粗糙度,同时对不同磨粒粒度的材料去除率进行了讨论.     

不同碳源浓度金刚石涂层刀具切削石材的性能研究

采用不同碳源浓度金刚石涂层刀具与未涂层刀具铣削石材,研究切削参数对切削力及加工表面质量的影响,分析刀具磨损机理,找到金刚石刀具最佳切削参数,进而实现切削优化.采用正交实验法,通过测力仪测量出不同刀具、不同切削参数下的切削力,测试已加工材料的表面粗糙度,观测刀具磨损情况.结果表明,对铣削分力Fx、Fz影响最大的是涂层碳源浓度;对铣削分力Fy影响最大的是切削深度;对表面粗糙度影响最大的是进给速度;当主轴转速达到n=3000 r/min、进给速度为vf=300 mm/min、切削深度d=1.0 mm、涂层碳源浓度为3;时,刀具切削性能最佳;3;涂层碳源浓度金刚石刀具较其他碳源浓度(含未涂层)刀具,加工后的石材表面粗糙度最低、切削力最小、耐磨性高,提高了加工精度,延长刀具的使用寿命.     

单晶金刚石刀具切削各向同性热解石墨的磨损机理

为了研究各向同性热解石墨切削过程中单晶金刚石刀具磨损及其对加工质量的影响,对各向同性热解石墨材料进行了切削试验.观测了刀具磨损形貌的演变过程,分析了刀具磨损机理以及刀具磨损对加工表面质量的影响.研究结果表明,在切削距离逐渐增加的情况下,单晶金刚石刀具后刀面磨损区域逐渐增大,磨损形貌分为平行沟槽和微细网状两种.切削过程中产生的颗粒状切屑和交变应力分别是导致磨粒磨损和解理磨损的主要原因.切削距离300 m内,试件加工表面粗糙度值Ra在0.2～0.4 μm之间波动,切削距离达到l000 m以后,试件加工表面粗糙度值明显增大,但是保持了相对稳定,表面粗糙度值Ra约为0.8μm.     

显微激光拉曼光谱法鉴别SiC晶体的多型体结构

利用显微激光拉曼光谱法对掺氮6H-SiC单晶中的寄生多型体进行了鉴别,结果表明其中有4H-SiC和15R-SiC两种寄生多型体.不同SiC多型体的纵光学声子与等离子体激元的耦合模(LOPC模)表明:在掺氮6H-SiC单晶的生长条件下,6H-SiC的掺氮效应与4H-SiC存在明显差别,而与15R-SiC的掺氮效应相似.     

基于单磨粒微米划刻的单晶硅精密切削机理研究

为了探究硅片器件精密磨削加工的切削特征与机理,运用三棱锥形状的金刚石磨粒以不同加载压力划刻单晶硅材料表面模拟磨削加工过程,分析了划痕形貌特征、切削力与切削深度的演变规律,阐释了单晶硅的微米级切削加工机理。单晶硅微破碎去除发生的临界条件为法向切削力80 mN,临界切削深度2.03 μm;剥落去除发生的临界条件为法向切削力800 mN,切削深度5.65 μm。切削深度、切削力比在不同切削机理条件下具备可区分的差异化特征。平均切削深度随加载压力的变化规律呈现出鲜明的自相似性特征。此外,还分别构建了塑性去除、微破碎去除、剥落去除三个阶段的切削力方程,更准确地描述了切削力与切削深度的密切关系。     

高质量半绝缘Φ150mm 4H-SiC单晶生长研究

采用数值模拟研究PVT法Φ150 mm 4H-SiC单晶生长的功率、频率选择、坩埚位置及保温厚度等关键生长参数.研究表明Φ150 mm 4H-SiC单晶生长功率是2inch 4H-SiC生长功率的2倍,优化的加热频率在5 kHz以下,系统分析不同生长参数下生长腔内径向及轴向温度梯度的变化规律.在此基础上初步的进行了Φ150 mm 4H-SiC单晶的生长工作,获得了无裂纹、直径完整的高质量SiC衬底材料.拉曼光谱Mapping测量显示Φ150 mm SiC衬底全片无多型,均为4H-SiC晶型.X光摇摆曲线显示半宽小于30 arcsec.采用掺杂过渡金属V杂质,获得了电阻率超过5×109 Ω·cm的150mmSiC衬底.     

4H碳化硅单晶中的位错

4H碳化硅(4H-SiC)单晶具有禁带宽度大、载流子迁移率高、热导率高和稳定性良好等优异特性,在高功率电力电子、射频/微波电子和量子信息等领域具有广阔的应用前景。经过多年的发展,6英寸(1英寸=2.54 cm)4H-SiC单晶衬底和同质外延薄膜已得到了产业化应用。然而,4H-SiC单晶中的总位错密度仍高达10³~10⁴ cm^-2,阻碍了4H-SiC单晶潜力的充分发挥。本文介绍了4H-SiC单晶中位错的主要类型,重点讲述4H-SiC单晶生长、衬底晶圆加工以及同质外延过程中位错的产生、转变和湮灭机理,并概述4H-SiC单晶中位错的表征方法,最后讲述了位错对4H-SiC单晶衬底和外延薄膜的性质,以及4H-SiC基功率器件性质的影响。     

CsI-LiCl共晶材料的坩埚下降法生长与闪烁性能研究

本文采用坩埚下降法,在真空密封的石英坩埚中成功生长出CsI-LiCl与CsI-LiCl:Na共晶闪烁体。通过扫描电子显微镜(SEM)观察晶体微结构表明该共晶中LiCl相与CsI相存在周期性的层状排列,CsI相的厚度在5 μm左右。共晶样品的X射线激发发射谱显示在CsI-LiCl和CsI-LiCl:Na共晶样品存在缺陷发光,在CsI-LiCl样品中还观察到了纯CsI的自陷激子(STE)发光。CsI-LiCl样品在α粒子激发下的多道能谱中观察到明显的全能峰,这一结果证明CsI-LiCl共晶可用于热中子探测的潜力。     

静电纺丝法制备CeO2微纳米纤维及其除氟性能

以聚丙烯腈(PAN)为载体,六水合硝酸铈[Ce(NO₃)₃·6H₂O]为原料,采用静电纺丝法制备了Ce(NO₃)₃/PAN纤维,在空气中热处理得到CeO₂微纳米纤维,通过XRD、BET和SEM对CeO₂微纳米纤维进行表征。采用静态吸附实验探讨了CeO₂微纳米纤维去除水溶液中氟离子的性能,考察了溶液pH值、初始氟离子浓度及共存阴离子等对吸附性能的影响。结果表明,pH=3时,CeO₂微纳米纤维对F^-的吸附性能最佳,CeO₂吸附量随着F^-浓度的增大呈上升趋势。CeO₂微纳米纤维对F^-的吸附等温线遵循Langmuir模型,二级动力学模型能很好地描述CeO₂微纳米纤维对F^-的吸附过程。CeO₂微纳米纤维的除氟性能优良,可为其实际应用提供理论参考。     

X-ray analysis of sideroxol from <Emphasis Type="Italic">Sideritis leptoclada</Emphasis>

Sideroxol (1), a kaurane diterpene which has the ent-7α,18-dihydroxy-15β,16β-epoxykaurane structure (MW = 320.47, C₂₀H₃₂O₃) was obtained from the acetone extract of Sideritis leptoclada plant as well as from some other Sideritis species. It crystallizes in the orthorhombic space group P2₁, 2₁, 2₁ with a = 10.967(3), b = 24.555(5), c = 6.372(4) Å, Dc = 1.240 g cm⁻³, Z = 4, and refines to R = 0.065 for 721 independent reflections. The skeleton consists of three fused six-membered rings and a five-membered ring with fused epoxide. The six membered rings exhibited slightly distorted chair conformation. In addition to sideroxol, two kaurane and five kaurene diterpenes were isolated from the hexane and acetone extracts of the studied plant.     

Photoluminescence characteristics of Mg- and Si-doped GaN thin films grown by MOCVD technique

We have studied the optical, structural and surface morphology of doped and undoped GaN thin films. The p- and n-type thin films have been successfully prepared by low-pressure MOCVD technique by doping with Mg and Si, respectively. The different carrier concentrations were obtained in the GaN thin films by varying dopant concentrations. Photoluminescence (PL) studies were carried to find the defect levels in the doped and undoped GaN thin films at low temperature. In the undoped GaN thin films, a low intensity and broad yellow band peak was observed. The donor–acceptor pair (DAP) emission and its phonon replicas were observed in both the Si or Mg lightly doped GaN thin films. The dominance of the blue and the yellow emissions increased in the PL spectra, as the carrier concentration was increased. The XRD and SEM analyses were employed to study the structural and surface morphology of the films, respectively. Both the doped and the undoped films exhibited hexagonal structure and polycrystalline nature. Mg-doped GaN thin films showed columnar structure whereas Si-doped films exhibited spherical shape grains.     

New zeotype borophosphates with chiral tetrahedral topology: (H)0.5M1.25(H2O)1.5[BP2O8]·H2O (M = Co(II) and Mn(II))

Two new isostructural open‐framework zeotype transition metal borophosphate compounds, (H)_0.5M_1.25(H₂O)_1.5[BP₂O₈]·H₂O (M = Co(II) and Mn(II)) were synthesized by mild hydrothermal method. The structure of compounds were characterized by single‐crystal X‐ray diffraction which have ordered, alternating, vertex‐sharing BO₄, PO₄, and (MO₄)OM(H₂O)₂ groups with hexagonal, P 6₁ 2 2 (No 178) space group and unit cell parameters for Co a = 9.4960(6) Å, c = 15.6230(13) Å, for Mn a = 9.6547(12) Å, c = 15.791(3) Å, Z = 1 for both of them. TGA/DTA analysis, IR spectroscopy were used for characterization. Magnetic susceptibility measurements for both of the compound indicate strong antiferromagnetic interaction between metal centers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Solubility of Ag2O into the Na2O–B2O3–Al2O3 system

The solubility of Ag₂O was measured for the Na₂O–B₂O₃ and Na₂O–B₂O₃–Al₂O₃ system with the rotating crucible method and static method, respectively, under air atmosphere at temperatures ranging from 1273 to 1423 K. The contamination of melts from crucibles could be avoided by the rotating crucible method, with which it became possible to measure the solubility of Ag₂O for the Na₂O–B₂O₃ system above the melting point of Ag for the first time. It was found that the addition of Na₂O decreases the solubility of Ag₂O while the addition of Al₂O₃ had little effect on the solubility. The effect of Na₂O and Al₂O₃ on the solubility of Ag₂O is expressed by interaction coefficients and is analyzed in terms of the basicity of melts. The solubility of Ag₂O in Na₂O–B₂O₃–Al₂O₃ melts increased with increased temperature. This phenomena was explained by a small enthalpy change in oxidation of silver.     

Considerations on the structure and physical properties of B2O3-SiO2 and GeO2-SiO2 glasses

Data of density, refractive index and thermal expansion coefficient for B₂O₃-SiO₂ and GeO_2-SiO₂ glasses have been analyzed. The volumes of the structural units are the same found for the vitreous B₂O₃, GeO₂ and SiO₂. The volume of any structural unit is constant over the entire composition region of the glass system. The same has been found for the differential refraction and unit refraction of the structural units in these glasses. Different features are observed for the differential expansion of the structural units. There is a considerable change with composition in the differential expansion of BO₃, GeO₄ and SiO₄ units. The effect is attributed to a change in the asymmetry of vibrations with the number of Si-O-B or Si-O-Ge linkages in the matrix. The thermal expansion coefficient is mainly determined by the contribution of B₂O₃ or GeO₂ in the concerned glasses.     

Molecular structure and crystal packing of uncomplexed 1,6-bis(N-cyano-p-methoxy-anilino)-2,4-hexadiyne, C22H18N4O2

The X-ray crystal structure of 1,6-bis(N-cyano-p-methoxy-anilino)-2,4-hexadiyne, C₂₂H₁₈N₄O₂, is determined. The crystal packing is dominated by phenyl stacking interactions. Weak C–H···N hydrogen bonds help align the molecules. C–H··· hydrogen bonding is not apparent.     

Structural and electrical properties of vapour phase grown Cd1 − xFexTe single crystals

Cd_1 − xFe_xTe single crystals were prepared by vapour phase growth method in the composition range of 0 ≤ x ≤ 0.03. Chemical analysis, surface morphology, structural investigations and electrical properties were carried out by EDAX, SEM, XRD, TEM and transport technique, respectively. Microscopic variations between the target and actual compositions were noticed. Morphology studies revealed that dislocation aided growth is active in the present crystals. TEM and XRD studies confirmed that the samples of all compositions crystallized in zinc blende structure, and the lattice parameters varied almost linearly decreases with Fe content. At room temperature, the resistivity of the Cd_1 − xFe_xTe crystals of all compositions (x = 0.01, 0.015, 0.02, 0.025 and 0.03) lies in the range of 3.5-6.5 M Ω, the activation energies lie in the range of 63-133 meV, and the samples were show the ‘p’ type conductivity.     

空位浓度对纤锌矿CdS电子结构和光学性质影响的第一性原理研究

本文基于密度泛函理论的平面波超软赝势方法,采用第一性原理研究了含Cd空位缺陷CdS和含S空位缺陷纤锌矿CdS的几何结构、能带结构、电子态密度及光学性质。通过计算分析可知,含Cd空位缺陷的CdS体系均为p型半导体,含S空位缺陷的CdS体系跃迁方式均由直接跃迁变为间接跃迁。Cd、S空位缺陷的CdS体系的态密度总能量降低。空位CdS体系相较于本征CdS体系的静介电常数均有提高,并随着空位浓度的增大而增大,Cd空位缺陷体系更为明显,极化能力得到显著提升。空位Cd的CdS体系相较于本征CdS体系在红外波段存在明显的吸收,空位S的CdS体系相较于本征CdS体系在可见光波段存在明显的吸收。