ICF玻璃靶丸化学镀磁性Ni-Co-Fe-P四元合金涂层

采用化学镀技术在ICF玻璃靶丸表面均匀包覆一层磁性Ni-Co-Fe-P四元合金涂层,通过扫描电子显微镜、原子力显微镜、能量衍射谱仪和振动样品磁强计对ICF玻璃靶丸表面化学镀Ni-Co-Fe-P四元合金涂层的形貌、组成和磁性能进行了表征。结果表明:化学镀Ni-Co-Fe-P四元合金涂层的ICF玻璃靶丸,表面由平均直径为50 nm的细小颗粒组成,表面粗糙度小,磁性能高,可望用于磁悬浮实验研究。     

磁性ICF靶丸的化学镀工艺制备与表征

 采用化学镀工艺在ICF聚苯乙烯靶丸表面包覆了一层磁性的Ni-P合金镀层，并分别用扫描电子显微镜、能谱仪、X射线衍射仪以及振动样品磁强计对其形貌、组成、结构和磁性能进行了表征。结果表明：通过化学镀工艺制备的Ni-P合金镀层厚度约为4 μm，且为非晶结构，并具有一定的磁性；该磁性ICF靶丸可望用来进行磁悬浮实验研究。最后，对聚苯乙烯靶丸表面磁性涂层的制备机理进行了讨论。     

ICF玻璃靶丸化学镀磁性Ni-P涂层的研究

 采用化学镀方法对ICF空心玻璃微球靶丸进行处理，使其表面均匀包覆一层磁性Ni-P合金镀层，从而使得ICF玻璃靶丸具有一定的磁性，可望用于进行磁悬浮ICF定位打靶实验研究。用X射线衍射仪、扫描电子显微镜和振动样品磁强计对涂层的组成、结构、形貌及磁性能进行了表征。结果表明：对 ICF玻璃靶丸进行化学镀处理，其球形度、同心度和壁厚均匀性都与化学镀前未发生明显改变，其饱和磁化强度和矫顽力分别为3.883×10^-3 A/g和1.046×^-3 T。     

磁性ICF玻璃靶丸的化学镀工艺

 采用化学镀工艺在ICF玻璃靶丸表面包覆了一层磁性的Ni-P合金镀层,制备出磁性ICF玻璃靶丸。研究了化学镀主盐质量浓度、还原剂质量浓度、络合剂质量浓度、施镀温度及镀液pH值对沉积速率与镀液稳定性的影响,获得了化学镀制备磁性ICF玻璃靶丸的最佳工艺为：主盐硫酸镍30 g/L,还原剂次亚磷酸钠30 g/L,络合剂柠檬酸钠50 g/L,pH值10,温度(40±2) ℃。     

精密热处理过程温度测量多模态重构方法

为了增大惯性约束聚变玻璃靶丸的磁悬浮力,通过热处理工艺对其表面金属氧化物涂层进行晶态调控从而增强磁性能的方法对热处理温度控制精度要求极高,需要从多方面对温度进行把控。目前基于圆图记录仪的温度测量手段已经不能满足惯性约束聚变对热处理温度开展实时多模态数据分析的要求。提出一种针对精密热处理过程温度测量的多模态重构方法,首先将精密热处理过程的温度数据进行数字化传输与存储,然后在计算机中进行多模态解析与重构,最后基于空间拓扑关系与特征参数标定结果,利用Corexy机构实现热处理温度的多模态重构。结果表明所提方法可以实现对温度调控过程的单一化模态分离与多模态重构,实现误差一般小于5%。     

镍钨合金镀层结构

近年，ICF研究中需要用到愈来愈多的合金腔靶或平面靶，其中这些合金材料中有相当一部分无法通过真空镀膜等手段得到。但是，研究发现，某些无法由真空镀膜获得的合金薄膜可以通过电镀或化学镀等技术获得，而且所得薄膜性能（如均匀性等）优异。因此，电镀合金技术等在ICF靶用合金薄膜的研究中具有十分重要的现实意义。     

微球GDP涂层制备技术研究进展

辉光放电碳氢聚合物（GDP）靶丸因具有较大的抗张强度、红外透明、涂层表面粗糙度高且均一性好、内应力较小等特性,成为惯性约束聚变（ICF）点火的首选靶丸。20世纪70年代,国外就开展了GDP靶丸制备技术的研究工作,主要以美国为代表,另外俄罗斯、日本、法国等国家也有相关研究。目前,美国已基本具备制备出满足点火要求的Ge掺杂GDP靶丸的能力,而我国从20世纪90年代才开始微球GDP涂层的研究工作。     

薄壁玻璃靶丸低温保气性能研究

 对薄壁玻璃靶丸在液氮保存状态下保气性能进行了研究。实验结果表明：在－196℃环境中,薄壁靶丸的保气半寿命由常温的3~10d延长到100~500d左右,靶丸的表面粗糙度没有明显变化,能满足ICF打靶要求。     

空腔Cu靶的化学镀制备方法及其特性

 在预处理芯轴（基体）表面金属的催化作用下，通过镀液可控制的还原反应在芯轴表面不断产生金属Cu的化学沉积，然后刻蚀掉芯轴，经Cu层表面钝化处理而得到空腔Cu靶。对Cu靶的表面形貌、孔隙率、厚度及其均匀性、Cu靶纯度、耐氧化性能等进行了测试与分析，实验结果表明，所测各项数据达到Cu靶ICF应用的性能指标。化学镀方法为制备其它金属或合金空腔靶提供了新的途径。     

ICF用磁性玻璃靶丸悬浮磁场的确定及材料制备初步研究

 根据靶丸悬浮原理，推导出ICF用磁性靶丸在悬浮磁场中受力的函数关系式，从而得到了靶丸悬浮的理论模型。通过实验和理论相结合的方法，得出当靶丸中磁性材料掺入质量百分比由1%增加到6%时，靶丸的磁场强度由0.09 mT增加到0.44 mT，而对应的外界悬浮磁场由0.93 mT减小到0.23 mT。     

Electroless preparation and characterization of magnetic Ni-P plating on polyurethane foam

Magnetic Ni-P plating was coated on surface of polyurethane (PU) foam by electroless plating technique. Morphology, composition, structure, thermal decomposing behavior and magnetic property of PU foam before and after plating were characterized by scanning electron microscopy (SEM), energy diffraction spectrum (EDS), X-ray photoelectron spectroscopy (XPS), infrared spectrometer (IR), X-ray diffraction (XRD), thermogrametric analysis (TG) and vibrating sample magnetometer (VSM), respectively. The results showed that the Ni-P plating was composed by particles whose diameters were in the range of 1-2 μm. Because of the Ni-P plating coated on surface of PU foam, peak intensity of the plated PU foam in IR and XRD were lower than those before plating. TG curves of PU foam before and after plating were composed of two decomposing stages. Because part of Ni in Ni-P plating was oxidized, TG curve of the plated PU foam was uptilt during 650-1000 °C. The plated PU foams are magnetic and can be used in some special application.     

精炼温度对空心玻璃微球性能的影响

为实现对惯性约束聚变（ICF）靶用空心玻璃微球（HGM）质量及性能的有效调控,研究了精炼温度对HGM批次产品中A级HGM百分数的影响,实验测试了不同精炼温度条件下HGM批次的平均直径和壁厚、抗张强度、对氘气的保气性能、表面粗糙度及其随时间的变化。测试结果表明:升高精炼温度并不是总有利于提高HGM的质量和性能; 当精炼温度低于1600 ℃时,满足ICF物理实验参数要求的HGM百分数随着精炼温度的增高而增加,但是,当精炼温度高于1600 ℃时,HGM的合格率则随着精炼温度的增高而显著下降; 随着精炼温度的升高,HGM的抗拉强度快速提高,表面粗糙度快速下降; HGM在室温下对氘气的阻气能力快速下降,且在大气中的潮解速率和程度显著降低。     

Low-phosporous nickel-coated carbon microcoils: Controlling microstructure through an electroless plating process

Carbon microcoils (CMCs) have been coated with a nickel-phosphorus (Ni-P) film using an electroless plating process, with sodium hypophosphite as a reducing agent in an alkaline bath. CMC composites have potential applications as microwave absorption materials. The morphology, elemental composition and phases in the coating layer of the CMCs and Ni-coated CMCs were investigated by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and X-ray diffraction (XRD), respectively. The effects of process parameters such as pH, temperature and coating time of the plating bath on the phosphorus content and deposition rate of the electroless Ni-P coating were studied. The results revealed that a continuous, uniform and low-phosphorous nickel coating was deposited on the surface of the CMCs for 20 min at pH 9.0, plating bath temperature 70 °C. The as-deposited coatings with approximately 4.5 wt.% phosphorus were found to consist of a mix of nano- and microcrystalline phases. The mean particle size of Ni-P nanoparticles on the outer surface of the CMCs was around 11.9 nm. The deposition rate was found to moderately increase with increasing pH, whereas, the phosphorous content of the deposit exhibited a significant decrease. Moreover, the material of the coating underwent a phase transition between an amorphous and a crystalline structure. The thickness of the deposit and the deposition rate may be controlled through careful variation of the coating time and plating bath temperature.     

Incorporation of nano zinc oxide for improvement of electroless nickel plating

The advantages of electroless nickel plating (EN) include excellent corrosion resistance, wear resistance, solderability, low porosity and uniform thickness even on complex parts and ability to plate on nonconductors. In the present study nano ZnO particles were synthesized by using an electrochemical technique and incorporated the particles into Ni-P plates. An alkaline bath was selected and used for nano zinc oxide incorporation. The electrochemical and metallurgical properties of the Ni-nano ZnO-P plates were evaluated and compared with that of the un-reinforced Ni-P plates. The incorporation of the nano ZnO particles resulted in improvement of metallurgical and corrosion resistance characteristics of the plates.