硼/氮原子共注入金刚石的原子级研究

利用Tersoff势和分子动力学方法研究了室温下500 eV的能量粒子硼(4个)和氮(8个)共注入金刚石晶体中晶体结构的变化特征和缺陷分布特征.结果表明：粒子注入金刚石后产生的空位比间隙原子更靠近晶体的近表层分布；间隙原子主要以四面体间隙(T形)和哑铃状分裂间隙的形式存在于晶体中，T形间隙结构更容易存在，并且大部分间隙原子富集在空位的周围；注入金刚石中的硼原子和氮原子有78%左右处于替代位置,硼、氮原子之间的键长比完整金刚石结构的键长短13%，硼氮原子成键有利于减少金刚石晶格的畸变程度.     

Ab initio thermodynamic characteristics of the formation of oxygen vacancies,and boron,carbon, and nitrogen impurity centers in anatase

Using the ab initio projector augmented wave (PAW) method, calculations are performed for the electronic energy-band structure of titanium dioxide having the structure of anatase doped with boron, nitrogen, and carbon. Thermodynamic characteristics are determined for the formation of impurity centers, such as the preference energy for the interstitial position, the energy of impurity oxidation, and the energy of oxygen vacancy formation. It is shown that under the conditions of thermodynamic equilibrium the interstitial position of boron atoms is stable, whereas carbon atoms, depending on the oxygen pressure, can occupy both interstitial positions and substitutional positions of oxygen atoms, and nitrogen atoms replace oxygen atoms. It is shown that the presence of oxygen vacancies promotes the thermodynamic stability of carbon and nitrogen atoms. The obtained densities of electronic states correspond to ESR spectroscopy data, which indicates the presence of spin-polarized electrons in the states of the oxygen vacancy.     

B,N协同掺杂金刚石电子结构和光学性质的第一性原理研究

基于金刚石的稳定结构, 在实验研究的基础上, 本文采用基于周期性密度泛函理论计算了B/N单掺杂、共掺杂金刚石的晶体结构, 并就掺杂方式和掺杂后形成能进行了对比研究, 得到了B/N双掺杂的最稳定结构. 在此基础上, 进一步计算了N单掺杂及B/N共掺杂最稳定结构的吸收光谱、电子结构和态密度. 通过与实验结果对比可以看出, 较N单掺杂, B/N共掺杂的吸收光谱发生明显红移, 与实验符合较好. 计算结果表明: N原子单掺杂优先于B原子; 由于原子间的协同作用, B/N近邻共掺杂体系的形成能最低, 为掺杂的最可能结构.     

Effect of excess hydrogen on the electronic properties of passivated diamond

Recently, Yan et al. reported a theoretical approach to overcome the n-type doping problem of diamond by passivating the B acceptor and the reduction of ionization energy of dopants. Using the proposed approach, we have systemically investigated the effect of excess H atoms on the electronic properties of a passivated system [diamond doped with (B+H) complex] based on the variation of Fermi level from first-principle calculations. The results show that the excess H atom is responsible for n-type behavior when all valence electrons of substitutional B atom participate in the hybridization between substitutional B and H atoms. On the contrary, when part of valence electrons of the substitutional B atom participates in the hybridization, H atoms make the passivated system show p-type or insulator behavior. Further study indicates that the excess H atoms are more apt to make the passivated system show p-type rather than n-type behavior under the same conditions. It leads to a much more comprehensive understanding of the interaction between the excess H atoms and the passivated system compared with that of Yan et al. The results may be useful to provide guidance for experimental work on obtaining n-type diamond in the future.     

能量粒子轰击金刚石的计算机模拟

利用Tersoff势和分子动力学方法研究了初始动能为500 eV的硼粒子注入金刚石的微观行为.结果表明：硼注入后产生温度为5000 K的热峰，其寿命为0.18 ps；同时产生半径为0.45 nm局部非晶化区域，三重配位原子数占该区域原子数的7%.薄膜表层原子向内弛豫，近表层原子向外弛豫，表面层与近表层原子的间距减少了15%，表面层表现为压应力.硼原子以B<110>分裂间隙的形式存在于金刚石结构中. 关键词： 分子动力学模拟 金刚石 硼 注入     

Effect of boron and nitrogen co-doping on CNT's electrical properties: Density functional theory

In this work, we have theoretically studied the changes in electrical properties of three different geometrical structures of carbon nanotubes upon co-doping them with boron and nitrogen atoms. We applied different doping mechanisms to study band structure variations in the doped structures. Doping carbon nanotubes with different atoms will create new band levels in the band structure and as a consequence, a shift in the Fermi level occurs. Whereas, filling up the lowest conduction/ upper valence bands created an up/ downshift in the Fermi level. Moreover, dopants concentration and dopants position play a critical rule in defining the number of new band levels. These new band levels in the band gap region represented as new peaks appeared in the density of states. These new bands are solely attributed to co-doping carbon nanotubes with boron and nitrogen atoms.     

Ti原子与氮掺杂金刚石(001) 界面结合强度的第一性原理研究

摘 要：金属钛原子在金刚石表面的结合强度直接影响金刚石真空介电窗口的使用性能和寿命. 本文通过基于密度泛函理论的第一性原理方法研究了Ti原子与不同氮掺杂位置的金刚石（001）界面的结合能、电荷分布和稳态几何结构. 结果表明：Ti原子与N原子取代掺杂在第二层C原子处金刚石表面的结合能比未掺杂和掺杂在第三层的结合能都高,达到-7.293 eV,使得金刚石表面形成的界面结构更加稳定,结合强度更好;通过电荷分布分析,N原子掺杂在第二层金刚石表面的Ti原子上的电荷转移最明显,对金刚石表面碳原子吸附最强,也具有更好的结合强度. 与未掺杂金刚石表面形成的Ti-C键键长相比,N掺杂在第二层和第三层C原子处金刚石表面形成的Ti-C键键长比前者分别长0.051 Å和0.042 Å,略有增加.     

掺杂CVD金刚石薄膜的应力分析

在不同实验条件下，用微波等离子体化学气相沉积(MPCVD)技术在Si基体上制备了S掺杂和B-S共掺杂CVD金刚石薄膜，利用X射线衍射仪和拉曼光谱仪研究掺杂对CVD金刚石薄膜的应力影响.研究结果发现，随着S掺杂浓度的增加，薄膜中sp²杂化碳含量和缺陷增多，CVD金刚石薄膜压应力增加；小尺寸的B原子与大尺寸的S原子共掺杂时，微量B的加入改变了CVD金刚石薄膜的应力状态，共掺杂形成B-S复合体进入金刚石晶体后降低金刚石晶体的晶格畸变程度，减少S原子在晶界上偏聚数量和晶体中非金刚石结构相含量，降低由于杂质、缺陷及sp²杂化碳含量产生的晶格畸变和薄膜压应力，提高晶格完整性. 关键词： 金刚石薄膜 掺杂 应力     

A Monte Carlo simulation study of boron profiles as-implanted into LPCVD-NiDoS polycrystalline thin films

This work presents a Monte Carlo simulation study of boron profiles obtained from as-implanted ions into thin films nitrogen doped silicon (NiDoS) thin films. These films are performed by LPCVD technique from Si₂H₆ and NH₃ gas sources, four values deliberately chosen, of the ratio NH₃/Si₂H₆ to obtain samples, differently in situ nitrogen-doped. Taking into account the effect of the codoping case, and the structure specificity of these films, an accurate Monte Carlo model based on binary collisions in a multi-atomic target was performed. Nitrogen atoms present in the target is shown to affect the boron profiles and confirms clearly a reduction penetration effect which becomes more significant at high nitrogen concentrations. Whereas, the fine-grained polysilicon structure, and thus the presence of grains (G) and grain boundaries (GB), is known to enhance the opposite phenomenon by assuming an effective role played by GB's in the scattering calculation process of the incident ions. This role is represented by the change in direction of the incident ion after interaction with GB without corresponding loss in its energy.The results obtained show an enhancement of the stopping parameter when nitrogen concentration increases, while the GB interaction remains very important. This behavior is due to a great number of GB's interactions with boron atoms which gave low deflection angles. So that, the average positions described by the sequences of trajectories took place farther than what expected with channeling effect in crystal silicon materials.     

Ground-state properties of boron-doped diamond

Boron-doped diamond undergoes an insulator-metal or even a superconducting transition at some critical value of the dopant concentration. We study the equilibrium lattice parameter and bulk modulus of boron-doped diamond experimentally and in the framework of the density functional method for different levels of boron doping. We theoretically consider the possibility for the boron atoms to occupy both substitutional and interstitial positions and investigate their influence on the electronic structure of the material. The data suggest that boron softens the lattice, but softening due to substitutions of carbon with boron is much weaker than due to incorporation of boron into interstitial positions. Theoretical results obtained for substitution of carbon are in very good agreement with our experiment. We present a concentration dependence of the lattice parameter in boron-doped diamond, which can be used for to identify the levels of boron doping in future experiments. The text was submitted by the authors in English.     

B,P掺杂β-Si3N4的电子结构和光学性质研究

运用第一性原理方法, 计算了B, P两种元素单掺杂和共掺杂的β -Si₃N₄材料的电子结构和光学性质. 结果表明: B掺杂体系的稳定性更高, 而P掺杂体系的离子性更强; 单掺和共掺杂均窄化带隙, 且共掺在禁带中引入深能级, 使局域态增强; 单掺杂体系介电函数虚部、吸收谱和能量损失谱各峰均发生红移、幅值减小, 而共掺后介电函数虚部主峰出现蓝移、能量损失峰展宽、高能区电子跃迁大大增强, 且控制共掺杂的B, P比例可获得较低的带电缺陷浓度.     

基于第一性原理的CVD金刚石涂层表面氧原子作用分析

采用第一性原理方法研究了氧原子在CVD金刚石涂层表面吸附形成的两种氧掺杂结构的差异及脱附CO的难易程度.仿真计算结果表明：氧原子在金刚石表面顶位和桥位吸附形成C=O羰结构和C-O-C醚结构,改变与其直接成键的局部金刚石结构;C-O-C结构吸附能比C=O结构大,其结构更加稳定;C=O结构断键脱附形成CO的能垒比C-O-C结构更低,CVD金刚石涂层表面脱附CO主要是以C=O断键形成;氢终止表面能够增强碳原子之间成键,提高C=O脱附的能垒,而氧终止表面作用相反,降低脱附能垒.     

天然金刚石形成透明硼皮金刚石的研究

 本文采用离子注入法，对天然金刚石表面进行少量渗硼，形成透明硼皮金刚石。经NP-1型X光电子能谱仪（XPS）表面测试，证明注入硼后的金刚石表面硼原子和碳原子形成了结合键。又经热失重分析（TGA）表明，用B₂O₃和硼作离子源进行注入，均能使金刚石的抗氧化温度得到提高，但用硼注入得到的“硼皮”金刚石抗氧化性更好些。用四种不同能量进行注硼时，都能使金刚石的抗氧化性得到几乎相同程度的提高，与注入的深度无关。     

Effects of bonded and non-bonded B/N codoping of graphene on its stability,interaction energy,electronic structure,and power factor

We model boron and nitrogen doped/codoped monolayer graphene to study its stability, interaction energy, electronic and thermal properties using density functional theory. It is found that a doped graphene sheet with non-bonded B or N atoms induces an attractive interaction and thus opens up the bandgap. Consequently, the power factor is enhanced. Additionally, bonded B or N atoms in doped graphene generate a repulsive interaction leading to a diminished bandgap, and thus a decreased power factor. We emphasis that enhancement of the power factor is not very sensitive to the concentration of the boron and nitrogen atoms, but it is more sensitive to the positions of the B or N atoms in ortho, meta, and para positions of the hexagonal structure of graphene. In the B and N codoped graphene, the non-bonded dopant atoms have a weak attractive interaction and interaction leading to a small bandgap, while bonded doping atoms cause a strong attractive interaction and a large bandgap. As a result, the power factor of the graphene with non-bonded doping atoms is reduced while it is enhanced for graphene with bonded doping atoms.     

硼/氮原子共掺入金刚石的晶格损伤及其退火过程的计算机模拟

借助于Tersoff势函数和分子动力学模拟技术研究了室温下500eV的能量粒子硼(4个)和氮(8个)共掺入金刚石晶体中所引起的损伤区域内晶体微细观结构的变化特征以及后续加热退火晶体结构的演变特征.结果表明：随着掺入原子数目的增加，受影响的区域范围渐渐增大，12个粒子全部注入金刚石晶体后局部影响区域的半径达0.68nm，损伤区域中心的三配位原子数增加而四配位数原子数量减少.加热退火过程中损伤中心区域的原子发生扩散，部分原子的扩散距离达到4个晶格间距.加热退火使损伤区域中心原子间的平均键长趋于金刚石结构的键长.退火后薄膜中注入的杂质原子向表面扩散引起应力分布产生变化，杂质原子经过一系列的扩散过程能够到达空位的位置，减少薄膜中空位数量，减小晶格畸变程度，原子向表面扩散引起应力产生重新分布，薄膜中应力峰值的峰位向薄膜表面发生移动，局部应力集中程度降低.通过不同退火温度的比较发现低温下退火(800℃)更有利于空位的运动和晶格损伤的恢复从而提高晶格质量. 关键词： 金刚石共掺杂 分子动力学 退火     

Synthesis of N-type semiconductor diamonds with sulfur,boron co-doping in FeNiMnCo-C system at high pressure and high temperature

A series of diamonds with boron and sulfur co-doping were synthesized in the Fe Ni Mn Co-C system by temperature gradient growth(TGG) under high pressure and high temperature(HPHT). Because of differences in additives, the resulting diamond crystals were colorless, blue-black, or yellow. Their morphologies were slab, tower, or minaret-like. Analysis of the x-ray photoelectron spectra(XPS) of these diamonds shows the presence of B, S, and N in samples from which N was not eliminated. But only the B dopant was assuredly incorporated in the samples from which N was eliminated. Resistivity and Hall mobility were 8.510 ?·cm and 760.870 cm~2/V·s, respectively, for a P-type diamond sample from which nitrogen was eliminated. Correspondingly, resistivity and Hall mobility were 4.211×10~5 ?·cm and 76.300 cm~2/V·s for an N-type diamond sample from which nitrogen was not eliminated. Large N-type diamonds of type Ib with B–S doping were acquired.     

Zn空位对Al-P共掺杂ZnO电子结构影响的第一性原理计算

采用第一性原理平面波赝势法计算ZnO（Al,P）体系的晶格参数和电子结构,重点分析Zn空位对体系晶体结构、形成能、态密度的影响.计算结果表明：Al和P共掺杂过程中,Al_Zn-P_Zn有更低的形成能,能带分析呈现n型.并随着Zn空位浓度的增大使得掺杂后的晶胞体积减小,晶格常数c先增大后减小.存在Zn空位的掺杂体系形成能比Al_Zn-P_O掺杂体系低,体系较稳定.能带分析呈现p型趋势.Al和P以1∶2的比例掺杂时,体系的形成能降低,体系更稳定;同时,比较1个V_Zn和2个V_Zn的Al_Zn-P_Zn共掺杂体系的能带结构发现,随着Zn空位浓度增大,带隙增大,体系p型化特征增强.Al_Zn-2P_Zn共掺杂体系带隙减小为0.56 eV,更有利于提高其导电性质.然而出现2V_Zn后,带隙增大为0.73 eV,小于本征ZnO带隙,p型化程度更强烈;此外态密度分析表明2V_Zn的Al_Zn-2P_Zn共掺杂使得态密度更加分散,更多的电子穿过费米能级使得p型化更明显.因此,将Al/P按1∶2的比例共掺且Zn空位增至2个时,可以获得导电性能更好的p型ZnO.     

Characterization of phosphorus-doped homoepitaxial (1 0 0) diamond films grown using high-power-density MWPCVD method with a conventional quartz-tube chamber

Phosphorus-doped n-type homoepitaxial diamond films have been successfully grown at high substrate temperatures (>1000 °C) on high-pressure/high-temperature-synthesized type-Ib single-crystalline diamond (1 0 0) substrates, by using a conventional microwave plasma chemical-vapor-deposition (CVD) system with high power densities. The deposition system employed in this work had an easily exchangeable 36 mm inner-diameter quartz-tube growth chamber. The homoepitaxial diamond films thus grown were characterized by means of Hall-effect measurements with an AC magnetic field, atomic force microscope observations and secondary ion mass spectrometry techniques. The dependences of the substrate temperature (≤1300 °C) and the P/C ratio in the source gas (≤9900 ppm) on the specimen features were investigated. The optimum substrate temperature deduced was ≈1160 °C, which was also applicable to the CVD growth of undoped homoepitaxial diamond layers. The n-type conductions with an activation energy ≈0.6 eV were observed for the specimens with amounts of the P atoms incorporated to ≈1.5 × 10¹⁸ cm⁻³ whereas the doping efficiencies changed from ≈0.06% to ≈0.92% with the growth condition. Possible origins for these results are discussed in relation to the growth mechanism.     

Investigation into the adsorption of atomic nitrogen on an Al2O3 (0001) surface

Computer simulation of sapphire nitridation used to obtain nitride-based heterostructures (GaN) on an Al₂O₃ substrate has been performed. The adhesion of atomic nitrogen to the sapphire (0001) surface is investigated ab initio. The possibility of replacing surface-layer oxygen atoms with nitrogen atoms has been examined. The calculated results indicate that adsorbed nitrogen atoms occupy the most stable positions above surface oxygen atoms at different nitrogen concentrations. The changes in the total system energy after replacement of surface oxygen atoms with nitrogen atoms have been calculated. It turns out that oxygen replacement is energetically unfavorable for a single nitrogen adatom. However, this process becomes energetically favorable if the concentration of nitrogen atoms increases. This outcome, obtained for the first time, enables better understanding of the atomic-scale mechanism of sapphire nitridation.     

Comparative Study of Substitutional N and Substitutional P in Diamond

Based on density functional theory calculations, it is found that for substitutional N in diamond the C_(3v) symmetry structure is more stable, while C_(3v) and D_(2d) symmetry patterns for the substitutional P in diamond have comparable energies. Moreover, the substitutional N is a deep donor for diamond, while P is a shallow substitutional n-type dopant. This is attributed to the different doping positions of dopant(the N atom is seriously deviated from the substitutional position, while the P atom nearly locates in the substitutional site), which are determined by the atomic radius.