半磁半导体Zn1-xMnxS中的能量传递

本文测量了Zn1-xMnxS在不同Mn浓度(0.001x=0.062,T=80K时的Zn1-xMnxS的发射谱及其衰减曲线,得到两个衰减寿命:τ1=70μs,τ2>1000μs,这表明在高Mn浓度时存在着两个弛豫过程:一个是较快的,另一个则是较慢的,根据Goede等人的实验结果可以断定较慢的过程来自孤立的Mn2-离子,那么便可以判知较快的过程是来源于Mn2-离子对.正是高Mn浓度下的Zn1-xMnxS中存在着Mn2+-Mn2+离子对,在其间有能量迁移以及它和能量受主之间的能量传递造成了该体系中的IR发射.     

光电容法研究电子辐照GaP中的深能级

本文提出含多个深能级响应的光电容瞬态分析方法:在不考虑各能级之间电子、空穴跃迁的条件下,可出“多指数过程分离法”,将总的瞬态过程分离为各能级上指数型瞬态过程之和.运用这一方法,对lMeV(4×1015cm-2电子辐照GaP LED进行了定态和两种注入条件的瞬态光电容测量,观察到H1、H2、H3三个空穴能级(0.51、0.75、1.15eV)和E1、E2、E3、E4四个电予能级(0.68、0.84、0.89、1.01eV),并得到各能级的光离化截面谱.外量子效率及发射谱测量结果表明;电子辐照引入的深能级(H1-H3,E1-E4)表现出无辐射复合中心的性质.     

在C_(70)固体p-GaAs结构中的甚深深能级

发展了恒温电容瞬态数据处理方法 ,称新方法为恒温电容瞬态时间积谱 (ICTTS) .用ICTTS方法测量分析了C70固体 p GaAs异质结的深能级 ,结果发现在C70 固体中存在两个很深的空穴陷阱 ,H1 和H2 ,它们的能级位置分别为Ev 0 85 6eV和Ev 1 0 37eV     

铜铁镁三掺铌酸锂晶体的第一性原理研究

利用基于密度泛函理论的第一性原理,研究了Cu:Fe:Mg:LiNbO3晶体及对比组的电子结构和光学特性.研究显示,单掺铜或铁铌酸锂晶体的杂质能级分别由Cu 3d轨道或Fe 3d轨道贡献,禁带宽度分别为3.45和3.42 eV;铜、铁共掺铌酸锂晶体杂质能级由Cu和Fe的3d轨道共同贡献,禁带宽度为3.24 eV,吸收峰分别在3.01,2.53和1.36 eV处;Cu:Fe:Mg:LiNbO3晶体中Mg^2+浓度低于阈值或高于阈值(阈值约为6.0 mol%)的禁带宽度分别为2.89 eV或3.30 eV,吸收峰分别位于2.45 eV,1.89 eV或2.89 eV,2.59 eV,2.24 eV.Mg^2+浓度高于阈值,会使吸收边较低于阈值情况红移;并使得部分Fe^3+占Nb位,引起晶体场改变,从而改变吸收峰位置和强度.双光存储应用中可选取2.9 eV作为擦除光,2.5 eV作为读取和写入光,选取Mg^2+浓度达到阈值的三掺晶体在增加动态范围和灵敏度等参量以及优化再现图像的质量等方面更具优势.     

减速电势法测量功函数变化的实验方法

功函数(work function) 定义为使电子脱离固体进入周围空间(真空)所必须给与电子的最低能量,有时也称为逸出功.它是表征固体表面宏观性质的重要物理量之一,一般随温度缓变,但随表面状况(如表面清洁度、晶向、结构、反应、化学组成、电荷转移等)变化灵敏,变化幅度一般从几十到几百毫电子伏(meV).对于 O/W(100)系统,变化可大于 1eV[1].因此获取功函数随时间变化的信息对于各种瞬态表面现象的研究往往比测量功函数本身更为重要.自动连续测量固体表面某区域内功函数　随时间t的变化曲线　(t)比在不同时刻测量　再连成中　(1)曲线更为精确有效.…     

产生短间隔高精度纳秒激光双脉冲的实用电路

本文介绍了我们研制的“运动粒子瞬态激光全息测试仪”电子线路.该电路经严格的逻辑设计及计算,采用了10MHz时钟电路,并将1MHz的时钟信号巧妙地引入门控电路中,同时在技术上采用了行之有效的措施,消除了可能产生0.1μs的随机误差,时间间隔达到了(1～9)±0.1μs的精度,所输出的激光双脉冲能量接近,整机抗干抗能力强,一次性试验成功率高,可精确地测量雾化粒子场中的微粒的速度、形状、大小及其分布,收到了良好的使用效果.     

Co,Zn共掺铌酸锂电子结构和吸收光谱的第一性原理研究

利用基于密度泛函的第一性原理的计算方法,研究了Co单掺及Co和Zn共掺LiNbO_3晶体的电子结构和吸收光谱.研究显示,各掺杂体系铌酸锂晶体的带隙均较纯铌酸锂晶体变窄. Co:LiNbO_3晶体禁带宽度为3.32 eV; Co:Zn:LiNbO_3晶体, Zn的浓度低于阈值或达到阈值时,禁带宽度分别为2.87或2.75 eV. Co:LiNbO_3晶体在可见-近红外光波段2.40, 1.58, 1.10 eV处形成吸收峰,这些峰归结于Co 3d分裂轨道的跃迁;加入抗光折变离子Zn~(2+),在1.58, 1.10 eV处的吸收峰增强,可以认为Zn~(2+)与Co~(2+)之间存在电荷转移,使e_g轨道电子减少,但并不影响t_(2g)轨道电子.结果表明,晶体中的Co离子在不同共掺离子下可充当深能级中心(2.40 eV),或可充当浅能级中心(1.58 eV),两种情况下,掺入近阈值的Zn离子均有助于实现优化存储.     

非晶硒对X射线光电转换特性的研究

非晶硒X射线光电导具有很高的固有空间分辨率,有可能研制探测X射线成象的平板化数字器件,在探测X射线成象方面倍受注目.它对X射线的光电转换特性和灵敏度是重要的性能参数之一.我们制作了约400μm厚的非晶硒膜,在1～12.5V/μm场强范围,0.2～12mR/s照射率范围测量了X射线光电流值.实验结果显示,非晶硒具有线性的光电转换特性,其灵敏度随场强的增加而增加.计算表明,对于医疗诊断常用的轫致辐射X射线谱,用X射线在非晶硒中产生一电子-空穴对所需的能量W±约50eV(10V/μm场强)     

Se+注入ZnSe晶体的深能级研究

将Se离子注入到ZnSe晶体中,用深能级瞬态谱仪(DLTS)测量了注Se+前后ZnSe晶体中深能级的变化,发现在ZnSe中经常出现的分别位于导带下0.30eV和0.33eV的两个能级在注Se+和退火后消失。这个结果进一步证实了Beomi等人提出的以上两个能级分别与Se双空位和包含一个Se单空位的复合体有关的论点。同时注Se+后在导带下0.34eV出现一个新的能级,其电子俘获截面明显区别于0.33eV能级。该能级可能与Se填隙原子或占Zn位的反位Se原子有关。     

LPE碲镉汞薄膜的显微Raman谱与显微荧光谱分析

利用Raman显微镜系统对4块用液相外延(LPE)方法在Cd0.96Zn0.04Te衬底上生长的Hg0.8Cd0.2Te外延薄膜样品，在100～5 000cm^-1光谱范围进行测量，在实验曲线中除了观察到与碲镉汞材料晶格振动相符的类．HgTe的光学振动横模(TO1模)和纵模(LO1模)的Raman散射峰、类-CdTe光学振动横模(TO2模)和纵模(LO2模)混合的Raman散射峰以及来源于TO1 LO1的二级Raman散射峰外，在1 000～5 000cm^-1光谱范围首次发现了LPE碲镉汞薄膜的显微荧光峰，该显微荧光的发光范围换算为电子伏特标度为1．34～1．83eV．发光中心位于2750cm^-1即1.62eV，发光峰的半高宽(FWFIM)约为0．25eV。通过分析指出．该显微荧光来源于碲镉汞外延层中阴性离子空位与材料导带底的共振能级的发光。     

Luminescence and defect creation in LiF and LiF-Na

The topic is the radiative and nonradiative decay of electronic excitations with the creation of radiation defects in LiF. A luminescence band with a peak at 3.45 eV is observed in the x-ray luminescence spectrum at 4.2 K; it may be assigned to the luminescence of a self-localized exciton. In LiF-Na, additional luminescence bands with peaks at 2.0 and 2.4 eV are observed; these may be attributed to the luminescence of electron excitations localized around the Na' ion. The formation of Frenkel defects at 4.2 K in LiF and LiF-Na is discussed.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 12, pp. 28–32, December, 1994.     

Photoluminescence from deep centers in GaAs

Sharp line structure attributable to phonon assisted radiative emission has been observed in the 6 K photoluminescence spectra from deep centers in bulk samples of chromium doped GaAs. Two luminescence bands at 0.56 and 0.8 eV have been observed and both bands exhibit evidence of phonon assisted radiative recombination. An exploration of these luminescence bands in terms of excited state to ground state transitions of Cr³⁺ and Cr²⁺ ions is proposed.     

ZnSe晶体中Cu杂质深能级的ODLTS谱

用控制Cu杂质在ZnSe品格中占据位置的方法,成功地得到了Cu-G和Cu-R中心分别占优势的ZnSe:Cu晶体.首次用ODLTS方法测得与Cu-R和Cu-G中心相应的受主能级分别位于价带顶上0.72eV和0.30eV.     

Luminescence of [Be] centre in MgO:Be

Doping of MgO single crystals with Be results in the formation of numerous Be-containing paramagnetic centres, easily detectable by EPR, and creates an intensive luminescence band at 6.2 eV, observable at T<200 K, and gives rise to new thermoluminescence peaks at 147 and 190 K. A paramagnetic centre with a rhombic symmetry that decays at 160 K was identified as a [Be]⁺ (i.e. O⁻–Be²⁺) centre—a hole trapped by O²⁻ lattice ion near a Be²⁺ perturbing defect. The luminescence excitation and isochronal annealing studies led to the conclusion that the 6.2 eV luminescence arises at the radiative decay of electron excitations near Be²⁺. These excitations can be created at the recombination of electrons with the holes localised in the [Be]⁺ centres, at the recombination of holes with the electrons trapped in the Be¹⁺ centre or at a direct excitation of oxygen near the Be²⁺ ion.     

Optical studies on the red luminescence of InGaN epilayers

Photoluminescence, photoluminescence excitation and time-resolved photoluminescence studies were performed in a partially relaxed InGaN epilayer, and exhibiting a 3D growth mode at the surface. Two emission bands, a red (centred at 1.88 eV) and a blue (centred at 2.58 eV) were observed. In order to investigate their origin and their relation with the strain relaxation along the growth direction, the sample was etched. After etching, only an asymmetrical broad emission band centred at 2.15 eV was observed.The decrease of decay time and the increase of the band edge absorption energy with increasing monitored photon energy, along the red emission, are assigned to the effect of localization of excitons at potential minima, originated in compositional and strain inhomogeneities of the sample. Therefore, the blue shift observed on this band with an increase in temperature, is caused by the population of higher energy states. The large difference between the luminescence intensities, decay times and the thermal quenching of the red and blue (centred at 2.58 eV) band is also accounted for by the localization model. It is demonstrated that the luminescence observed after etching is a superposition of two bands, one originated from the InGaN film, and the other from the GaN underlayer. The large difference between absorption and emission energies, compared with those measured in the as-grown sample, within the same spectral region, indicates that this emission has a different origin. It is suggested that deep levels might be responsible for the luminescence observed after etching.     

Luminescence of dense, octahedral structured crystalline silicon dioxide (stishovite)

It is obtained that, as grown, non-irradiated stishovite single crystals possess a luminescence center. Three excimer pulsed lasers (KrF, 248 nm; ArF, 193 nm; F₂, 157 nm) were used for photoluminescence (PL) excitation. Two PL bands were observed. One, in UV range with the maximum at 4.7±0.1 eV with FWHM equal to 0.95±0.1 eV, mainly is seen under ArF laser. Another, in blue range with the maximum at 3±0.2 eV with FWHM equal to 0.8±0.2 eV, is seen under all three lasers. The UV band main fast component of decay is with time constant τ=1.2±0.1 ns for the range of temperatures 16-150 K. The blue band decay possesses fast and slow components. The fast component of the blue band decay is about 1.2 ns. The slow component of the blue band well corresponds to exponent with time constant equal to 17±1 μs within the temperature range 16-200 K. deviations from exponential decay were observed as well and explained by influence of nearest interstitial OH groups on the luminescence center. The UV band was not detected for F₂ laser excitation. For the case of KrF laser only a structure less tail up to 4.6 eV was detected. Both the UV and the blue bands were also found in recombination process with two components having characteristic time about 1 and 60 μs. For blue band recombination luminescence decay is lasting to ms range of time with power law decay ∼t⁻¹.For the case of X-ray excitation the luminescence intensity exhibits strong drop down above 100 K. such an effect does not take place in the case of photoexcitation with lasers. The activation energies for both cases are different as well. Average value of that is 0.03±0.01 eV for the case of X-ray luminescence and it is 0.15±0.05 eV for the case of PL. So, the processes of thermal quenching are different for these kinds of excitation and, probably, are related to interaction of the luminescence center with OH groups.Stishovite crystal irradiated with pulses of electron beam (270 kV, 200 A, 10 ns) demonstrates a decrease of luminescence intensity excited with X-ray. So, irradiation with electron beam shows on destruction of luminescent defects.The nature of luminescence excited in the transparency range of stishovite is ascribed to a defect existing in the crystal after growth. Similarity of the stishovite luminescence with that of oxygen deficient silica glass and induced by radiation luminescence of α-quartz crystal presumes similar nature of centers in those materials.     

Auger-free luminescence due to interatomic p–d transition and self-trapped exciton luminescence in Rb2ZnCl4 crystals

It is reported that Auger-free (AF) luminescence appears with two bands at 4.5 and 6.3 eV in Rb₂ZnCl₄. This luminescence originates from a radiative transition of the Cl 3p valence electrons into the Zn 3d outermost-core holes. The present work is the first observation of AF luminescence due to interatomic p–d transitions in halide crystals. The appearance of two AF luminescence bands suggests the existence of two types of AF transitions following core hole creation. A largely Stokes-shifted luminescence band is also found to appear at 1.9 eV. This band has an excitation threshold at the fundamental absorption edge, and is ascribed to the radiative decay of a self-trapped exciton.     

Electrical properties and emission mechanisms of Zn-doped β-Ga2O3 films

We study the electrical properties and emission mechanisms of Zn-doped β-Ga₂O₃ film grown by pulsed laser deposition through Hall effect and cathodoluminescence which consist of ultraviolet luminescence (UV), blue luminescence (BL) and green luminescence (GL) bands. The Hall effect measurements indicate that the carrier concentration increases from 7.16×10¹¹ to 6.35×10¹² cm⁻³ with increasing a nominal Zn content from 3 to 7 at%. The UV band at 272 nm is not attributed to Zn dopants and ascribed as radiative electron transition from conduction band to a self-trapped hole while the BL band is attributable to defect level related to Zn dopant. The BL band has two emission peaks at 415 and 455 nm, which are ascribed to the radiative electron transition from oxygen vacancy (V_O) to valence band and recombination of a donor–acceptor pair (DAP) between V_O donor and Zn on Ga site (Zn_Ga) acceptor, respectively. The GL band is attributed to the phonon replicas’ emission of the DAP. The acceptor level of Zn_Ga is estimated to be 0.26 eV above the valence band maximum. The transmittance and absorption spectra prove that the Zn-doped β-Ga₂O₃ film is a dominantly direct bandgap material. The results of Hall and cathodoluminescence measurements imply that the Zn dopant in β-Ga₂O₃ film will form an acceptor Zn_Ga to produce p-type conductivity.     

Self-activated luminescence in zinc-sulfo-selenide crystals

The orange luminescence at 2.15eV of As-grown ZnS_0.52Se_0.48crystals has been studied. The peak energy, halfwidth and Gaussian band shape exhibit a temperature dependence which is similar to that of the self-activated (SA) luminescence of ZnS at 2.66 eVand to that of ZnSe at 2.03 eV, and which can be described satisfactorily by a configurational coordinate model. However, optically detected magnetic resonance experiments at 1.8 K show that the luminescence is due to the recombination of an electron thermally released from a donor state with a hole trapped at an A-center acceptor state. The temperature dependence of the thermoluminescence spectra above 77 K and their spectral shift under additional IR exposure are also consistent with radiative recombination involving distant donor-acceptor pairs.     

硅衬底生长的InGaN/GaN多层量子阱中δ型硅掺杂n-GaN层对载流子复合过程的调节作用

为了解决在单晶硅衬底上生长的InGaN/GaN多层量子阱发光二极管器件发光效率显著降低的问题,使用周期性δ型Si掺杂的GaN取代Si均匀掺杂的GaN作为n型层释放多层界面间的张应力。采用稳态荧光谱及时间分辨荧光谱测量,提取并分析了使用该方案前后的多层量子阱中辐射/非辐射复合速率随温度（10~300 K）的变化规律。实验结果表明引入δ-Si掺杂的n-GaN层后,非辐射复合平均激活能由（18±3）meV升高到（38±10）meV,对应非辐射复合速率随温度升高而上升的趋势变缓,室温下非辐射复合速率下降,体系中与阱宽涨落有关的浅能级复合中心浓度减小,PL峰位由531 nm左右红移至579 nm左右,样品PL效率随温度的衰减受到抑制。使用周期性δ型Si掺杂的GaN取代Si均匀掺杂的GaN作为生长在Si衬底上的InGaN/GaN多层量子阱LED器件n型层,由于应力释放,降低了多层量子阱与n-GaN界面、InGaN/GaN界面的缺陷密度,使得器件性能得到了改善。