氮化铟p型掺杂的第一性原理研究

采用基于密度泛函理论(DFT)的总体能量平面波超软赝势法，对Mg，Zn，Cd掺杂InN的32原子超原胞体系进行了几何结构优化，从理论上给出了掺杂和非掺杂体系的晶体结构参数，其中非掺杂体系的理论值与实验值符合很好. 计算了掺杂InN晶体的结合能，总体态密度、集居数，差分电荷密度，并对此做了细致的分析. 计算结果表明，相对于Zn和Cd，Mg_In在InN中的溶解度会更大，并能提供更多的空穴态，非常有利于InN的p型掺杂. 关键词： 氮化铟 p型掺杂 电子结构 第一性原理     

Cd:O共掺杂AlN的电子结构和p型特性研究

为研究Cd：O共掺杂纤锌矿AlN的p型特性,进而揭示导致纤锌矿AlN空穴浓度增加的机理,对Cd：O共掺杂AlN进行了基于密度泛函理论的第一性原理研究.通过计算Cd_n-O（n=1,2,3,4）复合体掺杂AlN的结合能,发现Cd：O在AlN中可以稳定存在,共掺杂提高了Cd在AlN中的固溶度.分析Cd和Cd₂-O掺杂AlN体系的激活能,发现Cd₂-O的激活能比Cd减小0.21 eV,表明Cd₂-O的空穴浓度比单掺Cd大约提高 关键词： Cd：O共掺杂 纤锌矿AlN 电子结构 p型掺杂特性     

Be、Mg掺杂AlN电子结构的第一性原理计算

基于密度泛函理论(Density Functional Theory)框架下的第一性原理平面波超软赝势方法,计算分析了纤锌矿结构的AlN晶体和Be、Mg掺杂AlN晶体的晶格参数、结合能、能带结构、总体态密度、分波态密度、差分电荷分布及电荷集居数.计算结果表明:Be和Mg都是良好的p型掺杂剂,但是Be掺杂AlN晶体比Mg提供的空穴更多,Be比Mg更有利于AlN晶体的p型掺杂.     

Be、Mg 掺杂AlN电子结构的第一性原理计算

基于密度泛函理论(Density Functional Theory) 框架下的第一性原理平面波超软赝势方法,计算分析了纤锌矿结构的AlN晶体和Be、Mg掺杂AlN晶体的晶格参数、结合能、能带结构、总体态密度、分波态密度、差分电荷分布及电荷集居数．计算结果表明: Be和Mg都是良好的p型掺杂剂,但是Be掺杂AlN晶体比Mg提供的空穴更多,Be比Mg更有利于AlN晶体的p型掺杂．     

Zn,O共掺杂实现p型AlN的第一性原理研究

基于密度泛函理论(density functional theory),采用第一性原理平面波超软赝势法,研究了纤锌矿AlN,Zn掺杂和Zn,O共掺杂AlN的晶体结构、能带、电子态密度、差分电荷分布及电荷布居数.计算结果表明:Zn,O共掺杂方法中引入激活施主O原子,能使受主能级向低能方向移动,形成了浅受主能级.同时,受主能带变宽、非局域化特征明显、从而提高了Zn原子的掺杂浓度和系统的稳定性.Zn,O共掺杂更有利于获得p型AlN. 关键词： 第一性原理 AlN 电子结构 p型共掺杂     

Be, O共掺杂实现p型AlN的第一性原理研究

基于密度泛函理论框架下的第一性原理平面波超软赝势方法,研究了掺杂和非掺杂AlN体系的晶格参数、 能带结构、总体态密度、分波态密度、差分电荷分布及电荷集居数.计算结果表明: Be掺杂AlN晶体能够在能隙中形成深受主能级,空穴载流子局域于价带顶, 而引入了激活施主O原子的Be, O共掺杂方法,能使受主能带变宽、非局域化特征明显. 同时,受主能级向低能方向移动,形成了浅受主能级, 从而提高了Be原子的掺杂浓度和系统的稳定性. Be, O共掺杂更有利于获得p型AlN.     

Cu、Zn掺杂对AlSb电子结构和光学性质影响

运用密度泛函平面波赝势方法和广义梯度近似,对替代式掺杂Cu和Zn的闪锌矿AlSb的超晶胞晶体结构、电子结构和光学性质进行了计算。分析了其电子态分布和结构的关系,给出了掺杂前后AlSb体系的复介电常数和复折射函数。结果表明,掺有Cu和Zn的AlSb晶体空穴密度增大,会明显提高材料的电导率;两种掺杂体系光学带隙均变窄;通过分析掺杂前后AlSb晶体的复介电常数和复折射函数,解释了体系的发光机制。     

Ag,Zn掺杂对CdS电子结构和光学性质的影响

运用密度泛函平面波赝势方法和广义梯度近似, 对替代式掺杂Ag和Zn的闪锌矿CdS的超晶胞晶体结构、电子结构和光学性质进行了计算, 分析了其电子态分布与结构的关系,给出了掺杂前后CdS体系的介电函数和复折射率函数. 研究表明,掺有Ag的CdS晶体空穴浓度增大,会明显提高材料的电导率, 而Zn掺杂不改变CdS晶体载流子浓度; Ag, Zn掺杂体系光学带隙均变窄; 通过分析掺杂前后CdS晶体的介电函数和复折射率函数,解释了体系的发光机理. 关键词： 密度泛函理论 Ag,Zn掺杂CdS 电子结构 光学性质     

Mg，Cu 掺杂CdS电子结构的第一性原理研究

采用基于密度泛函理论（DFT）的第一性原理的平面波超软赝势方法,对闪锌矿结构CdS晶体及CdS:M（M=Mg, Cu）的几何结构、能带结构、电子态密度、集聚数和电荷密度分布进行了研究.对掺杂后体系的几何结构进行了优化计算,发现Mg和Cu原子掺入CdS后晶格常量均减少,晶格发生畸变.在此基础上研究了掺杂对体系电子结构的影响.结果表明,Mg,Cu掺入CdS都能提供较多空穴态,形成p型电导,并且Cu较Mg是更好的p型掺杂剂. 关键词： 密度泛函理论 电子结构 p型掺杂     

Al和N共掺p型Zn1-xMgxO电子结构的第一性原理计算

采用密度泛函理论下的第一性原理平面波超软赝势方法,对Zn1-xMgxO超晶胞和掺杂Al,N后的Zn1-xMgxO超晶胞分别进行了优化计算.结合广义梯度近似计算了Al和N共掺杂后Zn1-xMgxO的能带结构、电子态密度和Mulliken电荷布居分布.计算表明:掺入N原子的2p态电子为Zn1-xMgxO价带顶提供空穴载流子,使Zn1-xMgxO价带顶向高能方向移动;掺入Al原子的3p态电子则与N原子的2p态电子在费米能级附近发生轨道杂化,使费米能级处价带能级展宽,Al和N共掺杂可获得p型Zn1-xMgxO.     

射频等离子体辅助MBE生长GaN及Mg掺杂的光致发光

采用射频等离子体辅助分子束外延(RF plasma-assisted MBE)系统生长非故意掺杂GaN和p型GaN,并且通过室温和低温光致发光(PL)谱测试研究了材料的发光特性及与杂质态的关系,对于GaN外延层出现的黄带发光进行分析。结果表明,富Ga条件下生长的GaN材料特性要优于富N生长的材料;非故意掺杂的富Ga样品中出现的黄带发光(YL)与GaN中生成能最低的氮空位(V_N)缺陷有关;不同的Mg掺杂浓度对样品的PL特性有较大的影响;结合Hall效应测量结果,认为在Mg重掺杂的样品中出现的黄带发光,与GaN的自补偿效应以及重掺杂导致的晶体质量下降有关。     

Optimization of ZnSe film growth conditions for p-type doping

Wide bandgap semiconductors such as ZnSe and ZnO have attracted great interest due to their applications in solar cells, light emitting diodes, and lasers. However, these wide bandgap semiconductors are frequently difficult to be doped to heavy concentrations, greatly limiting their application. A substrate holder with a natural temperature gradient was developed for batch growth of films at different deposition temperatures, in order to investigate ZnSe film growth and doping challenges. Thin ZnSe films were grown by pulsed laser deposition and characterized using X-ray diffraction, optical transmission and reflection, Raman spectroscopy, and Energy Dispersive X-ray analysis. Deposition temperature and film stoichiometry (Zn:Se) are shown to be significant factors affecting ZnSe growth and doping. ZnSe films with improved crystallinity have been obtained by enriching with selenium and depositing at an optimized temperature. Heavily p-type ZnSe films with hole concentrations of ~2.7 × 10¹⁹ cm^?3 and resistivities of ~0.099 Ohm cm have been obtained (compared with previous reports of ~1 × 10¹⁸ cm^?3 and ~0.75 Ohm cm). The results, which are consistent with previous theoretical prediction of compensating defects in ZnSe films, can help to optimize ZnSe growth conditions and understand doping challenges in wide bandgap semiconductors.     

Properties and perspectives of ultrawide bandgap Ga2O3 in optoelectronic applications

Gallium oxide (Ga₂O₃) is an ultrawide bandgap semiconducting material that has been developed for many advanced technology and engineering applications and has potential uses in power devices, optoelectronics and sensing applications because of its high-quality material properties and availability of economically intrinsic substrates. Understanding the properties and applications of Ga₂O₃ aids in expanding its usage into new fields. This review summarises the crystal structure, polymorphism, thermal properties and optical and optoelectronic device applications of Ga₂O₃. As a wide bandgap semiconductor, this material has elicited new research interests on the basis of fundamental technologies, leading to various types of applications, including those in the optoelectronic field, such as light-emitting diodes and solar cells. Ga₂O₃ devices consume less power and have relatively low production cost, making them suitable for mass production. Issues, such as low thermal conductivity and anisotropic crystals in Ga₂O₃ structures, have been discussed; and suggestions, such as the doping method, have been provided to improve the electrical and optical properties of Ga₂O₃. The potential, challenges and progress of Ga₂O₃, particularly as an emerging material for high-power and deep-ultraviolet optoelectronic devices, are also reviewed and presented.     

Recent progress of the native defects and p-type doping of zinc oxide

Zinc oxide(ZnO) is a compound semiconductor with a direct band gap and high exciton binding energy.The unique property,i.e.,high efficient light emission at ultraviolet band,makes ZnO potentially applied to the short-wavelength light emitting devices.However,efficient p-type doping is extremely hard for ZnO.Due to the wide band gap and low valence band energy,the self-compensation from donors and high ionization energy of acceptors are the two main problems hindering the enhancement of free hole concentration.Native defects in ZnO can be divided into donor-like and acceptorlike ones.The self-compensation has been found mainly to originate from zinc interstitial and oxygen vacancy related donors.While the acceptor-like defect,zinc vacancy,is thought to be linked to complex shallow acceptors in group-VA doped ZnO.Therefore,the understanding of the behaviors of the native defects is critical to the realization of high-efficient p-type conduction.Meanwhile,some novel ideas have been extensively proposed,like double-acceptor co-doping,acceptor doping in iso-valent element alloyed ZnO,etc.,and have opened new directions for p-type doping.Some of the approaches have been positively judged.In this article,we thus review the recent(2011-now) research progress of the native defects and p-type doping approaches globally.We hope to provide a comprehensive overview and describe a complete picture of the research status of the p-type doping in ZnO for the reference of the researchers in a similar area.     

Electroluminescence from ZnO nanowires with a p-ZnO film/n-ZnO nanowire homojunction

ZnO homojunction light-emitting diodes based on ZnO nanowires were fabricated on Si(100) substrates. An N–In codoped p-type ZnO film grown by ultrasonic spray pyrolysis and an unintentionally doped n-type ZnO nanowire quasi-array grown by an easy low-temperature hydrothermal method were employed to form the homojunction diode. Under a forward bias larger than 8 V, electroluminescence, which was composed of an ultraviolet peak centered at 387 nm and a green band around 540 nm, was observed. The electroluminescence emission was contributed by the ZnO nanowires. The results reported here suggest that ZnO-based ultraviolet light-emitting devices could be realized at low cost. PACS 42.72.Bj; 73.40.Lq; 85.60.Jb     

3d过渡金属掺杂对Cd12O12纳米线电子和磁性能的影响

采用基于密度泛函理论的第一性原理计算方法,系统研究了3d过渡金属元素(Sc、Ti、Cr、Mn、Co、Cu和Zn)掺杂Cd12O12纳米线的几何结构,电子结构和磁性。结果表明：所有掺杂体系均是热力学稳定的;掺杂Ti或Zn时体系保留了原有的非磁半导体特性,掺杂Mn、Co或Cu时能够实现磁性半导体态,而在掺杂Sc（Cr）时体系转变为非磁性金属态（磁性金属态）。研究结果表明,掺杂3d过渡金属元素的Cd12O12纳米线在电子、光电和自旋电子学领域具有潜在的应用价值。     

Al-2N掺杂量对ZnO光电性能的影响

与本文相近的Al-2N掺杂量的范围内, 对ZnO掺杂体系吸收光谱分布红移和蓝移两种实验结果均有文献报道, 但是, 迄今为止对吸收光谱分布尚未有合理的理论解释. 为了解决该问题, 本文采用基于密度泛函理论的广义梯度近似 平面波超软赝势方法, 用第一性原理构建了两种不同掺杂量的Zn_0.98148Al_0.01852O_0.96296N_0.03704和Zn_0.96875Al_0.03125O_0.9375N_0.0625超胞模型. 在几何结构优化的基础上, 对模型能带结构分布、态密度分布和吸收光谱分布进行了计算. 计算结果表明, 在本文限定的掺杂量范围内, Al-2N掺杂量越增加, 掺杂体系的体积越减小, 体系总能量越升高, 体系稳定性越下降, 形成能越升高, 掺杂越难; 所有掺杂体系均转化为简并p型化半导体, 掺杂体系最小光学带隙均变窄,吸收光谱均发生红移; 同时发现掺杂量越增加, 掺杂体系最小光学带隙变窄越减弱, 吸收光谱红移越减弱. 研究表明: 要想实现Al-2N共掺在ZnO中最小光学带隙变窄、掺杂体系发生红移现象, 除了限制掺杂量外, 尺度长短也应限制; 其次, Al-2N掺杂量越增加,掺杂体系空穴的有效质量、浓度、 迁移率、电导率越减小,掺杂体系导电性能越减弱. 计算结果与实验结果的变化趋势相符合. 研究表明, Al-2N共掺在ZnO中获得的新型半导体材料可以用作低温端的温差发电功能材料.