Slow-rise and fast-drop current feature of ultraviolet response spectra for ZnO-nanowire film modulated by water molecules

This study describes the fabrication of ZnO-nanowire films by electro-chemical anodization of Zn foil.The ZnO films are characterized by field emission scanning electron microscopy,X-ray diffraction patterns,and transmission electron microscopy,respectively.The ultraviolet(UV) photo-response properties of the surface-contacted ZnO film are studied through the current evolution processes under different relative humidities.Unlike the usually observed current spectra of the ZnO films,the drop time is shorter than the rise time.The photo-conductivity gain G and the response time τ are both increased with the increase of the applied bias.The photo-conductivity gain G is lowered with the increase of the environmental humidity,while the response time τ is increased.These results can be explained by considering three different surface processes:1) the electron-hole(e-p) pair generation by the UV light illumination,2) the following surface O2-species desorption,and 3) the photo-catalytic hydrolysis of water molecules adsorbed on the ZnO surface.The slow-rise and fast-drop current feature is suggested to originate from the sponge-like structure of the ZnO nanowires.     

PEDOT:PSS Schottky contacts on annealed ZnO films

Polycrystalline ZnO and ITO films on SiO₂ substrates are prepared by radio frequency (RF) reactive magnetron sputtering. Schottky contacts are fabricated on ZnO films by spin coating with a high conducting polymer, poly(3, 4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) as the metal electrodes. The current-voltage measurements for samples on unannealed ZnO films exhibit rectifying behaviours with a barrier height of 0.72 eV (n=1.93). The current for the sample is improved by two orders of magnitude at 1 V after annealing ZnO film at 850 ℃, whose barrier height is 0.75 eV with an ideality factor of 1.12. X-ray diffraction, atomic force microscopy and scanning electron microscopy are used to study the properties of the PEDOT:PSS/ZnO/ITO/SiO₂. The results are useful for applications such as metal-semiconductor field-effect transistors and UV photodetectors.     

电化学沉积高c轴取向ZnO薄膜及其光学性能分析

采用阴极还原方法，在透明导电玻璃(ITO)上制备了高c轴择优取向的ZnO薄膜.通过X射线衍射、扫描电子显微镜等表征技术，研究了沉积电流对ZnO薄膜的结构、应力状态及表面形貌的影响；利用光致荧光光谱及透射光谱等分析方法，探讨了沉积电流变化对ZnO薄膜的光学性能的影响.研究结果显示：各沉积电流下均可制得高c轴取向的ZnO薄膜；薄膜表面形貌受电流的影响较大；从透射谱可以看出，薄膜在可见光波段有较高透射率，且薄膜厚度随沉积电流的增大而增大.光致荧光测量表明，电化学沉积的ZnO薄膜具有明显的带隙展宽.而且，随着沉积电流的增加，带隙发光强度逐渐减弱，缺陷发光逐渐增强.     

掺铁铌酸锂晶体的光电导衰减特性研究

利用电化学分析仪对掺铁同成分铌酸锂晶体进行瞬态光电导研究. 以不同掺铁浓度铌酸锂晶体为样品, 在不同强度的纳秒级脉冲光照射下对光电导的研究发现: 铌酸锂晶体的瞬态光电导是由较为复杂的电子迁移过程形成, 其衰减可以用一个指数函数叠加一个扩展指数来拟合. 拟合参数与光强、掺铁浓度存在以下依赖关系: 入射光强增强时, 幅值σ₁^max、σ₂^max、时间常数τ₂和扩展因子β 值增大, 在光强增大到一定时, τ₂和β出现饱和; 晶体的掺铁浓度升高时, σ₁^max、σ₂^max、τ₂ 值增大, 而β值减小. 根据实验结果, 从理论上提出了光电子导带迁移伴随光电子在小极化子上跳跃迁移的复合电荷传输模型. 该模型较好地解释了掺铁同成分铌酸锂晶体的光电导的衰减特点.     

TiCl4处理多孔薄膜对染料敏化太阳电池中电子传输特性影响研究

借助于强度调制光电流谱(IMPS)和强度调制光电压谱(IMVS)技术,研究了纳米TiO₂多孔薄膜在TiCl₄溶液处理后组装成的染料敏化太阳电池(DSC)中电子传输和背反应动力学特性. 研究表明:纳米TiO₂多孔薄膜经TiCl₄溶液处理后,电池中暗电流减小,电子寿命τ_n明显延长,电子传输时间τ_d缩短,电子有效扩散系数D_n增大,电子扩散长度L_n值升高,入射单色光子/电子转化效率η_IPCE增加,光生电荷量Q_oc显著增加. 文章从微观层面上研究了TiCl₄溶液处理纳米TiO₂多孔薄膜对DSC内部电子的产生、传输和复合过程的影响,从而很好地解释了电池光伏性能随TiCl₄溶液处理的变化关系. 关键词： 4')" href="#">TiCl₄ 电子传输 染料敏化 太阳电池     

染料敏化太阳电池中TiO2膜内电子传输和背反应特性研究

采用强度调制光电流谱(IMPS)和强度调制光电压谱(IMVS)研究电池内部电子传输机理和电子背反应动力学特性.利用理论表达式对不同TiO₂多孔膜厚度(d)的电池实验数据进行了拟合,得到了电池的吸收系数(α)、电子扩散系数(D_n)、电子寿命(τ_n)、电子传输时间(τ_d)和入射单色光光电转化效率(IPCE)等微观参数的数值.研究表明：膜薄有利于加快电子传 关键词： 染料敏化 太阳电池 IMPS/IMVS 传输     

ZnO纳米线场效应管的制备及I-V特性研究

采用静电探针和原子力探针技术,将化学气相沉积工艺制备的,长度为30—200 μm,直径80—750 nm的单根半导体ZnO纳米线搭接在Au,Zn,Al不同功函的金属隔离沟道两端,构建出了最基本的ZnO纳米线绝缘栅场效应管. 研究了沟道类型、纳米线直径、退火温度和外加栅压对ZnO纳米线场效应管I-V特性的影响. 利用半导体与金属材料的肖特基接触、欧姆接触的产生机理及电子输运理论,对结果进行了分析和讨论. 关键词： ZnO纳米线 场效应管 I-V特性')" href="#">I-V特性     

p型ZnO薄膜的制备及特性

采用射频磁控溅射在Si片上制备ZnO薄膜，通过离子注入对样品进行N掺杂，在不同温度下进行退火并实现了p型转变.用扫描电子显微镜、X射线衍射和Hall测量对薄膜进行了表征，结果表明薄膜具有良好的表面形貌和高度c轴择优取向，退火后p型ZnO薄膜的最高载流子浓度和最低电阻率分别为1.68×10¹⁶cm^-3和41.5Ω·cm.讨论并分析了退火温度和时间对ZnO薄膜p型转变的影响.     

Growth and characterization of thin ZnO films deposited on glass substrates by electrodeposition technique

Electrodeposition technique was used in order to produce nanometric zinc oxide films on glass insulating substrates. The effect of electrolyte concentration and applied current density on the formation and growth of electrodeposited Zn thin films in aqueous solutions of ZnSO₄ were studied. After a thermal oxidation, a characterization of the structural morphology of the films deposited was carried out by optical microscopy (OM), atomic force microscopy (AFM), scanning electron microscopy (SEM) and by grazing incidence X-rays diffraction (GIXD). These characterization techniques show that the grains size of the films after oxidation at temperature 450 °C is between 5 and 15 nm, as well as the structure is polycrystalline nature with several orientations. UV/vis spectrophotometry confirms that it is possible to obtain transparent good ZnO films with an average transmittance of approximately 80% within the visible wavelength region, as well as the optical gap of obtained ZnO films is 3.17 eV.     

Pulsed laser deposition of ZnO grown on glass substrates for realizing high-performance thin-film transistors

We report characterization of ZnO thin-film transistors (TFTs) on glass substrates fabricated by pulsed laser deposition (PLD). ZnO films were characterized by X-ray diffraction (XRD), atomic force microscopy and Hall effect measurements. The XRD results showed high c-axis-oriented ZnO(0002) diffraction corresponding to the wurtzite phase. Moreover, the crystallization and the electrical properties of ZnO thin films grown at room temperature are controllable by PLD growth conditions such as oxygen gas pressure. The ZnO films are very smooth, with a root-mean-square roughness of 1 nm. From the Hall effect measurements, we have succeeded in fabricating ZnO films on glass substrates with an electron mobility of 21.7 cm²/V s. By using the ZnO thin film grown by two-step PLD and a HfO₂ high-k gate insulator, a transconductance of 24.1 mS/mm, a drain current on/off ratio of 4.4×10⁶ and a subthreshold gate swing of 0.26 V/decade were obtained for the ZnO TFT.     

Surface morphology and growth mechanism of catalyst‐free ZnO and Mgx Zn1–x O nanorods

High‐resolution transmission electron microscopy was employed to investigate morphologies and catalyst‐free growth mechanism of ZnO/Mg_x Zn_1–x O ‘multi‐quantum well’ and ‘core‐shell’ nanorod heterostructures as well as ZnO nanorods. The one‐dimensional growth mechanism and the hexagonal faceting of ZnO nanorod were explained by the surface energy anisotropy. The morphology change by alloying with Mg was successfully explained by investigating the energy gain by adatom adsorption and the reduction in the surface energy anisotropy. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

蓝宝石基片的处理方法对ZnO薄膜生长行为的影响

采用反应射频磁控溅射方法,在经过不同方法处理的蓝宝石基片上,在同一条件下沉积了ZnO薄膜.利用原子力显微镜、X射线衍射、反射式高能电子衍射等分析技术,对基片和薄膜的结构、表面形貌进行了系统表征.研究结果显示,不同退火条件下的蓝宝石基片表面结构之间没有本质的差异,均为α-Al₂O₃ (001)晶面,但基片表面形貌的变化较大.在不同方法处理的蓝宝石基片上生长的ZnO薄膜均具有高c轴取向的织构特征,但薄膜的表面形貌差异较大.基片经真空退火处 关键词： ZnO薄膜 反应磁控溅射 基片处理 形貌分析     

The effect of UV irradiation on nanocrysatlline zinc oxide thin films related to gas sensing characteristics

The effect of ultraviolet (UV) light irradiation on the nanocrystalline ZnO thin films was investigated. The degree of crystallinity, electrical conductivity, optical properties and surface properties of ZnO thin films were measured as a function of UV irradiation time. It was found that the degree of crystallinity and electrical properties of ZnO films were affected by UV irradiation, however, no noticeable change in the surface morphology was observed. The gas sensing properties of as-deposited and UV irradiated films were also measured. It was observed that the gas sensing properties were affected by the UV irradiation. The irradiation time less than 5 min has improved the sensor while the irradiation time more than 5 min degraded the sensor characteristics for a UV power density of 2.45 W cm⁻².     

Structural, morphological and photoluminescence properties of W-doped ZnO nanostructures

W-doped ZnO nanostructures were synthesized at substrate temperature of 600 °C by pulsed laser deposition (PLD), from different wt% of WO₃ and ZnO mixed together. The resulting nanostructures have been characterized by X-ray diffraction, scanning electron microscopy, atomic force microscopy and photoluminescence for structural, surface morphology and optical properties as function of W-doping. XRD results show that the films have preferred orientation along a c-axis (0 0 L) plane. We have observed nanorods on all samples, except that W-doped samples show perfectly aligned nanorods. The nanorods exhibit near-band-edge (NBE) ultraviolet (UV) and violet emissions with strong deep-level blue emissions and green emissions at room temperature.     

TiO2颗粒尺寸对染料敏化太阳电池内电子输运特性影响研究

采用强度调制光电流谱(IMPS)和强度调制光电压谱(IMVS)研究了染料敏化太阳电池(DSC)内部电子传输和背反应动力学特性.在纳米TiO₂薄膜厚度相同的情况下,借助于IMPS/IMVS测量了由3种不同TiO₂颗粒尺寸大小薄膜制备出DSC的电荷传输特征参数值.IMPS/IMVS理论模型拟合实验测量数据的结果表明：在不同入射光强下,随着颗粒尺寸的增大,电子扩散系数(D_n)增大,而电子寿命(τ_n 关键词： 染料敏化 太阳电池 IMPS/IMVS 电子传输     

Effect of temperature on pulsed laser deposition of ZnO films

ZnO thin films have been deposited on Si(1 1 1) substrates at different substrate temperature by pulsed laser deposition (PLD) of ZnO target in oxygen atmosphere. An Nd:YAG pulsed laser with a wavelength of 1064 nm was used as laser source. The influences of the deposition temperature on the thickness, crystallinity, surface morphology and optical properties of ZnO films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), selected area electron diffraction (SAED), photoluminescence (PL) spectrum and infrared spectrum. The results show that in our experimental conditions, the ZnO thin films deposited at 400 °C have the best surface morphology and crystalline quality. And the PL spectrum with the strongest ultraviolet (UV) peak and blue peak is observed in this condition.     

Structural and photoluminescence characteristics of ZnO films by room temperature sputtering and rapid thermal annealing process

ZnO thin films deposited on SiO₂/Si substrates at room temperature by sputtering technology were annealed with a rapid thermal annealing process at various temperatures from 200 °C to 900 °C. The physical and optical properties of the ZnO films were investigated by X-ray diffraction, scanning electron microscopy and room-temperature photoluminescence (PL). The surface structures of the thin films showed great variations with increased annealing temperature. The PL spectrum illustrated that a stronger UV emission intensity appeared at an annealing temperature of 500 °C. On the other hand, visible-light emission could be obtained when the ZnO films were annealed above 500 °C and reached a maximum intensity at 900 °C. The possible mechanisms for visible-light emission are discussed. PACS 81.15.Cd; 81.40.Ef; 78.55.-m; 78.55.Et     

Nanoporous structures on ZnO thin films

Porous structures were formed on ZnO thin films which were grown by an electrochemical deposition (ECD) method. The growth processes were carried out in a solution of dimethylsulfoxide (DMSO) zinc perchlorate, Zn(ClO₄)₂, at 120 ^°C on indium tin oxide (ITO) substrates. Optical and structural characterizations of electrochemically grown ZnO thin films have shown that the films possess high (0002) c$c$-axis orientation, high nucleation, high intensity and low FWHM of UV emission at the band edge region and a sharp UV absorption edge. Nanoporous structures were formed via self-assembled monolayers (SAMs) of hexanethiol (C₆SH) and dodecanethiol (C₁₂SH). Scanning electron microscope (SEM) measurements showed that while a nanoporous structure (pore radius 20 nm) is formed on the ZnO thin films by hexanathiol solution, a macroporous structure (pore radius 360 nm) is formed by dodecanethiol solution. No significant variation is observed in X-ray diffraction (XRD) measurements on the ZnO thin films after pore formation. However, photoluminescence (PL) measurements showed that green emission is observed as the dominant emission for the macroporous structures, while no variation is observed for the thin film nanoporous ZnO sample.     

Room-temperature deposition of crystalline patterned ZnO films by confined dewetting lithography

In this work patterned ZnO films were prepared at room-temperature by deposition of ∼5 nm size ZnO nanoparticles using confined dewetting lithography, a process which induces their assembly, by drying a drop of ZnO colloidal dispersion between a floating template and the substrate. Crystalline ZnO nanoparticles exhibit a strong visible (525 nm) light emission upon UV excitation (λ = 350 nm). The resulting films were characterized by scanning electron microscopy (SEM) and atomic force microscope (AFM). The method described herein presents a simple and low cost method to prepare crystalline ZnO films with geometric patterns without additional annealing. Such transparent conducting films are attractive for applications like light emitting diodes (LEDs). As the process is carried out at room temperature, the patterned crystalline ZnO films can even be deposited on flexible substrates.     

Growth and characterization of pulsed laser deposited ZnO thin films

One of the most important and promising materials from metal oxides is ZnO with specific properties for near UV emission and absorption optical devices. The properties of ZnO thin films strongly depend on the deposition method. Among them, pulsed laser deposition (PLD) plays an important role for preparing various kinds of ZnO films, e.g. doped, undoped, monocrystalline, and polycrystalline. Different approaches — ablation of sintered ZnO pellets or pure metallic Zn as target material are described. This contribution is comparing properties of ZnO thin films deposited from pure Zn target in oxygen atmosphere and those deposited from sintered ZnO target. There is a close connection between final thin film properties and PLD conditions. The surface properties of differently grown ZnO thin films are measured by secondary ion mass spectrometry (SIMS), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Furthermore, different approaches — ablation of sintered ZnO pellet or pure metallic Zn as target materials are described. The main results characterize typical properties of ZnO films versus technological parameters are presented. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia