Effects of selenium treatment on composition and photoluminescence properties of porous silicon

In this work, an ultrasonically enhanced anodic electrochemical etching is developed to fabricate light-emitting porous silicon material. Porous silicon layer is fabricated in n-type (1 0 0) oriented silicon using HF solution and treated in selenious acid to increase the photoluminescence intensity. It is found that the increase of photoluminescence intensity after selenious acid treatment is higher in the intact zones and lower in the detached zones of ultrasonic excitation. The photoluminescence appears as a non-monotonous function of time exposure of selenious acid treatment. Surface chemical composition analysis by X-ray photoelectron spectroscopy shows formation of Si-Se_x and Si-Se_x-O_y on the surface of porous silicon treated with the selenious acid.     

光照下经H2O2处理的多孔硅的光致发光

光照下经H₂O₂处理的多孔硅其荧光强度随处理时间增加先增强后减弱,处理1min后,荧光强度达极大。未经H₂O₂处理的多孔硅在空气中激光照射下,其荧光退化很快,经H₂O₂处理的多孔硅在同样条件下,荧光退化明显变慢。红外吸收实验表明,H₂O₂处理后多孔硅与氧有关的振动大幅度增强,而各种Si—H键则明显减少。对比红外吸收与荧光强度的变化, 关键词：     

Stable ultraviolet photoluminescence emission in n-type porous silicon

This very paper is focusing on the investigation of porous silicon preparation with n-type silicon wafer by means of electrochemical anodization in the dark and, particularly, on its stable ultraviolet photoluminescence emission. A lateral electrical potential was applied, for this purpose, on silicon wafers, driving the electrons away and letting holes appear on the surface of the silicon wafer to enhance the electrochemical etching process. Characterizations have been made with scanning electronic microscope, fluorescence spectrophotometer and Fourier transform infrared spectroscope. An ultraviolet photoluminescence emission of 370 nm is found in the as-prepared n-type porous silicon, which seems to be well associated with the formation of oxygen-related species (twofold coordinated silicon defect) during the anodic oxidation. The result characterized by photo-bleaching performance indicates that the ultraviolet photoluminescence emission is so stable—only 7% reduction within 3600 s. Meanwhile the morphology of as-prepared n-type porous silicon is investigated.     

Improvement of photoluminescence and electrical properties of porous silicon layer treated with lanthanum

The influence of surface treatment of porous silicon (PS) in lanthanum (La) containing solution during different times on its photoluminescence and electrical properties has been investigated. For this purpose, chemical composition, structural, vibrational, photoluminescence and electrical characteristics of the porous silicon layer with and without lanthanum were examined using X-ray diffractometry (XRD), energy dispersive X-ray (EDX) spectroscopy, Fourier transmission infrared (FTIR) spectroscopy, photoluminescence (PL) spectroscopy and current–voltage (I–V) measurements. The results indicate that porous silicon layers treated with lanthanum exhibit an enhancement of photoluminescence intensity and show an improvement current intensity compared to untreated porous silicon layer.     

Spectroscopy of electroreflection, the electron band structure, and the mechanism of visible photoluminescence of anisotropically etched silicon

We present the results of studies of electroreflection in the 1.1–4.4 eV spectral range, of electron Auger spectroscopy, and of electron diffraction involving the photoluminescent Si-SiO₂ system prepared via anisotropic chemical etching of the Si(100) surface. These results are explained on the basis of a four-layer model of the band structure and energy transition diagram for a system with a quantum well at the silicon surface, surface electron states at the boundary, and a gradient of the band potential in the transition layer. We find that light-emitting silicon remains an indirect-gap semiconductor and that the visible photoluminescence is due to direct recombinations of the light-excited electrons and holes in the quantum well at the center of the Brillouin zone with the participation of the band of deep localized states, which is due to the presence of oxygen at the silicon surface. Zh. éksp. Teor. Fiz. 116, 1750–1761 (November 1999)     

Properties of erbium silicate doped with chromium in porous silicon

The possible formation of chromium-doped erbium silicate Er₂SiO₅: Cr in thin layers of porous silicon is demonstrated. This paper reports on studies of the photoluminescence, electron paramagnetic resonance, and transverse current transport in porous silicon layers (with different chromium and erbium contents) grown on n-and p-silicon single crystals heavily doped with shallow impurities. The Er₂SiO₅: Cr phase with the photoluminescence maxima at approximately 1.3 and 1.5 μm manifests itself after high-temperature annealing at 1000°C. The introduction of erbium and annealing at 700°C increase the intensity of the red photoluminescence of porous silicon by several factors. The decrease in the electrical conductivity of porous silicon suggests the onset of the formation of erbium silicate. The current-voltage characteristics exhibit a nonlinear behavior with an exponential dependence of the current on the voltage due to the discrete electron tunneling. An electron paramagnetic resonance spectrum of P _b centers in p-type heavily doped silicon is observed for the first time.     

Photophysical processes stimulated in nanoporous silicon by high-power laser radiation

Photoprocesses initiated on the surface of porous silicon irradiated with laser radiation with wavelengths (λ = 266, 337, and 532 nm) in a wide range of intensities (up to 2 × 10⁷W/cm²) were investigated. Laser-induced luminescence and laser mass-spectrometry were used as experimental procedures. X-ray reflection was used to determine the parameters of the porous silicon films. The photoluminescence spectra obtained at different wavelengths and low intensities were analyzed. This analysis showed that for an optically thin layer of porous silicon the luminescence spectrum does not depend on the wavelength of the exciting radiation. This indicates the existence of a separate system of levels in porous silicon that are responsible for the luminescence. The behavior of the photoluminescence spectra as a function of the intensity q of the exciting radiation was investigated. It was shown that the luminescence intensity is a nonlinear function of q. At high intensities of the exciting radiation, the luminescence intensity saturates and a short-wavelength shift of the spectra is observed; this is due to the high concentrations of photoexcited carriers. This increases the probability of the experimentally observed nonequilibrium photodesorption of H₂ and Si from the surface of porous silicon.     

Short-range order,large-scale potential fluctuations,and photoluminescence in amorphous SiN<Subscript>x</Subscript>

The short-range order and electron structure of amorphous silicon nitride SiN_x (x<4/3) have been studied by a combination of methods including high-resolution X-ray photoelectron spectroscopy. Neither random bonding nor random mixture models can adequately describe the structure of this compound. An intermediate model is proposed, which assumes giant potential fluctuations for electrons and holes, caused by inhomogeneities in the local chemical composition. The characteristic scale of these fluctuations for both electrons and holes is about 1.5 eV. The photoluminescence in SiN_x is interpreted in terms of the optical transitions between quantum states of amorphous silicon clusters.     

On the origin of photoluminescence in heavily-doped silicon

The origin of the photoluminescence in heavily-doped silicon is examined. Transient photoluminescence data for Si(P) are presented and used to identify the “Low Level” emission bands in terms of recombination of impurity band electrons with holes bound to acceptor sites. The “High Level” bands are attributed to recombination of impurity band electrons with free holes. The energies of the band gap and optical band gap in heavily-doped silicon are determined from the photoluminescence measurements.     

多孔硅的后处理及其发光特性

采用一种新颖而简便的方法,改善多孔硅的发光特性。该方法包括酸处理和阴极还原两步。实验证明通过对多孔硅进行酸处理,能有效提高多孔硅的发光强度;通过对多孔硅进行阴极还原处理,能明显改善多孔硅的发光稳定性,而且发光强度也得到了提高。综合酸处理和阴极还原两技术的特点,对所制备的多孔硅立即先进行酸处理,然后再对其进行阴极还原处理,结果表明该方法能较好地提高多孔硅的发光效率和发光稳定性。而且还对其发光机制进行了探讨。     

Effect of the external electric field on the kinetics of recombination of photoexcited carriers in a ZnSe/BeTe type II heterostructure

The kinetics of the radiative recombination of photoexcited electrons and holes for a spatially direct transition in a ZnSe/BeTe type II heterostructure in an external electric field has been analyzed. A strong decrease (more than two orders of magnitude) in the photoluminescence intensity, as well as a decrease in the duration of the relaxation of the direct transition, is observed when the electric field is applied. The energy levels and wavefunctions of electrons and holes in the ZnSe/BeTe heterostructure subjected to the electric field have been numerically calculated. It has been shown that the observed decrease in the photoluminescence intensity and duration of the relaxation of the direct transition is due to both an increase in the radiative recombination time and an increase in the rate of escape of photoexcited holes from the above-barrier level in the ZnSe layer to the BeTe layer.     

发光多孔硅的表面氮钝化

报道对多孔硅在NH₃气中进行快速热处理的结果。红外吸收谱表明,经处理样品的表面由Si(NH)₂和Si₃N₄所覆盖,电子自旋共振谱指出,经处理的样品有相当低的悬挂键密度,光荧光谱表明,经适当条件处理的样品的发光强度与未作处理样品相比仅略有降低,而且在大气中存放三个月基本不变,这些结果表明,氮化物可以在多孔硅表面形成优良的钝化膜,这对多孔硅的实际应用及理论研究都有一定意义。     

Multiparticle states and the factors that complicate an experimental observation of the quantum coherence in the exciton gas of SiGe/Si quantum wells

The measured stationary and time-resolved photoluminescence is used to study the properties of the exciton gas in a second-order 5-nm-thick Si_0.905Ge_0.095/Si quantum well. It is shown that, despite the presence of an electron barrier in the Si_0.905Ge_0.095 layer, a spatially indirect biexciton is the most favorable energy state of the electron–hole system at low temperatures. This biexciton is characterized by a lifetime of 1100 ns and a binding energy of 2.0–2.5 meV and consists of two holes localized in the SiGe layer and two electrons mainly localized in silicon. The formation of biexcitons is shown to cause low-temperature (5 K) luminescence spectra over a wide excitation density range and to suppress the formation of an exciton gas, in which quantum statistics effects are significant. The Bose statistics can only be experimentally observed for a biexciton gas at a temperature of 1 K or below because of the high degree of degeneracy of biexciton states (28) and a comparatively large effective mass (about 1.3m _e ). The heat energy at such temperatures is much lower than the measured energy of localization at potential fluctuations (about 1 meV). This feature leads to biexciton localization and fundamentally limits the possibility of observation of quantum coherence in the biexciton gas.     

调制掺杂的应变In0.60Ga0.40As/In0.52Al0.48As多量子阱结构的光致发光谱研究

报道了调制掺杂的应变In_0.60Ga_0.40As/In_0.52Al_0.48As多量子阱中室温光致发光光谱.观察到n=1和2电子子带到n=1重空穴子带的强发光峰.在低温下可以观察到n=1电子子带到n=1轻空穴弱发光肩胛.通过对发光强度随激发功率及温度依赖关系以及理论模型的分析研究,认为该调制掺杂量子阱中辐射复合效率降低的主要机制是应变失配位错对载流子的陷阱作用.界面上的失配位错是陷阱的主要来源.并用静态的光致发光理论模型 关键词：     

Distinctive features of time-resolved photoluminescence of porous silicon coated with a layer of diamondlike carbon

Time-resolved photoluminescence from porous silicon coated with a diamondlike carbon film is investigated. The intensity of the photoluminescence from the carbon film is obserd to increase after deposition, and there is an accompanying change in the intensity and a shortwavelength shift of the photoluminescence band of porous silicon that depends on the porosity of its original layers. These changes are explained by the formation of carbon nanoclusters on the surface of the silicon filaments. Zh. Tekh. Fiz. 68, 83–87 (April 1998)     

Electromigration with enhanced green emission in the titanium dioxide nanotube/graphene composite

One of the most studied photoluminescence emission peaks of anatase titanium dioxide (TiO₂) is green, located at about 520 nm, which is assigned to the radiative recombination between a mobile electron in the conduction band and oxygen vacancy defect as a trapped hole in the bandgap. Composite materials of TiO₂ with graphene are normally shown by the gradual quenching of photoluminescence intensity as a result of carrier lifetime extension, which is important to enhance photocatalytic activity. Herein we report an observation of the intensity enhancement of the green PL emission in a composite TiO₂ nanotube (TNT) and graphene produced through facile hydrothermal synthesis. The heterojunction formation of graphene and TNT makes the excited photoelectrons easy to diffuse from TNT to graphene. Hence, the recombination rate of mobile electrons in graphene and trapped holes located on the nanotube surface is enhanced due to the high mobility of electrons in graphene.     

Visible photoluminescence from silicon nanopowders produced by silicon evaporation in a high-power electron beam

Silicon nanopowders produced by electron-beam-induced evaporation of a bulk silicon sample in an argon atmosphere are studied by the photoluminescence technique and Raman scattering spectroscopy. A photoluminescence peak in the visible region of the spectrum has been detected at room temperature in powders consisting of silicon nanocrystals. The strong short-wavelength shift of the photoluminescence peak can be attributed to the quantum size effect of electrons and holes in small silicon nanocrystals (about 2 nm). The size of silicon nanocrystals is determined by analyzing Raman spectra, and it is consistent with estimates obtained from photoluminescence data.     

Photoconductivity of Si/Ge/SiO<Subscript>x</Subscript> and Si/Ge/Si structures with germanium quantum dots

A nonmonotonic dependence of the lateral photoconductivity (PC) on the interband light intensity is observed in Si/Ge/Si and Si/Ge/SiO_x structures with self-organized germanium quantum dots (QDs): in addition to a stepped increase in PC, a stepped decrease in PC is also observed. The effect of temperature and drive field on these features of the PC for both types of structures with a maximum nominal thickness of the Ge layer (N_Ge) is studied. The results obtained are discussed in the context of percolation theory for nonequilibrium carriers localized in different regions of the structure: electrons in the silicon matrix and holes in QDs.     

Patterning of porous silicon by metal-assisted chemical etching under open circuit potential conditions

Porous silicon is the most studied Si-based light-emitting material. The potential for the application of porous silicon in optoelectronics and also for chemical or biochemical sensing is high. Therefore, the successful patterning of porous silicon on Si wafers is of great interest. HF-based aqueous solutions containing H₂O₂ as oxidizing agent, in combination with appropriate metal deposition, can supply the necessary current in order to sustain the electrochemical etching of single crystalline Si under no external anodic bias. The H₂O₂ concentration can tune the etching rate of the Si wafers as well as the observed photoluminescence intensity and photon energy. We demonstrate that porous silicon growth can be preferentially initiated at sites where metal (Pt) has been deposited and effectively be confined there, in order to form a well-defined pattern of desired geometry. Conventional DC sputtering using stainless-steel masks was applied in order to test various patterning geometries and lengthscales. Photoluminescence spectroscopy, atomic force and optical microscopy were used in order to characterize the produced porous silicon patterns. This method could be a simple, cost-effective way for the production of porous silicon patterns on Si wafers, which could be used in various fields of application.     

Annealing and amorphous silicon passivation of porous silicon with blue light emission

The photoluminescence (PL) of the annealed and amorphous silicon passivated porous silicon with blue emission has been investigated. The N-type and P-type porous silicon fabricated by electrochemical etching was annealed in the temperature range of 700-900 °C, and was coated with amorphous silicon formed in a plasma-enhanced chemical vapor deposition (PECVD) process. After annealing, the variation of PL intensity of N-type porous silicon was different from that of P-type porous silicon, depending on their structure. It was also found that during annealing at 900 °C, the coated amorphous silicon crystallized into polycrystalline silicon, which passivated the irradiative centers on the surface of porous silicon so as to increase the intensity of the blue emission.