三级公自转行星系统中弯月透镜表面膜厚均匀性的研究

为提高弯月透镜表面的膜厚均匀性,对三级公自转行星系统中弯月透镜表面进行了膜厚均匀性的研究。构建了三级公自转行星盘的运动轨迹方程,并根据膜厚计算公式,建立了与三级盘倾角、公转半径有关的弯月透镜表面相对膜厚分布模型,采用电子束蒸发和离子束辅助沉积技术对分布模型进行了实验验证。此外,根据多次实验结果优化三级公自转行星系统结构参数,以提高弯月透镜表面的膜厚均匀性。实验结果表明,在未使用修正挡板技术的情况下,当公转半径为650 mm、倾角为60°时,可将弯月透镜凸面表面膜厚均匀性控制在±2.45%以内。     

光溅射镀膜均匀性的优化模拟

为了改善脉冲激光溅射沉积大面积薄膜的均匀性,发展了基片离轴旋转的扫描技术.根据基片离轴旋转的基本原理和等离子体羽空间余弦分布规律,建立了径向膜厚分布公式.数值模拟了各种因素对基片离轴旋转扫描沉积薄膜均匀性的影响.分析表明,优化粒子束中心与基片中心偏置距离、溅射点与基片的距离是改善基片离轴旋转扫描镀膜均匀性的主要途径.同时也考虑了电机转速、镀膜时间和激光重频的影响.通过参量优化,当均匀度要求在95％时,计算得到薄膜的最大半径超过40 mm.     

光溅射镀膜均匀性的优化模拟

为了改善脉冲激光溅射沉积大面积薄膜的均匀性,发展了基片离轴旋转的扫描技术.根据基片离轴旋转的基本原理和等离子体羽空间余弦分布规律,建立了径向膜厚分布公式.数值模拟了各种因素对基片离轴旋转扫描沉积薄膜均匀性的影响.分析表明,优化粒子束中心与基片中心偏置距离、溅射点与基片的距离是改善基片离轴旋转扫描镀膜均匀性的主要途径.同时也考虑了电机转速、镀膜时间和激光重频的影响.通过参量优化,当均匀度要求在95%时,计算得到薄膜的最大半径超过40mm.     

特定折射率材料及光学薄膜制备

根据太阳电池阵激光防护膜性能优化的需要,应用离子辅助电子束双源共蒸工艺方法制备了优化设计所需的特定折射率的薄膜材料并用于制备激光防护膜。测试结果显示:用该工艺方法制备的掺杂材料薄膜的折射率n=1.75,与优化设计所需数值相符;激光防护膜性能优良,太阳辐射能透过率提高6%以上,实现了对该激光防护膜性能的进一步优化。为了使该双源共蒸方法适于大面积薄膜的制备,应用均匀性挡板技术来提高该方法制备大面积薄膜的膜厚均匀性,使制备的掺杂材料薄膜在口径为400 mm时的不均匀性小于2.1%。该双源共蒸方法制备工艺简单、可靠,适于实际工程应用。薄膜性能测试结果与理论优化结果相符,达到预期优化目标。     

风洞模拟等离子体绕流场回波频谱调制特性实验研究

目标以极高速度在大气层内运动时,周围会因剧烈摩擦产生等离子体绕流场.等离子体绕流场运动速度分布不均匀,而且绕流场电子密度随时间动态变化,导致等离子体绕流场对入射其中的电磁波产生不均匀的频率调制,进而影响雷达的探测性能.为了复现等离子体绕流场在电磁波照射时产生的不均匀频谱调制现象,本文在中国科学院力学研究所JF-10风洞开展了等离子体绕流场回波频谱测量实验,通过信号源、环形器、天线和频谱仪组成的测量系统,以点频发射体制,获取了S和C波段的回波频谱数据,观察到了等离子体绕流场对目标回波频谱的调制现象,对测量现象的形成原因进行了讨论;基于测量数据,仿真分析了等离子体绕流场对目标一维距离像的散焦效应.     

非对称磁镜场电子回旋共振氧等离子体刻蚀化学气相沉积金刚石膜

分别应用郎缪尔双探针和离子灵敏探针对非对称磁镜场电子回旋共振氧等离子体的电子参数、空间分布和离子参数进行了测量,分析了气压对等离子体参数及空间分布的影响。利用该等离子体在优化的气压条件下对化学气相沉积金刚石膜进行了刻蚀,并研究了刻蚀机理。结果表明:电子温度为5~10 eV,离子温度为1 eV左右,而等离子体数密度在1010cm-3数量级。随气压的升高,电子和离子温度降低,而电子数密度先增大后减小。在低气压下等离子体数密度空间分布更均匀,优化的刻蚀气压为0.1 Pa。刻蚀过程中,离子的回旋运动特性得到了加强,有利于平行于金刚石膜表面的刻蚀,有效地保护了金刚石膜的晶界和缺陷。     

微晶硅薄膜在粗糙表面的大面积均匀生长机制在

用氩气稀释硅烷作为反应气体,利用感应耦合等离子体在廉价衬底上大面积均匀沉积微晶硅薄膜．X射线衍射和拉曼分析表明衬底能显著地影响晶向,且微晶硅薄膜由小晶粒组成．台阶仪测试表明,微晶硅薄膜具有大范围均匀的特点．探针分析表明衬底附近区域的离子密度及电子温度分布均匀．基于以上结果可知：粗糙表面在晶体结构形成具有重要的作用,电感耦合等离子体反应器可以大面积均匀沉积薄膜．此外,氩气能影响反应过程并提高微晶硅薄膜特性．     

激光等离子体中Thomson散射光谱的拟合

依据无碰撞、无磁场、麦克斯韦速度分布等离子体模型下的Thomson散射理论编写了一维Thomson散射光谱拟合程序，并考虑了等离子体中的热流引起的电子相对漂移.研究了诊断系统的谱分辨率、收集立体角、Thomson散射参数α、等离子体参数梯度和电子的相对漂移速度对Thomson光谱拟合的影响.等离子体不均匀性和有限收集立体角对参数诊断影响很小，因此可以用无梯度无收集立体角的拟合程序简化处理；实验中为了提高信号的信噪比可以适当增加收集立体角；α较小时对拟合影响很大，实验中可以通过选取散射角提高α值和精确监测等离子体密度来减小它的影响. 关键词： Thomson散射 激光等离子体 电子相对漂移     

光学玻璃基底原子层同质材料沉积薄膜光谱及激光诱导损伤特性研究

通过原子层沉积技术在熔石英玻璃表面制备了同质材料的单层SiO₂薄膜,对光学薄膜的物理化学性质和强激光辐照下的激光诱导损伤性能进行了深入研究。实验中采用双叔丁基氨基硅烷（BTBAS）和臭氧（O₃）作为反应前驱体,在熔石英光学元件表面进行了SiO₂薄膜的原子层沉积工艺研究,以不同沉积温度条件制备了一系列膜样品。首先对原子层沉积特性和薄膜均匀性展开了研究,发现薄膜生长厚度与沉积循环次数之间符合线性生长规律,验证了制备薄膜的原子级逐层生长特性,并且表面沉积膜层的均匀性很好,其测得膜厚波动不超过2%。然后针对不同温度条件下沉积的SiO₂薄膜,对其粗糙度及各类光谱特性展开了研究,对比结果表明：样品的表面粗糙度在镀膜后有轻微的降低;薄膜样品在200～1 000 nm范围内具有出色的透过率,均超过90%并逐渐趋近于93.3%,且其透射光谱与在裸露熔石英衬底上测得的光谱没有明显差异;镀膜前后荧光光谱和傅里叶变换红外光谱的差异证实了原子层沉积SiO₂膜中点缺陷（非桥键氧、氧空位、羟基等）的存在,这将会影响薄膜耐损伤性能。最后对衬底和膜样品进行了紫外激光诱导损伤测试,损伤阈值的变化表明熔石英元件表面沉积薄膜后的激光损伤性能有所降低,其零概率损伤阈值从31.8 J·cm-2减小到20 J·cm-2左右,与光谱缺陷情况表征相符合。薄膜中点缺陷部位会吸收紫外激光能量,导致局域温度升高,进而出现激光诱导损伤现象并降低抗激光损伤阈值。在选定的沉积温度范围内,较高温度条件下沉积的SiO₂薄膜其激光诱导损伤性能更好,可以控制沉积温度条件使得元件的抗损伤性能更为接近衬底本身,后续有望通过其他反应参数的优化来获得薄膜抗损伤性能的进一步提升。     

集成化导光板下表面微棱镜二维分布设计

集成化导光板下表面微结构分布是影响背光模组出射光均匀性的关键因素,因此是背光模组设计的重点之一.本文针对微棱镜一维分布设计中存在的大面积同一性影响背光模组亮度均匀性的问题,提出一种集成化导光板下表面微棱镜二维分布的设计思想,以提高背光模组的亮度均匀性.利用光学软件Lighttools对5.0英寸集成化导光板下表面微棱镜结构的较佳二维分布进行优化探索,通过与较佳的一维分布仿真结果对比分析可知,优化后的二维分布模式下,背光模组的光能利用率、照度均匀性、亮度均匀性分别达到92.03%,87.07%和91.94%,满足行业标准;其中,照度均匀性比一维分布提高了10%;同时,从亮度图观察,背光模组的整体亮度均匀性得到了有效提升.该研究结果对于背光模组轻薄化、集成化开发具有一定的参考价值.     

高脉冲功率能量PLD法制备MgZnO薄膜中的沉积机理

用PLD法成功制备了一系列高质量的MgZnO薄膜。实验中发现高脉冲能量沉积薄膜的结构和发光特性随基片温度的变化规律与低脉冲能量下的结果不一样:基片在室温时高脉冲能量制备薄膜的XRD峰的半峰全宽比高基片温度时的结果相对更小;AFM显示其颗粒变大,柱状生长突出;PL谱紫峰与绿峰强度比最大,结晶质量反而提高。另一方面,与低脉冲能量时相反,增大氧气压强后高脉冲能量沉积的薄膜XRD半峰全宽变窄。结合实验现象和表征,合理解释了高脉冲能量沉积的机理。室温制备高质量MgZnO薄膜的PLD沉积机理对于以后在柔性衬底上沉积薄膜的研究有重要的参考价值。     

ECR-PECVD制备Si3N4薄膜沉积工艺的研究

由偏心静电单探针诊断了电子回旋共振等离子体增强化学汽相沉积(ECR-PECVD)反应室内等离子体密度的空间分布规律．结果表明在轴向位置Z=50cm处,直径Φ12cm范围内等离子体密度分布非常均匀．分析了等离子体密度径向均匀性对沉积速率均匀性和薄膜厚度均匀性的影响．讨论了沉积制备一定薄膜厚度的Si₃N₄薄膜的工艺重复性．研究了各种沉积工艺参数与Si₃N₄薄膜沉积速率的相互关系．得到了ECR-PECVD技术在沉积薄膜时的工 关键词：     

等离子体闪光法识别薄膜损伤的误判消除方法

传统的等离子体闪光法,是根据探测器是否接收到来自薄膜样片周围发射的闪光信号,对薄膜是否发生损伤进行评判,这样的评判方法极易把空气与薄膜的等离子体闪光混淆而发生误判。为了消除这种误判,提出通过比较空气和薄膜各自的等离子体闪光的点燃时间,利用两者时间上的差异,实现对传统等离子体闪光法误判现象的消除方法。为了验证新方法的可靠性,借助于多光子吸收和级联电离理论,建立了空气等离体子体点燃时间的计算模型,根据薄膜与激光的相互作用原理建立了薄膜被击穿时的等离子体点燃时间计算模型,利用建立的模型仿真计算了空气和薄膜的等离子体闪光点燃时间分别为1.856和7.843 ns;搭建实验装置以实现对传统等离子体闪光法的更新,在装置中的不同位置设置三个光电探测器分别采集入射激光信号、空气和薄膜等离子体闪光信号,采集入射激光信号的光电探测器置于聚焦透镜的侧面,另外两个探测器位于薄膜样片周围且左右对称放置,分别用于采集薄膜的等离子体闪光信号和空气的等离子体闪光信号,所有光电探测器采集的信号转换为电信号后同步传输至示波器,以入射激光信号为基准信号,其与空气和薄膜等离子体闪光信号的起始时刻之差,分别为空气和薄膜等离子体闪光点燃时间。脉宽为10 ns、波长为1 064 nm的Nd∶YAG脉冲激光以0.015 cm的聚焦光斑半径、82.4 mJ的入射能量作用于光学厚度为λ/4、直径为20 mm的单层Al₂O₃薄膜样片上后,采集上述激光作用条件下的各路信号,经处理后得到的空气和薄膜的等离子体闪光点燃时间测试值分别为2.7和7.8 ns;理论计算和实验测试结果表明,空气的点燃时间总是小于薄膜的点燃时间,二者有很好的一致性。说明当强激光作用于单层Al₂O₃薄膜表面时,空气等离子体闪光先于薄膜等离子体闪光发生。基于空气和薄膜等离子体闪光点燃时间上的这种差异,利用闪光信号时间上的差别就可准确分辨出薄膜是否发生损伤,从而获得识别薄膜损伤与否的判据,这种从时间差异上识别薄膜等离子体闪光损伤的新方法,无论从理论上还是实验上均为传统等离子体闪光法误判现象的消除提供了技术基础。     

等离子体削波纳秒激光脉冲波形测量

实验上采用比对方法测试了激光不经过固体与经过固体介质产生等离子体削波的脉冲波形信号,获得等离子体削波效应产生的脉冲削波倍数。实验结果表明,在波长1.064 m,脉宽1 ns,聚焦透镜焦距100 mm,薄石英片厚度100 m,约束等离子体的小孔直径80 m情况下,等离子体效应产生的脉冲削波倍数为12~14;分别改变石英片厚度和约束等离子体小孔直径,等离子体脉冲削波倍数不变;增加入射激光能量,脉冲削波倍数增加,且经过等离子体后的激光脉冲波形的后沿逐渐出现很陡的下降沿。在产生脉冲削波的截断点位置进行图形拼接重构得到激光脉冲波形信息。     

On the influence of the mass ablated by a laser pulse on thin film morphology and optical properties

To know and to control experimental parameters that play a role in laser ablation is vital to define film properties. Among the others, laser fluence is commonly used. Yet, when plasma expansion dynamics takes place through an ambient gas, the relation between the ablated mass per pulse and gas mass is critical and till now it was poorly investigated. While the gas mass is fixed by the pressure in the deposition chamber, the ablated mass is not unequivocally determined by the laser fluence. For a given fluence value the ablated mass changes as a function of the irradiated target area. Here, we show that nanostructured silver thin films deposited keeping unaltered the laser fluence, while changing in a controlled way the irradiated area and hence the ablated mass per pulse, display markedly differentiated morphological and optical properties, as evidenced by electron microscopy and UV–Vis and Raman spectroscopies.     

Diamond-like-carbon films produced by magnetically guided pulsed laser deposition

We have compared the quality of carbon films deposited with magnetically guided pulsed laser deposition (MGPLD) and conventional pulsed laser deposition (PLD). In MGPLD, a curved magnetic field is used to guide the plasma but not the neutral species to the substrate to deposit the films while, in conventional PLD, the film is deposited with a mixture of ions, neutral species and clusters. A KrF laser pulse (248 nm) was focused to intensities of 10 GW/cm² on a carbon source target and a magnetic field strength of 0.3 T was used to steer the plasma around a curved arc to the deposition substrate. Electron energy loss spectroscopy was used in order to measure the fraction of sp³ bonding in the films produced. It is shown that the sp³ fraction, and hence the diamond-like character of the films, increased when deposited only with the pure ion component by MGPLD compared with films produced by the conventional PLD technique. The dependence of film quality on the laser intensity is also discussed. Received: 7 December 2000 / Accepted: 20 August 2001 / Published online: 2 October 2001     

Pulsed laser deposition (PLD) — an advanced state for technical applications

The conventional thin-film deposition equipment of pulsed laser deposition (PLD) has been modified for the preparation of individual thin solid films and nanometer-layer stacks of uniform thickness across 100-mm substrates. The planar target configuration was replaced by a cylindrical one and the target motion regime has been improved to provide precise spatial control of the plasma plume orientation. During thin-film deposition, substrate translation is preferred instead of the usual rotation technique. With this arrangement the emission characteristic of the plasma source can be computer controlled and the desired coating can be tailored via a stepper-motor-driven manipulator for the desired layer thickness profile across an extended substrate. Thus, for example, a homogeneous film thickness is obtained even for lower target/substrate distances, and an appropriate deposition rate can be maintained. In a second version, this cylinder geometry principle of plasma plume control by target surface morphology is extended to a spatial solution. The hemispherical target surface becomes the basic element for inside-wall coating of tubes or even of more complex hollow bodies. First applications of the equipment are explained and compared with typical results of the conventional technique.     

Aluminum film microdeposition at 775 nm by femtosecond laser-induced forward transfer

Micro-deposition of an aluminum film of 500-nm thickness on a quartz substrate was demonstrated by laserinduced forward transfer (LIFT) using a femtosecond laser pulse. With the help of atomic force microscopy (AFM) and scanning electron microscopy (SEM), the dependence of the morphology of deposited aluminum film on the irradiated laser pulse energy was investigated. As the laser fluence was slightly above the threshold fluence, the higher pressure of plasma for the thicker film made the free surface of solid phase burst out, which resulted in that not only the solid material was sputtered but also the deposited film in the liquid state was made irregularly.     

Liquids microprinting through a novel film-free femtosecond laser based technique

Laser-induced forward transfer (LIFT) is a high resolution microprinting technique in which small amounts of material are transferred from a previously prepared donor thin film to a receptor substrate. The application of LIFT to liquid donor films allows depositing complex and fragile materials in solution or suspension without compromising the integrity of the deposited material. However, the main drawback of LIFT is the preparation of the donor material in thin film form, being difficult to obtain reproducible thin films with thickness uniformity and good stability.In this work we present a laser microprinting technique that is able to overcome the drawbacks associated with the preparation of the liquid film, allowing the deposition of well-defined uniform microdroplets with high reproducibility and resolution. The droplet transfer mechanism relies on the highly localized absorption of strongly focused femtosecond laser pulses underneath the free surface of the liquid contained in a reservoir.An analysis of the influence of laser pulse energy on the morphology of the printed droplets is carried out, revealing a clear correlation between the printed droplet dimensions and the laser pulse energy. Such correlation is interpreted in terms of the dynamics of the liquid displaced by a laser-generated cavitation bubble close to the free surface of the liquid. Finally, the feasibility of the technique for the production of miniaturized biosensors is tested.