SiC材料及器件研制的进展

作为第三代的半导体材料－ＳｉＣ具有禁带宽度大、热导率高、电子的饱和漂移速度大、临界击穿电场高和介电常数低等特点,在高频、大功率、耐高温、抗辐照的半民体器件及紫外探测器和短波发光二级管等方面具有广泛的应用前景,文章综述了半导体ＳｉＣ材料生长及其器件研制的概况。     

半导体材料的华丽家族—氮化镓基材料简介

GaN基氮化物材料已成功地用于制备蓝,绿,紫外光发光器件,日光盲紫外探测器以及高温,大功率微波电子器件,由于该材料具有大的禁带宽度,高的压电和热电系数,它们还有很强的其他应用潜力,诸如做非挥发存储器以及利用压电和热效应的电子器件等,在20世纪80年代末和90年代初,在GaN基氮化物材料的生长工艺上的突破引发了90年代GaN基器件,特别是光电子和高温,大功率微波器件方面的迅猛发展,文章评述了GaN基氮化物的材料特性,生长技术和相关器件应用。     

氢终端单晶金刚石反相器特性

超宽禁带半导体金刚石材料在高温、高压电路中具有重要的应用潜力.本研究采用微波等离子体化学气相沉积生长的单晶金刚石衬底制备了原子层沉积(atomic layer deposition, ALD)的Al₂O₃栅介质的氢终端金刚石金属氧化物半导体场效应晶体管(metal oxide semiconductor field effect transistor, MOSFET)器件,并与负载电阻互连,成功制备了金刚石反相器. 4μm栅长的氢终端金刚石器件实现了最大113.4 m A/mm的输出饱和漏电流,器件开关比高达109,并在不同负载电阻条件下均成功测得金刚石反相器的电压反转特性,反相器的最大增益为10.     

主编介绍

正郝跃教授,中国科学院院士,西安电子科技大学教授,微电子学著名专家。籍贯安徽省,1958年3月生于重庆市,1982年毕业于西安电子科技大学半导体物理与器件专业,1991年获西安交通大学博士学位。他长期从事微电子学与固体电子学的科学研究和人才培养工作,在氮化镓/碳化硅第三代(宽禁带)和超宽禁带半导体材料、微波毫米波固态器件、紫外光电器件、新型微纳米半导体新材料、新结构、新器件与集成电等方面取得了系统的创新成果。成果获得了国家技术发明奖二等1项,国家科技进步奖二等两项;国家级教学成果一等奖1项;2010年获得"何梁何利"科学技术奖,2019年获得了陕西省最高科学技术奖。     

宽禁带半导体SiC的离子束合成,掺杂隔离与智能剥离

碳化硅作为新一代宽禁带半导体材料，在高温、高频、高功率、抗辐照电子器件中有着十分广阔的潜在应用前景．文章结合作者的工作，综述了离子束技术在ＳｉＣ研究中的应用，其中包括ＳｉＣ的合成、掺杂、器件隔离和智能剥离．     

宽禁带化合物半导体(发光材料)体单晶生长的现状及其发展的动向

本文介绍了国外宽禁带化合物半导体(发光材料)体单晶生长的现状和进展,以及在光器件应用方面的动态。综述范围主要有在禁带宽度允许发射近红外波长以下的发光材料,重点是可见光。另外,也介绍了某些新型发光材料,如兰色光MIS型器件所需要的发光材料等。     

半导体超晶格国家重点实验室诚聘英才

中国科学院半导体研究所半导体超晶格国家重点实验室长期以来主要致力于半导体物理的电子/自旋量子调控及光、电器件方面的研究,研究内容涉及从基础理论、材料生长、微纳器件的基本物理/功能特性到半导体光电器件的实用基础研究。当前科研人员中包括4位中国科学院院士、9人获得国家杰出青年基金资助、3人获选优秀青年科学基金资助。     

二维正方晶格光子晶体禁带特性

基于平面波展开法,以碳化硅构成二维正方晶格光子晶体,数值模拟了TE模、TM模二维光子晶体的禁带特性,结果表明,TE模更容易形成光子禁带。同时设计了以碳化硅构成二维正方晶格光子晶体波导,数值模拟了TE模、TM模波导的传输特性和禁带特性,结果表明,TE模构成的波导电磁波能够较好的传播,它们的光子禁带都没有出现。研究结论为光子晶体波导器件的开发提供参考。     

大失配、强极化第三代半导体材料体系生长动力学和载流子调控规律

高质量氮化镓(Ga N)材料是发展第三代半导体光电子与微电子器件的根基。大失配、强极化和非平衡态生长是Ga N基材料及其量子结构的固有特点,对其生长动力学和载流子调控规律的研究具有重要的科学意义与实用价值,受到各国科学界与产业界广泛高度重视。本文对大失配、强极化氮化物半导体材料体系外延生长动力学和载流子调控规律进行了研究,旨在攻克蓝光发光效率限制瓶颈,突破高Al和高In氮化物材料制备难题,实现高发光效率量子阱和高迁移率异质结构,制备多波段、高效率发光器件和高频率、高耐压电子器件,实现颠覆性的技术创新和应用,带动电子材料产业转型升级。     

GaN基半导体异质结构的外延生长、物性研究和器件应用

GaN基宽禁带半导体异质结构具有非常强的极化效应、高饱和电子漂移速度、高击穿场强、高于室温的居里转变温度、和较强的自旋轨道耦合效应等优越的物理性质,是发展高功率微波射频器件不可替代的材料体系,也是发展高效节能功率电子器件的主要材料体系之一,在半导体自旋电子学器件上亦有潜在的应用价值。GaN基异质结构材料、物理与器件研究已成为当前国际上半导体科学技术的前沿领域和研究热点。本文从GaN基异质结构的外延生长、物理性质及其电子器件应用三个方面对国内外该领域近年来的研究进展进行了系统的介绍和评述,并简要介绍了北京大学在该领域的研究进展。     

Electronic properties of SiC surfaces and interfaces: some fundamental and technological aspects

The wide band gap semiconductor silicon carbide (SiC) is the first-choice material for power electronic devices operating at high voltages, high temperatures, and high switching frequencies. Due to their importance for crystal growth, processing, and device fabrication, the electronic properties of SiC surfaces and interfaces to other materials such as metals and dielectrics are of particular interest. Unreconstructed, H-terminated SiC surfaces which are passivated in a chemical as well as an electronic sense are obtained in a thermal hydrogenation process. It is demonstrated that deposition of Al₂O₃ on H-terminated SiC(0001) leads to an interface which is lower in defects than the thermally grown SiO₂/SiC interface. Furthermore, starting from hydrogenated SiC{0001} surfaces it is possible to prepare unreconstructed (1×1) surfaces with one dangling bond per unit cell. These surfaces show indications for strong electron correlation effects. PACS 68.47.Fg; 73.20.At; 79.60.Bm; 68.35.Bs; 68.35.Dv     

Surface and interface issues in wide band gap semiconductor electronics

Wide band gap (WGB) materials are the most promising semiconductors for future electronic devices, and are candidates to replace the conventional materials (Si, GaAs, …) that are approaching their physical limits. Among WBG materials, silicon carbide (SiC) and gallium nitride (GaN) have achieved the largest advancements with respect to their material quality and device processing. Clearly, the devices performances depend on several surface and interface properties, which in turn are often crucially determined by the quality of the available material, as well as by the device processing maturity. In this paper, some surface and interface issues related to SiC and GaN devices processing are reviewed. First, the control of metal/SiC barrier uniformity and surface preparation will be discussed with respect to the performance of Schottky-based devices. Moreover, the impact of high-temperature annealing required for high-voltage Schottky diodes and MOSFETs fabrication, on the surface morphology and device performances will also be briefly presented. In the second part, it will be shown that for GaN the material quality is still the main concern, since dislocations have a severe influence on the current transport and barrier homogeneity of metal/GaN interfaces. Other practical implications of thermal annealing and surface passivation during GaN-based devices fabrication will also be addressed.     

First-principle study of the structural,electronic,and optical properties of SiC nanowires

We preform first-principle calculations for the geometric, electronic structures and optical properties of SiC nanowires(NWs). The dielectric functions dominated by electronic interband transitions are investigated in terms of the calculated optical response functions. The calculated results reveal that the SiC NW is an indirect band-gap semiconductor material except at a minimum SiC NW(n = 12) diameter, showing that the NW(n = 12) is metallic. Charge density indicates that the Si–C bond of SiC NW has mixed ionic and covalent characteristics: the covalent character is stronger than the ionic character, and shows strong s–p hybrid orbit characteristics. Moreover, the band gap increases as the SiC NW diameter increases. This shows a significant quantum size and surface effect. The optical properties indicate that the obvious dielectric absorption peaks shift towards the high energy, and that there is a blue shift phenomenon in the ultraviolet region. These results show that SiC NW is a promising optoelectronic material for the potential applications in ultraviolet photoelectron devices.     

生长温度对6H-SiC上SiCGe薄膜发光特性的影响

利用低压化学气相淀积工艺在6H-SiC衬底成功制备了SiCGe薄膜。通过光致发光(PL)谱研究了生长温度对SiCGe薄膜发光特性的影响。结果表明:生长温度为980,1030,1060℃的SiCGe薄膜的室温光致发光峰分别位于2.13,2.18,2.31eV处;通过组分分析和带隙计算,认定该发光峰来自于带间辐射复合,证实了改变生长温度对SiCGe薄膜带隙的调节作用。同时,对SiCGe薄膜进行了变温PL测试,发现当测试温度高于200K时,发光峰呈现出蓝移现象。认为这是不同机制参与发光所造成的。     

石墨烯过渡层对金属/SiC接触肖特基势垒调控的第一性原理研究

由于SiC禁带宽度大,在金属/SiC接触界面难以形成较低的势垒,制备良好的欧姆接触是目前SiC器件研制中的关键技术难题,因此,研究如何降低金属/SiC接触界面的肖特基势垒高度(SBH)非常重要.本文基于密度泛函理论的第一性原理赝势平面波方法,结合平均静电势和局域态密度计算方法,研究了石墨烯作为过渡层对不同金属(Ag,Ti,Cu,Pd,Ni,Pt)/SiC接触的SBH的影响.计算结果表明,单层石墨烯可使金属/SiC接触的SBH降低;当石墨烯为2层时,SBH进一步降低且Ni,Ti接触体系的SBH呈现负值,说明接触界面形成了良好的欧姆接触;当石墨烯层数继续增加,SBH不再有明显变化.通过分析接触界面的差分电荷密度以及局域态密度,SBH降低的机理可能主要是石墨烯C原子饱和了SiC表面的悬挂键并降低了金属诱生能隙态对界面的影响,并且接触界面的石墨烯及其与金属相互作用形成的混合相具有较低的功函数.此外,SiC/石墨烯界面形成的电偶极层也可能有助于势垒降低.     

石墨烯过渡层对金属/SiC接触肖特基势垒调控的第一性原理研究

由于SiC禁带宽度大,在金属/SiC接触界面难以形成较低的势垒,制备良好的欧姆接触是目前SiC器件研制中的关键技术难题,因此,研究如何降低金属/SiC接触界面的肖特基势垒高度(SBH)非常重要.本文基于密度泛函理论的第一性原理赝势平面波方法,结合平均静电势和局域态密度计算方法,研究了石墨烯作为过渡层对不同金属(Ag,Ti,Cu,Pd,Ni,Pt)/SiC接触的SBH的影响.计算结果表明,单层石墨烯可使金属/SiC接触的SBH降低;当石墨烯为2层时,SBH进一步降低且Ni,Ti接触体系的SBH呈现负值,说明接触界面形成了良好的欧姆接触;当石墨烯层数继续增加,SBH不再有明显变化.通过分析接触界面的差分电荷密度以及局域态密度,SBH降低的机理可能主要是石墨烯C原子饱和了SiC表面的悬挂键并降低了金属诱生能隙态对界面的影响,并且接触界面的石墨烯及其与金属相互作用形成的混合相具有较低的功函数.此外,SiC/石墨烯界面形成的电偶极层也可能有助于势垒降低.     

Band Gap Adjustment of SiC Honeycomb Structure through Hydrogenation and Fluorination

Previous calculations show that the two-dimensional(2 D) silicon carbide(SiC) honeycomb structure is a structurally stable monolayer. Following this, we investigate the electronic properties of the hydrogen and fluorine functionalized SiC monolayer by first-principles calculations. Our results show that the functionalized monolayer becomes metallic after semi-hydrogenation or semi-fluorination, while the semiconducting properties are obtained by the full functionalization. Compared with the bare SiC monolayer, the band gap of the fully hydrogenated system is increased, in comparison with the decrease of the gap in the fully fluorinated case. As a result, the band gap can be tuned from 0.73 to 4.14 eV by the functionalization. In addition to the metal-semiconductor transition, hydrogenation and functionalization also realize a direct-indirect semiconducting transition in the 2 D SiC monolayer. These results provide theoretical guidance for design of photoelectric devices based on the SiC monolayer.     

Supercontinuum generation in all-solid photonic crystal fiber with low index core

In this paper we report on the fabrication and characterization of an all-solid photonic band gap fiber with high contrast and low index core. The fiber cladding is composed of high index lead-silicate rods while borosilicate NC21 glass is used as a background glass. A 70 nm wide photonic band gap at 875 nm central wavelength is experimentally identified and compared with a numerical model. We also present a novel method for photonic band gap measurement using a femtosecond pulsed laser. The method is verified against standard one and discussed.     

光导开关研究进展及其在脉冲功率技术中的应用

 概述了GaAs光导开关的发展历史,通过对GaAs和SiC进行比较指出,SiC由于禁带宽度大、击穿场强高、电子饱和漂移速度大、热导率高等优势被认为是更好的光导开关材料。比较了本征光电导和非本征光电导的不同之处,报道了利用本征光电导和非本征光电导的SiC光导开关的最新进展。介绍了光导开关在超宽带源和紧凑型脉冲功率系统中的应用,提出了SiC光导开关进一步发展的关键技术并进行了展望。