提高多孔硅传感特性的一种新方法(英文)

研究了多孔硅(PS)吸附有机溶剂分子后对多孔硅荧光谱的淬灭效应。结果表明:淬灭多孔硅发光的有机溶剂分子是极性分子,有机溶剂分子的极性不同对多孔硅发光的淬灭程度也不同,且有些有机溶剂分子吸附氧化多孔硅比吸附多孔硅引起的发光淬灭具有更好的可逆性和选择性;用含有胺基的正丁胺(CH3CH2CH2CH2-NH2)作碳源,用射频辉光放电等离子系统在多孔硅表面沉积c n膜对多孔硅进行钝化处理后发现:其电致发光强度明显增强,发光峰位兰移,且在大气中存放60天后,其电致发光谱强度基本不衰减,峰位不再移动。经钝化处理的器件较未经处理的器件具有小的串联电阻Rs和低的驱动电压。这为提高多孔硅的传感特性提供了一种新方法。     

高温氧化多孔硅的电子束辐照效应

通过高温氧化处理得到的多孔硅,其阴极射线发光谱呈现明显的三峰结构。峰强随电子束辐照时间而下降。对光致发光很弱的样品,电子束辐照后光致发光明显地增强。红外透射谱及Raman谱分析表明样品基本上成为SiO_x.进一步分析指出三峰可能来源于SiO_x中的缺陷中心发光。电子束辐照在SiO_x禁带中引进了一些缺陷能级,通过这些能级使得紫外线可激发样品发光,出现光致发光增强的现象。     

Mechanism of light emission in low energy ion implanted silicon

A silicon wafer implanted with a single low energy (42 keV) silicon ion beam results in strong luminescence at room temperature. The implantation results in the formation of various luminescent defect centers within the crystalline and polymorphous regions of the wafer. The resulting luminescence centers (LC) are mapped using fluorescence lifetime imaging microscopy (FLIM). The emission from the ion-implanted wafer shows multiple PL peaks ranging from the UV to the visible; these emissions originate from bound excitonic states in crystal defects and interfacial states between crystalline/amorphous silicon and impurities within the wafer. The LCs are created from defects and impurities within the wafer and not from nanoparticles.     

Improved electroluminescence performance of ZnS:Cu,Cl phosphors by ultrasonic treatment

ZnS:Cu,Cl electroluminescence (EL) phosphors were prepared by high-temperature (1150 °C) solid-state reaction, subsequent ultrasonic treatment (t=0-60 min) and final low-temperature annealing process at 750 °C. The as-synthesized phosphors were characterized by X-ray powder diffraction (XRD), UV-vis absorbance spectra, electron probe microanalyzer (EPMA) and photoluminescence (PL) spectra. EL performance was investigated on an EL lamp fabricated by screen-printing at 100 V and 400 Hz. Ultrasound irradiation leads to intensity reductions and width increases of some XRD diffraction peaks, and results in a slight red-shift of UV-vis absorption edge. It also exhibits strong influences on PL and EL properties of the phosphors. Generally, PL performance monotonically declines with the increase of ultrasonic time, while EL performance benefits from the ultrasonic treatment and is superior to that of the commercial ones. The defects in the microstructure induced by the ultrasonic treatment are the fundamental reason for the change of PL and EL performances.     

Spin injection in the multiple quantum-well LED structure with the Fe/AlOx injector

A spin-injection/-detection device has been fabricated based on the multiple quantum well light emitting diode (LED) structure. It is found that only a broad electroluminescence (EL) peak of a full width at half maximum of 8.6 nm appears at the wavelength of 801 nm in EL spectra with a circular luminescence polarization degree of 18%, despite PL spectra always show three well resolved peaks. The kinetic energy gained by injected electrons and holes in their drift along opposite directions broadens the EL pe...     

电致发光成像技术在硅太阳能电池隐性缺陷检测中的应用

论述了一种利用硅太阳能电池在一定偏压下的电致发光(Electroluminescence,EL)成像来检测硅太阳能电池隐性缺陷的方法.硅太阳能电池的EL波长范围为850～1 200 nm.正向偏压下的EL光强反映了少数载流子的浓度及其扩散长度,而反向偏压下的EL区和发光强度对应于电池的缺陷区域和缺陷密度.用硅CCD相机...     

Photoluminescence and electroluminescence studies of polyvinyl carbazole films

Polyvinyl carbazole (PVK) film has been prepared by solution method. Its absorption, photoluminescence (PL) and electroluminescence (EL) have been studied. For PL and absorption studies, film of PVK was prepared by spreading PVK solution on clean glass plate. The dried film was taken out of the glass plate and used for absorption, thickness measurement and PL studies. The film is transparent in the visible region and absorption starts at 340 nm wavelength. The absorption peaks are obtained at 280, 250 and 220 nm, indicating that optical gap of film is 3.65 eV and molecular orbitals exist at 4.43, 4.96 and 5.64 eV. PL studies reveal that excitation by violet light gives luminescence at 430, 480 and 690 nm. For EL studies, cell is prepared by depositing PVK film on a portion of conducting glass plate and taking aluminum foil as second electrode. It is observed from the characteristics that the current varies linearly, where as EL intensity varies non-linearly with increasing voltage. Higher brightness has been observed at higher frequencies. EL spectrum shows a sharp peak at 400 nm and a broad and less intense peak at 700 nm, which are attributed to radiative decay of singlet exciton and defect centers, respectively.     

Defect‐band photoluminescence imaging on multi‐crystalline silicon wafers

Defect‐band emission photoluminescence (PL) imaging with an indium‐gallium‐arsenide (InGaAs) camera was applied to multi‐crystalline silicon (mc‐Si) wafers, which were taken from different heights of different Si bricks. Neighboring wafers were picked at six different processing steps, from as‐cut to post‐metallization. By using different cut‐off filters, we were able to separate the band‐to‐band emission images from the defect‐band emission images. On the defect‐band emission images, the bright regions that originate from extend‐ ed defects were extracted from the PL images. The area fraction percentage of these regions at various processing stages shows a correlation with the final cell electrical parameters. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Structure and radiation properties of dislocations arising during oxygen precipitate growth in silicon

The structural and radiation properties of defects formed during oxygen precipitation in Czochralski-grown silicon (Cz-Si) has been investigated by the methods of transmission electron microscopy (TEM) and photoluminescence (PL). It has been shown that the spectral intensity of dislocation-related luminescence (DL) is considerably redistributed as precipitates grow. A comparison of the concentration of different types defects with the DL integral intensity has shown that the secondary defects, namely, dislocations punched out of precipitates, make a main contribution to DL. In this case, the spectral distribution and integral intensity of DL are related to the extension of dislocation loops. The results show the capability of optimization of the dislocation-generation process to increase the intensity of the D1 line for its use in optoelectronics.     

Photoluminescence study of proton-implanted InP1−xAsx:Yb

Photoluminescence (PL) studies of low-energy (60 keV, H⁺₂), proton-implanted InP_1-xAs_x (0 x 17) crystals doped with Yb are reported. In the implanted samples we observed remarkable intensity reduction of all the PL lines. After annealing, the PL spectra did not recover to their preirradiation values indicating high thermal stability of the generated damage. We have not seen any influence of hydrogen or lattice defects on the shape of the Yb intra-4f-shell luminescence. We show that hydogen-implantation-induced defects stabilize surfaces of InP and InPAs compounds, preventing their decomposition during capless thermal annealing up to 650°C. It is suggested that this enhanced surface stabilization is due to the presence of defects saturated with hydrogen atoms which are bound tightly to the phosphorus atoms.     

Infrared electroluminescence from a Si MOS structure with Ge in the oxide

We report on room-temperature infrared electroluminescence (EL) from metal-oxide-semiconductor devices made from Si. We compare the luminescence from RF sputtered oxide films containing SiO₂ with and without Ge by using a composite target and luminescence from a SiO₂ layer made by rapid thermal oxidation. The sputtered films were annealed in the temperature range 600-900 °C. This densifies the films and is likely to reduce the concentration of defects. A luminescence peak located around 1150-1170 nm is observed at current densities as low as 0.1 A/cm². The corresponding photon energy is close to that of the Si band gap. In addition, we observe several broad luminescence bands in the range 1000-1750 nm. These bands get stronger with Ge in the SiO₂ film. Some of these bands have previously been suggested and are directly associated with Ge. Since we observe that the intensity is correlated with the presence of Ge while the mere presence of the bands is not, we discuss the EL bands being due to defects which concentration is influenced by Ge in the oxide.     

基于DCGANs的半片光伏组件电致发光图像增强技术

针对半片光伏组件电致发光（electroluminescence,EL）缺陷自动识别过程中训练用样本不足导致模型过拟合的问题,采用深度卷积生成对抗网络（deep convolutional generative adversarial networks,DCGANs）生成可控制属性的半片光伏组件EL图像,再采用多尺度结构相似性（multiscale structural similarity,MS-SSIM）指标对生成的EL图像与拍摄的EL图像之间的相似程度进行了评估。评估结果得到,使用DCGANs生成的所有类型半片光伏组件的EL图像与拍摄的EL图像的MS-SSIM指标都大于0.55,大部分的MS-SSIM值在0.7附近。在分类模型的训练过程中,测试集准确率随着训练集中生成图像数量的增加而升高,当生成图像数量达到6 000张时,测试集准确率达到97.92%。实验结果表明,采用DCGANs能够生成高质量且可控制属性的半片光伏组件EL图像,较好地解决因缺少训练样本而导致的模型过拟合问题。     

Characterization of cell mismatch in a multi-crystalline silicon photovoltaic module

In this study the causes and effects of cell mismatch were identified in a multi-crystalline silicon photovoltaic module. Different techniques were used to identify the causes of the mismatch, including Electroluminescence (EL) imaging, Infrared (IR) imaging, current–voltage (I–V) characteristics, worst-case cell determination and Large Area Laser Beam Induced Current (LA-LBIC) scans. In EL images the cracked cells, broken fingers and material defects are visible. The presence of poorly contacted cells results in the formation of hot-spots. LA-LBIC line scans give the relative photoresponse of the cells in the module. However, this technique is limited due to the penetration depth of the laser beam. The worst case cell determination compares the I–V curves of the whole module with the I–V curve of the module with one cell covered, allowing the evaluation of the performance of each cell in a series-connected string. These methods allowed detection of the poorly performing cells in the module. Using all these techniques an overall view of the photoresponse in the cells and their performance is obtained.     

Photoluminescence of a ZnO/GaN Heterostructure Interface

Growth of a ZnO/GaN heterostructure is carried out using pulsed laser deposition. By etching the ZnO layer from the ZnO/GaN structure, the photoluminescence （PL） of the associated GaN layer shows that the donor- acceptor luminescence of CaN shifts to about 3.27eV, which is consistent with the electroluminescence （EL） of n-ZnO/p-GaN already reported. XPS shows that oxygen diffuses into the CaN crystal lattice from the surface to 20nm depth. The PL spectra at different temperatures and excitation densities show that oxygen plays the role of potential fluctuation. The associated PL results of the interface in these LEDs could be helpful to understand the mechanism of EL spectra for ZnO/CaN p-n junctions.     

采用发射极非均匀指间距技术改善功率异质结双极晶体管热稳定性的研究

为了提高多发射极功率异质结双极晶体管的热稳定性,本文利用耦合热阻表征发射极指间距变化对发射极指间热耦合作用的影响,得到了耦合热阻与发射极指间距之间的变化关系,提出了发射极非均匀指间距技术.通过热电反馈模型对采用发射极非均匀指间距技术的功率HBT进行热稳定性分析,得到了多发射极指上的温度分布.结果表明,多发射极HBT在采用非均匀发射极指间距技术后,峰值温度明显下降,温度变化幅度更加平缓,有效地提高了器件的热稳定性. 关键词： 异质结双极晶体管 耦合热阻 指间距     

Efficient visible electroluminescence from porous silicon diodes with low driven voltage

By using n-butylamine as carbon resource, diamond-like carbon film (DLCF) was deposited on the p-n porous silicon (PS) surface by means of a radio-frequency glow discharge plasma system. Electroluminescent (EL) spectra show that EL intensity of the passivated PS diodes increases by 4.5 times and 30-nm blue-shift of EL peak occurs compared with the diodes without treatment and both of them are stable while the passivated diodes are exposed to the air indoor. The current-voltage (Ⅰ-Ⅴ) characteristics exhibit that the passivated diodes have a smaller series resistance and a lower onset voltage. The EL intensityvoltage (ⅠEL-Ⅴ) relations of the PS devices with different DLCF thicknesses show that only medium DLCF thickness is optimum. These experimental phenomena have been explained based on Raman spectra and IR spectra of the diamond-like carbon films and IR spectra of the passivated PS samples.     

Ir(Fppy)_3掺杂PVK体系发光特性的研究

对蓝色磷光材料Ir(Fppy)3不同浓度掺杂PVK薄膜的光致发光(PL)和电致发光(EL)特性进行了研究。并制备了结构为ITO/PEDOT:PSS/PVK:Ir(Fppy)3/BCP/Alq3/LiF/Al的蓝色磷光有机电致发光器件。实验结果发现,磷光材料掺杂浓度不同,器件发光特性不同。当Ir(Fppy)3掺杂浓度比较低时,EL光谱中可以观察到PVK较弱的发光;当Ir(Fppy)3掺杂浓度较高时,会发生浓度猝灭;当Ir(Fppy)3掺杂浓度比较适中时,EL光谱中观察不到PVK的发光,只有Ir(Fppy)3的发光。通过I-V-L特性的比较,当掺杂浓度为4%时,器件的光电特性最好。     

Si-based erbium-doped light-emitting devices

We report on the fabrication and performance of Si-based light sources. The devices consist of MOS structures with erbium (Er)-doped silicon rich oxide (SRO) film as gate dielectric. The devices exhibit electroluminescence (EL) at 1.54 μm at room temperature with a 0.2% external quantum efficiency. These devices show a high stability due to the silicon excess in the film. The Er-doped SRO films have been introduced in a Si/SiO₂ Fabry-Perot Microcavity in order to increase the spontaneous emission rate, the extraction efficiency and the spectral purity at the resonant wavelength. The active medium in the cavity has been electrically pumped and the conduction mechanisms have been analyzed. The EL spectra have also been acquired and compared with photoluminescence (PL) ones for the same resonant cavity light-emitting device (RCLED). The EL and PL peak intensities of the on-axis emission at the resonant wavelength are over 20 times above that of the similar Er-doped SRO film without a cavity. The Si-based RCLEDs exhibit different quality factors, ranging from 60 to 170. The spectra shape and intensity have been correlated with the quality factor. A high directionality of the emitted light, due to the presence of the resonant cavity, has also been observed: the overall luminescence is confined within 10° cone from the sample normal.     

聚酰亚胺薄膜的电致发光和光致发光

测量了氙灯辐照后聚酰亚胺(PI)薄膜的光致发光(PL)强度、PL谱和氙灯辐照后直流高电场下PI薄膜的电致发光(EL)强度、EL谱、XRD谱和吸收光谱,研究了其EL、PL特性与微观结构的关系.结果表明:PI薄膜的PL强度随测量时间呈指数衰减,EL强度随场强呈指数增长;辐照39 h后,PI的预击穿场强为2.56MV/cm,...     

CdSe/ZnSe自组装量子点中非线性系数随着温度的规律性变化(英文)

研究了在CdSe/ZnSe自组装量子点中CdSe量子点的发光随着激发光强度变化的特性。发现当激发强度(I)变化3个数量级的时候,量子点发光的峰位、峰形都没有发生明显的变化。通过公式L∝Ik(其中I是激发光强度,L是量子点发光强度,k是非线性系数)得到非线性系数k值。实验结果表明:在温度由21 K升高到300 K的过程中,k值随温度变化可以分为3个区域:当温度低于120 K时,k值接近于1;然后,随着温度升高,k值慢慢变小;最后,随温度进一步升高,k值由200 K时的0.946迅速减少到0.870。结合发光随温度变化的实验结果,确认在120 K以下发光主要来源于束缚激子复合。在温度由200 K升高到300 K的过程中,非线性系数的单调减小主要归因于随着温度的升高,发光部分来自于由自由电子或空穴到束缚态能级(FB)的复合。进一步通过分析量子点发光的积分强度随着温度的变化的实验结果,发现发光强度随温度升高而减弱的主要原因是材料中的缺陷或者位错等提供非辐射渠道。