Progress in Modification of Indium-Tin Oxide/Organic Interfaces for Organic Light-Emitting Diodes

The oxide/organic interfaces play crucial roles in the hole injection from the anode electrodes to the emitting organics in organic light-emitting diodes (OLEDs), and hence have strong impacts on the efficiencies and other properties of the devices. Indium-tin oxide (ITO) is currently the most popular anode material used in OLEDs due to several merits, such as good etch ability, good adherence, high transparency, low resistivity, and high work function. Interfacial engineering between the ITO electrode and the overlying organic layers is an important process to obtain the high performance of the diode devices. In this article, recent progress in modification of the ITO/organic interfaces is reviewed, as these interfaces are important to the development of the technologies aiming at improving the electroluminescence, and efficiencies as well as reducing the operation voltages of OLEDs. ITO/Organic interfacial properties can be controlled or modified by simply changing the surface properties of ITO using chemical or physical treatments, and by adding a buffer layer (e.g., metal, oxide, or organic thin films) between the ITO and hole transport or emitting organic layers. The literature data showed that the electroluminescence, efficiencies, and lifetimes of the OLEDs could be greatly increased and the operation voltage considerably decreased when the ITO/organic interfaces have been properly improved.     

在半导体-金属相变温度附近氧化钒薄膜光学性质的异常变动

在可见光—近红外波段的不同波长下,测量了半导体-金属相变过程中氧化钒薄膜样品的反射率和透射率.在薄膜相变过程中,不同波段的反射率曲线和透射率曲线表现出不同的变化趋势.利用非相干光在薄膜中的多级反射-透射模型,计算了相变过程中不同波长下氧化钒薄膜的折射率n和消光系数k随温度的变化.结果表明,在相变温度附近氧化钒薄膜光学性质的异常变动,其原因既有薄膜的折射率和消光系数随波长的变化趋势不同,也有在吸收性薄膜中存在探测光多次反射和透射的累加效应.     

磁控溅射制备氧化硅薄膜生长速率

氧化硅薄膜是半导体工业中常见的薄膜材料,通常采用化学气相沉积方法制备。但是这种制备方法存在缺欠。采用磁控溅射的方法首先在石英衬底上制备了氧化硅薄膜。研究了射频功率、氧气含量和溅射压强对氧化硅薄膜沉积速率的影响。发现沉积速率随着射频功率的增加而增加;随着氧气含量的增加,先减小后增大;当溅射压强在0.4~0.8 Pa之间变化时,沉积速率变化很小,当溅射压强超过0.8 Pa时沉积速率迅速下降。讨论了不同生长条件下造成氧化硅薄膜生长速率变化的原因。     

射频磁控溅射低温制备非晶铟镓锌氧薄膜晶体管

利用射频磁控溅射技术室温制备了铟镓锌氧(IGZO)薄膜,采用X射线衍射(XRD)表征薄膜的晶体结构,原子力显微镜(AFM)观察其表面形貌,分光光度计测量其透光率。结果表明:室温制备的IGZO薄膜为非晶态且薄膜表面均匀平整,可见光透射率大于80%。将室温制备的IGZO薄膜作为有源层,在低温(<200℃)条件下成功地制备了铟镓锌氧薄膜晶体管(a-IGZO TFT),获得的a-IGZO-TFT器件的场效应迁移率大于6.0 cm2.V-1.s-1,开关比约为107,阈值电压为1.2 V,亚阈值摆幅(S)约为0.9 V/dec,偏压应力测试a-IGZO TFT阈值电压随时间向右漂移。     

Effect of oxygen partial pressure on PLD cobalt oxide films

Thin CoO oxide layers with superior properties in terms of crystallographic ordering, surface roughness and constant and controlled chemical compositions have been prepared by pulsed laser deposition in reactive O₂ atmosphere at 400 °C. Such systems are particularly suitable both for applications and for basic studies, any time high quality and controlled surfaces are required, for example in multilayered systems whose behaviour critically depends on interface properties, such as magnetically exchange-coupled systems. A structural and microstructural study of such films is presented, together with the compositional analysis for different process conditions. The best control on film stoichiometry was obtained by protecting the surface with a thin Pt cap-layer, before air exposure.     

Effect of the chemistry and structure of the native oxide surface film on the corrosion properties of commercial AZ31 and AZ61 alloys

The purpose of this study has been to advance in knowledge of the chemical composition, structure and thickness of the thin native oxide film formed spontaneously in contact with the laboratory atmosphere on the surface of freshly polished commercial AZ31 and AZ61 alloys with a view to furthering the understanding of protection mechanisms. For comparative purposes, and to more fully describe the behaviour of the native oxide film, the external oxide films formed as a result of the manufacturing process (as-received condition) have been characterised. The technique applied in this research to study the thin oxide films (thickness of just a few nanometres) present on the surface of the alloys has basically been XPS (X-ray photoelectron spectroscopy) in combination with ion sputtering. Corrosion properties of the alloys were studied in 0.6 M NaCl by measuring charge transfer resistance values, which are deduced from EIS (electrochemical impedance spectroscopy) measurements after 1 h of exposure. Alloy AZ61 generally showed better corrosion resistance than AZ31, and the freshly polished alloys showed better corrosion resistance than the alloys in as-received condition. This is attributed to a combination of (1) higher thickness of the native oxide film on the AZ61 alloy and (2) greater uniformity of the oxide film in the polished condition. The formation of an additional oxide layer composed by a mixture of spinel (MgAl₂O₄) and MgO seems to diminish the protective properties of the passive layer on the surface of the alloys in as-received condition.     

硒化亚铜薄膜热电性能研究进展

热电材料可以实现热能和电能的相互转换,它是一种环境友好的功能性材料.当前,热电材料的热电转换效率低,这严重制约了热电器件的大规模应用,因此寻找更加优异热电性能的新材料或提高传统热电材料的热电性能成为热电研究的主题.与块状材料相比,薄膜具有二维的宏观性质和一维的纳米结构特性,方便研究材料的物理机制与性能的关系,还适用于制备可穿戴电子设备.本文总结了Cu₂Se薄膜5种不同的制备方法,包括电化学沉积、热蒸发、旋涂、溅射以及脉冲激光沉积.另外,结合典型事例,总结了薄膜的表征手段,并从Cu₂Se的电导率、塞贝克系数和热导率等参数出发,讨论了各个参数对热电性能的影响机制.最后介绍了Cu₂Se薄膜热电的热门应用方向.     

Optical and electrical properties of aluminum zinc oxide (AZO) nanostructured thin film deposited on polycarbonate substrate

Transparent polymer materials, due to their unique properties, such as light weight, optical transparency, and electrical and mechanical properties, have become very attractive as a replacement for inorganic glass substrates in a wide range of optoelectronic applications. In this research, aluminum zinc oxide nanostructured thin film was deposited on polycarbonate polymer substrates using a magnetron sputtering technique. The structure, morphology, and surface composition of the thin film were investigated by X-ray diffraction and field emission scanning electron microscopy. The optical and electrical properties of the thin film were investigated by UV–VIS-NIR spectrophotometer, ellipsometer, and four point probe method. The X-ray diffraction pattern showed that the aluminum zinc oxide thin film had a polycrystalline structure. The optical and electrical results indicated that the refractive index, band gap, and sheet resistance of the aluminum zinc oxide thin film were 1.8, 3.2 eV, and 265 Ω/sq, respectively.     

高活性氧化亚铜薄膜材料的绿色合成研究

本文采用一步脉冲雾化化学气相沉积法在250℃下制备了氧化亚铜薄膜催化剂.实验研究了前驱体中掺杂水对氧化铜薄膜表面形貌、拓扑结构、表面成分和光学特性的影响规律.结果表明所制得的催化剂为纯相的氧化亚铜.前驱体溶液中掺杂水会导致氧化亚铜的晶粒变小,从而使得共光学能隙从2.16 eV降至2.04 eV.原子力显微镜结果表明随着水的加入,氧化亚铜的表面粗糙度降低,表面更加均匀.此外,利用密度泛函理论计算得到了水和乙醇在氧化亚铜薄膜表面的吸附和反应特性,并提出了氧化亚铜的形成机理.本文开发了一种低成本且实际可行的薄膜制造方法,该方法在太阳能电池和半导体等领域具有潜在应用.     

A possible origin of room temperature ferromagnetism in Indium-Tin oxide thin film: Surface spin polarization and ferromagnetism

Room temperature ferromagnetism in both transition-metals doped and undoped semiconductor thin films and nanostructures challenges our understanding of the magnetism in solids. In this report, we performed the magnetic measurement and Andreev reflection spectroscopy study on undoped Indium-Tin oxide (ITO) thin films and bulk samples. The magnetic measurement results of thin films show that the total magnetization/cm² is thickness independent. Prominent ferromagnetism signal was also discovered in bulk samples. Spin polarized electron transports were probed on ITO thin film/superconductor interface and bulk samples surface/superconductor interface. Based on the magnetic measurement results and spin polarization measurement data, we propose that the ferromagnetism in this material originates from the surface spin polarization and this surface polarization may also explain the room temperature ferromagnetism discovered in other undoped oxide semiconductor thin films and nanostructures.     

Metal-supported ultrathin oxide film systems as designable catalysts and catalyst supports

Thin oxide films lend themselves as model supports for studies in heterogeneous catalysis, for example, to study the growth and reaction of metal deposits (atoms, clusters and nanoparticles). If the thickness of the film is chosen appropriately these thin films are reasonable models to mimic the situation of bulk materials. If thin films below a critical thickness are studied these materials exhibit properties in their own right. Their structural properties may be tuned to control their functional characteristics. Possible implications for heterogeneous catalysis are discussed.     

N2O处理对背沟刻蚀金属氧化物薄膜晶体管性能的影响

通过采用稀土元素镨掺杂铟锡锌氧化物半导体作为薄膜晶体管沟道层,成功实现了基于铝酸的湿法背沟道刻蚀薄膜晶体管的制备.研究了N₂O等离子体处理对薄膜晶体管背沟道界面的影响,对其处理功率和时间对器件性能的影响做了具体研究.结果表明,在一定的功率和时间处理下能获得良好的器件性能,所制备的器件具有良好的正向偏压热稳定性和光照条件下负向偏压热稳定性.高分辨透射电镜结果显示,该非晶结构的金属氧化物半导体材料可以有效抵抗铝酸的刻蚀,未发现明显的成分偏析现象.进一步的X射线光电能谱测试表明, N₂O等离子体处理能在界面处形成一个富氧、低载流子浓度的界面层.其一方面可以有效抵抗器件在沉积氧化硅钝化层时等离子体对背沟道的损伤;另一方面作为氢的钝化体,抑制了低能级施主态氢的产生,为低成本、高效的薄膜晶体管性能优化方式提供了重要参考.     

SRPES investigation of tungsten oxide in different oxidation states

The microstructure and morphology of metal oxide films have a large influence on the sensitivity, selectivity and stability of the gas sensors and catalysts. Considering that the sensing properties of thin film sensors are strongly related to their microstructures and to the exact stoichiometry of their surfaces, an accurate control of these parameters is extremely important for the production of sensors with reproducible behavior. In this paper, an influence of preparation and annealing conditions on the physical and chemical properties of tungsten oxide thin film is investigated. Two types of samples having polycrystalline structure were prepared by different methods (deposition under UHV conditions, oxidation of metallic tungsten layer in air). The samples were reduced by heating in UHV at different temperatures and/or by Ar ion bombardment. It was found that the stability of tungsten oxide layer with respect to the treatment procedures depends strongly on the preparation conditions of the sample. The reduction process is discussed in terms of different oxidation states resolved in the W4f photoelectron spectrum. Easy reducibility of the tungsten oxide layer prepared by vacuum deposition was found to be a consequence of its nano-crystalline structure.     

氧化物薄膜研制中的电子能谱技术

随着科学技术的不断发展，人们正在寻求更新的实用材料．金属氧化物，包括金属氧化物薄膜的各种实用材料，在工业界、信息产业界和能源开发等方面的应用前景，早已引起国内外学者的极大关注．例如，由于氧化物具有各种特殊的介电和光学性质，研究和开发基于氧化物薄膜的气敏材料非常热门．如何制备出有实用价值的各种薄膜材料，是科学家们一直关心和深入研究的课题．电子能谱技术在各种材料的基础研究和实际应用中起着重要的作用．本文以有序金属氧化物薄膜研制为例，简要评述了电子能谱技术（包括X射线光电子能谱（XPS），紫外光电子能谱（UPS），俄歇电子能谱（AES）和高分辨电子能量损失谱（HREELS）），以及低能电子衍射（LEED）等技术在氧化物薄膜材料制备和表征中的应用．     

电化学方法制备ZnO纳米颗粒掺杂类金刚石薄膜及其场发射性能研究

采用液相电化学沉积技术制备了ZnO纳米颗粒掺杂的类金刚石(DLC)薄膜, 研究了ZnO纳米颗粒掺杂对DLC薄膜场发射性能的影响. 利用X射线光电子能谱、透射电子显微镜、Raman光谱以及原子力显微镜分别对薄膜的化学组成、 微观结构和表面形貌进行了表征. 结果表明: 薄膜中的ZnO纳米颗粒具有纤锌矿结构, 其含量随着电解液中Zn源的增加而增加. ZnO纳米颗粒掺杂增强了DLC薄膜的石墨化和表面粗糙度. 场发射测试表明, ZnO纳米颗粒掺杂能提高DLC薄膜的场发射性能, 其中Zn与Zn+C的原子比为10.3%的样品在外加电场强度为20.7 V/μm时电流密度达到了1 mA/cm². 薄膜场发射性能的提高归因于ZnO掺杂引起的表面粗糙度和DLC薄膜石墨化程度的增加.     

退火温度和Ga含量对溶液法制备InGaZnO薄膜晶体管性能的影响

采用溶液法在玻璃衬底上制备InGaZnO薄膜,并以InGaZnO为沟道层制备底栅顶接触型薄膜晶体管,研究了退火温度和Ga含量对InGaZnO薄膜和晶体管电学性能的影响.研究表明,退火可以明显改善溶液法制备InGaZnO薄膜晶体管的电学性能.退火温度的升高会导致薄膜晶体管阈值电压的负向漂移,并且饱和迁移率和电流开关比增大.X射线光电子能谱测量表明,随退火温度的增加,InGaZnO薄膜表面吸附氧减少,沟道层中氧空位增多导致电子浓度增大.退火温度为380?C时,晶体管获得最佳性能.饱和迁移率随Ga含量的增加而减小.In:Ga:Zn摩尔比为5:1.3:2时,晶体管达到最佳性能:饱和迁移率为0.43 cm~2/(V·s),阈值电压为1.22 V,开关电流比为4.7×10~4,亚阈值摆幅为0.78 V/decade.     

拓扑绝缘体薄膜生长与栅电压调控输运特性研究

文章讨论了三维拓扑绝缘体制备和输运性质研究方面的进展情况.首先介绍了拓扑绝缘体体材料和薄膜的制备,并介绍了文章作者利用分子束外延方法,在硅表面以及高介电常数材料钛酸锶表面生长高质量拓扑绝缘体Bi2Se3薄膜的工作.然后介绍了拓扑绝缘体输运研究的现状,以及文章作者在栅电压调控拓扑绝缘体外延薄膜的化学势和输运性质方面的研究成果.     

氧化物分子束外延技术及其在关联材料电子态研究中的应用

氧化物分子束外延薄膜和异质结生长技术近年来迅速发展,人们已实现以单原子层的精度来精确生长多种复杂量子材料,有力地推动了铜氧化物高温超导电性、二维电子气、氧化物电子学和自旋电子学器件等领域的研究.文章介绍了氧化物分子束外延的技术关键,并以La1-xSrxMnO3薄膜为例,介绍了钙钛矿结构的氧化物薄膜生长和刻画.特别是文章作者通过建立超高真空下的原位样品传送系统,可把薄膜样品直接传送到角分辨光电子能谱仪中,实现了薄膜的原位电子结构测量.所测得的La1-xSrxMnO3的电子结构与能带计算结果较为相符.而此类立方结构的、不可解理材料的电子结构,过去往往是无法直接测量的.     

Intensity analysis of XPS spectra to determine oxide uniformity: Application to SiO2/Si interfaces

A simple method of determining oxide uniformity is derived which requires no knowledge of film thickness, escape depth, or film composition. The method involves only the measurement of oxide and substrate intensities and is illustrated by analysis of XPS spectral data for thin SiO₂ films grown both thermally and by low-temperature chemical vapor deposition on monocrystalline Si. A region 20–30 Å thick is found near the SiO₂/Si interface on thermally oxidized samples which has an inelastic mean free path 35% less than that found in the bulk oxide. This is interpreted as being due to lattice mismatch resulting in a strained region which is structurally, but not stoichiometrically, distinct from the bulk oxide.     

Resonant x-ray reflectivity measurements of a Ni/Fe alloy thin film: A composition profile

We have measured the composition profile of a Ni/Fe permalloy (0.8 Ni/0.2 Fe) thin film using glancing incidence X-ray reflectivity. Resonant reflectivity measurements were carried out by tuning the X-ray energy below and above, close and away from the respective K-edges of Fe and Ni. The information obtained using this method allows a determination of not only the electron density but also the composition profiles of the Ni/Fe alloy thin film. This non-destructive technique is a promising tool for the determination of the chemical composition of thin film. We used a matrix formalism to describe the wave propagation in a continuous medium. In our calculations, we used linear segments to approach the local electron density profile at the interfaces and Gaussian factors to account for the rms(root mean squre) roughness due to irregularities in the boundary position. We were able to obtain excellent fits to the data and get consistent geometry and composition parameters from the reflectivity measurements at five different X-ray energies. We detected oxidation layers on the top surface and between the alloy thin film and the substrate. We observed also that the Ni/Fe composition at the interfaces deviate from that of the bulk of the thin film sample.