共查询到19条相似文献,搜索用时 109 毫秒
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可见光波段及1 064 nm波长处用于Glan-Taylor棱镜减反射膜 总被引:1,自引:0,他引:1
为了提高Glan-Taylor棱镜的透射率,研究了Glan-Taylor棱镜在可见光波段及1 064 nm波长处减反射膜膜的设计和制备.为提高薄膜和冰洲石晶体的附着力,采用沉积Al2O3为过渡层,ZrO2作缓冲层的方法,用单纯形优化的方法进行膜系优化设计.用电子束沉积和离子束辅助沉积的方法制备了多层减反射膜,并采用石英晶体振荡法监控膜厚和沉积速率.测量结果表明,在可见光波段及1 064 nm波长处的剩余反射率均小于0.5%经测试薄膜与冰洲石晶体的附着力性能良好. 相似文献
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针对光电极值法和石英晶振法各自的弊端,结合两种方法提出了光控-晶控膜厚监控法.在相同工艺条件下,分别使用这三种方法监控905nm窄带滤光片(规整膜系)和830nm截止滤光片(非规整膜系)的膜厚,对制备的滤光片的透射率光谱曲线进行比较.结果表明,光控-晶控膜厚监控法除了各项指标都符合要求外,在曲线通带处获得的平均透过率值比光电极值法和石英晶振法获得的平均透过率值提高了3%~6%,且与理论光谱基本吻合,光谱特性最好.该方法不仅对规整和非规整膜系都能进行监控,且能有效降低膜厚误差,提高光谱特性. 相似文献
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为了提高Glan-Taylor棱镜的透射率,研究了Glan-Taylor棱镜在可见光波段及1064nm波长处减反射膜膜的设计和制备.为提高薄膜和冰洲石晶体的附着力,采用沉积Al2O3为过渡层,ZrO2作缓冲层的方法,用单纯形优化的方法进行膜系优化设计.用电子束沉积和离子柬辅助沉积的方法制备了多层减反射膜,并采用石英晶体振荡法监控膜厚和沉积速率.测量结果表明,在可见光波段及1064nm波长处的剩余反射率均小于0.5%经测试薄膜与冰洲石晶体的附着力性能良好. 相似文献
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目前,在镀制多层增透膜时所用的方法是:利用真空蒸发膜料并按石英晶体振荡频率ω连续控制分层厚度 h_J(J 是从基底算起的层数)。当ω的变化达到预定值Δω_1时,就停止 J 层的淀积。在镀制时,每制备一组增透膜最好都有层厚的控制方法。这样就可调节频率Δω,以便使实际的层厚近似于技术程序所规定的最佳层厚 h_J,并且保证增透 相似文献
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借助于VC 编程从理论上模拟分析了膜厚监控误差以及监控片不均匀性对光学膜厚监控的影响。结果表明,膜厚监控误差和监控片的不均匀性都对监控曲线有影响;随着膜层层数的增加,监控片不均匀性逐渐增大。实验制备了多层规整薄膜并对其监控曲线进行了分析,分析表明考虑到膜厚监控误差和监控片不均匀性后计算的光学监控曲线和镀膜过程实测光学监控曲线吻合较好。这说明膜厚监控误差和监控片不均匀性是引起监控曲线与理论值偏离的重要因素。介绍了如何计算考虑膜厚监控误差和监控片不均匀性后的理论监控曲线。这将对膜厚自动监控,尤其是对非规整膜系的自动监控具有重要的指导意义。 相似文献
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《中国光学与应用光学文摘》2005,(2)
O484.1 2005021301 光学薄膜膜厚监控方法及其进展=Progress in optical thin film thickness monitoring[刊,中]/廖振兴(华中科技大学 激光技术国家重点实验室.湖北,武汉(430074)).杨芳… //激光杂志.-2004,25(4).-10-12 针对目前膜厚监控技术的广泛使用和其方法的日益 多样性,力图对光学薄膜膜厚监控方法作一个全面、细致 的描述。包括膜厚监控方法的分类、进展和展望,重点介 绍了几种膜厚的光学监控方法。图3参14(于晓光) 相似文献
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基于石英晶体的旋光色散原理,提出了一种测量石英晶体光轴方向厚度的光谱分析方法。利用光学矩阵方法对测量原理进行了分析,指出通过测量由两个正交的偏光镜和待测石英晶体所组成的系统的透射曲线就可以精确计算出待测石英晶体的厚度。在实验的过程中进行了误差分析,分析表明选取长的测量波段、低的扫描速度、短的响应时间和小的狭缝宽度都有利于提高测量精度,并从理论上证明所得厚度的精度高于电子数显千分尺的测量精度。利用三种不同的方法对两块不同厚度的石英晶体进行了测量,测量结果表明利用提出的方法所得厚度的精度可以达到0.1μm,与理论分析的结果相一致。 相似文献
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T. Khasanov 《Optics and Spectroscopy》2007,102(1):128-131
A method of determination of the refractive indices of uniaxial crystals from the compensator parameters is proposed. In this case, the accuracy is limited by the temperature fluctuations inside a crystal. The orientation of the optical axis with respect to the surface and the thickness and the thermal expansion coefficient of the crystal can be determined additionally. This method can be used for precise determination of the refractive indices and absorption coefficients of biaxial crystals. Experimental results of determination of the temperature coefficients of the refractive indices and of linear expansion for a plane-parallel plate cut from artificial crystalline quartz parallel to the optical axis are presented. 相似文献
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Fabrication of broadband antireflection coatings using broadband optical monitoring mixed with time monitoring 下载免费PDF全文
Multi-layer optical coatings with complex spectrum requirements, such as multi-band pass filters, notch filters, and ultra-broadband antireflection coating, which usually contain very thin layers and sensitive layers, are difficult to be fabricated using a quartz crystal monitoring method or a single wavelength optical monitoring system(SWLOMS). In this paper, a broadband antireflection(AR) coating applied in the wavelength range from 800 nm to 1800 nm was designed and deposited by ion beam sputtering(IBS). Ta_2O_5 and Si O_2 were chosen as high and low refractive index coating materials,respectively. The optimized coating structure contains 9 non-quarter-wave(QW) layers totally with ultra-thin layers and sensitive layers in this coating stack. In order to obtain high transmittance, it is very important to realize the thickness accurate control on these thin layers and sensitive layers. A broadband optical monitoring mixed with time monitoring strategy was successfully used to control the layer thickness during the deposition process. At last, the measured transmittance of AR coating is quite close to the theoretical value. A 0.6% variation in short wavelength edge across the central 180 mm diameter is demonstrated. A spectrum shift of less than 0.5% for 2 continuous runs is also presented. 相似文献
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Naoyuki Takahashi Takato Nakumura Yoshinori Kubo Katsumi Tamanuki 《Journal of Physics and Chemistry of Solids》2005,66(7):1145-1149
Crystalline quartz films with an AT-cut plane have been grown by catalyst-enhanced vapor-phase epitaxy, at atmospheric pressure, using two quartz buffer layers on a sapphire (110) substrate. In this method, the first quartz buffer layer was deposited on the sapphire (110) substrate at 773 K. After annealing at 823 K, the second buffer layer was deposited at 723 K. The crystal quartz epitaxial layer was then grown at 843 K. The X-ray full-width-at-half-maximum (FWHM) value of the crystalline quartz film obtained was smaller than that of crystalline quartz prepared using a hydrothermal process. The crystalline quality of the quartz films was dependent on the thickness of the buffer layers. Furthermore, it was found that angle control of the cut plane depended on the film thickness of the second buffer layer. The quartz films grown by vapor phase epitaxy show good oscillation characteristics at room temperature. 相似文献
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用直流磁控溅射技术在石英基片上制备不同厚度(5 nm~114 nm之间)的铬膜.使用X射线衍射仪和分光光度计分别检测薄膜的结构和光学性质,利用德鲁特模型和薄膜的透射、反射光谱计算铬膜的厚度和光学常量,并采用Van der Pauw方法测量薄膜电学性质.结果表明:制备的铬薄膜为体心立方的多晶态,随着膜厚的增加,薄膜的结晶性能提高,晶粒尺寸增大;在可见光区域,当膜厚小于32 nm时,随着膜厚的增加,折射率快速减小,消光系数快速增大,当膜厚大于32 nm时,折射率和消光系数均缓慢减小并逐渐趋于稳定;薄膜电阻率随膜厚的增加为一次指数衰减. 相似文献
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用直流磁控溅射技术在石英基片上制备不同厚度(5nm~114nm之间)的铬膜.使用X射线衍射仪和分光光度计分别检测薄膜的结构和光学性质,利用德鲁特模型和薄膜的透射、反射光谱计算铬膜的厚度和光学常量,并采用Van der Pauw方法测量薄膜电学性质.结果表明:制备的铬薄膜为体心立方的多晶态,随着膜厚的增加,薄膜的结晶性能提高,晶粒尺寸增大;在可见光区域,当膜厚小于32nm时,随着膜厚的增加,折射率快速减小,消光系数快速增大,当膜厚大于32nm时,折射率和消光系数均缓慢减小并逐渐趋于稳定;薄膜电阻率随膜厚的增加为一次指数衰减. 相似文献
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根据石英晶体的旋光色散特性,利用光学矩阵方法对多级石英晶体旋光光学滤波器的滤波原理进行了详细的理论分析,推导出多级石英晶体旋光光学滤波器的透射主峰波长和通带半宽度的计算公式.利用分光光度计对单级和多级石英晶体旋光光学滤波器的滤波特性进行了实验研究,结果表明单级和多级石英晶体旋光光学滤波器滤波特性与理论曲线一致.从理论和实验上证明了多级石英晶体旋光光学滤波器与单级相比通带半宽度得到了有效的压缩,且随滤波器级数的增大,压缩的程度也随之增大.
关键词:
光学滤波器
偏振
石英晶体
旋光色散 相似文献