透射式指数掺杂GaAs光电阴极最佳厚度研究

通过研究指数掺杂GaAs光电阴极中光电子扩散漂移长度与均匀掺杂GaAs光电阴极中光电子扩散长度的差异,确定透射式指数掺杂GaAs光电阴极的最佳厚度范围为16—22 μm.利用量子效率公式对透射式指数掺杂GaAs光电阴极最佳厚度进行了仿真分析,发现厚度为20 μm时阴极积分灵敏度最大.外延生长阴极厚度分别为16和20 μm的两种透射式指数掺杂GaAs样品并进行了激活实验,测得样品的积分灵敏度分别为1228和1547 μA/lm,两者的比值为796%. 实验结果与仿真结果符合. 关键词： GaAs光电阴极 透射式 指数掺杂 厚度     

均匀掺杂GaAs材料光电子的输运性能研究

通过建立原子结构的理论模型和电离杂质散射理论公式,研究了光电子在透射式均匀掺杂GaAs光电阴极体内的输运过程,分析了光电阴极的掺杂浓度、发射层厚度、电子扩散长度等相关因素对阴极出射面的弥散圆斑以及到达阴极出射面的光电子数与激发光电子总数之比的影响.计算结果表明,当透射式均匀掺杂GaAs光电阴极发射层厚度为2 μm、电子扩散长度为3.6 μm、掺杂浓度为1×10¹⁹ cm^-3时,其极限线分辨率为769 mm^-1.此GaAs材料光电子的输运性能 关键词： GaAs 光电阴极 光电子输运 弥散圆斑 分辨率     

指数掺杂结构对透射式GaAs光电阴极量子效率的影响研究

通过在一维连续性方程光电子产生函数项中加入短波约束因子,修正了指数掺杂和均匀掺杂透射式GaAs光电阴极量子效率公式.利用修正的透射式阴极量子效率公式分别拟合制备的指数掺杂和均匀掺杂透射式阴极量子效率实验曲线,符合得很好.另外拟合得到的阴极性能参数表明,由于内建电场的作用,指数掺杂阴极的性能要好于均匀掺杂阴极,指数掺杂结构能够明显提高透射式阴极的量子效率. 关键词： 透射式光电阴极 指数掺杂 量子效率 内建电场     

发射层厚度对透射式GaAs光电阴极表面光电压谱的影响

通过求解一维稳态少子扩散方程,推导了含有后界面复合速率和发射层厚度的透射式GaAs光电阴极表面光电压谱理论方程.通过对发射层厚度分别为1.6 μm和2.0 μm,掺杂浓度为1×1019 cm－3的GaAs透射式阴极样品测试,理论曲线和实验曲线基本一致.通过引入表面光电压谱积分灵敏度公式,仿真探讨了表面光电压谱在一定体材料参量条件下,积分灵敏度受发射层厚度的影响|发现在体材料参量一定条件下,透射式GaAs光电阴极具有最佳厚度,同时最佳厚度受后界面复合速率的影响更大,同时GaAlAs窗口层也能很好降低发射层后界面复合速率.     

发射层厚度对透射式GaAs光电阴极表面光电压谱的影响

通过求解一维稳态少子扩散方程,推导了含有后界面复合速率和发射层厚度的透射式GaAs光电阴极表面光电压谱理论方程.通过对发射层厚度分别为1.6 μm和2.0 μm,掺杂浓度为1×1019 cm-3的GaAs透射式阴极样品测试,理论曲线和实验曲线基本一致,通过引入表面光电压谱积分灵敏度公式,仿真探讨了表面光电压谱在一定体材...     

透射式负电子亲和势GaN光电阴极的光谱响应研究

利用金属有机化合物化学气相淀积(MOCVD)生长了发射层厚度为150 nm、掺杂浓度为1.6×10¹⁷ cm^-3的透射式GaN光电阴极,并在超高真空激活系统中对其进行了激活.通过多信息量测试系统进行了测试,发现透射式负电子亲和势(NEA)GaN光电阴极的量子效率曲线成一个"门"的形状,在255—355 nm波段有较大且平坦的响应,在290 nm处取得最大值为13%,由于AlN缓冲层对短波段光的吸收系数较大,在小于255 nm的波段量子效率出现了下降,当波长大于3 关键词： 透射式 NEA GaN光电阴极 量子效率     

激活台内透射式GaAs光电阴极的光谱响应特性研究

利用在线光谱响应技术,对透射式GaAs光电阴极在高温激活和低温激活后的光谱响应特性进行了测试,计算并比较了高温激活和低温激活后阴极的积分灵敏度和光谱响应特性参数.结果发现,与高温激活相比,低温激活后GaAs光电阴极的积分灵敏度提高了13％,低温激活后阴极的截止波长和峰值波长均向长波有微小偏移.将已获得的测试曲线与铟封后的三代像增强器的光谱响应曲线进行了比较,结果发现铟封前后的光谱响应曲线存在明显差异.     

透射式GaAs光电阴极材料的MOCVD生长

用常压MOCVD装置,制备了透射式GaAs光电阴极材料。发射层P-型GaAs掺杂浓度到10¹⁸-10¹⁹cm^-3,少子扩散长度到4.02μm。AlGaAs层的Al组分含量到0.83,其吸收光谱长波限与设计值基本符合。利用此材料进行了阴极激活实验,制成了透射式GaAs光阴极。     

高性能透射式GaAs光电阴极量子效率拟合与结构研究

为了探索高性能透射式GaAs光电阴极的特征结构,对光电阴极量子效率公式进行了光谱反射率与短波截止限的修正,并利用修正后的公式对ITT透射式GaAs光电阴极量子效率(≈43%)曲线进行了拟合,得到拟合相对误差小于5%时的结构参数为:窗口层Ga_1-xAl_xAs的厚度介于0.3-0.5 μm,Al组分x值为0.7,发射层GaAs的厚度介于1.1-1.4 μm.另外,根据拟合结果讨论了均匀掺杂透射式GaAs光电阴极的优化结构参数,如果光电阴极具有0.4 μm厚的Ga_1-xAl_xAs(x=0.7)窗口层和1.1-1.5 μm厚的GaAs发射层,则积分灵敏度可以达到2350 μA/lm以上. 关键词： 透射式GaAs光电阴极 量子效率 积分灵敏度 光学性能     

一种提高透射式GaAs光电阴极响应速度的方案

本文提出了一种可提高透射式GaAs光电阴极响应速度的阴极结构方案,并对这种结构的透射式GaAs光电阴极在电场作用下的响应时间进行了理论计算。计算结果表明,这种结构可便透射式GaAs光电阴极的响应时间由1ns左右减少到几个或几十个ps。     

Distribution of carriers in gradient-doping transmission-mode GaAs photocathodes grown by molecular beam epitaxy

The gradient-doping structure is first applied to prepare the transmission-mode GaAs photocathode and the integral sensitivity of the sealed image tube achieves 1420~μ A/lm. This paper studies the inner carrier concentration distribution of the gradient-doping transmission-mode GaAs photocathode after molecular beam epitaxy (MBE) growth using the electrochemical capacitance-voltage profiling. The results show that an ideal gradient-doping structure can be obtained by using MBE growth. The total band-bending energy in the gradient-doping GaAs active-layer with doping concentration ranging from 1× 10^19~cm^-3 to 1×10^18~cm^-3 is calculated to be 46.3 meV, which helps to improve the photoexcited electrons movement toward surface for the thin epilayer. In addition, by analysis of the band offsets, it is found that the worse carrier concentration discrepancy between GaAs and GaAlAs causes a lower back interface electron potential barrier which decreases the amount of high-energy photoelectrons and affects the short-wave response.     

透射式GaAs光阴极的静电键合粘结

提出了用于GaAs光阴极粘结的静电键合方法.相比于传统的热粘结方法,该方法温度低（350℃）,时间短（5 min）,在空气中进行.所制得的GaAs光阴极在激活台内的峰值灵敏度为68.8 mA/W（峰值波长为830 nm）.以此制作的三代微光管的积分灵敏度为1 311 μA/lm,优于传统的热粘结工艺制作的微光管的灵敏度(～1 200 μA/lm).     

Comparative research for transmission-mode GaAs photocathodes of different doping structures on surface photovoltage

In order to well study the internal body performance for transmission-mode GaAs photocathode of different varied doping structures, two GaAs photocathodes of exponential doping structure and gradient doping structure were designed respectively. Because surface photovoltage spectrum has close relation with the internal properties of GaAs photocathodes, the connection between surface photovoltage and internal electronic field was well discussed through deduction and calculation. The difference of two structures and the value of internal electronic energy were exactly calculated and verified by experiments. The internal band bending energy could form an internal electronic field with the same direction, which could help the photo-excited electrons to move toward surface barrier layer. This research shows a better method to well study the varied doping structures for GaAs photocathode materials and will help to improve the growth structure for transmission-mode GaAs photocathode module in the future.     

变组分AlGaAs/GaAs透射式光电阴极分辨力特性分析

建立了变组分AlGaAs/GaAs光电阴极二维载流子输运连续性方程.在一定的边界条件下,利用数值计算方法对此方程进行求解,得到了变组分AlGaAs/GaAs光电阴极调制传递函数(MTF)理论计算模型.利用该模型计算了透射式变组分和均匀组分阴极的理论MTF,分析了分辨力与Al组分变化范围、入射光子波长、AlGaAs和GaAs层厚度的关系.计算结果表明,变组分阴极与均匀组分阴极相比,阴极分辨力显著提高.当空间频率f在100—500 lp·mm-1区间时,分辨力的提高最为明显,如当f=200 lp·mm-1时,一般可提高150%—260%.变组分阴极分辨力的提高是内建电场作用的结果,但内建电场太大时,也会由于Al组分含量过高而影响阴极的长波响应.     

Quantum efficiency conversion from the reflection-mode GaAs photocathode to the transmission-mode one

In the article, the transmission-mode negative electron affinity GaAs photocathode is compared with the reflection-mode one in structure, working principle and the quantum efficiency equation. The key point to establish relation between the two modes is that the active-layer is in full accord and the biggest difference is that the incident direction of photons is inverse. Based on the relation and difference above, we obtain the electron escape probability P and the spectrum absorption coefficient α of the reflection-mode GaAs photocathode by multilayer film matrix theory. The quantum efficiency of the transmission-mode GaAs photocathode can be estimated through the coefficients P and α of the reflection-mode one. Two groups of samples are analyzed, the one group contains uniform doping reflection-mode and transmission-mode GaAs photocathodes and the other contains exponential doping ones. Through the analysis and curve fitting, we find that the conversion difference of the uniform-doping is about 11.22% while that of the exponential-doping is about 5.46%. Another four groups of samples with exponential-doping active layer are experimentalized and the differences of them are all less than 6%. The results prove the suggested method is feasible and effective and it is more suitable for the conversion of GaAs photocathode with exponential-doping active layer.     

铟封前后透射式GaAs光电阴极光谱响应特性的测试与分析

利用自行研制的光谱响应测试仪工程化样机,对透射式GaAs光电阴极在高温激活结束、低温激活结束以及铟封成管后的光谱响应特性进行了测试。结果显示,铟封后阴极整个响应波段的光谱响应下降,长波响应受到最显著的影响,表现为800~815 nm之间长波响应大幅度衰减,截止波长和峰值波长向短波移动,峰值响应和积分灵敏度减小,最终的光谱响应曲线变得平坦。阴极参量的计算结果反映铟封后阴极的表面逸出几率降低,说明铟封引起阴极表面激活层发生变化,使得能量较低的长波段光生电子不容易逸出,阴极长波响应和灵敏度随之降低。进一步分析了铟封过程中影响阴极表面激活层的因素。