MoS2/SiO2界面黏附性能的尺寸和温度效应

探索二维材料与其衬底之间的黏附性能对于二维材料的制备、转移以及器件性能的优化至关重要.本文基于原子键弛豫理论和连续介质力学方法,系统研究了尺寸和温度对MoS₂/SiO₂界面黏附性能的影响.结果表明,由于表面效应引起的热膨胀系数、晶格应变和杨氏模量的变化, MoS₂/SiO₂界面黏附能随MoS₂厚度的减小而增大,而热应变使MoS₂/SiO₂界面黏附能随温度的升高而逐渐降低.此外,预测了在不同尺寸和温度下MoS₂在SiO₂衬底上的“脱落”条件,系统阐述了MoS₂与SiO₂衬底之间黏附性能的物理机制,为基于二维材料电子器件的优化设计提供了理论基础.     

基于椭圆偏振光谱法的玻璃表面离子束改性分析

采用阳极层线性离子源解离氮气对玻璃表面进行刻蚀处理,研究表面改性后玻璃表面的变化,并分析离化电压对表面粗糙度、折射率以及光学厚度的影响。在此基础上,基于椭圆偏振光谱仪,通过对比不同表面状态下的Δ光谱,讨论固定波长变化入射角的Δ光谱曲线特征与表面折射率、布儒斯特角、粗糙度以及光学厚度之间的关系。结果表明,刻蚀后玻璃的布儒斯特角附近的Δ光谱曲线形状发生变化,突变向高角度偏移,曲线下降斜率增大。通过建模并拟合分析发现,氮离子束轰击使玻璃表面产生光密介质层,表面折射率增大,布儒斯特角增大,粗糙度降低,且随离化电压升高,折射率不变,而光密介质层厚度增加。由原子力显微镜分析表面形貌,验证了离子束对玻璃表面的平整化作用。X射线光电子能谱结果表明离子束使玻璃表面发生选择性溅射,推断光密介质层的产生来自于离子束对玻璃表面的夯实作用。此外,推导并验证了Δ光谱曲线的特征与材料表面状态之间的普适关系,提出了基于椭圆偏振光谱仪的材料表面评估方法,即Δ曲线的突变发生角度增大说明折射率与布儒斯特角的增大;下降斜率增大说明表面粗糙度减小;曲线两端尖角增大说明光学厚度增大。反之亦然。     

由于表面粗糙引起的激光声表面波色散的实验和理论研究

表面粗糙是材料制造过程中必有的副产物, 粗糙表面会引起其中传播的声表面波的速度发生变化. 在利用激光声表面波对材料性质进行评估时, 常用宽带的激光声表面波速度频散特性对材料性质进行反演. 为了研究表面粗糙度是否能作为反演的特征参数之一, 本文建立了激光在表面粗糙样品中激发声表面波、聚偏氟乙烯换能器宽带接收声表面波的实验装置来研究不同粗糙度表面对声表面波速度的影响; 理论上建立了激光在粗糙表面中激发声表面波的计算模型, 利用有限元法得到声表面波的时域特征, 并进一步得到声表面波的速度色散曲线, 理论结果和实验结果能很好地拟合. 这为利用激光声表面波对表面粗糙的评估提供理论和实验依据. 关键词： 表面粗糙 激光声表面波 速度色散 聚偏氟乙烯传感器 有限元法     

干法刻蚀影响应变量子阱发光的机理研究

采用感应耦合等离子体刻蚀技术对InAsP/InP应变多量子阱和InAsP/InGaAsP应变单量子阱材料的覆盖层进行了不同厚度的干法刻蚀. 实验结果表明，干法刻蚀后量子阱光致荧光强度得到了不同程度的增强. 干法刻蚀过程不仅增加了材料表面粗糙度，同时使其内部微结构发生变化. 采用湿法腐蚀方法去除表面变粗糙对量子阱发光特性的影响，得到干法刻蚀覆盖层20 nm后应变单量子阱微结构变化和其表面粗糙度变化两个因素分别使荧光强度提高1.8倍和1.2倍的结果. 关键词： 干法刻蚀 应变多量子阱 光致发光谱 损伤     

NiFeNb种子层对坡莫合金磁滞回线的影响

以NiFeNb为种子层，制备(Ni₇₉Fe₂₁)_1-xNb_{x(5nm)/(Ni79Fe21) (20nm)/Ta(3nm)系列膜，并对其颗粒大小、 磁滞回线及表面粗糙度等进行测量，探讨种子层中Nb含量x对坡莫合金磁滞回线的影响.结果 表明，以NiFeNb作种子层能更好地改善坡莫合金的微结构. Nb含量为23％时的磁滞回线有最 小的最大磁能积、矫顽力.种子层影响坡莫合金磁滞回线的一个重要原因是脱附激活能等因 素造成种子层具有不同的表面粗糙度，进而使坡莫合金具有不同的微结构和磁性能. 关键词： NiFeNb种子层 坡莫合金 磁滞回线 粗糙度}     

第一性原理研究BaTiO3(001)表面的电子结构

在密度泛函理论的基础上,采用平面波赝势方法计算了立方相BaTiO₃(001)表面的电子结构.结构优化表明最表层原子都向体内弛豫,且金属原子弛豫幅度最大,同时各层层间距变化呈交错分布.对两种表面结构的总能计算发现TiO₂表面稳定性比BaO表面弱,一方面是由于TiO₂表面结构中存在O-2p表面态,使价带和导带中电子态向高能区域偏移.另一方面,TO₂表面附近Ti—O共价键存在强弱差异,有利于发生表面吸附.而在BaO表面结构中,最表层BaO的存在消除了这种差异,因而其表面稳定性较强. 关键词： 第一性原理 钛酸钡 电子结构 表面能     

基于杂散光抑制要求的光学表面粗糙度控制方法研究

光学表面加工误差引起的散射是影响光学系统成像性能的重要因素.描述表面总散射能量的均方根粗糙度是评定光学表面粗糙度的通用指标,但因其未能体现散射能量的空间分布,在表征光学表面散射对具体光学系统杂散光性能影响时存在准确度不足的局限.本文基于全积分散射及双向散射分布函数理论,针对杂散光抑制要求提出一种光学表面粗糙度控制的新方法.首先通过分析确定光学表面纹理中影响系统杂散光的空间频率范围,然后度量该频率带限范围内的表面均方根粗糙度,作为控制光学表面粗糙度的指标.以太阳磁场望远镜(MFT)为例进行方法验证,确定主镜表面纹理有效频率范围为0—18 mm~(-1),分析了主镜表面带限均方根粗糙度对MFT杂散光性能的影响.结果表明,带限均方根粗糙度与MFT杂散光性能之间的关系稳定性能大幅提高,由此验证了采用带限均方根粗糙度描述光学表面粗糙度,能更为准确地控制其对具体光学系统杂散光性能的影响.     

缓冲层对InSb/GaAs薄膜质量的影响

InSb是制作3~5μm红外探测器的重要材料。在GaAs衬底上外延生长InSb,存在的主要问题在于两种材料间14.6%的晶格失配度,会引入较大的表面粗糙度以及位错密度,使外延材料的结构和电学性能均会受到不同程度的影响。通过系列实验,研究了在生长过程中缓冲层对薄膜质量的影响。利用高能电子衍射仪(RHHEED)得到了合适的生长速率和Ⅴ/Ⅲ比,研究了异质外延InSb薄膜生长中低温InSb缓冲层对材料生长质量以及不同外延厚度对材料电学性质的影响。采用原子力显微镜(AFM)、透射电子显微镜(TEM)、X射线双晶衍射(DCXRD)等方法研究了InSb/GaAs薄膜的表面形貌、界面特性以及结晶质量。通过生长合适厚度的缓冲层,获得了室温下DCXRD半高峰宽为172″,77 K下迁移率为64300 cm²·V^-1·s^-1的InSb外延层。     

分子动力学模拟H原子与Si的表面相互作用

通过分子动力学模拟了入射能量对H原子与晶Si表面相互作用的影响. 通过模拟数据与实验数据的比较, 得到H原子吸附率随入射量的增加 呈先增加后趋于平衡的趋势. 沉积的H原子在Si表面形成一层氢化非晶硅薄膜, 刻蚀产物(H₂, SiH₂, SiH₃和SiH₄)对H原子吸附率趋于平衡有重要影响, 并且也决定了样品的表面粗糙度. 当入射能量为1 eV时, 样品表面粗糙度最小. 随着入射能量的增加, 氢化非晶硅薄膜中各成分(SiH, SiH₂, SiH₃)的量以及分布均有所变化. 关键词： 分子动力学 吸附率 表面粗糙度 氢化非晶硅薄膜     

二氧化钛薄膜表面粗糙度研究

为了探究二氧化钛(TiO₂)薄膜表面粗糙度的影响因素, 利用离子束辅助沉积电子束热蒸发技术对不同基底粗糙度以及相同基底粗糙度的K9玻璃完成二氧化钛(TiO₂)光学薄膜的沉积。采用TalySurf CCI非接触式表面轮廓仪分别对镀制前基底表面粗糙度和镀制后薄膜表面粗糙度进行测量。实验表明, TiO₂薄膜表面粗糙度随着基底表面的增大而增大, 但始终小于基底表面粗糙度, 说明TiO₂薄膜具有平滑基地表面粗糙的作用; 随着沉积速率的增大, 薄膜表面粗糙度先降低后趋于平缓; 对于粗糙度为2 nm的基底, 离子束能量大小的改变影响不大, 薄膜表面粗糙度均在1.5 nm左右; 随着膜层厚度的增大, 薄膜表面粗糙度先下降后升高。     

The effect of bombardment with neutralized neon ions on the roughness of a fused silica and beryllium surface

The effect of Ne ion beam etching on the roughness of materials for optical substrates—fused silica and beryllium—is studied. It is shown that the treatment of a fused silica surface by neutralized Ne ions with an energy of 400–800 eV makes it possible to smooth roughnessed in the range of higher spatial frequencies of 3–63 μm^–1 at an incidence angle of 0°–30°. For beryllium, the possibility of smoothing the surface roughness at an ion energy of 400 eV is found.     

基于Wenzel模型的粗糙界面异质形核分析

异质形核是形核发生的主要形式. 经典形核理论对基底界面作了理想化平面假设,然而实际异质形核体系中理想平直的固体界面是不存在的,这导致了异质形核描述与实际情况的偏差. 考察了固相晶胚在非平整界面上的异质形核过程,基于Wenzel润湿模型,分析了非理想界面的粗糙度因子对固相晶胚形核功的影响规律. 结果表明:当基底与晶核之间的本征润湿角小于90°时,基底界面越粗糙越有利于形核;本征润湿角大于90°时,基底界面越粗糙越不利于形核. 同时,游离晶胚在基底上润湿是球冠晶胚形成的重要途径,粗糙界面润湿过程中界面自由能的 关键词： 异质形核 粗糙界面 Wenzel模型 润湿过程     

车削零件表面粗糙度图像法检测优选方法

为实现对车削零件表面粗糙度检测,提出一种基于机器视觉表面粗糙度检测图像处理的新方法。该方法先按相应算法对所采集图像剔出受光衍射影响严重区域,然后再按其灰度分布情况进行区域优化,获得的图像灰度特征参数能反映表面粗糙度量值的有效特征区域。用该方法对表面粗糙度Ra标称值为0.8 μm~12.5 μm的五种车削样件测试,处理后图像灰度的均值、方差、能量和熵等特征参数与Ra标称值单调关系显著,各特征曲线的非线性误差均在1.5%以内。对比实验显示,这种特征提取和区域优化方法可应用于表面粗糙度的区分与检测。     

The conversion of wettability in transparent conducting Al-doped ZnO thin film

We report on the systematic changes of surface wettability in one of the most promising transparent conducting oxide materials, Al-doped ZnO (AZO) thin films. It was revealed that the characteristic surface wettability, which would make a key role in adhesion with other layers of optoelectronic device, can be largely changed by Al concentrations and film growth temperature. Keeping the electrical conductivity constant, the water contact angle (WCA) of a 2 mol% AZO film was changed by about 50 ^°C depending on the surface roughness. In the samples grown at 300 ^°C, the roughness enhancement was large and a hydrophobic surface formed, whereas in the samples grown at 500 ^°C a hydrophilic surface formed. We attributed the variation in surface wettability with growth temperature to changes in surface morphology. This result suggests that 2 mol% Al doping concentration can be considered as a critical concentration in changing of surface morphology of AZO as well as in electrical properties.     

Characterization of the surface contamination of deep X‐ray lithography mirrors exposed to synchrotron radiation

In deep X‐ray lithography (DXRL), synchrotron radiation is applied to pattern polymer microstructures. At the Synchrotron Laboratory for Micro and Nano Devices (SyLMAND), Canadian Light Source, a chromium‐coated grazing‐incidence X‐ray double‐mirror system is applied as a tunable low‐pass filter. In a systematic study, the surface conditions of the two mirrors are analyzed to determine the mirror reflectivity for DXRL process optimization, without the need for spectral analysis or surface probing: PMMA resist foils were homogeneously exposed and developed to determine development rates for mirror angles between 6 mrad and 12 mrad as well as for white light in the absence of the mirrors. Development rates cover almost five orders of magnitude for nominal exposure dose (deposited energy per volume) values of 1 kJ cm^?3 to 6 kJ cm^?3. The rates vary from case to case, indicating that the actual mirror reflectivity deviates from that of clean chromium assumed for the experiments. Fitting the mirror‐based development rates to the white‐light case as a reference, reflectivity correction factors are identified, and verified by experimental and numerical results of beam calorimetry. The correction factors are related to possible combinations of a varied chromium density, chromium oxidation and a carbon contamination layer. The best fit for all angles is obtained assuming 7.19 g cm^?3 nominal chromium density, 0.5 nm roughness for all involved layers, and an oxide layer thickness of 25 nm with a carbon top coat of 50 nm to 100 nm. A simulation tool for DXRL exposure parameters was developed to verify that the development rates for all cases do coincide within a small error margin (achieving a reduction of the observed errors by more than two orders of magnitude) if the identified mirror surface conditions are considered when calculating the exposure dose.     

Laser cutting of polymeric materials: An experimental investigation

The CO₂ laser cutting of three polymeric materials namely polypropylene (PP), polycarbonate (PC) and polymethyl methacrylate (PMMA) is investigated with the aim of evaluating the effect of the main input laser cutting parameters (laser power, cutting speed and compressed air pressure) on laser cutting quality of the different polymers and developing model equations relating input process parameters with the output. The output quality characteristics examined were heat affected zone (HAZ), surface roughness and dimensional accuracy. Twelve sets of tests were carried out for each of the polymer based on the central composite design. Predictive models have been developed by response surface methodology (RSM). First-order response models for HAZ and surface roughness were presented and their adequacy was tested by analysis of variance (ANOVA). It was found that the response is well modeled by a linear function of the input parameters. Response surface contours of HAZ and surface roughness were generated. Mathematical model equations have been presented that estimate HAZ and surface roughness for various input laser cutting parameters. Dimensional accuracies of laser cutting on polymers were examined by dimensional deviation of the actual value from the nominal value. From the analysis, it has been observed that PMMA has less HAZ, followed by PC and PP. For surface roughness, PMMA has better cut edge surface quality than PP and PC. The response models developed can be used for practical purposes by the manufacturing industry. However, all three polymeric materials showed similar diameter errors tendency in spite of different material properties.     

The effect of surface roughness on thermal-elasto-hydrodynamic model of contact mechanical seals

In this paper,the effect of surface roughness on sealing clearance,pressure distribution,friction torque and leakage is studied by the thermal-elasto-hydrodynamic mixed lubrication model.A convergent nominal clearance is formed by the pressure deformation and thermal deformation of the seal faces.This causes more serious wear in the inner side than that of the outer side of the contact area.Mass leakage increases with the growing of the surface roughness.The temperature and thermal deformation on the seal surface increases substantially if the roughness is reduced.The contact mechanical seals have consistent performance when the standard deviation of surface roughness is approximately 0.2μm.In order to validate the theoretical analysis model,a method combining the measurement of three-dimensioned profile and Raman spectrum is proposed.     

二氧化锆薄膜表面粗糙度的研究

采用电子束蒸发工艺,利用泰勒霍普森相关相干表面轮廓粗糙度仪,研究了不同基底粗糙度、不同二氧化锆薄膜厚度以及不同的离子束辅助能量下所沉积的二氧化锆薄膜的表面粗糙度。结果表明：随着基底表面粗糙度的增加,二氧化锆薄膜表面粗糙度呈现出先缓慢增加,当基底的粗糙度大于10nm后呈现快速增加的趋势;随着二氧化锆薄膜厚度的增加,其表面均方根粗糙度（RMS）先减小后增大;随着辅助沉积离子能量的增加,其表面粗糙度呈现出先减小后增加的趋势。     

Surface modification of polystyrene with atomic oxygen radical anions-dissolved solution

A novel approach to surface modification of polystyrene (PS) polymer with atomic oxygen radical anions-dissolved solution (named as O⁻ water) has been investigated. The O⁻ water, generated by bubbling of the O⁻ (atomic oxygen radical anion) flux into the deionized water, was characterized by UV-absorption spectroscopy and electron paramagnetic resonance (EPR) spectroscopy. The O⁻ water treatments caused an obvious increase of the surface hydrophilicity, surface energy, surface roughness and also caused an alteration of the surface chemical composition for PS surfaces, which were indicated by the variety of contact angle and material characterization by atomic force microscope (AFM) imaging, field emission scanning electron microscopy (FESEM), X-ray photoelectron spectroscopy (XPS), and attenuated total-reflection Fourier transform infrared (ATR-FTIR) measurements. Particularly, it was found that some hydrophilic groups such as hydroxyl (OH) and carbonyl (CO) groups were introduced onto the polystyrene surfaces via the O⁻ water treatment, leading to the increases of surface hydrophilicity and surface energy. The active oxygen species would react with the aromatic ring molecules on the PS surfaces and decompose the aromatic compounds to produce hydrophilic hydroxyl and carbonyl compounds. In addition, the O⁻ water is also considered as a “clean solution” without adding any toxic chemicals and it is easy to be handled at room temperature. Present method may suit to the surface modification of polymers and other heat-sensitive materials potentially.     

Monitoring acoustic emission (AE) energy of abrasive particle impacts in a slurry flow loop using a statistical distribution model

Slurry erosion has been recognized as a serious problem in many industrial applications. In slurry flows, the estimation of the amount of incident kinetic energy that transmits from particles suspended in the fluid to the containment structures is a key aspect in evaluating its abrasive potential. This work represents a systematic investigation of particle impact energy measurement using acoustic emission (AE), as indicated by a sensor mounted on the outer surface of a sharp bend, in an arrangement that had been pre-calibrated using controlled single and multiple impacts. Particle size, free stream velocity, and nominal particle concentration were varied, and the amount of energy dissipated in the carbon steel bend was assessed using a slurry impingement flow loop test rig. Silica sand particles of mean particle size 225–650 μm were used for impingement on the bend with particle nominal concentrations between 1 and 5% while the free stream velocity was changed between 4.2 and 14 ms⁻¹.