超分辨率活体人眼视网膜共焦扫描成像系统

活体人眼共焦扫描成像系统的分辨率受到人眼像差、数值孔径和探测针孔尺度的限制,本文设计了一套超分辨活体人眼视网膜共焦扫描系统,采用自适应光学技术探测并校正人眼像差,结合光学超分辨技术提高系统分辨率,补偿有限尺度针孔对分辨率的影响,并获得活体人眼的实时、高分辨图像. 关键词： 超分辨 共焦扫描光学显微术 眼科光学 自适应光学     

激光干涉光刻法制作100 nm掩模

 介绍了一种利用激光干涉光刻技术得到特征图形,并通过离子束刻蚀将图形转移到铬层上,从而获得掩模的方法。针对掩模透光率以及对干涉图形对比度可能产生影响的两个参数分别进行了数值仿真,从而证明此方法的可行性和参数的优化选择。自搭干涉光刻实验系统,用257 nm的激光光源实现光刻,得到特征尺寸为100 nm的图形,再经过离子束刻蚀,最终得到周期200 nm、线宽100 nm的掩模。     

微球辅助相移干涉三维形貌测量

相移干涉显微镜在微观物体三维形貌的重构横向分辨率上受衍射极限影响,一般在微米级,限制其应用。将高折射率微球嵌入Mirau型相移干涉显微系统中,利用微球超分辨机理提高了其三维重构横向分辨能力,通过和原子力显微镜的测量对比验证了方法的可行性。仿真分析了微球尺寸对光子纳米喷流效应和超分辨能力的影响;同时使用两种不同尺寸的微球对275nm线宽的标准光栅样品进行了三维形貌重构;结果表明,在两种微球的辅助下,相移干涉显微系统均能够精确还原样品的三维结构,光栅深度测量结果与原子力显微镜结果相当。在微球辅助下,系统的横向分辨能力达到了275nm,相较于不使用微球的情况下提高了2.1倍,微球的最高放大率达到了3.4倍。系统在微纳米测量等领域具有较高的应用价值。     

改善共焦系统轴向分辨率的位相型光瞳滤波器

利用约束全局优化算法———CGO算法,设计了两种用于共焦系统的三区位相型光瞳滤波器.第一种滤波器在不改变系统的横向分辨率的同时,可以大幅度地提高轴向分辨率,提高了系统的层析能力.第二种滤波器在提高系统轴向分辨率的同时,又能提高其横向分辨率,适用于系统的三维成像. 关键词： CGO算法 光瞳滤波器 超分辨     

超分辨在共焦三维形貌检测术中的应用

通过对共焦三维形貌检测术的分析,根据超分辨理论,在共焦系统中加入环形光瞳滤波器,以期延长系统的动态检测范围,并提高系统的横向分辨率。理论和实验结果表明该方法在适当牺牲轴向分辨率的条件下,能有效地延长系统的动态检测范围,且提高其横向分辨率。     

用于MiniLED背光模组的亮度增强薄膜设计与制备

传统的两层棱镜膜对于MiniLED背光的增亮效果不明显,因此设计了一种微结构薄膜来代替两层棱镜膜。首先,根据MiniLED背光的配光曲线及尺寸,对微结构进行分段设计。将与MiniLED芯片等宽区域设定为顶角90°的棱柱结构,对2个MiniLED芯片之间的区域,将MiniLED芯片作为扩展光源,芯片2个端点发出的光束到达微结构底面会形成一个夹角,将夹角的角平分线处光线准直到轴向方向,结合Snell定律进行计算,得到棱柱微结构倾角。然后,通过LightTools仿真软件对单个微结构及微结构阵列分别进行了建模和仿真,仿真结果表明:加微结构薄膜后的轴向视角亮度相比于加两层棱镜膜提升了31.3%。最后,通过无掩模光刻设备对设计的微结构薄膜进行加工制备,并对样片进行测试。实测结果表明:加微结构薄膜后的轴向视角亮度相较于加两层棱镜膜提升了25.7%。实现了针对MiniLED背光模组的亮度增强设计。     

具有抗漂移特性的激光共焦拉曼光谱成像技术与系统

共焦拉曼技术结合了共焦显微技术和拉曼光谱技术,具有高分辨率、高灵敏度、可层析成像的优势,广泛应用于物理、材料科学、生物医学、文物鉴定以及刑侦等领域。由于拉曼光谱成像需要较长时间,测量中系统易受环境等因素影响产生漂移,造成离焦,而现有商用共焦拉曼光谱仪并无定焦能力,容易影响测量结果。针对此问题,研制了一种具有抗漂移能力的激光共焦拉曼光谱探测系统。在不改变共焦拉曼探测基本原理的基础上,利用拉曼轴向响应曲线最大值对应显微物镜焦面这一特性,对每个探测点进行轴向扫描,采集一定数量的轴向信号,通过曲线拟合寻找光谱强度极值位置,保证扫描过程中样品始终处于系统的焦点位置处,抑制离焦影响,改善拉曼光谱成像效果。以单层石墨烯样品进行单点测试,证明仪器在5 μm离焦范围内可以实现实时定焦,定焦后采集到的拉曼光谱强度几乎不变,具有良好的抗漂移能力;对硅台阶样品进行成像测试,结果表明成像过程中,信号强度未发生明显变化,且横向分辨率有一定改善,效果明显优于普通共焦拉曼光谱探测系统。     

图像复原式整形环形光横向超分辨共焦显微测量新方法

提出一种新的图像复原式整形环形光横向超分辨共焦显微测量法. 该方法首先利用二元光学器件，将高斯照明光束整形为环形光束，用于初步改善共焦显微镜的横向分辨力，然后利用基于最大似然估计法(maximum likelihood estimate, MLE)的单幅图像超分辨复原技术，重建测量图像的高频信息，来进一步改善共焦显微镜的横向分辨力. 实验表明,当λ=632.8nm，N.A. =0.85时，该方法能使共焦显微镜获得优于0.1μm的横向分辨力. 利用该方法建立的横向超分辨共焦显微系统除了具有显著的超分辨效果外 关键词： 超分辨 超分辨复原 最大似然估计 共焦成像     

基于波像差判据的同步相移显微干涉检焦方法

为了实时准确地将激光直写系统中经直写物镜聚焦的光斑定位于待加工元件表面,提出了一种基于波像差判据的同步相移显微干涉检焦方法,实现了对离焦量的实时检测与调整。在直写系统中引入检焦光路,与直写光路共享同一物镜,构建Linnik型同步相移显微干涉检焦系统,提取包含离焦量的波面相位信息;再从大数值孔径（NA）的物镜波像差数据中解析出离焦量的大小与方向。仿真结果验证了基于波像差判据的离焦计算方法的正确性,NA≥0.5时,离焦探测灵敏度可达4 nm, 通过实验验证了同步相移显微干涉检焦方法的可行性,检焦精度可达10 nm以内,满足激光直写高精度的测量要求。     

极紫外光刻含缺陷掩模仿真模型及缺陷的补偿

建立了一个基于单平面近似的极紫外(EUV)光刻三维含缺陷掩模的快速仿真模型。该仿真模型中,采用相位突变和振幅衰减表示缺陷对多层膜的反射系数的影响,吸收层模型采用薄掩模修正模型。以22 nm三维接触孔图形为例,周期为60 nm时,该仿真模型与波导法严格仿真相比,仿真速度提高10倍以上,而关键尺寸(CD)仿真误差小于0.6 nm。基于该仿真模型,对掩模缺陷进行了补偿计算,得到了与严格仿真一致的最佳图形修正量。针对不同的缺陷形态尺寸,提出了缺陷的可补偿性的概念,并进一步讨论了二维图形的缺陷的可补偿性。     

Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode

We report on recent developments of an “at wavelength” full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nm wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first results obtained from a six inches mask blank prototype as prerequisite for industrial usage.     

Microstructure measurement based on frequency-shift feedback in a-cut Nd:YVO_4 laser

A new optical method based on frequency-shift feedback and laser confocal microscopy is presented to noninvasively measure a microstructure inside a sample. Due to the limit of axial resolution caused by poor signal detection ability, conventional laser feedback cannot precisely measure the microstructure. In this Letter, the light scattered by the sample is frequency shifted before feedback to the laser to obtain a magnification. Weak signals that change with the microstructure can be detected. Together with the tomography ability of laser confocal microscopy, the inner microstructure can be measured with high axial resolution.     

A lateral super-resolution differential confocal technology with phase-only pupil filter

In order to achieve a higher lateral resolution required for ultraprecision measurement of microstructural workpieces, phase-only pupil filtering differential confocal microscopy (PFDCM), a new approach is proposed based on the differential confocal microscopy (DCM), which uses a three-zone phase-only pupil filter with lateral super-resolution capability obtained through optimized design to change the distribution of DCM three-dimensional point spread function, so that the DCM lateral resolution is therefore significantly improved while its axial resolution is slightly improved. Preliminary experimental comparison and analyses indicate that, the lateral and axial resolutions of PFDCM are better than 0.2 μm and 2 nm, respectively, when wavelength of incidence laser beam , numerical aperture of measuring lens NA=0.85, and lateral spot size with a three-zone phase-only pupil filter G_T=0.65. It is therefore concluded that PFDCM is a new approach to further improvement of lateral resolution in laser probe measurement systems.     

微型差动式共焦自聚焦光聚焦探测系统

为解决微小内轮廓尺寸为代表的微小尺寸的非接触式超精密测量问题，提出了将自聚焦透镜体积小的特点与共焦显微技术的高分辨率和绝对位置跟踪特性相结合的差动式自聚焦共焦微型显微技术的光探测技术，建立了相应的传感系统，介绍了系统的工作原理和构成，自聚焦透镜测头直径为1mm，两个探测器差动设置，不但消除了光源的光强漂移和探测器的电子漂移产生的共模噪声，提高了测量信噪比，而且有效地提高了系统的轴向分辨率，初步实验表明，系统轴向分辨率在倾斜率小于20度的范围内可达5nm。     

Reflective mask for projection lithography operating at a wavelength of 13.5 nm

This work is devoted to the technology of mask manufacturing and investigation of the characteristics of the reflective mask employed in the extreme ultraviolet lithography test bench designed at the Institute for Physics of Microstructures, Russian Academy of Sciences. The mask??s structure and composition have been optimized. The antireflecting (absorbing) coating and stop-layer materials that are used to etch the mask structure and the multilayer interference system, which reflects radiation at the operating wavelength, have been selected. The mask manufacturing technology is described. The measured reflective and geometrical characteristics of a mask (absorbing layer thicknesses, line widths, and line-edge roughnesses) are presented. A new direct method for certifying mask defects of 30 nm or more is proposed.     

Differential confocal technology based on radial birefringent pupil filtering principle

In order to improve the spatial resolution of a confocal system, a radial birefringent pupil filter (RBPF) is introduced into a differential confocal system. RBPF consists of two polarizers with a birefringent element between them, and its pupil function is deduced from Jones matrix. The thickness and curvature radius of RBPF are optimized independently, using the first zero coordinate ratio. The pupil function is modulated by RBPF to enhance the half-width of the response function, and lateral resolution is improved when response curve is changed with the position of RBPF as well as the polarization; then axial super-resolution of the system can be guaranteed using differential confocal detection mechanism. In comparison with conventional pupil filtering technology, RBPF features high lateral resolution and can be easily produced; moreover, it also has a simple structure. Together with its low cost, RBPF provides a new way for the improvement of super-resolution of confocal system. It is indicated from theoretical analysis and preliminary experiments that the lateral resolution can be significantly improved and the measurement error is reduced by 76 nm when measuring a standard grating of period 3 μm; the axial resolution up to 3 nm has been achieved using the optimized pupil filter. In addition to its application for measurement of a small irregular surface in a limited space, the whole differential confocal system proposed can be fitted onto a coordinate measuring machine for non-contact measurement of dimensions and surface roughness.     

具有高空间分辨力的整形环形光式差动共焦测量法

提出一种新的具有高空间分辨力的整形环形光式差动共焦测量方法。该方法通过整形环形光式共焦测量法和锐化爱里斑主瓣，改善系统横向分辨力；通过差动共焦测量法改善系统的轴向分辨力，最终达到提高系统空间分辨能力的目的。理论分析和实验表明：整形环形光内孔归一化半径ε越大，横向分辨力改善越明显，量程扩展范围越宽；当入射光波长λ=632.8nm，物镜数值孔径取NA=0.85，ε=0.5时，该系统的横向分辨力优于0.2μm，轴向分辨力优于2nm。该方法为光触针测量系统空间分辨力的提高提供了1种新的方法，可广泛应用于超精密三维微细结构工件的超精密测量。     

At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy

A new at-wavelength inspection technology to probe nanoscale defects buried underneath Mo/Si multilayers on an extreme ultraviolet (EUV) lithography mask blank has been implemented using EUV photoemission electron microscopy (EUV-PEEM). EUV-PEEM images of programmed defect structures of various lateral and vertical sizes recorded at an ~13.5 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps, enhancing the edge visibility of the phase defects, which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.     

Wavelength division multiplexed confocal microscopy using supercontinuum

We investigate both theoretically and experimentally wavelength division multiplexed confocal imaging by using white light supercontinuum. We show that with the optimized pinhole diameter an axial resolution of 0.75 μm and detection efficiency of 80% can be achieved. In addition, we applied the axial WDM confocal system to 3D surface measurement and the result agreed well with that measured by commercially available surface profilometer. The measured sensitivity of the system is 3.25 nm. Finally, we demonstrated lateral confocal imaging by using supercontinuum. An effective lateral scanning range of 130 μm was obtained.