Identification of Acceptor States in Li-N Dual-Doped p-Type ZnO Thin Films

Li-N dual-doped p-type ZnO （ZnO：（Li, N）） thin films are prepared by pulsed laser deposition. The optical properties are studied using temperature-dependent photoluminescence. The Lizn-No complex acceptor with an energy 1evel of 138 me V is identified from the free-to-neutral-acceptor （e, A0 ） emission. The Haynes factor is about 0.087 for the Lizn-No complex acceptor, with the acceptor bound-exciton binding energy of 12meV. Another deeper acceptor state located at 248 meV, also identified from the （e, A0） emission, is attributed to zinc vacancy acceptor. The two acceptor states might both contribute to the observed p-type conductivity in ZnO：（Li,N）.     

The mechanism of Li, N dual-acceptor co-doped p-type ZnO

The formation of single defects and defect complexes are investigated in Li, N co-doped ZnO by the first-principles plane wave method with projector augmented wave (PAW) pseudo-potential technology. We find that: (i) p-type conductivity could be achieved in single Li doped ZnO under an O-rich condition, since the formation energy of Li_Zn acceptor is much lower than the interstitial Li_i; (ii) the dual-acceptor complex Li_Zn-N_O is unlikely to form, and the good p-type conductivity is mainly attributed to the Li_Zn acceptor, even in Li, N co-doped ZnO; (iii) the additional introduction of N may help compensate the single Li_i donor defects under certain growth conditions, but its role in the p-type conductivity in ZnO remains to be clarified. PACS 71.15.Mb; 73.61.Ga; 71.15.Nc; 71.20.Nr; 71.55.Gs     

Formation of shallow acceptors in ZnO doped by lithium with the addition of nitrogen

We performed first-principle total-energy calculations to investigate the mechanism for the realization of high quality p-type ZnO codoped with lithium and nitrogen. We find that the higher hole concentrations measured in the codoped ZnO is related to decreased ionization energy of acceptors and reduction of compensations. The dual acceptor N_O-Li_Zn complex proposed in experiments is unstable. While in the (Li_I-N_O)-Li_Zn complex, where acceptor Li_Zn binds to the passivated (Li_I-N_O) complex is stable and acts as a single acceptor. The activation energy of this complex is about 60 meV lower than that of Li_Zn in Li-monodoped ZnO. The formation of inactive (Li_I-N_O) complexes creates a fully occupied impurity band just above the valence band maximum of ZnO. Thus Li atoms binding to this complex is activated by the electrons from the complex state rather than from the host states, accounting for decreased activation energy. Besides, Li_I⁺ and N_O⁻ bind tightly through the Coulomb interaction. Such binding will suppress the amount of compensating donor Li_I and limit the compensation for the desired acceptor Li_Zn.     

Structural, optical and electronic properties of P doped p-type ZnO thin film

P doped ZnO films were grown on quartz by radio frequency-magnetron sputtering method using a ZnO target mixed with 1.5 at% P₂O₅ in the atmosphere of Ar and O₂ mixing gas. The as-grown P doped ZnO film showed n-type conductivity, which was converted to p-type after 800 °C annealing in Ar gas. The P doped ZnO has a resistivity of 20.5 Ω cm (p∼2.0×10¹⁷ cm⁻³) and a Hall mobility of 2.1 cm² V⁻¹ s⁻¹. XRD measurement indicated that both the as-grown and the annealed P doped ZnO films had a preferred (0 0 2) orientation. XPS study agreed with the model that the P_Zn-2V_Zn acceptor complex was responsible for the p-type conductivity as found in the annealed P-doped ZnO. Temperature-dependent photoluminescence (PL) spectrum showed that the dominant band is located at 3.312 eV, which was attributed to the free electronic radiative transition to neutral acceptor level (FA) in ZnO. The P_Zn-2V_Zn acceptor complex level was estimated to be at E_V=122 meV.     

Dependence of luminescent properties and crystal structure of Li-doped ZnO nanoparticles upon Li content

This study examines the effect of Li content on the luminescent and structural properties of Li_xZn_1?xO nanoparticles by scanning electron microscopy, x-ray diffraction, photoluminescence (PL) and Raman scattering measurements. A dependence of luminescent properties and crystal structure upon Li content was found. The intensity of the band-edge luminescence of Li_0.10Zn_0.90O nanoparticles was nearly 10 times higher than that of the ZnO nanoparticles. This is because of the combined effect of the improved crystallinity and a decrease in the probability of nonradiative recombination. However, the incorporation of excess Li into ZnO degrades the PL intensity due to the combined effect of the weakened crystallinity and the increased probability of nonradiative recombination.     

Electrical properties and emission mechanisms of Zn-doped β-Ga2O3 films

We study the electrical properties and emission mechanisms of Zn-doped β-Ga₂O₃ film grown by pulsed laser deposition through Hall effect and cathodoluminescence which consist of ultraviolet luminescence (UV), blue luminescence (BL) and green luminescence (GL) bands. The Hall effect measurements indicate that the carrier concentration increases from 7.16×10¹¹ to 6.35×10¹² cm⁻³ with increasing a nominal Zn content from 3 to 7 at%. The UV band at 272 nm is not attributed to Zn dopants and ascribed as radiative electron transition from conduction band to a self-trapped hole while the BL band is attributable to defect level related to Zn dopant. The BL band has two emission peaks at 415 and 455 nm, which are ascribed to the radiative electron transition from oxygen vacancy (V_O) to valence band and recombination of a donor–acceptor pair (DAP) between V_O donor and Zn on Ga site (Zn_Ga) acceptor, respectively. The GL band is attributed to the phonon replicas’ emission of the DAP. The acceptor level of Zn_Ga is estimated to be 0.26 eV above the valence band maximum. The transmittance and absorption spectra prove that the Zn-doped β-Ga₂O₃ film is a dominantly direct bandgap material. The results of Hall and cathodoluminescence measurements imply that the Zn dopant in β-Ga₂O₃ film will form an acceptor Zn_Ga to produce p-type conductivity.     

Electronic structure and magnetic properties of the N monodoping and (Li, N)-codoped ZnO

Using first-principles calculations based on density functional theory, we investigated systematically the electronic structures and magnetic properties of N monodoping and (Li, N) codoping in ZnO. The results indicate that monodoping of N in ZnO favors a spin-polarized state with a magnetic moment of 0.95 μ_B per supercell and the magnetic moment mainly comes from the unpaired 2p electrons of N and O atoms. In addition, it was found that monodoping of N in ZnO is a weak ferromagnet and it is the spin-polarized O atoms that mediate the ferromagnetic exchange interaction between the two N atoms. Interestingly, by Li substitutional doping at the cation site (Li_Zn), the ferromagnetic stability can be increased significantly and the formation energy can be evidently reduced for the defective system. Therefore, we think that the enhancement of ferromagnetic stability should be attributed to the accessorial holes and the lower formation energy induced by Li_Zn doping.     

Possible approach to fabricate p-type ZnO through the Be–N codoping method: First-principles calculations

An ab initio calculation based on density functional theory is applied to study Be–N codoped ZnO and the possible complexes are discussed. The calculated results show that the substitutional N defect at the O site (N_O) easily binds with the interstitial Be (Be_i), rather than the substitutional Be defect at the Zn site (Be_Zn). This indicates that 4Be_Zn–N_O complex is not a stable acceptor and is unlikely to form. Fortunately, Be_i–3N_O is of high structural stability and its transition energy is very low due to the impurity band caused by the Be_i–2N_O passive complex. Therefore, Be_i–3N_O can serve as a stable source of p-type conductivity. In addition, it is also suggested that Be–N codoped p-type ZnO can be prepared under Zn-rich condition because Be_i–3N_O has the lowest formation energy in this environment.     

p型K:ZnO导电机理的第一性原理研究

基于密度泛函理论,利用局域密度近似的第一性原理平面波赝势方法,对掺K以及含有氢填隙(H_i)、氧空位(V_O)、锌填隙(Zn_i)和锌空位(V_Zn)的K:ZnO电子结构分别进行了研究.结果表明,1) 单独掺K可引入浅受主,但系统总能增高;2) K与H共掺可降低系统总能,提升稳定性;3) V_O在K+H:ZnO中的形成比Zn_i困难得多,二者都是 关键词： 氧化锌 p型 第一性原理 电子结构     

表面效应对Li掺杂的ZnO薄膜材料p型电导的影响

利用第一性原理的方法研究了在ZnO非极性表面和极性表面的不同原子层中, 分别用Li原子去替位Zn原子(记为Li_Zn)后的相对稳定性和热离化能. 计算结果表明Li_Zn处于ZnO表面区域时的稳定性优于在ZnO体中时的稳定性, 并且Li_Zn在表面区域的热离化能要比它在体结构中的热离化能大很多, 于是, ZnO表面效应的存在会使Li掺杂的ZnO薄膜材料的p型导电能力大幅度降低. 这个结果对低维ZnO体系p型掺杂有着重要的指导意义. 我们进一步发现, 在不同的ZnO表面区域里Li_Zn的热离化能会表现出很大的差异是源于不同的表面具有不同的静电势分布.     

Fabrication and photoluminescence of P doped ZnO nanobelts by thermal evaporation method

Uniform and flat single crystal ZnO:P nanobelts (NBs) were fabricated on Si (1 0 0) substrates by the thermal evaporation method. The growth process, free-catalyst self-assembly vapor-solid (V-S) mechanism, was described and investigated deeply in terms of thermodynamics and kinetics. Then, the photoluminescence (PL) properties of ZnO NBs were studied in a temperature range from 10 to 270 K. At 10 K the recombination of acceptor-bound exciton (A⁰X) was predominant in the PL spectrum, and was attributed to the transition of P_Zn−2V_Zn complex bound exciton. The active energy of A⁰X and acceptor binding energy were calculated to be 17.2 and 172 meV, respectively. The calculated acceptor binding energy of P doped ZnO nanostructure is in good agreement with that of P doped ZnO film.     

Effects of S incorporation on Ag substitutional acceptors in ZnO:(Ag, S) thin films

Ag–S codoped ZnO thin films have been fabricated on Si substrates by radio frequency (RF) magnetron sputtering using a thermal oxidation method. XRD and SEM measurements showed that the sample has hexagonal wurtzite structure with a preferential (002) orientation and the surface is composed of compact and uniform grains. Ag_Zn–nS_O defect complexes were observed in the Ag–S codoped ZnO films by XPS analysis. Low temperature PL spectra showed neutral acceptor bound exciton emission related to Ag_Zn–nS_O. The corresponding acceptor ionization energy of 150 meV is much lower than that of monodoped Ag (246 meV), which is favorable for p-type doping of ZnO.     

Activation energies of the acceptor-bound excitons and the donor-acceptor pairs in nitrogen-doped p-type ZnSe, p-type ZnSySe1−y, and p-type Zn1−xMgxSySe1−y epitaxial films grown on GaAs (1 0 0) substrates

Nitrogen-doped p-type ZnSe, p-type ZnS_ySe_1−y, and p-type Zn_1−xMg_xS_ySe_1−y epilayers were grown on n-type GaAs (1 0 0) substrates by molecular beam epitaxy. Photoluminescence (PL) spectra for the p-type ZnSe and the lattice-matched p-type ZnS_0.06Se_0.94, and p-type Zn_0.92Mg_0.08S_0.12Se_0.88 epilayers showed a deep acceptor bound exciton emission and a donor-acceptor pair emission. Temperature-dependent PL measurements were carried out to determine the activation energies of these states. The activation energies of the acceptor-bound excitons and the donor-acceptor pairs were determined to be 40 and 65 meV in the p-type ZnSe epilayer, 20 and 45 meV in the p-type ZnS_0.06Se_0.94, and 45 and 43 meV in the p-type Zn_0.92Mg_0.08S_0.12Se_0.88 epilayers.     

Nano-star formation in Al-doped ZnO thin film deposited by dip-dry method and its characterization using atomic force microscopy, electron probe microscopy, photoluminescence and laser Raman spectroscopy

Zinc oxide doped with Al (AZO) thin films were prepared on borosilicate glass substrates by dip and dry technique using sodium zincate bath. Effects of doping on the structural and optical properties of ZnO film were investigated by XRD, EPMA, AFM, optical transmittance, PL and Raman spectroscopy. The band gap for ZnO:Al (5.0 at. wt.%) film was found to be 3.29 eV compared with 3.25 eV band gap for pure ZnO film. Doping with Al introduces aggregation of crystallites to form micro-size clusters affecting the smoothness of the film surface. Al³⁺ ion was found to promote chemisorption of oxygen into the film, which in turn affects the roughness of the sample. Six photoluminescence bands were observed at 390, 419, 449, 480, 525 and 574 nm in the emission spectra. Excitation spectra of ZnO film showed bands at 200, 217, 232 and 328 nm, whereas bands at 200, 235, 257 and 267 nm were observed for ZnO:Al film. On the basis of transitions from conduction band or deep donors (CB, Zn_i or V_OZn_i) to valence band and/or deep acceptor states (VB, V_Zn or O_i or O_Zn), a tentative model has been proposed to explain the PL spectra. Doping with Al³⁺ ions reduced the polar character of the film. This has been confirmed from laser Raman studies.     

First-principles calculation on p-type conduction of (Sb,N) codoping in ZnO

Based on first-principles calculations, (Sb, N) codoped ZnO are investigated. We find that Sb_Zn–4N_O have lower formation energy and can form p-type conduction with smaller hole effective mass. In comparation to monodoping of Sb, Sb_Zn–4N_O complex can form better p-type conductivity than Sb_Zn–2V_Zn, which may be strongly compensated by Sb_Zn defect and result in a decrease of p-type conduction. So we inferred that (Sb, N) codoping in ZnO under O-poor condition should be a realizable candidate of p-type conduction.     

Defects, stress and abnormal shift of the (0 0 2) diffraction peak for Li-doped ZnO films

The effect of changes in Li content on the structural property of sol-gel Li-doped ZnO films was investigated in this study. The observed changes of the Li incorporation-induced strain along c-axis are closely related to the different ratios between the concentrations of Li interstitials (Li_i) and Li substituting for Zn (Li_Zn) in the films. According to the observed results from X-ray diffraction (XRD) and photoluminescence measurements, we found that the domination of the dissociative mechanism in the Li-doped ZnO films led to transformation from Li_Zn to Li_i, involving the formation of Zn vacancies (V_Zn). In addition, the interaction between these defects (that is, Li_Zn, Li_i, V_Zn and oxygen vacancy) and the crystal structure may lead to the abnormal shift of the (0 0 2) diffraction peak position determined from XRD measurements.     

The luminescence of ZnO film grown on GaAs interlayer by PA-MOCVD

ZnO film was firstly prepared by PA-MOCVD method on the substrate pre-coated with GaAs interlayer. Hall measurement found that the GaAs interlayer had important effects on the electrical behavior of the ZnO film. It could make the ZnO film convert to p-type conductivity. The XPS results confirmed that the acceptor was arsenic. And the acceptor level was 130 meV above the ZnO valence band maximum. Low-temperature PL measurement was introduced to investigate the optical properties of both as-grown n-type and arsenic doped p-type ZnO films. Then, based on this technology, ZnO homojunction light emitting device (LED) was fabricated with arsenic doped p-type ZnO and unintentionally doped n-type ZnO on GaAs/p⁺-Si substrate. Its current-voltage (I-V) character showed a typical rectification behavior, which was different from the n-ZnO/p⁺-Si structure. The UV-visible (385-580 nm) electroluminescence was detected under relatively low current injection condition from the n-ZnO/p-ZnO/p⁺-Si LED.     

Fabrication of Sb-doped p-type ZnO thin films by pulsed laser deposition

p-Type ZnO thin films have been realized via monodoping antimony (Sb) acceptor by using pulsed laser deposition. The obtained films with the best electrical properties show a hole concentration in the order of 10¹⁸ cm⁻³ and resistivity in the range of 2-4 Ω cm. X-ray diffraction measurements revealed that all the films possessed a good crystallinity with (0 0 2)-preferred orientation. Guided by X-ray photoemission spectroscopy analysis and a model for large-sized-mismatched group-V dopant in ZnO, an Sb_Zn-2V_Zn complex is believed to be the most possible acceptor in the Sb-doped p-type ZnO thin films.     

Indium-incorporation-induced transformation of optical, photoluminescence and lasing properties of InGaN epilayers

A comparative combined study of photoluminescence (PL), PL kinetics, stimulated emission (SE) and photoreflectance (PR) properties in In_xGa_1−xN epilayers is carried out in the composition range 0≤x≤0.19. In-incorporation up to 4% leads to the sufficient longer radiative recombination decay time due to the decrease in non-radiative recombination channels, which are peculiar to GaN, and band-to-band optical transitions predominate the spontaneous PL spectrum. Further In-incorporation (x>4%) leads to the localization of carriers and/or excitons at band-tails in the In-rich areas. Correlation between the position of dominant low-energy PR oscillation due to the main band gap and SE peak position shows that band-to-band transitions are responsible for lasing and dominate the PL spectrum in all highly pumped In_xGa_1−xN samples.     

Synthesis and optical properties of N-In codoped ZnO nanobelts

N-In codoped ZnO nanobelts were successfully synthesized via high-temperature chemical vapor deposition for the first time, using the mixture of In/ZnO as a precursor. The EDX spectrum showed that In was introduced into ZnO nanobelts. In order to better understand the optical properties of N-In codoped ZnO nanobelts, the Raman and low-temperature PL spectra of the undoped, In-doped and N-In codoped ZnO nanostructures were measured. By contrasting, N is incorporated into the nanobelts. The temperature dependent photoluminescence (PL) spectra were investigated. Their PL spectra in the temperature from 9 K to room temperature were dominated by an A^oX emission of excitons bound to 2No-In_Zn acceptor complexes. The dissociation energy of the acceptor complexes is estimated to be 89-112 meV.