Photoemission of spin-polarized electrons from negative electron affinity GaAsP

GaAs_0.62P_0.38 activated to negative electron affinity and irradiated with circularly polarized light of a wavelength shorter than approximately 680 nm emits electrons whose spins are mainly oriented antiparallel to the photon spins. At 650 nm a degree of electron spin polarization around 40% is observed. The spectrum of spin polarization of the photoelectrons is similar to that known from GaAs cathodes but is shifted to shorter wavelengths. 25 μA current of spin-polarized electrons were achieved with a 5 mW He-Ne laser.     

Enhancement of minority carrier lifetime in GaAs1? x P x ( x =0.4; 0.65) by nitrogen implantation

Minority carrier lifetimes in nitrogen implanted GaAs_1-x P _x (x=0.4; 0.65) were measured at 77K by an optical phase shift method as a function of nitrogen dose and annealing temperature in order to investigate the dependence of the lifetime on the concentration of nitrogen isoelectronic traps. A large increase in the lifetime was observed after nitrogen implantation followed by annealing at and above 800°C. The maximum lifetimes were 22ns for GaAs_0.35P_0.65 and 6.7 ns for GaAs_0.6P_0.4. They were obtained by implantation to a dose of 5×10¹³ cm⁻² in GaAs_0.35P_0.65 and 10¹³ cm⁻² in GaAs_0.6P_0.4. The lifetime after nitrogen implantation followed by annealing was longer by a factor of 6–7 than that of the unimplanted sample.     

Theoretical investigation of the conduction and valence band offsets of GaAs1−x Nx/GaAs1−yNy heterointerfaces

Theoretical investigations of the conduction band offset (CBO) and valence band offset (VBO) of the relaxed and pseudo-morphically strained GaAs_1−xN_x/GaAs_1−yN_y heterointerfaces at various nitrogen concentrations (x and y) within the range 0-0.05 and along the [0 0 1] direction are performed by means of the model-solid theory combined with the empirical pseudopotential method under the virtual crystal approximation that takes into account the effects of the compositional disorder. It has been found that for y < x, the CBO and VBO have negative and positive signs, respectively, whereas the reverse is seen when y > x. The band gap of the GaAs_1−xN_x over layer falls completely inside the band gap of the substrate GaAs_1−yN_y and thus the alignment is of type I (straddling) for y < x. When y > x, the alignment remains of type I but in this case it is the band gap of the substrate GaAs_1−yN_y which is fully inside the band gap of the GaAs_1−xN_x over layer. Besides the CBO, the VBO and the relaxed/strained band gap of two particular cases: GaAs_1−xN_x/GaAs and GaAs_1−xN_x/GaAs_0.98N_0.02 heterointerfaces have been determined.     

Enhancement of minority carrier lifetime in GaAs1−x P x (x=0.4; 0.65) by nitrogen implantation

Minority carrier lifetimes in nitrogen implanted GaAs_1-x P _x (x=0.4; 0.65) were measured at 77K by an optical phase shift method as a function of nitrogen dose and annealing temperature in order to investigate the dependence of the lifetime on the concentration of nitrogen isoelectronic traps. A large increase in the lifetime was observed after nitrogen implantation followed by annealing at and above 800°C. The maximum lifetimes were 22ns for GaAs_0.35P_0.65 and 6.7 ns for GaAs_0.6P_0.4. They were obtained by implantation to a dose of 5×10¹³ cm^?2 in GaAs_0.35P_0.65 and 10¹³ cm^?2 in GaAs_0.6P_0.4. The lifetime after nitrogen implantation followed by annealing was longer by a factor of 6–7 than that of the unimplanted sample.     

MBE GaAs1-xSbx/GaAs应变层量子阱的光调制反射光谱

本文采用光调制反射光谱技术研究了MBE GaAs_1-xSb_x/GaAs应变层量子阱。通过实验分析和理论上对受应力作用后能带结构的估算,确认在这一系统中流体静压力作用引起的能带结构变化主要出现在导带上,同时也证实了GaAs_1-xSb_x/GaAs应变层量子阱属于第Ⅱ型量子阱结构。实验结果与理论估算符合很好。 关键词：     

Nitrogen implantation in GaAs1−xPx (x=0.4; 0.65)

Nitrogen ions were implanted in GaAs_1−xP_x (x=0.4; 0.65) at room temperature at various doses from 5×10¹² cm⁻² to 5×10¹⁵ cm⁻² and annealed at temperatures from 600°C up to 950°C using a sputtered SiO₂ encapsulation to investigate the possibility of creating isoelectronic traps by ion implantation. Photoluminescence and channeling measurements were performed to characterize implanted layers. The effects of damage induced by optically inactive neon ion implantation on photoluminescence spectrum were also investigated. By channeling measurements it was found that damage induced by nitrogen implantation is removed by annealing at 800°C. A nitrogen induced emission intensity comparable to the intensity of band gap emission for unimplanted material was observed for implanted GaAs_0.6P_0.4 after annealing at 850°C, while an enhancement of the emission intensity by a factor of 180 as compared with an unimplanted material was observed for implanted GaAs_0.35P_0.65 after annealing at 950°C. An anomalous diffusion of nitrogen atoms was found for implanted GaAs_0.6P_0.4 after annealing at and above 900°C.     

Size quatized levels of the valence band and the optical gain in strained <Emphasis Type="Italic">p</Emphasis>-AlGaAs/GaAsP/<Emphasis Type="Italic">n</Emphasis>-AlGaAs structures under uniaxial compression

The band structure, size quatized levels, and wave functions in the conduction and valence bands of strained n-Al _x Ga_{1 − x} As/GaAs _y P_{1 − y} /p-Al _x Ga_{1 − x} As (y = 0.84) heterostructures are calculated numerically upon a uniaxial compression along the [110] direction. The calculation indicates a sublinear increase of the effective optical gap in the GaAs_0.84P_0.16 quantum well, strong mixing of states of light and heavy holes, and merging of the corresponding ground states in the quantum well of the valence band under a pressure of 4.5–5 kbar. The calculation of matrix elements of the electron-photon interaction operator for a system of possible interband transitions permits one to determine the optical gain for the TE and TM modes. The increase in this coefficient by two to fourfold under uniaxial compression agrees with the previously published experimental data on the increase of the electroluminescence intensity.     

Extraction of G<Subscript>M</Subscript><Superscript>n</Superscript> from inclusive electron scattering on D, <Superscript>4</Superscript>He

We use the relation between Structure Functions (SFs) of nuclei A and nucleons N in order to fomulate a criterion which isolates the QE part out of the total inclusive cross-section. From data points around the QEP we extract the reduced neutron magnetic form factor 〈α _n = G _M ⁿ/μ _n G _d〉. The latter shows an unexpected decrease up to Q ² = 10GeV^2, the largest measured.     

Modification of GaAs by medium-energy N<Stack><Subscript>2</Subscript><Superscript>+</Superscript></Stack> ions

The modification of GaAs with a 2500-eV beam containing N ₂ ⁺ and Ar⁺ ions is examined with Auger electron spectroscopy. Most implanted nitrogen atoms are found to react with the matrix, substituting arsenic atoms to produce a several-nanometer-thick layer of the single-phase GaAs_1−x N_x (x=6%) solid solution. The GaN phase is absent. Displaced arsenic atoms and nitrogen atoms unreacted with the matrix are present in the layer and on its surface. The former segregate, whereas the latter form molecules.     

Performance improvement for epitaxially grown SiGe on Si solar cell by optimizing the back surface field

This letter reports on the performance improvement of an epitaxially grown SiGe on Si solar cell by optimizing the back surface field (BSF). First, a Si_0.18Ge_0.82 on silicon (Si) solar cell was fabricated with a 0.25 μm BSF layer. A 25 mV open‐circuit voltage (V_OC) improvement was observed on this BSF solar cell compared with the reference solar cell without BSF layer. Then, a Si_0.18Ge_0.82 on Si solar cell with double BSF layers was designed and fabricated. The measured efficiency of this solar cell is 3.4% when filtered by a GaAs_0.79P_0.21 top cell. To the best of the authors' knowledge, the 3.4% efficiency reported here is the highest efficiency for SiGe on Si solar cells when filtered by a GaAs_0.79P_0.21 top cell. The previous best reported efficiency for high Ge composition SiGe on Si solar cell was only 1.7% when filtered by a GaAs_0.79P_0.21 top cell.     

670 nm AlGaInP/GaInP strained multi-quantum well laser diode with high characteristic temperature (T 0)

A 670 nm AlGaInP/GaInP strained multi-quantum well laser diode with a high characteristic temperature (T ₀) has been achieved by optimization of quantum well structures and the metal-organic chemical vapour deposition process. The hole concentration of 5×10¹⁷ cm^-3 in the p-AlGaInP cladding layer on a (100) 5° off GaAs substrate has been obtained with very small ratio, 0.35, of mole flow rate of zinc source to the group III sources ([DEZn]/[III]) of 0.35. The threshold current and maximum temperature for continuous wave operation of lasers with cavity length of 300 m have been measured as 45 mA and 80°C, respectively. The characteristic temperature (T ₀) of the lasers has been measured as high as 153 K. The laser without facet protections could operate for more than 1000 h at 50°C and 5 mW.     

The emission spectrum of <Emphasis Type="Italic">p</Emphasis>-AlGaAs/GaAsP/<Emphasis Type="Italic">n</Emphasis>-AlGaAs diodes under uniaxial compression

New experimental data are presented on the effects of uniaxial compression of up to 4 kbar along the [110] and [1$ \bar 1 $ \bar 1 0] crystallographic directions on the spectra of electroluminescence and the current-voltage characteristics of diodes based on n-Al _x Ga_{1 − x} As/GaAs _y P_{1 − y} /p-Al _x Ga_{1 − x} As (y = 0.84) heterostructures that were designed for injection lasers. With increasing pressure, the spectra show a shift to shorter wavelengths, reaching 25 meV at 3 kbar; the intensity increases 2–3 times as well. Numerical calculations were carried out on the band structure of the investigated heterostructures under compression along the [110] axis, which indicate the increase in the effective band gap in the quantum well (QW) GaAs _y P_{1 − y} , with a pressure coefficient of about 8.5 meV/kbar and reduction of the barrier height at the boundaries of the QW. The calculations predict the possibility that light and heavy holes crossover at pressures above 4.5–5 kbar. The increase in the effective band gap completely describes the experimental data on the shift of the electroluminescence spectra. The mixing of light and heavy holes when approaching the band crosspoint is the probable cause of an increase in the intensity of radiation under uniaxial compression.     

Laser-pumped molecular laser

The parameters of laser-pumped molecular lasers are investigated. It is established that the energy and tuning characteristics of an NH₃ laser (E_g = 1.5 J, efficiency 20%, P_av = 20 W, radiation frequency tuning band 753–890 cm^-1) are decisively influenced by the addition of N₂. A focusing raster optical-pumping system has made it possible to obtain a specific lasing energy 12 J/liter. A CF₄ laser with lasing energy 40 mJ operates in the 612–655 cm^-1 band. Experiments on dissociation of the molecules CCl₄ and UF₆ were carried out with the aid of NH₃ and CF₄ lasers. The systems and methods of producing Raman lasers (RL) are presented. An effective RL amplifier on rotational transitions in compressed H₂, which transforms tens of beams of Nd lasers into one coherent beam of the first Stokes component with λ ? 1.13 μm at an efficiencyup to 70%, is described.     

High-temperature operation of AlGaInAs/InP lasers1994

We discuss the design of uncooled lasers which minimizes the change in both threshold current and slope efficiency over the temperature range from–40 to +85°C [1]. To prevent carrier overflow under high-temperature operation, the electron confinement energy is increased by using the Al _x Ga _y In_1–x–y As/InP material system [1] instead of the conventional Ga _x In_1–x As _y P_1–y /InP material system. Experimentally, we have investigated strained quantum well lasers with three different barrier layers and confirmed that the static and dynamical performance of the lasers with insufficient carrier confinement degrades severely under high-temperature operation [2]. With an optimized barrier layer, the Al _x Ga _y In_1–x–y As/InP strained quantum well lasers show superior hightemperature performance, such as a small drop of 0.3 dB in slope efficiency when the heat sink temperature changes from 25 to 100°C [3], a maximum CW operation temperature of 185°C [4], a thermally-limited 3-dB bandwidth of 13.9 GHz at 85°C [2], and a mean-time-to-failure of 33 years at 100°C and 10 mW output power [5].     

Isoelectronic trap transitions in GaAs1−xPx:N in the region of resonant enhancement (ENN ∼ EΓ, 0.3<x<0.4)

For GaAs_1?xP_x:N crystal composition x < 0.8, the distinction between NN₁ and NN₃ transitions becomes blurred. Photoluminescence measurements on N-doped GaAs_1?xP_x layers (0.3 < x < 0.4) and, for comparison, on the same vapor epitaxial crystals with the N-doped layer removed, indicate that the NN₃ transition reappears (and thus also the NN₁ transition) as E_NN3 approaches E_Γ. This is attributed to the resonant enhancement that occurs when E_NN ～ E_Γ.     

GaP和GaAs1-xPx中N束缚激子压力行为的理论计算

本文在Koster-Slater单带位势近似下对GaP和GaAs_1-xP_x中N等电子中心束缚激子的压力行为与能带结构的关系进行讨论与分析,得到杂质态压力系数的一个近似的解析表达式,并对N和NN_i中心能级的压力关系进行计算。同时,给出NN_i中心配位的一组新的指认。 关键词：     

Pressure studies of conduction-band N-pair-state mixing in dilute GaAs1−xNx alloys

High-pressure photoluminescence (PL) experiments (at 9 K) are reported for GaAs_1−xN_x/GaAs quantum wells having N compositions (x=0.0025, 0.004) in the dilute regime where the GaAs_1−xN_x alloy conduction band (CB) evolves rapidly by incorporation of N-pair states. Under increasing pressure, the PL spectra exhibit several new N-pair features that derive from CB-resonant states at 1 atm. Two of these features appear strongly at sub-band-gap energies for P29 kbar in the x=0.0025 sample, but are absent for all pressures in the x=0.004 sample. Several competing PL assignments due to bound-exciton recombination at NN_i pairs (i=1–4 is the anion separation) are considered in light of prior findings for N-doped (10¹⁷ cm⁻³) GaAs. The absence of certain PL features in the x=0.004 sample shows that N-pair states mix into the CB-continuum via a selective process, and this selectivity offers an important test for band-structure calculations in dilute GaAs_1−xN_x alloys.     

Optoelectronic properties of GaAs1−xPx alloys under the influence of temperature and pressure

This work is concerned with the dependence of the electronic energy band structures for GaAs_1−xP_x alloys on temperature and pressure that is based on local empirical pseudo-potential method. The band structures of GaAs_1−xP_x alloys were calculated in the virtual crystal approximation using the EPM which incorporates compositional disorder as an effective potential.     

长波长大应变InGaAs/InGaAsP分布反馈激光器的材料生长与器件制备

采用低压金属有机化合物气相沉积法(LP-MOCVD)生长并制作了1.6—1.7μm大应变InGaAs/InGaAsP分布反馈激光器.采用应变缓冲层技术，得到质量良好的大应变InGaAs/InP体材料.器件采用了4个大应变的量子阱，加入了载流子阻挡层改善器件的温度特性.1.66μm和1.74μm未镀膜的3μm脊型波导器件阈值电流低(小于15mA)，输出功率高(100mA时大于14mW).从10—40℃，1.74μm激光器的特征温度T₀=57K，和1.55μm InGaAsP分布反馈激光器的特征温度相当. 关键词： MOCVD InGaAs/InGaAsP 应变量子阱 分布反馈激光器     

High speed all-silicon optical modulator

Electrorefractive effect is experimentally demonstrated in an all-silicon optical structure. A highly doped Si P⁺ layer is embedded in the intrinsic region of a PIN diode integrated in a SOI waveguide. Holes are confined at equilibrium around the P⁺ layer. By applying a reverse bias to the diode, electrical field sweeps the carriers out of the active region. Free carrier concentration variations are responsible for local refractive index variations leading to an effective index variation of the waveguide optical mode and to an optical absorption variation. As a figure of merit, the product V_πL_π, determined from the measured effective index variation, is equal to 3.1 V cm. Furthermore, the device performances have theoretically been investigated. Estimations show that V_πL_π as small as 1 V cm are feasible using optimized structures. Response times lower than 2 ps are predicted, which gives the possibility to achieve very high-speed modulation. Furthermore, a temperature increases from 300 to 400 K does not change the index variation amplitude, and despite the carrier mobility reduction, response times are still lower than 2 ps.