Magnetron formation of Ni/YSZ anodes of solid oxide fuel cells

Physico-chemical and structural properties of nanocomposite NiO/ZrO₂:Y₂O₃ (NiO/YSZ) films applied using the reactive magnetron deposition technique are studied for application as anodes of solid oxide fuel cells. The effect of oxygen consumption and magnetron power on the discharge parameters is determined to find the optimum conditions of reactive deposition. The conditions for deposition of NiO/YSZ films, under which the deposition rate is maximum (12 μm/h), are found and the volume content of Ni is within the range of 40–50%. Ni-YSZ films reduced in a hydrogen atmosphere at the temperature of 800°C have a nanoporous structure. However, massive nickel agglomerates are formed in the course of reduction on the film surface; their amount grows at an increase in Ni content in the film. Solid oxide fuel cells with YSZ supporting electrolyte and a LaSrMnO₃ cathode are manufactured to study electrochemical properties of NiO/YSZ films. It is shown that fuel cells with a nanocomposite NiO/YSZ anode applied using a magnetron sputtering technique have the maximum power density twice higher than in the case of fuel cells with an anode formed using the high-temperature sintering technique owing to a more developed gas-anode-electrolyte three-phase boundary.     

单一稀土镧在不同基底上的电沉积及其性能的研究

研究在低温熔融盐体系中于不同基底上电沉积单一稀土金属镧（La）。经X-射线能谱仪测定,在镍片基底上沉积的La的质量分数为100％,铜片基底上沉积的La质量分数为72．84％;在镍铁合金灯丝上沉积得到La-Ni合金薄膜,其中La的质量分数为50．02％,Ni的质量分数为2．48％。经扫描电子显微镜观察,所得的沉积膜为均匀、光滑、致密的黑色沉积薄膜。经X-射线衍射仪分析,镧在不同基底上沉积所得的沉积膜为不同晶型,以镍片为基底得到的单质镧为α-六方晶型;以铜片为基底得到的单质镧为面心立方晶;均与基底晶型相匹配。在镍铁合金灯丝上电沉积所得的La-Ni合金薄膜致密均匀,在无水乙醇中久浸而不脱落,并呈现强磁性。     

长链香豆素LB膜对n-Si/Ni液结上的光致电荷转移的影响

本文研究了由硬脂酸香豆素制得的LB膜对n-Si/Ni电极性能的修饰作用.该LB膜沉积方式是Z型的,成膜之后吸收蓝移(由343nm移至325nm).在60mW·cm^-2溴钨灯光照下,n-Si/Ni/3LB/Fe(CN) /Pt电池的光电转换效率增大了一倍,稳定性亦有明显改善.交流阻抗测量表明,光照使n-Si/Ni/3LB电极的电解电阻大大减小,实验结果表明,硬脂酸香豆素LB膜对n-Si/Ni电极上的光致电荷传递过程的修饰作用是良好的.     

Thickness dependence of the structural,mechanical and electrical properties of Ni films deposited on polyimide by ion beam‐assisted deposition (IBAD)

Ni thin films with different thicknesses were deposited on pre‐treated polyimide substrates by ion beam‐assisted deposition. Dependence of structural, mechanical and electrical properties of the Ni films on their thickness was investigated. The results showed a clear correlation between film properties and film thickness. The inter‐diffusion at the interface regions of the films with different deposition time were demonstrated by transmission electron microscopy and X‐ray photoelectron spectroscopy. With increasing film thickness, surface roughness of the Ni films firstly decreased and then increased, while the grain size gradually increased. Residual stress of the Ni thin films decreased with increasing Ni film thickness up to 202 nm and then slightly increased as the film thickness further increased. Resistivity decreased, and temperature coefficient of resistivity (TCR) increased with increasing film thickness due to the enhancement of crystallization degree and the increase in grain size. The decrease in surface roughness and residual stress also contributed to the decrease of resistivity and the increase of TCR of the films. An optimal film thickness is suggested, which yielded a relatively high TCR value and low levels of both surface roughness and residual stress. Copyright © 2012 John Wiley & Sons, Ltd.     

The electrocatalytic behavior of electrodeposited Ni–Mo–P alloy films towards ethanol electrooxidation

Ternary Ni–Mo–P thin films have been electrodeposited from citrate‐based electrolyte onto graphite substrates for application as anode catalysts for ethanol electrooxidation. The operating deposition parameters were optimized to produce Ni–Mo–P alloy films of outstanding catalytic activity. The phase structure of the deposits was evaluated employing X‐ray diffraction technique. Morphology and chemical composition of the deposited alloy films were studied using scanning electron microscopy and energy‐dispersive X‐ray analysis, respectively. The results demonstrated that the rate of Ni–Mo–P deposition increases with increasing the ammonium molybdate concentration in the plating electrolyte up to 10 g l^?1. Also, the amount of Mo in the deposits increases with increasing the ammonium molybdate concentration up to 7.5 g l^?1, and the maximum Mo content in the film was 9.1 at.%. The catalytic activity of Ni–Mo–P/C alloy films has been evaluated towards electrooxidation of ethanol in 1.0 M NaOH solution by using cyclic voltammetry and chronoamperometry. The catalytic performance of the prepared anodes as a function of the amount of Mo was studied. The results showed an increase in the oxidation peak current density of ethanol with increasing the Mo at.% in the deposited alloy films. Additionally, Ni–Mo–P/C electrodes displayed significantly improved catalytic activity and stability towards electrooxidation of ethanol compared with that of Ni–P/C electrode. Copyright © 2013 John Wiley & Sons, Ltd.     

An electrochemical strategy to incorporate iron into diamond like carbon films with magnetic properties

Fe–DLC composite film was deposited by a facile electrochemical process via the electrolysis of analytically methanol and Iron (III) 2, 4-pentanedionate under atmospheric pressure. The relative atomic ratio of Fe/C was around 10%, and nano-crystalline iron particles were homogeneously dispersed into the amorphous cross-linked carbon matrix. After doping iron into DLC films, the sp3-hybridized carbon content in DLC composite films increased, and the carbon composite film exhibits a magnetic field up to 12KOe. Moreover, the deposition of Fe–DLC composite film in liquid-phase electrochemical deposition may be followed by an atmospheric pressure plasma deposition (APPD) process.     

In situ STM studies of electrochemical growth of nanostructured Ni films and their anomalous IR properties

We have extended the study of anomalous IR properties, which were initially discovered on nanostructured films of platinum group metals and alloys, to nanostructured films of nickel, a member of the iron group triad, and broadened the fundamental knowledge on this subject. Nanostructured thin films of nickel supported on glassy carbon [nm-Ni/GC(n)] were prepared by electrochemical deposition under cyclic voltammetric conditions, and the thickness of films was altered systematically by varying the number (n) of potential cycling within a defined potential range for electrodeposition. Electrochemical in situ scanning tunneling microscopy (STM) was employed to monitor the electrochemical growth of nanostructured Ni films. These in situ STM images illustrated that, along the increase of the film thickness, Ni films have undergone a transformation from layer structure to island structure and finally to lumpish arris structure. Investigations by in situ FTIR spectroscopy employing adsorbed CO as the probe revealed that these nanostructures of Ni films yield abnormal IR features, Fano-like IR features, and normal IR features, respectively. The IR bands of CO adsorbed on Ni thin films of a layer structure were inverted in their direction and enhanced in their intensity up to 15.5 times on an nm-Ni/GC(4) electrode. The Fano-like IR features, which are defined as a bipolar band with its negative-going peak on the low wavenumber side and its positive-going peak on the high wavenumber side, are observed for the first time on Ni thin films of an island nanostructure, i.e., at the nm-Ni/GC(16) electrode. IR features changed to normal absorption in CO adsorbed on the nm-Ni/GC(25) electrode, i.e., that with lumpish arris nanostructured Ni film of a larger thickness.     

Asymmetric Ni/PVC films for high-performance electromagnetic interference shielding

A novel asymmetric Ni/PVC film has been developed by solution casting method. The structure, electrical conductivity, electromagnetic interference(EMI) shielding, and impact resistance were investigated. The results showed that the Ni particles were asymmetrically distributed along the thickness direction in the film. The top surface resistivity increased with film thickness, while the bottom surface exhibited the different trend. EMI shielding effectiveness(SE) depended on formation of closed packed conductive Ni network, which was influenced by both Ni content and film thickness. A linear relationship was observed between EMI SE and film thickness. The films with lower Ni content showed the faster increasing rate of EMI SE with film thickness. Some of the films show appreciably high EMI SE( 40 d B), indicating the promising application in EMI shielding field. Moreover, the films exhibit different impact performance under different impacting directions. All the experimental facts demonstrate that the asymmetric structure endows the film achieving high-performance EMI shielding function.     

The effect of nonmetallic element P in electroless Ni‐P coating on the passivation process during chemical conversion treatment

Pure Ni and electroless Ni‐P coating (ENPC) were passivated by a chemical conversion treatment. The passive films formed on pure Ni and ENPCs (with content of P 2.9, 7.2 and 11.7 at.% respectively) were analyzed by X‐ray photoelectron spectroscopy (XPS). High‐resolution XPS was also used to analyze the chemical states of the elements detected in the passive films. The results indicated that the detected Ni and P were in elemental states, and no compound with Ni and P element was detected in passive film, meaning that Ni and P did not participate in the formation of the passive film. The content of film‐forming reaction product in passive film increases with the content of element P in Ni‐P coating, suggesting that the nonmetallic P in Ni‐P coating played an important role in the formation of the passive film. The XPS results were used to analyze the formation mechanism of the passive film. Copyright © 2014 John Wiley & Sons, Ltd.     

Annealing-free adhesive electroless deposition of a nickel/phosphorous layer on a silane-compound-modified Si wafer

In this study, a post-annealing-free, adhesive nickel/phosphorous (Ni/P) layer was deposited on a 3-[2-(2-aminoethylamino)ethylamino] propyl-trimethoxysilane-modified (ETAS-modified) silicon (Si) surface through an electroless deposition process catalyzed by a novel polyvinylpyrrolidone-capped palladium nanocluster (PVP-nPd). ETAS was covalently bonded on the Si surface, whereas the amino groups on ETAS bridged with the palladium core in the PVP-nPd clusters. Because of the mentioned two effects, the deposited Ni/P layer showed superior adhesion on the Si wafer without the requirement of conventional annealing treatment. Compared with the Ni/P films deposited on bare and ETAS-modified Si surfaces by using commercial Sn/Pd colloids, the adhesion of the Ni/P film catalyzed by PVP-nPd on the ETAS-modified Si wafer improved 4- and 2-fold, respectively.     

One-step fabrication of nanostructured Ni film with lotus effect from deep eutectic solvent

We report a procedure to fabricate nanostructured Ni films via programmed electrochemical deposition from a choline-chloride-based ionic liquid at a high temperature of 90 °C. Three electrodeposition modes using constant voltage, pulse voltage, and reverse pulse voltage produce a variety of nanostructured Ni films with micro/nanobinary surface architectures, such as nanosheets, aligned nanostrips, and hierarchical flowers. The nanostructured Ni films possess face-centered cubic crystal structure. Amazingly, it is found that the electrodeposited Ni films deliver the superhydrophobic surfaces without any further modifications by low surface-energy materials, which might be attributed to the vigorous micro/nanobinary architectures and the surface chemical composition. The electrochemical measurements reveal that the superhydrophobic Ni film exhibit an obvious passivation phenomenon, which could provide enhanced corrosion resistance for the substrate in the aqueous solutions.     

Prefabrication of two-dimensional Ni–W/TiN films on oil-gas X52 steels by pulse electrodeposition

The main aim of this investigation was to prefabricate two-dimensional Ni–W/TiN films on oil-gas X52 steel substrates via pulse electrodeposition (PE). The influences of the TiN content in the bath on the surface morphology, nano-hardness, wear, and corrosion properties of the films were also discussed. The results indicated that the TiN particle size was only ～33 nm in 8 g/L TiN electrolyte, which was ～2.4 times less than that of TiN in 16 g/L solution. The Ni–W/8TiN film exhibited a uniform, smooth surface, and the depression depth and protrusion height were 45.3 nm and 81.7 nm, respectively. Three diffraction peaks at 43.72, 50.78, and 75.26° in the Ni–W/4TiN film emerged as the sharpest and narrowest peaks among the four films. Three XPS peaks for the Ni 2p_3/2 were present at 852.13, 856.35, and 861.87 eV in the Ni–W/8TiN film, corresponding to Ni, Ni²⁺ (Ni(OH)₂), Ni³⁺ (NiOOH) species. Besides, the XPS peak of W 4f_7/2, which located at 33.85 eV belonged to elemental W. The Ni–W/8TiN film had the lowest wear depth and width at 32.1 μm and 5.7 mm, respectively. Only some narrow and shallow scratches were found on the Ni–W/8TiN film surface, showing its outstanding tribological properties among the films tested. In addition, the Ni–W/4TiN film showed the highest mean frictional coefficient of 0.73, which was ～1.6 times more than that of the Ni–W/8TiN film.     

Growth and characterization of ultrathin carbon films on electrodeposited Cu and Ni

Ultrathin carbon films were grown on different types of metallic substrates. Free‐standing foils of Cu and Ni were prepared by electroforming, and a pure Ni film was obtained by galvanic displacement on a Si wafer. Commercial foil of Ni 99.95% was used as a reference substrate. Carbon films were grown on these substrates by chemical vapour deposition in a CH₄‐H₂ atmosphere. Obtained films were characterized by Raman spectroscopy, X‐ray photoelectron spectroscopy (XPS), Auger electron spectroscopy, and ultraviolet photoemission spectroscopy. The XPS at grazing collection angle was used to determine the thickness of carbon films. Depending on the deposition parameters, the films of graphene or graphite were obtained on the different substrates. The uniformity of graphene and its distribution over the sample area were investigated from Raman data, optical images, and XPS chemical maps. The presence of graphene or graphite in the films was determined from the Raman spectra and Auger peak of C KVV. For this purpose, the D parameter, which is a fingerprint of carbon allotropes, was determined from C KVV spectra acquired by using X‐rays and electron beam. A formation of an intermediate layer of metal hydroxide was revealed in the samples with graphene overlayer.     

Nanocrystalline structure and soft magnetic properties of nickel–molybdenum alloy thin films electrodeposited from acidic and alkaline aqueous solutions

Nanocrystalline nickel–molybdenum (Ni–Mo) alloy thin films were electrochemically synthesized in acidic and alkaline aqueous solutions. Transmission electron microscope bright-field images and electron diffraction patterns of the electrodeposits made it obvious that pure Ni consists of a submicron crystalline phase with the grain diameter of several hundred nanometers, while Ni–20 %Mo alloy was composed of a nanocrystalline phase with the grain diameter of a few nanometers. It was estimated that the nanocrystalline phase of electrodeposited Ni–Mo alloy thin films was introduced by the formation of supersaturated Ni–Mo solid solution phase with Mo content in the deposit more than 20 %. Submicron crystalline pure Ni thin films were hardly magnetized in perpendicular direction to the film plane while the nanocrystalline Ni–20 %Mo alloy thin films were isotropically magnetized. It was suggested that the isotropical magnetization behavior was caused by decreasing the demagnetizing field and the magneto crystalline anisotropy with a decrease in the magnetic moment and the average crystal grain size. Coercive force of a submicron crystalline pure Ni thin film electrodeposited from an acidic aqueous solution was ca. 100 Oe while that of a nanocrystalline Ni–20 %Mo alloy thin film electrodeposited from an alkaline aqueous solution was only 1～2 Oe. Soft magnetic properties of Ni–Mo alloy thin films electrodeposited from an alkaline aqueous solution were better than that from an acidic aqueous solution and it was improved with an increase in Mo content in the deposit. It was estimated that the electrodeposited Ni–Mo alloy catalysts could be easily recovered with magnetic field less than 1 kOe.     

Bioactivity and mechanical properties of nickel‐incorporated hydrogenated carbon nanocomposite thin films

In this paper, the influence of nickel incorporation on the mechanical properties and the in vitro bioactivity of hydrogenated carbon thin films were investigated in detail. Amorphous hydrogenated carbon (a‐C:H) and nickel‐incorporated hydrogenated carbon (Ni/a‐C:H) thin films were deposited onto the Si substrates by using reactive biased target ion beam deposition technique. The films' chemical composition, surface roughness, microstructure and mechanical properties were investigated by using XPS, AFM, TEM, nanoindentation and nanoscratch test, respectively. XPS results have shown that the film surface is mainly composed of nickel, nickel oxide and nickel hydroxide, whereas at the core is nickel carbide (Ni₃C) only. The presence of Ni₃C has increased the sp² carbon content and as a result, the mechanical hardness of the film was decreased. However, Ni/a‐C:H films shows very low friction coefficient with higher scratch‐resistance behavior than that of pure a‐C:H film. In addition, in vitro bioactivity study has confirmed that it is possible to grow dense bone‐like apatite layer on Ni/a‐C:H films. Thus, the results have indicated the suitability of the films for bone‐related implant coating applications. Copyright © 2011 John Wiley & Sons, Ltd.     

金属有机化学气相沉积法制备ZnO和ZnO∶Ni薄膜及其特性分析

采用金属有机化学气相沉积法制备了ZnO和ZnO∶Ni薄膜,并对它们的结构、光学和电学特性进行了对比研究.通过扫描电子显微镜( SEM)和X射线衍射(XRD)对薄膜的表面形貌和晶体结构进行了分析,结果表明,Ni元素的掺杂虽然降低了薄膜的晶体质量,但并未改变ZnO的纤锌矿结构.通过紫外-可见分光光度计对薄膜的光学特性进行了...     

半导体硅上电沉积Ni-Pd-P薄膜及其结构

采用控电位的沉积方式在半导体硅上制备出ＮｉＰｄＰ薄膜,结果表明镀液中Ｈ３ＰＯ３含量的增加对Ｐ、Ｎｉ的析出有促进作用,对Ｐｄ的析出有抑制作用．随ｐＨ值的升高,镍含量不断升高,Ｐｄ、Ｐ含量不断下降．Ｐ含量对薄膜内应力有很大影响,含Ｐ质量分数为１４９％的ＮｉＰｄＰ镀层表面上有许多裂缝,当Ｐ含量增加到２６１％时,镀层表面的裂缝已基本消失,继续增加Ｐ含量到３５０％时,裂缝完全消失．ＮｉＰｄＰ镀层的结构与其组成密切相关,Ｐ含量小于２００％的ＮｉＰｄＰ镀层形成的是面心立方结构的固溶体．Ｐ含量大于４００％的薄膜为非晶态结构．     

The inelastic mean free paths of auger electrons in thin films of copper and nickel

The inelastic mean free paths of 600–1000 eV Auger electrons have been determined in Cu and Ni films. Thin films of known thickness were produced by the vapor deposition of Cu on Ni substrates and vice versa. The strengths of the characteristic Auger signals of Cu and Ni were monitored as a function of film thickness. Values of the mean free paths are presented and compared to values previously published by other workers. By monitoring the strengths of the Auger signals from the condensate, it is concluded that backscattering factors for a Ni substrate carrying a Cu film are higher than the backscattering factors for a Cu substrate carrying a Ni film.     

基于LiCo0.8M0.2O2(M=Ni,Zr)薄膜的全固态薄膜锂电池

LiCo0.8M0.2O2 (M=Ni,Zr) films were fabricated by radio frequency sputtering deposition combined with conventional annealing methods. The structures of the films were characterized with X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM) techniques. It was shown that the 700 ±C-annealed LiCo0.8M0.2O2 has an @-NaFeO2-like layered structure. All-solid-state thin-film batteries (TFBs) were fabricated with these films as the cathode and their electrochemical performances were evaluated. It was found that doping of electrochemically active Ni and inactive Zr has different effects on the structural and electrochemical properties of the LiCoO2 cathode films. Ni doping increases the discharge capacity of the film while Zr doping improves its cycling stability.     

二甲基甲酰胺中钬镍合金的电沉积

研究了在二甲基甲酰胺(DMF)体系中钬的电还原及钬与镍的电解共沉积.结果表明,由 于微量水在电极上还原形成不溶的导电性差的膜层,使钬单独沉积很困难.恒电位电解用于 制备钬镍合金, EDAX,SEM和XRD用于分析镀层,得到了黑色粘附性好的非晶态钬镍合金镀层 ,钬的含量可高达72.7％.