Role of adsorbed NO in N2O decomposition over iron-containing ZSM-5 catalysts at low temperatures

Transient response and temperature-programmed desorption/reaction (TPD/TPR) methods were used to study the formation of adsorbed NO(x) from N2O and its effect during N2O decomposition to O2 and N2 over FeZSM-5 catalysts at temperatures below 653 K. The reaction proceeds via the atomic oxygen (O)(Fe) loading from N2O on extraframework active Fe(II) sites followed by its recombination/desorption as the rate-limiting step. The slow formation of surface NO(x,ads) species was observed from N2O catalyzing the N2O decomposition. This autocatalytic effect was assigned to the formation of NO(2,ads) species from NO(ads) and (O)(Fe) leading to facilitation of (O)(Fe) recombination/desorption. Mononitrosyl Fe2+(NO) and nitro (NO(2,ads)) species were found by diffuse reflectance infrared fourier transform spectroscopy (DRIFTS) in situ at 603 K when N2O was introduced into NO-containing flow passing through the catalyst. The presence of NO(x,ads) does not inhibit the surface oxygen loading from N2O at 523 K as observed by transient response. However, the reactivity of (O)(Fe) toward CO oxidation at low temperatures (<523 K) is drastically diminished. Surface NO(x) species probably block the sites necessary for CO activation, which are in the vicinity of the loaded atomic oxygen.     

SiO2—Al2O3和MgO催化剂上吸附CH3NO2的TPD和IR研究

用TPD和IR方法研究了CH_3NO_2在典型固体酸SiO_2-Al_2O_3和固体碱MgO催化剂上的吸附分解。结果表明,在SiO_2-Al_2O_3表面CH_3NO_2吸附转化为表面甲酰胺物种,后者在高温下分解为CO_2和NH_3。在MgO表面CH_3NO_2吸附形成多种表面化学物种,它们在升温过程中脱附,并通过表面亚硝基甲烷物种分解为NO、C_2H_4、C_2H_6和N_2O.讨论了CH_3NO_2分解过程中表面酸、碱中心的作用。     

氧化铈表面NO的热脱附性能

氧化铈表面ＮＯ的热脱附性能＊钟依均（浙江师范大学化学系，浙江金华３２１００４）罗孟飞黄宇增朱波袁贤鑫（杭州大学催化研究所，杭州３１００２８）关键词一氧化氮，热脱附，二氧化铈，表面反应ＣｅＯ２作为汽车尾气净化三效催化剂的助剂，由于其特殊的性能越来越引起...     

Pt/TiO_2催化剂上的氢—氧作用 Ⅰ.氢、氧的吸咐—脱附行为以及相互促进作用

本文采用程序升温脱附(TPD)技术研究了光沉积方法制备的Pt/TiO_2催化剂经过氧化、还原后氧、氢的脱附行为.光沉积过程中,Pt/TiO_2表面上可以生成大量的吸咐氢,在TPD中脱附;同时Pt/TiO_2表面上化学吸附的水在TPD过程中也可以分解释氢.氧化处理的Pt/TiO_2在TPD过程中于550～750K温区出现氧脱附峰,随着氧化温度升高,脱附峰位向高温移动,经实验证明,这种可脱附活泼氧物种的生成是由样品前身中留存氢引起的.还原处理的Pt/TiO_2在TPD过程中分别在300～600和大于600K出现两个氢脱附峰,认为是由于表面羟基和钛—氢(Ti~(4+)—H~-)物种的分解释氢引起的Pt/TiO_2上活泼氧物种的存在,增加了样品在室温条件下的吸氢量;在中温(473～573K)这种活泼氧物种则和氢发生反应,减少了TPD过程中的脱氢量;Pt/TiO_2在大于673K温度还原,可以消除活泼氧物种的影响.     

ZrO2催化剂上吸附CH3NO2的分解

用TPD和IR谱研究了CH_3NO_2在ZrO_2催化剂上的吸附活化和分解反应。结果表明,室温下CH_3NO_2在ZrO_2表面发生不可逆化学吸附,它们在TPD过程中可完全分解生成HCN、CO_2、CO、NH_3、H_2O和微量NO。其中H_2O和NO的脱附峰出现在383K附近。其它产物在543K附近出现极大值。IR结果表明,CH_3NO_2在ZrO_2上吸附形成诸如[CH_2NO_2],和/或吸附物种。这些吸附物种在升高温度时转化为表面态“HCN”。“HCN”或脱附,或进一步向表面“HCONH_2”和/或“HCOO~-”转化,后两种表面物种分解可产生CO_2、NH_3和CO。将这些结果与CH_3NO_2在SiO_2-Al_O_3和MgO催化剂上的结果进行了比较,讨论了酸-碱双功能性ZrO_2催化剂上CH_3NO_2活化分解的特点。     

介质阻挡放电等离子体与吸附在CuZSM-5上的NO或NO/O2的相互作用

采用吸附和程序升温脱附(TPD)技术研究了介质阻挡放电等离子体对CuZSM-5催化剂上吸附的氮氧化物作用. 实验表明, 介质阻挡放电等离子体使催化剂表面吸附的NO及Cu活性位上吸附的NOx物种脱附, 并引发表面化学反应生成新的氮氧化物. 对于NO/N2体系, 介质阻挡放电等离子体与吸附在CuZSM-5上NO作用, 主要生成N2O和O2. 在富氧体系NO/O2/N2, 则生成较大量的N2O、NO2和NO. 等离子体预处理活性下降的CuZSM-5, 可明显提高其催化分解NO活性. 对比有或无介质阻挡放电等离子体预处理NO或NO/O2饱和吸附的CuZSM-5上的NO-TPD结果表明, 等离子体提高催化剂活性的原因与其使催化剂Cu活性位上吸附的NOx物种脱附有关.     

CuO/Al_2O_3催化剂中毒与氧吸附

燃煤烟气属于贫燃燃烧 (燃烧时通入过量空气 )尾气 ,其中除含 NOx、SO2 外还含有 O2 等 ,与非贫燃系统尾气中 NOx 的催化还原脱除相比有着很大的不同 .目前这一领域的研究工作虽然取得一些进展 ,但仍有许多问题尚待解决 [1] .无论是 NOx 的催化还原还是催化分解 ,气相中存在的SO2 对非贵金属及其氧化物催化剂构成了严重威胁 ,原因是非贵金属氧化物很容易吸收 SO2 生成稳定的硫酸盐而使催化剂中毒失活 .为脱除烟气中的 NOx,有报道先将气相中的 NO催化氧化为NO2 ,然后将 NO2 和 SO2 同时液相吸收 .研究表明 ,作为 NO催化氧化的非贵…     

NO气体在TiO2表面的吸附行为

采用TPD (Temperature Programmed Desorption)试验方法测定了NO在TiO₂表面吸附后的脱附谱, 揭示了气体脱附量的变化规律. 结果表明, NO在TiO₂表面吸附后可在两个峰值温度450和980 K脱附出N₂气体, 其活化能分别是0.48 和2.5 eV. TiO₂表面经预覆氧处理后, N₂的脱附量降低. N₂的脱附量随NO气体暴露量增加而增加, 但当气体覆盖度超过一定值后, 脱附量趋于定值. 脱附峰值温度随气体暴露量的增加而降低.     

TPD and FT-IRAS investigation of ethylene oxide (EtO) adsorption on a Au(211) stepped surface

Adsorption of ethylene oxide, CH(2)CH(2)O (EtO), on a Au(211) stepped surface was studied by temperature programmed desorption (TPD) and Fourier transform infrared reflection-absorption spectroscopy (FT-IRAS). Ethylene oxide was completely reversibly adsorbed, and desorbed molecularly during TPD following adsorption on Au(211) at 85 K. EtO TPD peaks appeared at 115 K from the multilayer film and 140 and 170 K from the monolayer. Desorption at 140 K was attributed to EtO desorption from terrace sites, and that at 170 K to EtO desorption from step sites. Desorption activation energies and corresponding adsorption energies were estimated to be 8.4 and 10.3 kcal mol(-1), respectively. The EtO ring (C(2)O) deformation band appeared in IRAS at 865 cm(-1) for EtO in multilayer films and when adsorbed in the monolayer at terrace sites. The stronger chemisorption bonding of EtO at Au step sites slightly weakens the bonding within the molecule and causes a small red-shift of this band to 850 cm(-1) for adsorption at step sites. EtO presumably binds via the oxygen atom to the surface, and observation of the EtO-ring absorption band in IRAS establishes that the molecular ring plane of EtO adsorbed at step and terrace sites is nearly upright with respect to the crystal surface plane.     

Adsorption and dissociation of NO on stepped Pt (533)

We present an experimental and theoretical investigation of the adsorption, desorption, and dissociation of NO on the stepped Pt (533) surface. By combining temperature programmed desorption and reflection absorption infrared spectroscopy, information about the adsorption sites at different temperatures is obtained. Surprisingly, metastable adsorption structures of NO can be produced through variation of the dosing temperature. We also show that part of the NO molecules adsorbed on the step sites dissociates around 450 K. After dissociation the N atoms can desorb either by combining with an O fragment, or with another N atom, resulting in NO and N(2). The N(2) production can be enhanced by coadsorbing CO on the surface: CO scavenges the oxygen atom, thereby suppressing associative recombinative desorption of N and O atoms. Density functional theory calculations are used to reveal the adsorption energies and vibrational frequencies of adsorbed NO as well as barriers for dissociation of NO and for diffusion of N atoms. The combined experimental results and theoretical calculations reveal that dissociation of NO is the rate limiting step in the formation of N(2).     

Enhancement of O2 dissociation on Au111 by adsorbed oxygen: implications for oxidation catalysis

We show that the dissociation probability of O2 on the reconstructed, Au111-herringbone surface is dramatically increased by the presence of some atomic oxygen on the surface. Specifically, at 400 K the dissociation probability of O2 on oxygen precovered Au111 is on the order of 10(-3), whereas there is no measurable dissociation on clean Au111, establishing an upper bound for the dissociation probability of 10(-6). Atomic oxygen was deposited on the clean reconstructed Au111-herringbone surface using electron bombardment of condensed NO2 at 100 K. The dissociation probability for dioxygen was measured by exposing the surface to 18O2. Temperature programmed desorption (TPD) was used to quantify the amount of oxygen dissociation and to study the stability of the oxygen in all cases. Oxygen desorbs as O2 in a peak centered at 550 K with pseudo-first-order kinetics; i.e., the desorption peak does not shift with coverage. Our interpretation is that the coverage dependence of the activation energy for dissociation (deltaE(dis)) and/or preexponential factor (nu(d)) may be responsible for the unusual desorption kinetics, implying a possible energy barrier for O2 dissociation on Au111. These results are discussed in the context of Au oxidation chemistry and the relationship to supported Au nanoparticles.     

The Adsorption and Thermal Decomposition of CH2CO (CD2CO) on Si(111)-7 × 7

The adsorption and thermal decomposition of ketene on Si(l 11)-7 × 7 were investigated using various surface analysis techniques. When the surface was exposed to ketene at 120 K, two CO stretching modes at 220 and 273 meV appeared in HREELS, corresponding to two adsorbed ketene states. After the sample was annealed at ?250 K, the 273 and the 80 meV peaks vanished, indicating the disappearance of one of the adsorption states by partial desorption of the adsorbate. In a corresponding TPD measurement, a desorption peak for ketene species was noted at 220 K. Annealing the sample at 450 K caused the decomposition of the adsorbate, producing CH_x and O adspecies. Further annealing of the surface at higher temperatures resulted in the breaking of the CH bond, the desorption of H and O species and the formation of Si carbide. The desorption of H at 800 K was confirmed by the appearance of the D₂ (m/e = 4) TPD peak at that temperature when CD₂CO was used instead of CH₂CO.     

Water-enhanced low-temperature CO oxidation and isotope effects on atomic oxygen-covered Au(111)

Water-oxygen interactions and CO oxidation by water on the oxygen-precovered Au(111) surface were studied by using molecular beam scattering techniques, temperature-programmed desorption (TPD), and density functional theory (DFT) calculations. Water thermally desorbs from the clean Au(111) surface with a peak temperature of approximately 155 K; however, on a surface with preadsorbed atomic oxygen, a second water desorption peak appears at approximately 175 K. DFT calculations suggest that hydroxyl formation and recombination are responsible for this higher temperature desorption feature. TPD spectra support this interpretation by showing oxygen scrambling between water and adsorbed oxygen adatoms upon heating the surface. In further support of these experimental findings, DFT calculations indicate rapid diffusion of surface hydroxyl groups at temperatures as low as 75 K. Regarding the oxidation of carbon monoxide, if a C (16)O beam impinges on a Au(111) surface covered with both atomic oxygen ( (16)O) and isotopically labeled water (H 2 (18)O), both C (16)O (16)O and C (16)O (18)O are produced, even at surface temperatures as low as 77 K. Similar experiments performed by impinging a C (16)O beam on a Au(111) surface covered with isotopic oxygen ( (18)O) and deuterated water (D 2 (16)O) also produce both C (16)O (16)O and C (16)O (18)O but less than that produced by using (16)O and H 2 (18)O. These results unambiguously show the direct involvement and promoting role of water in CO oxidation on oxygen-covered Au(111) at low temperatures. On the basis of our experimental results and DFT calculations, we propose that water dissociates to form hydroxyls (OH and OD), and these hydroxyls react with CO to produce CO 2. Differences in water-oxygen interactions and oxygen scrambling were observed between (18)O/H 2 (16)O and (18)O/D 2 (16)O, the latter producing less scrambling. Similar differences were also observed in water reactivity toward CO oxidation, in which less CO 2 was produced with (16)O/D 2 (16)O than with (16)O/H 2 (16)O. These differences are likely due to primary kinetic isotope effects due to the differences in O-H and O-D bond energies.     

程序升温脱附研究CoH-FBZ上NOx的吸附

富氧条件下具有FAU和BEA两种拓扑结构的CoH-FBZ选择催化CH4还原NO，显示出较CoH Y和CoH Beta机械混合催化剂更好的催化活性。应用吸附和程序升温脱附(TPD)方法研究了NO和NO+O2与催化剂表面间的相互作用。结果表明，载体的拓扑结构直接影响N、O物种在催化剂表面的稳定性。NO与O2在CoH-FBZ表面形成的吸附态 NOy及NO在CoH-FBZ表面形成的吸附态相对更稳定。CoH-FBZ的NO+O2-TPD脱附曲线在630K和660K形成两个NO2脱附峰，表明在CoH-FBZ表面形成了新的 NOy吸附中心，即可能有新的Co位产生，该新Co位与沸石催化剂CoH-FBZ中新强酸位协同作用，使CoH-FBZ表现出新的CH4-SCR催化特性。     

Carbon-nitrogen place exchange on NO exposed beta-Mo2C

Atomic nitrogen and oxygen were deposited on beta-Mo(2)C through dissociative adsorption of NO. Reflectance absorbance infrared spectroscopy (RAIRS), thermal desorption, and synchrotron X-ray photoelectron spectroscopy (XPS) measurements were used to investigate the interplay between atomic nitrogen, carbon, and oxygen in the 400-1250 K region. The combination of the high resolution and high surface sensitivity offered by the synchrotron XPS technique was used to show that atomic nitrogen displaces interstitial carbon onto the carbide surface. Thermal desorption measurements show that the burnoff of the displaced carbon occurs at approximately 890 K. The incorporation of nitrogen into interstitial sites inhibits oxygen dissolution into the bulk. RAIRS spectroscopy was used to identify surface oxo, terminal oxygen, species formed from O(2) and NO on beta-Mo(2)C.     

The role of Oad in the decomposition of NH3 adsorbed on Ir(110): a combined TPD and high-energy resolution fast XPS study

High energy resolution fast XPS combined with TPD experiments were used to study the effect of chemisorbed oxygen on the adsorption and dissociation of NH(3) on Ir(110). Below 250 K the presence of O(ad) does not influence NH(3) decomposition. Above 250 K O(ad) enhances NH(3) dissociation, which results in three times as much N(2) formation and less molecular NH(3) desorption compared to the experiments without O(ad). The effect of O(ad) can be attributed to destabilization of NH(ad) on the surface, resulting in a further dehydrogenation towards N(ad). The presence of O(ad) on the surface lowers the temperature at which the N(ad) combination reaction takes place by as much as 200 K, due to repulsive interaction between N(ad) and O(ad). NO is formed above 450 K if both N(ad) and O(ad) are present on the surface.     

Interaction of oxygen with TiN(001): N<-->O exchange and oxidation process

This work presents a detailed experimental and theoretical study of the oxidation of TiN(001) using a combination of synchrotron-based photoemission and density functional theory (DFT). Experimentally, the adsorption of O2 on TiN(001) was investigated at temperatures between 250 and 450 K. At the lowest temperature, there was chemisorption of oxygen (O(2,gas)-->2O(ads)) without significant surface oxidation. In contrast, at 450 K the amount of O2 adsorbed increased continuously, there was no evidence for an oxygen saturation coverage, a clear signal in the Ti 2p core level spectra denoted the presence of TiOx species, and desorption of both N2 and NO was detected. The DFT calculations show that the adsorption/dissociation of O2 is highly exothermic on a TiN(001) substrate and is carried out mainly by the Ti centers. A high oxygen coverage (larger than 0.5 ML) may induce some structural reconstructions of the surface. The exchange of a surface N atom by an O adatom is a highly endothermic process (DeltaE=2.84 eV). However, the overall oxidation of the surface layer is thermodynamically favored due to the energy released by the dissociative adsorption of O2 and the formation of N2 or NO. Both experimental and theoretical results lead to conclude that a TiN+mO2 -->TiOx + NO reaction is an important exit channel for nitrogen in the oxidation process.     

N2 emission in NO and N2O reduction on Rh(100) and Rh(110)

The angular distribution of desorbing N(2) was studied in both the thermal decomposition of N(2)O(a) on Rh(100) at 60-140 K and the steady-state NO (or N(2)O) + D(2) reaction on Rh(100) and Rh(110) at 280-900 K. In the former, N(2) desorption shows two peaks at around 85 and 110 K. At low N(2)O coverage, the desorption at 85 K collimates at about 66 degrees off normal towards the [001] direction, whereas at high coverage, it sharply collimates along the surface normal. In the NO reduction on Rh(100), the N(2) desorption preferentially collimates at around 71 degrees off normal towards the [001] direction below about 700 K, whereas it collimates predominantly along the surface normal at higher temperatures. At lower temperatures, the surface nitrogen removal in the NO reduction is due to the process of NO(a) + N(a) --> N(2)O(a) --> N(2)(g) + O(a). On the other hand, in the steady-state N(2)O + D(2) reaction on Rh(110), the N(2) desorption collimates closely along the [001] direction (close to the surface parallel) below 340 K and shifts to ca. 65 degrees off normal at higher temperatures. In the reduction with CO, the N(2) desorption collimates along around 65 degrees off normal towards the [001] direction above 520 K, and shifts to 45 degrees at 445 K with decreasing surface temperature. It is proposed that N(2)O is oriented along the [001] direction on both surfaces before dissociation and the emitted N(2) is not scattered by adsorbed hydrogen.     

Low temperature H2O and NO2 coadsorption on theta-Al2O3/NiAl(100) ultrathin films

The coadsorption of H(2)O and NO(2) molecules on a well-ordered, ultrathin theta-Al(2)O(3)/NiAl(100) film surface was studied using temperature programmed desorption (TPD), infrared reflection absorption spectroscopy (IRAS), and X-ray photoelectron spectroscopy (XPS). For H(2)O and NO(2) monolayers adsorbed separately on the theta-Al(2)O(3)/NiAl(100) surface, adsorption energies were estimated to be 44.8 and 36.6 kJ/mol, respectively. Coadsorption systems prepared by sequential deposition of NO(2) and H(2)O revealed the existence of coverage and temperature-dependent adsorption regimes where H(2)O molecules and the surface NO(x) species (NO(2)/N(2)O(4)/NO(2)(-),NO(3)(-)) form segregated and/or mixed domains. Influence of the changes in the crystallinity of solid water (amorphous vs crystalline) on the coadsorption properties of the NO(2)/H(2)O/theta-Al(2)O(3)/NiAl(100) system is also discussed.     

Acetone and water on TiO2(110): H/D exchange

Isotopic H/D exchange between coadsorbed acetone and water on the TiO2(110) surface was examined using temperature programmed desorption (TPD) as a function of coverage and two surface pretreatments (O2 oxidation and mild vacuum reduction). Coadsorbed acetone and water interact repulsively on reduced TiO2(110) on the basis of results from the companion paper to this study, with water exerting a greater influence in destabilizing acetone and acetone having only a nominal influence on water. Despite the repulsive interaction between these coadsorbates, about 0.02 monolayers (ML) of a 1 ML d6-acetone on the reduced surface (vacuum annealed at 850 K to a surface oxygen vacancy population of 7%) exhibits H/D exchange with coadsorbed water, with the exchange occurring exclusively in the high-temperature region of the d6-acetone TPD spectrum at approximately 340 K. The effect was confirmed with combinations of d0-acetone and D2O. The extent of exchange decreased on the reduced surface for water coverages above approximately 0.3 ML due to the ability of water to displace coadsorbed acetone from first layer sites to the multilayer. In contrast, the extent of exchange increased by a factor of 3 when surface oxygen vacancies were pre-oxidized with O2 prior to coadsorption. In this case, there was no evidence for the negative influence of high water coverages on the extent of H/D exchange. Comparison of the TPD spectra from the exchange products (either d1- or d5-acetone depending on the coadsorption pairing) suggests that, in addition to the 340 K exchange process seen on the reduced surface, a second exchange process was observed on the oxidized surface at approximately 390 K. In both cases (oxidized and reduced), desorption of the H/D exchange products appeared to be reaction limited and to involve the influence of OH/OD groups (or water formed during recombinative desorption of OH/OD groups) instead of molecularly adsorbed water. The 340 K exchange process is assigned to reaction at step sites, and the 390 K exchange process is attributed to the influence of oxygen adatoms deposited during surface oxidation. The H/D exchange mechanism likely involves an enolate or propenol surface intermediate formed transiently during the desorption of oxygen-stabilized acetone molecules.