用迈克耳孙干涉仪测肥皂膜厚度实验的分析

利用白光干涉原理,借助迈克耳孙干涉仪对肥皂膜的厚度进行了非接触测量.在干涉条纹宽窄相同的条件下,对不同层数的肥皂膜进行对比测量;在干涉条纹宽窄不同的条件下,对相同层数的肥皂膜进行对比测量;通过计算给出了膜的中心厚度和不确定度,对比分析了各种条件下测量时误差产生的原因.结果表明:单层、双层膜适合在宽条纹下测量,四层膜适合在窄条纹下测量.     

光滑表面粗糙度Rz参数的一种干涉测量法

介绍了一种光滑表面粗糙度Rz 参数的干涉测量法.该方法用空气膜层上表面与样本表面的基准面平 行的方式来观察等厚干涉条纹, 用干涉条纹间的相对运动来判断样本表面的峰谷, 同时也给出了新的Rz 计算公 式.该方法测量过程较简单、 对仪器要求较低且有助于样本的表面微观形貌分析     

迈克尔逊干涉仪测透明介质厚度及折射率

提出了使用用迈克尔逊干涉仪,改变光源入射方式及观测方式以获得稳定、清晰等厚干涉现象的方法.探究了在光路中插入的被测透明介质如何对等厚干涉条纹产生影响,并导出了被测介质厚度、折射率及旋转角度与等厚干涉条纹移动量之间的关系.实现对透明介质厚度、折射率进行简练、快速的同时测量.     

双曲线等厚干涉条纹的形成及其应用

本文应用薄板纯弯曲理论,导出薄板变形后的中面为鞍形曲面。在变形的透明平板玻璃条中央放一玻璃片巧妙地形成了空气膜,通过干涉装置则能看到平时不多见的双曲线等厚干涉条纹。通过对双曲线干涉条纹两顶点间的距离的测量,可求出相应的     

用等厚干涉测液体的折射率

在等厚干涉的实验中,加入了用劈尖干涉对比法测液体折射率的内容,在不改变劈尖膜的条件下,同时测得空气膜和液体膜的干涉条纹宽度,从而可方便地求出液体的折射率,也使得等厚干涉的实验内容更加丰富和充实．     

超二代微光像增强器Na2KSb(Cs)多碱光电阴极荧光谱研究

利用785 nm波长激光作为激发源,测量了超二代微光像增强器Na2KSb(Cs)多碱光电阴极的荧光谱.试验中发现该荧光谱不是一条光滑的高斯型曲线,而是一条在高斯型荧光谱上叠加了一定频率间隔小锯齿峰的曲线.经实验验证和理论分析证明该荧光谱上的小锯齿峰是一种干涉条纹,与超二代微光像增强器的结构有关.干涉条纹之间的间距与相邻两干涉峰波长的乘积成正比,与超二代微光像增强器的近贴聚焦距离成反比.干涉条纹调制度大小与Na2KSb(Cs)多碱光电阴极的厚度成反比.通过测量超二代微光像增强器Na2KSb(Cs)多碱光电阴极荧光谱上两相邻干涉条纹的间距和调制度,就可以测量或比较出不同超二代微光像增强器Na2KSb(Cs)多碱光电阴极的膜厚、近贴聚焦距离.研究结果对提高超二代微光像增强器阴极灵敏度和分辨力提供了一个有效的分析手段.     

迈克耳孙干涉仪实验中等倾与等厚干涉条纹的判别

仔细研究了迈克耳孙干涉仪实验中产生等倾干涉和等厚干涉的实验条件和它们所产生的条纹的区别．提出了判别迈克耳孙干涉实验中等倾与等厚干涉条纹的依据．从而帮助学生加深对这两种干涉条纹的理解和判别．特别是在反射镜M1与M2不严格垂直时，同样可以观察到类似于等倾干涉的准圆环状条纹．我们对这一现象进行了分析和解释，并首次推导出等厚干涉直条纹任意一点上的微商(aδ/ad=2)为常数的结论，这一结果可以作为对迈克耳孙干涉仪现象的一个补充。     

掠入射法测量液体折射率实验现象分析

掠入射法是基于全反射定律,采用几何光学原理来测量液体折射率的一种方法.文中对掠入射法测量透明液体折射率实验中出现的干涉条纹进行了定量分析,认为在分光计望远镜中观察到的干涉条纹是光线进入辅助透镜和直角棱镜间被测薄液膜干涉形成的,通过定义干涉条纹疏密度,对于薄膜引起的光程差与干涉明纹(或暗纹)间距两者间的关系进行讨论,其讨论的结果与实验结果一致.     

基于点光源的迈克耳孙干涉实验条纹的机理分析

一般国内的大学物理和大学物理实验教材都只介绍干涉圆条纹和直线干涉条纹,用迈克耳孙干涉仪可以调制出椭圆和双曲线干涉条纹;但对条纹形成的理论推导很少涉及．本文根据点光源双光束干涉理论,分析基于点光源照明的迈克耳孙干涉实验中所产生的各种可能的干涉条纹：双曲线形干涉条纹、圆形干涉纹、椭圆形干涉纹及直线形干涉纹的形成条件．本文也对等倾干涉条纹、等厚干涉条纹与既非等倾也非等厚干涉条纹的机理进行分析和比较．通过对每一种干涉图样的解析分析和比较,旨在对迈克耳孙干涉实验有更全面和更深刻的了解．     

关于用干涉仪测膜厚问题的两点讨论

关于用干涉仪测膜厚问题的两点讨论郑永星（天津大学应用物理学系）一、干涉条纹突变移动量的测量问题本刊１９９３年第６期《用迈克尔孙干涉仪测薄膜厚度》一文断言，在迈氏干涉仪的一臂上置人折射率为ｎ的薄膜，因“导致干涉条纹的移动是个突变过程，无法测出干涉条纹移...     

Determination of Thickness and Optical Constants of ZnO Thin Films Prepared by Filtered Cathode Vacuum Arc Deposition

ZnO thin films are prepared on glass substrates by filtered cathode vacuum arc （FCVA） deposition technique. A new method is demonstrated to extract the refractive index, thickness and optical band gap of ZnO thin films from the transmission spectrum alone. The refractive index is calculated from the extremes of the interference fingers. The transmission spectrum is divided into two terms, non-interference term and interference effect term. The thickness of thin films is calculated by simulating the interference term, and the non-interference term is used to calculate optical band gap with the gained thickness. The results are compared with measurements by using an ellipsometry and a scanning electron microscope.     

Method of envelopes for studying a two-film system on a reflecting substrate

For determining the optical constants and the thickness of thin films (including strongly absorbing films) by the spectrophotometric method, we propose to deposit them on intermediate films formed on strongly reflecting substrates. Due to this, an interference pattern depending on the optical constants and the thickness of the film under study will be observed in the reflectance spectrum. The method of envelopes of the extrema in the reflectance spectrum that is based on the iterative approach is developed for studying two-film systems.     

Group refractive index measurement by fringes of equal chromatic order

Fringes of equal chromatic order in transmission across a thin liquid or a thin solid sample inside a wedge interferometer, followed with a grating spectrograph, are produced. A single-shot interferogram of the air and sample regions is recorded. Locations of fringes maxima in the air region are fitted in a numerical procedure based on Cauchy's dispersion function. Then it is used for measuring the interferometric gap thickness. The order of interference in the sample region is represented by a third-order polynomial in the wavenumber for deducing the sample group refractive index. An error analysis of the measured group refractive index is given. The method is applied for measuring the group refractive index of water and mica samples across the visible spectrum. The method measures both the sample thickness and its group refractive index. It is static with no moving parts and suitable for thin liquid or solid samples without immersion liquids.     

Thermal emission stimulated by excitation of metastable states

Waves interference inside thin films creates fine structures in the thermal emission spectrum of film when the magnitude of film thickness is of the same order than the coherence length of light. Here, we present an alternative to the theory of partially coherent light to explain these ripples pattern and easily predict the radiative properties of films in intermediate regime. The starting point of this theory is based on the observation that unlike vacuum, matter supports the presence of unstable electromagnetic waves with a finite lifetime. For thin absorbing films, we demonstrate that many of these metastable states are quantified and can be excited by an external radiation field. A direct connection is then established between the peaks of emission and these modes. These results open new prospects for the theoretical study and modelling of radiative exchanges inside and between microscale media.     

Photoluminescence spectra of doped GaAs films

We have studied the dependence of the photoluminescence (PL) spectrum on the doping level and the film thickness of n-GaAs thin films, both experimentally and theoretically. It has been shown theoretically that modification of the PL spectrum of p-type material by p-type doping is very small due to the large valence-band hole effective mass. The PL spectrum of n-type material is affected by two factors: (1) the electron concentration which determines the Fermi level in the material; (2) the thickness of the film due to re-absorption of the PL signal. For the n-type GaAs thin films under current investigation, the doping level as well as the film thickness can be very well calibrated by the PL spectrum when the doping level is less than 2×10¹⁸ cm^-3 and the film thickness is in the range of the penetration length of the PL excitation laser. PACS 78.20.-e; 78.55.Cr; 78.66.Fd     

透射光谱法测试双面薄膜的光学参数

由于普通的化学气相沉积法制作高掺Sn的二氧化硅薄膜比较容易产生结晶,而溶胶-凝胶法制备薄膜化学组成比较容易控制,可以制作出掺Sn浓度较大的材料。文章采用了溶胶-凝胶的方法制备出了66 mol%和75 mol%两种不同浓度的掺Sn的SiO₂薄膜,用浸渍法多次提拉薄膜以增加薄膜的厚度,之后用紫外-可见分光光度计测量了薄膜的透射光谱。之前基于透射光谱的方法计算玻璃基底上薄膜的光学参数都是针对单面薄膜,该文针对浸渍法产生的双面薄膜,建立了相对应的薄膜模型,并分别用包络线法计算出了两种不同薄膜样品的光学参数。计算结果表明两种不同薄膜样品的折射率随着波长的增加而增加,薄膜的厚度都为900 nm左右。     

PtSi超薄膜厚度的一种检测方法研究

介绍了采用角分辨X-射线光电子解谱(angle resolved X-ray photoelectric spectrum(ARXPS))测试薄膜不同角度光电子能谱强度,计算电子平均自由程,从而计算出PtSi超薄膜厚度的方法,并给出其透射电子显微镜(TEM)晶格象验证结果.实验表明该方法简单易行,适用于其他超薄膜厚度的测量 关键词： PtSi超薄膜 小角度X射线电子能谱 TEM晶格象     

弹流油膜彩色光干涉系统的特性研究

彩色光干涉技术是润滑油膜厚度测量的最有效的方法之一,但对其测量光学理论的研究并不十分透彻。以球-盘弹性流体动压润滑油膜测量装置为对象,建立了彩色光干涉的色度学计算模型,对该系统的干涉条纹和色彩进行了数值模拟与分析。分析结果与实验数据的一致性表明了所建立的模型和分析方法的正确。分析表明:铬膜厚度对图像的色彩和对比度有明显的影响,当其厚度为5～10nm时,能够获得对比度和色彩理想的图像;垫层厚度影响各颜色分量强度分布的初相变;LED光源可产生对比度较好的干涉条纹。     

Crystallization and annealing effects of sputtered tin alloy films on electromagnetic interference shielding

Sn, Al and Cu not only possess electromagnetic interference (EMI) shield efficiency, but also have acceptable costs. In this study, sputtered Sn-Al thin films and Sn-Cu thin films were used to investigate the effect of the crystallization mechanism and film thickness on the electromagnetic interference (EMI) characteristics. The results show that Sn-xAl film increased the electromagnetic interference (EMI) shielding after annealing. For as-sputtered Sn-xCu films with higher Cu atomic concentration, the low frequency EMI shielding could not be improved. After annealing, the Sn-Cu thin film with lower Cu content possessed excellent EMI shielding at lower frequencies, but had an inverse tendency at higher frequencies. For both the Sn-xAl and Sn-xCu thin films after crystallization treatment, the sputtered films had higher electrical conductivity, however the EMI shielding was not enhanced significantly.     

The determination of the refractive index and the thickness of thin films of aluminium oxide on aluminium by the polarimetric method

Formulas for the reflection of light from glass (i. e. a dielectric) coated with a thin non-metallic film are generalized for the case of the reflection of light from a metal coated with a thin non-metallic film, e. g. a film of aluminium oxide on aluminium. It is shown how the refractive index and the thickness of the aluminium oxide film on an aluminium mirror can be determined by measurements in polarized light. In conclusion the results of Drude's classical theory of thin non-metallic films on metallic mirrors are compared with the results obtained by the author on the basis of the interference of light in thin films.