非聚焦电子束照射SiO2薄膜带电效应

采用考虑电子散射、俘获、输运和自洽场的三维数值模型, 模拟了低能非聚焦电子束照射接地SiO₂薄膜的带电效应. 结果表明, 由于电子的迁移和扩散, 电子会渡越散射区域产生负空间电荷分布. 空间电荷呈现在散射区域内为正, 区域外为负的交替分布特性. 对于薄膜负带电, 电子会输运至导电衬底形成泄漏电流, 其暂态过程随泄漏电流的增加趋于平衡. 而正带电暂态过程随返回二次电子的增多而趋于平衡. 在平衡态时, 负带电表面电位随薄膜厚度、陷阱密度的增大而降低, 随电子迁移率、薄膜介电常数的增大而升高;而正带电表面电位受它们影响较小.     

The surface potential of insulating thin films negatively charged by a low-energy focused electron beam

We report on the surface potential characteristics in the equilibrium state of the grounded insulating thin films of several 100 nm thickness negatively charged by a low-energy (<5 keV) focused electron beam, which have been simulated with a newly developed two-dimensional self-consistent model incorporating electron scattering, charge transport and charge trapping. The obtained space charge is positive and negative within and outside the region, respectively, where the electron and hole densities are greater than the trap density. Thus, the surface potential is relatively high around the center, then it decreases to a maximum negative value and finally tends to zero along the radial direction. The position of the maximum value is far beyond the range of e-beam irradiation as a consequence of electron scattering and charge transport. Moreover, a positive electric field can be generated near the surface in both radial and axial directions. The surface potential at center exhibits a maximum negative value in the condition of the ～2 keV energy non-penetrating e-beam in this work, which is supported by some existing experimental data in scanning electron microscopy. Furthermore, the surface potential decreases with the increase in beam current, trap density and film thickness, but with the decrease in electron mobility.     

低能电子束照射接地绝缘薄膜的负带电过程

为揭示低能电子束照射接地绝缘薄膜的负带电过程及其机理,建立了同时考虑电子散射与电子输运的计算模型,综合Monte Carlo方法和有限差分法进行了数值模拟,获得了内部空间电荷、泄漏电流和表面电位随电子束照射的演化规律.结果表明,入射电子因迁移、扩散效应会超越通常的散射区域产生负空间电荷分布,并经过一定的渡越时间后到达接地基板,形成泄漏电流,负带电暂态过程则随着泄漏电流的增加而趋于平衡.在平衡状态下,泄漏电流随电子束能量和电流而增大;薄膜净负电荷量和表面电位随膜厚而增加、随电子迁移率的增大而降低,随着电子束 关键词： 绝缘薄膜 电子束照射 带电效应 数值模拟     

高能电子辐照绝缘厚样品的表面电位动态特性

采用数值计算和实验测量相结合的方法, 阐明了高能电子束照射下绝缘厚样品的表面电位和电子产额动态特性. 结果表明: 由于电子在样品内部的散射和输运, 沿着深度方向, 空间电位先缓慢下降到最小值, 然后逐渐升高并趋近于零; 随着电子束照射, 样品的表面电位逐渐下降, 可至负千伏量级, 电子总产额逐渐增大至一个接近于1的稳定值; 电子束停止照射后, 长时间放置下, 表面电位将逐渐升高, 但带电并不会消除; 表面电位随电子束能量的升高近似线性下降, 随入射角的增大而升高, 而随样品厚度的增大仅略有下降.     

Mechanism of electron beam poled SHG in 0.95GeS2·0.05In2S3 chalcogenide glasses

Utilizing the Maker fringe method, SHG was observed in the 0.95GeS₂·0.05In₂S₃ chalcogenide glass irradiated by the electron beam and the intensity of SH increases with the enhancement of beam current from 15 to 25 nA. According to Raman spectra of the as-prepared and the irradiated one, no distinct micro-structural transformation was found. In this work, the built-in charge model was founded to interpret the poling mechanism of electron beam irradiation, the emission of the secondary electrons and Auger electrons results in the formation of positive region and the absorbed electrons form negative region. The positive region was situated near the poling surface, and the negative region was much deeper than the positive region. Between the two opposite charged regions, a strong space-charge electrostatic field, E_dc, is created, which leads to the nonzero χ⁽²⁾ in the 0.95GeS₂·0.05In₂S₃ glass. The emission of backscattered electrons does no contribution to the formation of E_dc.     

Analysis of microscopic parameters of surface charging in polymer caused by defocused electron beam irradiation

The relationship between microscopic parameters and polymer charging caused by defocused electron beam irradiation is investigated using a dynamic scattering-transport model. The dynamic charging process of an irradiated polymer using a defocused 30 keV electron beam is conducted. In this study, the space charge distribution with a 30 keV non-penetrating e-beam is negative and supported by some existing experimental data. The internal potential is negative, but relatively high near the surface, and it decreases to a maximum negative value at z = 6 μm and finally tend to 0 at the bottom of film. The leakage current and the surface potential behave similarly, and the secondary electron and leakage currents follow the charging equilibrium condition. The surface potential decreases with increasing beam current density, trap concentration, capture cross section, film thickness and electron–hole recombination rate, but with decreasing electron mobility and electron energy. The total charge density increases with increasing beam current density, trap concentration, capture cross section, film thickness and electron–hole recombination rate, but with decreasing electron mobility and electron energy. This study shows a comprehensive analysis of microscopic factors of surface charging characteristics in an electron-based surface microscopy and analysis.     

电子辐照下聚合物介质深层充电现象研究

空间辐射环境中,聚合物介质的深层充放电效应是威胁航天器安全的重要因素之一.文中在Chudleigh和von Berlepsch所发展的电位衰减模型基础上引入传输电流项,考虑了电子入射引起的感应电导率和感应电场的影响,提出了新的分析研究介质材料深层充电规律和特征的模型.通过该模型,分析了不同辐射条件下介质的表面电位、内部电荷与电场分布的变化,并设计实验及援引其他实验数据对模型分析结果进行验证.分析和实验结果表明,聚合物介质在深层充电过程中的平衡电位随着入射电子束流强度和介质电阻率的增加而增大,决定深层充电平 关键词： 深层充电 电荷传输模型 电子束 聚合物     

Self-consistent charging in dielectric films under defocused electron beam irradiation

We clarify the transient and equilibrium charging characteristics of grounded dielectrics due to low-energy defocused electron beam irradiation by a three-dimensional self-consistent simulation model. The model incorporates the electron scattering, transport and trapping. Results show that some electrons can arrive at the grounded substrate due to the internal field and density gradient, forming the leakage current. The transient charging process tends to equilibrium as the surface potential decreases and the leakage electron current increases. The positive and negative space charges are distributed alternately along the beam incident direction. In the equilibrium state, the surface potential and leakage electron current decrease to stable values with increasing film thickness and the trap density, but with decreasing electron mobility. Moreover, the surface potential of the dielectric thin film exhibits a maximum negative value with variation of the beam energy; for example, under the condition of the film thicknesses 0.5 μm and 2 μm, the maximum negative values of surface potentials are -13 V and -98 V in beam energies 2 keV and 3.5 keV, respectively. However, for the thick film, the surface potential decreases with the increase in beam energy.     

Charge contrast of ferroelectric domain walls in ferroelastic terbium molybdate

An extraordinary potential contrast of a plane domain wall forming in the case of excess negative charging of a ferroelastic-ferroelectric Tb₂(MoO₄)₃ sample with a two-domain structure has been detected using a scanning electron microscope. Conditions and features of the formation of this potential contrast (called charge contrast) in the domain wall region are determined. It is shown that the surface is charged at a lower rate in the domain wall region, which is an elastically strained crystal region. The smallest domain wall width determined by the charge-contrast image was 1.6 μm on the average.     

Surface assisted electric transport in Ag2S thin films

Electric transport measurements of thickness-dependent electronic and ionic conductivity of epitaxial Ag₂S films are used to split both kinds of conductivity into bulk and surface components. The established considerable electronic and ionic surface conductances demonstrate unambiguously the co-existance of electronic and ionic space charge regions in the vicinity of silver sulfide free surface oriented along the zone axes []. The parameters of both space charge layers - surface potential, thickness of the space charge region and concentration of the surface compensating charges, are calculated. It is estimated that for intrinsic silver sulfide, the effective surface potential of () Ag₂S surface is negative, its value being about −610 mV at 400 K.     

Effect of electron emission on the charge and shielding of a dust grain in a plasma: A continuum theory

The continuum approximation is used to analyze the effect of electron emission from the surface of a spherical dust grain immersed in a plasma on the grain charge by assuming negligible ionization and recombination in the disturbed plasma region around the grain. A parameter is introduced that quantifies the emission intensity regardless of the emission mechanism (secondary, photoelectric, or thermionic emission). An analytical expression for the grain charge Z _d is derived, and a criterion for change in the charge sign is obtained. The case of thermionic emission is examined in some detail. It is shown that the long-distance asymptotic behavior of the grain potential follows the Coulomb law with a negative effective charge Z _eff, regardless of the sign of Z _d. Thus, the potential changes sign and has a minimum if Z _d > 0, which implies that attraction is possible between positively charged dust grains.     

空间多能电子辐照聚合物充电过程的稳态特性

空间同步轨道上多能电子辐照聚合物的充电过程及其稳态特性是研究和抑制通信卫星静电放电的基础.在同步电子散射-输运微观模型的基础上,采用具有10—400 keV积分能谱分布的多能电子辐照聚酰亚胺样品,进行了多能电子辐照聚酰亚胺充电过程的数值模拟,获得了空间电荷密度、空间电位、空间电场分布和聚合物样品参数条件下的表面电位和最大场强.结果表明,多能电子与样品发生散射作用并沉积在样品内形成具有高密度的电荷区域分布,同时在迁移和扩散的作用下输运至样品底部形成样品电流;充电达到稳态、电子迁移率较小时(小于10-10cm2·V-1·s-1),表面电位绝对值和充电强度随电子迁移率的降低明显加强,捕获密度较大时(大于1014cm-3),表面电位绝对值和充电强度随捕获密度的增大明显加强;聚合物样品厚度对表面电位和充电强度的影响大于电子迁移率、捕获密度和相对介电常数的影响.研究结果对于揭示空间多能电子辐照聚合物的充电现象及微观机理、提高航天器故障机理研究水平具有重要科学意义和价值.     

电介质/半导体结构样品电子束感生电流瞬态特性

电子束照射下电介质/半导体样品的电子束感生电流(electron beam induced current,EBIC)是其电子显微检测的重要手段.结合数值模拟和实验测量,研究了高能电子束辐照下SiO2/Si薄膜的瞬态EBIC特性.基于Rutherford模型和快二次电子模型研究电子的散射过程,基于电流连续性方程计算电荷的输运、俘获和复合过程,获得了电荷分布、EBIC和透射电流瞬态特性以及束能和束流对它们的影响.结果表明,由于电子散射效应,自由电子密度沿入射方向逐渐减小.由于二次电子出射,净电荷密度呈现近表面为正、内部为负的特性,空间电场在表面附近为正而在样品内部为负,导致一些电子输运到基底以及一些出射二次电子返回表面.SiO2与Si界面处俘获电子导致界面附近负电荷密度高于周围区域.随电子束照射样品内部净电荷密度逐渐降低,带电强度减弱.同时,负电荷逐渐向基底输运,EBIC和样品电流逐渐增大,电场强度逐渐减小.由于样品带电强度较弱,表面出射电流和透射电流随照射基本保持恒定.EBIC、透射电流及表面出射电流均随束流呈现近似正比例关系.对于本文SiO2/Si薄膜,透射电流随束能的升高逐渐增大并接近于束流值,EBIC在束能约15 keV时呈现极大值.     

相对论电子束虚阴极静电振荡的粒子模拟

本文运用有限大小粒子模型,用等离子体粒子模拟方法,对相对论电子束的虚阴极振荡作了一维静电粒子模拟。结果表明,在注入电流小于空间电荷极限电流时,电子束能稳定传输并能全部通过。当注入电流超过空间电荷极限电流时,传输是不稳定的,将有部分电子反射,部分通过。空间电荷形成的虚阴极的位置和电势周期性地振荡。电流越大,虚阴极位置越靠近注入面且变化范围越小,虚阴极电势越低且振幅越大,振荡频率越高且大于电子束等离子体频率。     

利用Monte Carlo法计算粒子传输中的空间电荷效应

在电子束印刷(electron-beam lithography)、聚焦离子束(focus ion beam)以及阴极射线管(cathode ray tube)等电子及离子束器件中,束中各粒子之间存在相互作用,产生空间电荷效应。人们对电子及离子束器件中的空间电荷效应已经做了大量的研究。到目前为止,通常采用Monte Carlo法计算粒子输运过程中的离散的空间电荷效应。在此主要研究在束形成区利用Monte Carlo法计算空间电荷效应,并讨论在计算过程中出现的边缘效应,在此基础上提出一些新的处理方法以减小边缘效应,提高计算效率。     

非磁化等离子体填充的相对论返波管的粒子模拟

 对非磁化等离子体填充的相对论返波管进行了粒子模拟分析，结果表明在一定的等离子密度范围内，观察到电子注的良好传输，得到了高功率电磁波输出。等离子体密度变化过程中，输出存在有峰值功率点。通过粒子模拟清晰地观察到注、等离子体及波相互作用的物理过程，并且模拟结果解释了部分实验现象。     

月表尘埃颗粒带电的机理及应用研究

研究月尘颗粒在电子束环境下以及紫外源辐照下的带电机理,利用数值方法模拟月尘颗粒在不同背景环境下的充电过程,以探索月表尘埃颗粒的带电机理,进而便于地面月尘环境模拟装置选择合适的月尘带电方式进行空间模拟实验.给出了尘埃在电子束环境下的充电方程,并将紫外辐射带电与具体应用相结合.通过模拟结果可知,在电子束环境下,月尘表面的电荷数随粒径尺寸增大,随电子枪辐照束斑半径减少,随电子枪流强的增加而增多;在紫外源的辐照下,月尘表面电荷数随颗粒尺寸的增大以及紫外线辐照度的增加而增多.由月尘颗粒受太阳紫外辐照带电的数值模拟结果可知,月尘需要在太阳长时间的辐照下才可以带上可观的电荷数,地面模拟该过程需增加辐照源来加速实验.通过模拟结果的分析比较并结合"空间环境模拟装置"中对月尘舱的设计要求,最终优选紫外源辐照带电方式作为月尘颗粒的带电方案.     

Effects of O2 and N2/H2 plasma treatments on the neuronal cell growth on single-walled carbon nanotube paper scaffolds

The O₂ and N₂/H₂ plasma treatments of single-walled carbon nanotube (SWCNT) papers as scaffolds for enhanced neuronal cell growth were conducted to functionalize their surfaces with different functional groups and to roughen their surfaces. To evaluate the effects of the surface roughness and functionalization modifications of the SWCNT papers, we investigated the neuronal morphology, mitochondrial membrane potential, and acetylcholine/acetylcholinesterase levels of human neuroblastoma during SH-SY5Y cell growth on the treated SWCNT papers. Our results demonstrated that the plasma-chemical functionalization caused changes in the surface charge states with functional groups with negative and positive charges and then the increased surface roughness enhanced neuronal cell adhesion, mitochondrial membrane potential, and the level of neurotransmitter in vitro. The cell adhesion and mitochondrial membrane potential on the negatively charged SWCNT papers were improved more than on the positively charged SWCNT papers. Also, measurements of the neurotransmitter level showed an enhanced acetylcholine level on the negatively charged SWCNT papers compared to the positively charged SWCNT papers.     

高能电子照射绝缘样品的泄漏电流特性

建立了考虑电子散射、输运、俘获和自洽场的数值计算模型, 研究了高能电子束照射下绝缘厚样品的泄漏电流特性, 并采用一个实验平台测量了泄漏电流. 结果表明: 在电子束持续照射下, 电子总产额会下降; 由于电子在样品内部的输运, 样品近表面呈现微弱的正带电, 在样品内部呈现较强的负带电; 样品内部电子会向下输运形成电子束感生电流, 长时间照射下会形成泄漏电流; 随着照射, 泄漏电流逐渐增大并趋于稳定值; 泄漏电流随样品厚度的增大而减小, 随电子束能量、电子束电流的增大而增大. 关键词： 绝缘样品 泄漏电流 电子产额 数值模拟     

Research on Electron Emission from Dielectric Materials by a Monte Carlo Method

The charge accumulation in an insulating material under an electron beam bombardment exerts a significant influence to scanning electron microscopic imaging. This work investigates the charging formation process by a self-consistent Monte Carlo simulation of charge production and transportation based on a charge dynamics model. The charging effect in a semi-infinite SiO₂ bulk and SiO₂ trapezoidal lines on a SiO₂ or Si substrate has been studied. We used two methods to calculate the spatial distributions of electric potential and electric field for two different systems respectively: the image charge method was used to deal with a semi-infinite bulk, and, random walk method to solve the Poisson equation for a complex geometric structure. The dynamic charging behavior depending on irradiation time has been investigated for SiO₂. The simulated CD-SEM images of SiO₂ trapezoidal lines with charging effect included were compared well with experimental results, showing the contrast change of SEM image along with scanning frames due to charging.