Effects of the azimuthal-angle focusing of atoms ejected from the (001) Ni and (001) Au faces

The features of the azimuthal-angle focusing of atoms sputtered from the surfaces of the Ni (001) and Au (001) faces are studied by molecular dynamics using computer simulation. The degree of anisotropy of the azimuthal-angle distribution for atoms sputtered from the (001) Au surface is found to be higher than for atoms sputtered from the (001) Ni face. It is shown that two maxima are observed at comparatively small polar observation angles in the azimuthal-angle distribution in the directions in which Wehner spots are formed, i.e., to the left and to the right of the center of the lens formed by two neighbors closest to the ejected atom. The maxima are shifted from the center with a decrease in the polar observation angle. This feature occurs due to the rainbow scattering effect. The contribution of atoms overfocused with respect to the lens center is studied. All overfocused atoms are found to be strongly blocked. When atoms are ejected from the (001) Au face, the interaction cross section strongly increases due to an increase in the atomic number, and the effects of blocking and focusing appear to be more pronounced.     

Al-50wt% Sn合金的离子溅射研究

用捕获膜技术和卢瑟福背散射(RBS)分析,测定Al-Sn多相合金在30keV Ar⁺离子轰击时Al和Sn的溅射原子角分布。溅射后的样品用扫描电子显微镜(SEM)进行观察,并用电子微探针分析仪(EPMA)对轰击样品(靶点)和未轰击样品作成分分析。结果表明,Al的溅射原子角分布近于cosine形状,而Sn却是over-cosine型角分布。本文给出一个按不同表面形貌特征划分的各元素富集区i进行叠加的产额表达式,Y(θ)=∑Y_i(θ),解释了实验结果。 关键词：     

The ejection of atomic particles from ion bombarded solids

Considerable interest has developed in the last decade in the study of atomic collisions in solids, particularly single crystal solids. This has been heightened by the observation of channelling and the interest in industrial aspects of ion implantation. In the following article, we present an up-to-date account of the work being done on the particles ejected from a single crystal, following ion bombardment. These particles include sputtered atoms and ions, scattered atoms and ions and secondary electrons. An attempt has been made to indicate the similarities and differences, particularly between the energy and angular distributions of these ejected particles. The major link involving the dependence of these distributions of all particles on crystallography is stressed.     

Anisotropic angular distribution of sputtered atoms

The sputtering yield angular distributions have been calculated on the basis of the ion energy dependence of total sputtering yields for Ni and Mo targets bombarded by low-energy Hg⁺ ions. The calculated curves show excellent agreement with the corresponding Wehner's experimental results of sputtering yield angular distributions. This fact clearly demonstrates the intrinsic relation between the ion energy dependence of total sputtering yields and the sputtering yield angular distribution. This intrinsic relation had been ignored in Yamamura's papers [Yamamura, Y. (1982). Theory of sputtering and comparison to experimental data, Nucl. Instr. and Meth., 194, 515–522; Yamamura, Y. (1981). Contribution of anisotropic velocity distribution of recoil atoms to sputtering yields and angular distributions of sputtered atoms, Rad. Eff., 55, 49–55.] due to some obvious mistakes.     

Sputtering of Cu atoms by Ar ions

Sputtering of Cu single-crystal, polycrystal and amorphous targets by 5 keV Ar ions has been studied by the binary collision lattice simulation code Cosipo. The sputtering yields, angular distributions, energy distributions and the space distributions of the original positions of the sputtered Cu atoms have been calculated. The results are discussed within the framework of cascade generations and surface structure.     

Effects of W and Mo crystalline texture on the angular distribution of sputtered atoms

The effects of W and Mo surface crystalline texture on the angular distribution of sputtered atoms were investigated experimentally and by computer simulation. A small-sized planar DC magnetron was used to sputter the target by 200–300 eV Ar⁺ ions. The crystalline texture was formed under rolling of metal foils and during the preparation of metal bars and was controlled by X-ray diffraction analysis. For W and Mo foils, a strong anisotropy of the angular distribution was found. The character of angular distribution was different in the planes oriented perpendicularly and in parallel to the direction of rolling. In the first case, the angular distribution was peaked at the polar angle θ=0, while in the second case, the angular distribution, in addition to a maximum at θ=0, revealed a pronounced maximum at θ≈ 57° and ≈60° for Mo and W, respectively. For bars, no azimuthal anisotropy was observed, but the angular distribution was peaked at θ=37° (Mo) and θ=45° (W). This is in contrast to the case of non-textured Mo and W polycrystals, for which the angular distribution had a maximum at θ=0. Computer simulation technique in combination with the results of X-ray analysis was used to clarify the above experimental findings. It was demonstrated that the angular distribution of sputtered atoms can be successfully used for the determination of the crystalline texture of metals.     

溅射原子角分布与靶点表面形貌的关联研究

27keV的Ar⁺离子垂直轰击处于不同温度的Cd靶,用捕获膜技术和Rutherford背散射谱仪(RBS)测定溅射原子角分布,并对所有样品的靶点形貌进行扫描电子显微镜(SEM)观察。结果发现,所有的角分布都呈over-cosine形状,但是在极角为0°处实验值与cosine值的偏离△,是不同的,在靶温度为150℃时的偏离△_T小于在室温时的偏离△_R,亦即△_T<△_R,提出一个简单的模型对这种溅射角分布 关键词：     

Analytical calculation of atom ejection from the Ni (111), Ni (001), and Au (001) surfaces in frames of a three-dimensional model

Atom ejection from lattice sites at the Ni (111) and Ni (001) surfaces in the azimuthal direction toward the center of a lens consisting of two nearest neighboring atoms in the surface plane is calculated using a developed analytical three-dimensional model. The types of scattering of ejected atoms are classified in frames of the constructed model. It is found that the first and second ejection cones are observed in the sputtering pattern in the case of atom ejection from the Ni (111) surface and that the contribution of strongly blocked atoms to sputtering is considerable. The focusing of sputtered atoms at some angle from the surface normal is observed. A maximum of the polar angular distribution of sputtered atoms is shifted nonmonotonically as the energy increases. It is shown that the energy spent by the ejected atom on the recoiling of the lens atoms can be larger than that spent by this atom to overcome the potential barrier. It is found that small changes in the potential hardness and the binding energy at the magnetic phase transition can lead to a qualitative change in the ejection pattern. The expressions for the final ejection angle and energy in the case of Ni in the f-state are found in the form of an expansion in terms of two small parameters. As one passes from the case of atom ejection from the Ni (001) face to the case of atom ejection from the Au (001) face, the interaction cross section increases significantly because of an increase in the atomic number and the effects of blocking and focusing turn out to be considerable.     

Behavior of the relativistic angular and energy distributions of atoms exposed to a strong and low-frequency circularly polarized laser field

In this Letter, we focus on the theoretical analysis of the relativistic energy and angular distributions of the ejected photoelectrons during the relativistic tunnel ionization of atoms by intense, circularly polarized light.We make a small modification of the general analytical expressions for these distributions. The role of the initial momentum, the ponderomotive potential, and the Stark shift are considered. We also present the maximal angle of electron emission.     

Angular distribution of copper atoms sputtered with energetic ions

Measurements of the angular distribution of copper atoms which are sputtered by noble gas ions within the energy range between 0.1 and 1 MeV have been carried out for different angles of ion incidence. The hemisphere over the target surface could be studied with a microphotometer inside the sputtering chamber and the distributions can be plotted in tri-dimensional diagrams. The results are in principle similar to those obtained at lower energies. The angle of maximum emission varies with ion energy and with the angle of incidence and can be related to the sputtering yield.     

Photoelectron spectra from multiple ionization of atoms in ultra-intense laser pulses

We address the question of the energy and angular distributions of the photoelectrons ejected from rare gas atoms submitted to ultra-intense infrared laser pulses, with peak intensities I(max) approximately 10(18) W/cm (2). Several unsolved issues regarding the angular distributions of the photoelectrons are analyzed. We believe that our results should help to trigger new investigations.     

Delay times in the sputtering of atoms from alkali-halide crystals during low-energy electron bombardment

Delay times in the sputtering of atoms from RbI, RbBr and NaCl by 540 eV electrons were investigated. This was done by simultaneously using the correlation technique and a slotted disc velocity selector. We observed delays in thermally ejected alkali and halogen atoms. These times were found to be independent of target temperature and are ascribed to lifetimes of excitons. Non-thermal halogen atoms are always sputtered without any delay.     

A reversion of atomic segregation under ion bombardment of Nix Pdy alloys

The angular distribution of atoms sputtered from Ni_xPd_y alloys (x, y=1, 5) under 3 and 10 keV Ar⁺ ion bombardment has been studied experimentally and using computer simulations. A collector technique combined with RBS to analyze the distribution of collected material was used. It was found that the Pd/Ni yield ratio increases with the polar ejection angle θ for all targets excluding NiPd₅. This peculiarity of sputtering was explained by a reversion of atomic segregation at high initial concentrations of Pd atoms in the target.     

Temperature dependence of the sputtering yield of surface metal clusters

The method of molecular dynamics has been used to investigate the influence of thermal oscillations of atoms on the sputtering of surface metal nanoclusters. The sputtering of a copper cluster consisting of 75 atoms from the (100) surface of a copper substrate by 200-eV argon ions for the target being at an equilibrium temperature of 0 and 300 K has been simulated. For each temperature, the sputtering yields have been predicted for both the substrate and the cluster and the polar and azimuthal angular distributions of sputtered atoms have been obtained. The procedure of simulation of two-object cluster-substrate systems at equilibrium temperatures other than 0 K is discussed. __________ Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 7, pp. 20–25, July, 2007.     

Classical trajectory calculations of the energy distribution of ejected atoms from ion bombarded single crystals

The energy distribution of particles ejected from single crystal surfaces has been calculated using classical dynamics. The model utilizes a microcrystallite of 4 layers with ~60 atoms/layer which is bombarded by 600 eV Ar⁺ at normal incidence. Calculations have been performed for the clean (100) face of copper as well as for copper with oxygen placed in various coverages and site geometries. The energy distributions for Cu, O, Cu₂, CuO and Cu₃ are reported for this system. The distribution for clean Cu exhibits structure which is shown to arise from preferred ejection mechanisms in the crystal. For oxygen adsorbates, the effect of the oxygen binding energy on the peak in the energy distribution of the ejected oxygen atoms is examined by arbitrarily varying the well-depth of the Cu-O pair potential. In general, higher values of the binding energy produce a maximum in the curve at higher energies and also produce a broader energy distribution. The O₂ and Cu₂ dimer distributions are found to peak at approximately the same energy as the O and Cu curves when compared on a kinetic energy/particle basis, although their widths are considerably smaller. Finally, we predict that the CuO energy distribution should be wider than either the Cu₂ or O₂ distributions since it results from the convolution of the Cu and O distributions which are quite different.     

Photoelectron angular distributions from two-photon ionization of atoms near ionization threshold

Photoelectron angular distributions(PADs) from two-photon ionization of atoms in linearly polarized strong laser fields are obtained in accordance with the nonperturbative quantum scattering theory.We also study the influence of laser wavelength on PADs.For two-photon ionization very close to the ionization threshold,most of the ionized electrons are vertically ejected to the laser polarization.PADs from twophoton ionization of atoms are determined by the second order generalized phased Bessel function at which the ponderomotive parameter plays a key role.In terms of dependence of PADs on laser wavelength,corresponding variations for the ponderomotive parameter are demonstrated.     

Angular distributions of Au and Cu atoms sputtered from Au-Cu alloys by keV Ar+ ion bombardment

Angular distributions of Au and Cu atoms sputtered from Au-Cu alloys under 3 keV AR⁺ ion bombardment were measured to understand the preferential sputtering. The surface composition of sputter-deposited Au-Cu films on substrates mounted at different ejection angles was analyzed by Auger electron spectroscopy and electron probe microanalysis. Although the result indicated that the proportion of sputtered Cu atoms to the Au atoms in the Au-Cu alloy depends on the ejection angle, marked enhancement of the lighter component in the direction normal to the surface has not been observed in spite of the larger mass ratio of the constituent atoms of the Au-Cu alloy.     

Angular distribution of atoms sputtered from germanium by 1–20 keV Ar ions

The angular distribution of atoms sputtered from germanium under 1–20 keV Ar⁺ ion bombardment (normal incidence) has been studied experimentally and using computer simulations. A collector technique combined with Rutherford backscattering to analyze the distribution of collected material was used. In addition, the surface topography was under control. It was found that the experimental angular distribution of sputtered atoms (E ₀=3–10 keV) could be approximated by the function cos ⁿ θ with n≈ 1.65. Such a high value of n is connected with the surface scattering of ejected atoms and a noticeable contribution of backscattered ions to the formation of the sputter flux (the mass effect). The target surface was found to be practically flat even at ion fluencies ～10¹⁸ ions/cm². The results obtained are compared with data from the literature, including our recent data on Si sputtering.     

FeCl+轰击Ag靶的溅射产额非线性增强效应

报道了用FeCl⁺、⁵⁶Fe⁺和³⁵Cl⁺轰击Ag靶的溅射原子角分布和产额测量结果.发现FeCl⁺轰击Ag的原子溅射产额与⁵⁶Fe⁺和³⁵Cl⁺轰击的溅射产额之和相比有大的增强.这种溅射产额增强现象可以用热峰蒸发(thermal spike-evaporation)加上表面拓扑效应(surface topography effect)的理论模型进行解释.