超声引起的SrAl_2O_4:Eu,Dy薄膜的应力发光

为了实现超声探伤和应力发光探伤二者结合,研究了SrAl_2O_4∶Eu,Dy(SAOED)/硅橡胶在超声振动下的应力发光性质。薄膜的微观结构表明,SrAl_2O_4∶Eu,Dy应力发光颗粒被高弹性的硅胶包裹。当超声波作用到薄膜表面时,超声振动可以促使应力发光颗粒周围的硅橡胶发生各种形变,从而使被包裹的应力发光颗粒发生有效形变,产生高效的应力发光。薄膜厚度以及超声频率对SAOED发光薄膜的应力发光有明显的影响。薄膜的超声应力发光强度随着薄膜厚度的增加先增大,当薄膜的厚度为1 mm时达到最大,之后随着薄膜厚度的增加而降低。薄膜的超声应力发光强度与超声频率大小成正比,即使最低频率仅为500 Hz时仍能检测到信号,说明SrAl_2O_4∶Eu,Dy/硅橡胶发光薄膜是一种很有应用前途的无损检测传感器。     

厚度依赖的La_(0.33)Pr_(0.34)Ca_(0.33)MnO_3的磁学性质北大核心CSCD

采用激光脉冲沉积(PLD)方法,在LaAlO3(001)衬底上外延生长了不同厚度的La0.33Pr0.34Ca0.33MnO3薄膜,并研究了薄膜晶格常数及居里温度随薄膜厚度的变化行为.XRD表征结果表明,随着薄膜厚度的增加,LPCMO的c轴长度逐渐减小,反映了衬底对薄膜的应力作用.薄膜磁矩随温度变化的测量结果说明,随着薄膜厚度的减小,TC及TB向低温移动,反映了薄膜厚度或者衬底应力作用对LPCMO磁性的直接影响.     

SrAl2O4:Eu,Ho/树脂应力发光薄膜在焊缝缺陷检测中的应用

采用高温固相法合成SrAl₂O₄∶Eu,Ho应力发光材料。XRD结果表明,所合成的样品较纯,掺杂离子并未改变基质材料的基体结构。将SrAl₂O₄∶Eu,Ho（SAOEH）应力发光粉末与树脂混合制备复合应力发光薄膜。光谱结果表明,薄膜的发光随着厚度的增加而增强;薄膜的SEM结果表明,SAOEH粉体颗粒均匀分散在树脂中。将应力发光薄膜应用于钢板焊缝处背面,应力测试结果表明薄膜应力发光先增强后减弱。当薄膜厚度为0.9 mm时,应力发光最强,且在焊缝处可得到较高的响应值。此外,在循环测试的过程中,应力发光薄膜可对焊板断裂实现实时响应,结合CCD相机可实现钢板焊缝检测的可视化,并对缺陷定位。     

Y_2O_3缓冲层对YBCO超导转变温度的影响（英文）

超导薄膜所受的应力对其临界转变温度Tc具有重要的影响,研究应力对超导薄膜Tc的影响对获得更高Tc材料具有重要意义.本文采用溶胶-凝胶法,在LAO单晶基板上制备了Y2O3/YBCO薄膜,并研究了Y2O3缓冲层对不同厚度YBCO超导薄膜的临界转变温度的影响.研究发现,当YBCO薄膜厚度为90nm时,由于Y2O3和YBCO薄膜的晶格错配,在YBCO/Y2O3薄膜的a-b面内引入了压应力,增加了c轴的晶格常数,结果提高了YBCO薄膜的临界转变温度.当YBCO薄膜的厚度较大时(如230nm),由晶格错配引起的应力通过位错的形式得以释放,YBCO薄膜的Tc变化不大.     

HfO2薄膜生长应力演化研究

薄膜应力的存在是薄膜材料的本征特性,对过程中薄膜应力的测量与精确控制具有重要意义.搭建了基于双光束偏转基底曲率测量装置,再结合薄膜厚度的实时监控,实现了对薄膜应力演化过程的观测.对HfO2薄膜的生长过程做了实时研究.结果显示,在所研究条件下,HfO2薄膜的生长应力随厚度的增加,在360～660 MPa范围内变化;沉积温度越高,沉积真空度越高,张应力越大;在真空度较高的沉积条件下,薄膜应力强烈地受到基底表面的影响,随着薄膜厚度的增加,应力也趋于稳定.     

Ti缓冲层及退火处理对Si(111)基片上生长的ZnO薄膜结构和发光特性的影响

采用反应磁控溅射法在Si（111）基片上制备了带有Ti缓冲层的高c轴取向ZnO薄膜.通过X射线衍射分析和光致荧光光谱测量,研究了Ti缓冲层厚度和退火处理对ZnO薄膜结晶质量和光致荧光特性的影响.研究结果表明,Ti缓冲层的引入可以有效改善Si基片上ZnO薄膜的发光性能,但缓冲层存在一个最佳的厚度.薄膜应力是影响ZnO薄膜紫外荧光发射性能的重要因素,较小的残余应力对ZnO薄膜的紫外荧光发射是有利的,残余应力的存在可以改变ZnO薄膜紫外荧光发射能量.随着退火温度的增加,薄膜中的张应力增大,导致带隙宽度减小以及激子复合跃迁峰逐渐向低能方向移动. 关键词： ZnO薄膜 缓冲层 退火处理 应力分析     

Gd掺杂对无氟金属有机物沉积法制备Y_(1-x)Gd_xBCO薄膜的应力调控

为了揭示Gd掺杂对克服YBa_2Cu_3O_(7-δ)(YBCO)薄膜厚度效应的机制,采用无氟金属有机物沉积法在铝酸镧基底上沉积制备了一系列不同掺杂比例的Y_(1-x)Gd_xBCO薄膜,并且采用X射线衍射、扫描电子显微镜、Raman光谱仪分析薄膜的生长取向、微观形貌以及晶格振动特征,系统地研究了Gd掺杂对应力的调控机制.结果表明:随着Gd掺杂比例的增加,晶体的晶格常数变大,导致膜内的张应力增加,薄膜的c轴取向也随之升高;但是随着Gd含量的进一步增加,会使薄膜结构恶化,性能下降;当Gd:Y的掺杂比例为1:1时,薄膜的c轴晶粒取向最佳,可以有效克服厚度效应.     

Al掺杂ZnO薄膜的厚度对其结构及磁学性能的影响

采用直流磁控共溅的方法在玻璃基底上制备了不同厚度的Al掺杂ZnO薄膜,并在真空和空气中分别退火.利用X射线衍射仪(XRD)和物理性能测量仪(PPMS)对系列薄膜的结构和磁性进行了表征.XRD结果显示:随着膜厚的增加,晶粒尺寸逐渐增大,薄膜的内应力逐渐减小.在空气退火的薄膜样品中观察到了室温的铁磁性,薄膜的饱和磁化强度M_s 随着膜厚的增加而增大,而矫顽力H_c却随着膜厚的增加而减小. 关键词： Al掺杂ZnO薄膜 薄膜厚度 应力 铁磁性     

低真空条件下制备的银薄膜的电阻率特性及结构

研究了在2.2 Pa低真空条件下用直流溅射法制备的银薄膜的电阻率特性和薄膜结构.实验表明,薄膜厚度对薄膜电阻率有显著影响,随膜厚的增加薄膜电阻率降低,在膜厚大于200 nm时趋于稳定,电阻率为2.54×10-8Ω.m.薄膜表面和晶粒间界对传导电子的散射导致了银薄膜电阻率的尺寸效应.研究结果表明,可以在2.2 Pa的低真空条件下制备金属银薄膜,将银靶用于目前大学物理实验课中金属薄膜制备及金属薄膜电阻率测量实验是可行的.     

采用椭偏法结合分光光度法研究极薄银的光学常数

极薄银在滤光片、高反射镜等中有广泛的应用,其光学常数严重影响着膜系的特性。在室温条件下,采用电阻热蒸发技术分别在硅和玻璃基底上沉积5.3 nm~26 nm不同厚度的极薄银薄膜,用TalySurfCCI非接触式轮廓仪测量了薄膜的厚度,研究了不同厚度银薄膜的光学常数n和k。镀制厚度5.3 nm、7.9 nm、14.1 nm、26.0 nm的银薄膜,结果显示极薄银的光学常数与块状银光学常数不同,当膜厚小于14.1 nm时,折射率n在380 nm~600 nm随波长增加而增加,在600 nm~1 600 nm随波长增加缓慢减小至趋于稳定值2.6;消光系数k在380 nm~500 nm随着波长增加而增加,在500 nm~1 600 nm随波长增加而缓慢减小至趋于0不变;当膜厚大于14.1 nm时,折射率随波长增加而增加,消光系数随波长近似呈线性增加。整体上,膜厚增加时折射率减小且趋于块状银的折射率,k随厚度增加而增加并最终趋于块状膜。用此拟合的光学常数代入TFc膜系设计软件计算其透射率,发现与分光光度计测得的透射率吻合较好。     

Two hardening mechanisms in single crystal thin films studied by discrete dislocation plasticity

Two-dimensional discrete dislocation plasticity simulations of the evolution of thermal stress in single crystal thin films on a rigid substrate are used to study size effects. The relation between the residual stress and the dislocation structure in the films after cooling is analyzed using dislocation dynamics. A boundary layer characterized by a high stress gradient and a high dislocation density is found close to the impenetrable film-substrate interface. There is a material-dependent threshold film thickness above which the dislocation density together with the boundary layer thickness and stress state are independent of film thickness. In such films the stress outside the boundary layer is on average very low, so that the film-thickness-independent boundary layer is responsible for the size effect. A larger size effect is found for films thinner than the threshold thickness. The origin of this size effect stems from nucleation activity being hindered by the geometrical constraint of the small film thickness, so that by decreasing film thickness, the dislocation density decreases while the stress in the film increases. The size dependence is only described by a Hall–Petch type relation for films thicker than the threshold value.     

金刚石薄膜的结构特征对薄膜附着性能的影响

在不同实验条件下，用微波等离子体化学气相沉积设备在硬质合金(WC+6%Co)衬底上沉积了 具有不同结构特征的金刚石薄膜.用Raman谱表征薄膜的品质和应力，用压痕实验表征薄膜的 附着性能，考察了薄膜中sp²杂化碳含量、形核密度、薄膜厚度对薄膜附着性能 的影响.结 果表明：sp²杂化碳的缓冲作用使薄膜中sp²杂化碳的含量对薄膜中 残余应力有较大的影 响，从而使薄膜压痕开裂直径统计性地随sp²杂化碳含量的增加而减小；仅仅依 靠超声遗 留的金刚石晶籽提高形核密度并不能有效改变薄膜与硬质合金基体之间的化学结合状况，从 而不能有效提高薄膜在衬底上的附着性能；在薄膜较薄时，晶粒之间没有压应力的存在，开 裂直径并不明显随厚度增加而增加，只有当薄膜厚度增加到一定值，晶粒之间才有较强压应 力存在，开裂直径随厚度的增加而较为迅速地增加. 关键词： 金刚石薄膜 附着性能 2杂化碳')" href="#">sp²杂化碳 成核密度 薄膜厚度     

用于头盔显示液晶像源的透镜薄膜设计与制备

LED已经成为头盔液晶显示的主流背光光源,为了提升LED主视角亮度,减小背光模块的体积,对双自由曲面透镜进行了扁平化设计,形成透镜薄膜,仿真结果表明光线透过透镜薄膜后,存在中心亮度升高、光斑缩小的问题。采用反馈优化方法修改了双自由曲面透镜设计时的能量分布,并重新设计了透镜薄膜,仿真结果表明优化后的光斑尺寸从2.3 mm增加到7.1 mm。采用无掩模直写光刻技术制备了两层透镜薄膜,分别包含一个扁平化后的自由曲面。对包含和不包含透镜薄膜的背光模块进行了测试,测试结果表明:包含透镜薄膜的背光模块平均亮度比不包含的提升了18.1%,设计的透镜薄膜可有效提升LED背光亮度,减小背光模块体积。     

Effect of electromechanical boundary conditions on the properties of epitaxial ferroelectric thin films

The effects of internal stresses and depolarization fields on the properties of epitaxial ferroelectric perovskite thin films are discussed by employing the dynamic Ginzburg-Landau equation (DGLE). The numerical solution for BaTiO₃ film shows that internal stress and the depolarization field have the most effects on ferroelectric properties such as polarization, Curie temperature and susceptibility. With the increase of the thickness of the film, the polarization of epitaxial ferroelectric thin film is enhanced rapidly under high internal compressively stress. With the thickness exceeding the critical thickness for dislocation formation, the polarization increases slowly and even weakens due to relaxed internal stresses and a weak electrical boundary condition. This indicates that the effects of mechanical and electrical boundary conditions both diminish for ferroelectric thick films. Consequently, our thermodynamic method is a full scale model that can predict the properties of ferroelectric perovskite films in a wide range of film thickness.     

The preparation and evaluation of graded multilayer ta-C films deposited by FCVA method

In this study, a series of graded multilayer ta-C films were investigated by varying their sublayer thickness ratios, in which each film sublayer was prepared at different substrate bias by filtered cathode vacuum arc (FCVA) method. The experimental results show that the graded multilayer film structure can effectively decrease the internal stress level of deposited ta-C film, and meanwhile the graded multilayer ta-C films still have high sp³ fractions. The applied substrate bias voltage and sublayer thickness ratio can apparently influence the microstructure characteristics and internal stress of the graded multilayer ta-C films. The graded multilayer ta-C film has larger sp³ fraction when applying a larger negative substrate bias voltage and having a thicker outer sublayer during the film deposition process. However, the internal stress in the as-deposited film also increases with larger thickness of the outer sublayer, and the optimal ratio of sublayer thicknesses is 1:1:1:1 for graded ta-C film with four sublayers.     

Influence of the thickness on structural,magnetic and electrical properties of La0.7Ca0.3MnO3 thin film

We have studied the effect of thickness on the structural, magnetic and electrical properties of La_0.7Ca_0.3MnO₃ thin films prepared by pulsed laser deposition method using X-ray diffraction, electrical transport, magneto-transport and dc magnetization. X-ray diffraction pattern reflects that all films have c-axis epitaxial growth on LaAlO₃ substrate. The decrease in out-of-plane cell parameter specifies a progressive relaxation of in the plane compressive strain as the film thickness is increases. From the dc magnetization measurements, it is observed that ferromagnetic to paramagnetic transition temperature increases with increase in the film thickness. Magneto-resistance and temperature coefficient of resistance increases with film thickness and have maximum value near its metal to insulator transition temperature.     

Shear-induced adhesive failure of a rigid slab in contact with a thin confined film

A rigid-glass prism (square or rectangular base, rectangular cross-section) is sheared off a thin film of silicone elastomer bonded to a glass plate by applying a tangential force at various distances above the prism/elastomer interface. At a given tangential force, the prism starts to slide on the elastomeric film. As the sliding velocity, thus the frictional force, is progressively increased, an elastic instability develops at the interface that results in the formation of numerous bubbles. These bubbles, the lateral dimension of which is comparable to the thickness of the film, move across the interface with speeds 1000 times faster than the overall sliding speed of the glass prism against the PDMS film. It is found that the glass prism continues to slide on the elastomeric film as long as the applied shear stress is less than a critical value. During sliding, however, a normal stress is developed at the interface that decays from the front (i.e. where the force is applied) to the rear end of the prism. When the normal stress reaches a critical value, the prism comes off the film. The critical shear stress of fracture increases with the modulus of the film, but decreases with the thickness following a square root relationship, as is the case with the removal of rigid punches from thin elastomeric films by normal pull-off forces.     

柔性基周期性厚度梯度薄膜的应变效应

可控的表面微结构在柔性电子、仿生器件和能源材料等方面均具有重要的应用价值.本文采用编织铜网作为掩模板,利用磁控溅射技术在柔性聚二甲基硅氧烷(PDMS)基底上制备具有周期分布的厚度梯度金属银薄膜,研究了薄膜在单轴压缩/拉伸过程中的形貌演化规律.实验发现,在单轴机械载荷作用下,银薄膜表面将形成相互垂直的条纹褶皱和多重裂纹.膜厚的梯度变化调制了薄膜的面内应力分布,导致褶皱在膜厚较小处率先形成,并逐渐扩展到膜厚较大区域,而裂纹则基本限定在膜厚较小区域.基于应力理论和有限元计算,对周期性厚度梯度薄膜的褶皱和裂纹的形貌特征、演化行为和物理机制进行了深入分析.该研究将有助于加深对非均匀薄膜体系的应变效应的理解,并有望通过梯度薄膜的结构设计在柔性电子等领域获得应用.     

光学薄膜残余应力分配预测模型计算方法研究

残余应力是光学薄膜研究的一个重要组成部分，它对光学元器件有很大的影响。根据弹性力学原理，基于应变不匹配，提出了一种可以预测薄膜残余应力分配的理论模型计算方法，并将计算结果与干涉仪测量值进行了对比。利用所建立的模型分析了薄膜参数变化时基底残余应力的变化情况。结果表明：所建模型合理；随着镀膜温度的增加，基底总残余应力随镀膜温度升高而呈增大的趋势;本征应力变化不太大；随着基底厚度的减小，基底上下表面应力呈增大的趋势，而薄膜应力则呈减小趋势，但变化趋势很小。基底的中心轴约位于基底上表面以下2／3处。     

Thickness effect on stress,structural, electrical and sensing properties of (0 0 2) preferentially oriented undoped ZnO thin films

Preferentially oriented (0 0 2) ZnO thin films with c-axis-oriented wurtzite structure have been grown on Si (1 0 0) and glass substrates using radio frequency magnetron sputtering. The residual stresses have been determined and calculated via the Stoney formalism. The ZnO thin films have been also characterised by X-ray diffraction and scanning electron microscope, and their stoichiometry was verified by Rutherford backscattering spectroscopy. The evolution of the residual stress was studied as a function of film thickness in the 10–1200 nm range. A growth scenario is proposed and a possible correlation between the residual stress, film’s texture and crystallographic orientation is highlighted. The crystalline quality was found to improve, while the stress values decreased with increasing thickness, and as a ramification the thicker films developed better sensing response to gases. The mechanical (stress) and electrical properties of the films were also investigated as a function of the film thickness, which tended to manifestly improve in dependence on thickness as well. We attribute this to the fact that the thinner films are under vehement misfit stress that declines with increasing the film thickness further.