The use of matrix-specific calibrations for oxygen in analytical glow discharge spectrometry

The performance of glow discharge optical emission spectroscopy and mass spectrometry for oxygen determination is investigated using a set of new conductive samples containing oxygen in the percent range in three different matrices (Al, Mg, and Cu) prepared by a sintering process. The sputtering rate corrected calibrations obtained at standard conditions for the 4 mm anode (700 V, 20 mA) in GD-OES are matrix independent for Mg and Al but not for Cu. The importance of a “blue shifted” line of oxygen at 130.22 nm (first reported by Köster) for quantitative analyses by GD-OES is confirmed. Matrix-specific calibrations for oxygen in GD-MS are presented. Two source concepts—fast flow (ELEMENT GD) and low gas flow (VG9000)—are evaluated obtaining higher sensitivity with the static flow source. Additional experiments using Ar-He mixtures or μs pulsed GD are carried out in ELEMENT GD aiming to improve the oxygen sensitivity.     

Emission characteristics of mixed gas plasmas in low-pressure glow discharges

Glow discharge optical emission spectrometry (GD-OES) with mixed plasma gases is reviewed. The major topic is the effect of type and content of gases added to an argon plasma on the emission characteristics as well as the excitation processes. Emphasis is placed on argon–helium, argon–oxygen, and argon–nitrogen mixed gas plasmas. Results for non-argon-matrix plasmas, such as neon–helium and nitrogen–helium mixtures, are also presented. Apart from the GD-OES, glow discharge mass spectrometry and furnace atomization plasma emission spectrometry with mixed plasma gases are also discussed.     

Direct solid sample analysis of SiC-powders by DC glow discharge and DC-ARC emission spectroscopy

Glow discharge atomic emission spectroscopy (GD-OES) and the classical spectrographic method with a dc arc source (DC-ARC OES) have been applied to the direct analysis of SiC powders. The homogeneity of pellets prepared from mixtures of SiC with copper powder and used for the GD experiments was investigated in detail. Various methods have been tested for the analytical calibration. These have been applied to the direct solid sample analysis of technical SiC powders. The experimental data were evaluated by chemometrical procedures. The results of the two methods have been compared.     

Use of radiofrequency power to enable glow discharge optical emission spectroscopy ultrafast elemental mapping of combinatorial libraries with nonconductive components: nitrogen-based materials

Combinatorial chemistry and high-throughput techniques are an efficient way of exploring optimal values of elemental composition. Optimal composition can result in high performance in a sequence of material synthesis and characterization. Materials combinatorial libraries are typically encountered in the form of a thin film composition gradient which is produced by simultaneous material deposition on a substrate from two or more sources that are spatially separated and chemically different. Fast spatially resolved techniques are needed to characterize structure, composition, and relevant properties of these combinatorial screening samples. In this work, the capability of a glow discharge optical emission spectroscopy (GD-OES) elemental mapping system is extended to nitrogen-based combinatorial libraries with nonconductive components through the use of pulsed radiofrequency power. The effects of operating parameters of the glow discharge and detection system on the achievable spatial resolution were investigated as it is the first time that an rf source is coupled to a setup featuring a push-broom hyperspectral imaging system and a restrictive anode tube GD source. Spatial-resolution optimized conditions were then used to characterize an aluminum nitride/chromium nitride thin-film composition spread. Qualitative elemental maps could be obtained within 16.8 s, orders of magnitude faster than typical techniques. The use of certified reference materials allowed quantitative elemental analysis maps to be extracted from the emission intensity images. Moreover, the quantitative procedure allowed correcting for the inherent emission intensity inhomogeneity in GD-OES. The results are compared to quantitative depth profiles obtained with a commercial GD-OES instrument.     

Feasibility of depth profiling of Zn-based coatings by laser ablation inductively coupled plasma optical emission and mass spectrometry using infrared Nd:YAG and ArF* lasers

The feasibility of depth profiling of zinc-coated iron sheets by laser ablation (LA) was studied using an Nd:YAG laser (1064 nm) with inductively coupled plasma optical emission spectrometry (ICP-OES), and an excimer ArF* laser (193 nm) with a beam homogenizer. The latter was coupled to an ICP with mass spectrometry (ICP-MS). Fixed-spot ablation was applied. Both LA systems were capable of providing depth profiles that approach the profiles obtained by glow discharge optical emission spectroscopy (GD-OES) and electron probe X-ray microanalysis (EPXMA). For Nd:YAG laser an artefact consisting of zinc depth profile signal tailing appeared, enlarging thus erroneously diffusional coating–substrate interface profile. However, the ArF* system partially reduced but not suppressed that phenomenon. For both LA systems the Fe signal from the substrate increased with depth as expected and reached a plateau. The depth resolution (depth range corresponding to 84%–16% change in the full signal) achieved was several micrometers. Ablation rate was found to depend on ablation spot area at constant irradiance. Consequently, ablated volume per shot dependence on pulse energy exhibits deviation from linear course.     

辉光放电发射光谱法测定硅钢薄板中微量硼元素

通过对辉光放电发射光谱参数的优化,以铁元素为内标来消除基体效应,建立了测定硅钢薄板中微量硼元素的方法.优化的实验参数为:放电电压1200V,放电电流50 mA,预溅射时间40 s,积分时间1o s.校准曲线硼元素含量范围0.0001％～0.022％,相关系数大于0.999,测量结果与认定值一致,相对标准偏差小于10％....     

Internal glow discharge-fourier transform ion cyclotron resonance mass spectrometry

A glow discharge (GD) ion source has been developed to work within the high magnetic field of a Fourier transform ion cyclotron resonance (FTICR) mass spectrometer. Characterization of this source revealed that the optimum operating voltage, pressure, and current are significantly lower than those for normal glow discharges. The sputter rate was lowered to 1/30th of that found with a normal glow discharge source operated external to the high magnetic field region. Operation of the GD source closer to the FTICR analyzer cell than with previous experimental designs resulted in improved ion transport efficiency. Preliminary results from this internal GD source have established detection limits in the low parts per million range for selected elemental species.     

辉光放电光谱法定量分析金属材料表面纳米级薄膜的研究

介绍了利用辉光放电光谱法分析金属材料表面的纳米级薄膜。通过优化辉光光源的放电参数，计算标准样品的溅射率。溅射率经校正后，建立各元素的标准工作曲线，从而形成了纳米级薄膜的定量表面分析方法。试验证明，此方法对膜厚的测定具有很好的准确度和精密度，可应用于多种金属材料表面纳米级薄膜的研究。     

The effect of glow discharge sputtering on the analysis of metal oxide films

The potential of radiofrequency glow discharge optical emission spectrometry (rf-GD-OES) for the quantification and the solid-state speciation of metal oxide films has been investigated in this work. Two types of oxide coatings, an iron oxide film deposited on silicon and a chromate conversion coating (CCC), were studied at 700 Pa of pressure and 30 W of forward power. The metal to oxygen ratios in the quantitative depth profiles (Fe/O and Cr/O, respectively) were used to evaluate the oxidation states of iron and chromium in the oxide films, demonstrating the capability of GD-OES technique for depth-resolved solid-state speciation. Furthermore, the effect of glow discharge sputtering on the samples surface in terms of modifications in the surface morphology and species transformations, were investigated by using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The iron and chromium oxidation states were carefully studied by XPS at the original samples surface and at the bottom of GD craters, and a systematic reduction of metal elements was observed after rf-GD-OES analysis. In the case of thin oxide films, preferential sputtering can be considered as a critical factor since oxygen atoms can be preferentially sputtered, leaving a metal-enriched surface and, therefore, promoting the reduction of metal elements. In the present study preferential sputtering was found to be sample dependent, changing the proportion of the metal reduction in the oxide film with its composition. Additionally, alternative sputter-depth-profiling techniques such as secondary ion mass spectrometry (SIMS), femtosecond laser ablation (fs-LA), and XPS ion gun were used for the analysis of the CCC in order to evaluate the reduction of Cr⁶⁺ to Cr³⁺ depending on the sputtering mechanism.     

Studies on the Element Characteristics of Nephrite Minerals from Different Deposits by GD‐MS

Element characteristics of nephrite minerals were determined by glow discharge mass spectrometry (GD‐MS) through surface adherence method. To solve the conductivity problem of non‐conductive nephrite samples, high purity indium pin (>99.9999%) was used as discharge host. During the preparation procedure, a small piece of nephrite sample was ground into powder (about 200 meshes), and then the sample powder was coated on the surface of indium pin to form a rod sample. Typical elements of nephrite minerals were analyzed by GD‐MS, and the relative standard deviations showed that the stability and reproducibility of this method were good. Meanwhile, four nephrite samples from two different deposits were further studied by this method. The GD‐MS results of major elements and trace elements revealed that typical elements of the nephrite minerals from same deposit were similar, and those from different deposits exhibited significant difference. In addition, results of external‐beam proton induced X‐ray emission (PIXE) were consistent with the result of GD‐MS determination. The present approach had been proven to be simple, efficient to perform the rapid screening and multi‐element semi‐quantitative analysis of nephrite samples.     

Analysis of graphitized cast irons by optical emission spectroscopy: matrix effects in the glow discharge and the spark excitation

Graphite has a substantially lower sputtering rate in glow discharge than have the other structural components of graphitized cast irons, which leads to a structure-related matrix effect, consisting of an increasing relative surface coverage by graphite of the sample surface during the initial stage of the GD-OES analysis, and, consequently, to an increasing carbon signal intensity. This effect exists inherently in any multicomponent system with different sputtering rates of the components and should be taken into account in GD-OES quantification. A simple theory is presented to describe quantitatively the changes in relative contributions of different phases to the flux of the sputtered material entering the discharge and a formula is presented, expressing elemental intensity changes as a function of sputtering rates and stoichiometry of the structural components.After reaching the steady state, there are no substantial differences in the GD-OES signal response of the analyzed elements between the graphitic and the white cast irons. To reach this steady state, long preburn times and high sputtering rates have to be used. In the spark atomization/excitation, there are very strong and complex structure-related matrix effects, which make the analysis of graphitic cast irons by spark excitation impossible.     

Detection of Copper Deposition on Anodes of Over-Discharged Lithium Ion Cells by GD-OES Depth Profiling

A method based on glow discharge optical emission spectroscopy (GD-OES) depth profiling is developed to detect copper deposition on graphite electrodes for the first time. Commercial 18650 cells with graphite anodes were subject to Cu dissolution by over-discharge to 0 V. On a first approach, the depth profiles for Cu show significant differences for over-discharged cells compared to a baseline graphite electrode from cells discharged to the end-of-discharge voltage. An accumulation of Cu is found on the anode surface by GD-OES, which is consistent with SEM and EDX. The trend of the total Cu amount is compared with ICP-OES measurements.     

The concept of constant emission yield in GDOES

This review paper describes the evolution of the quantification procedure for compositional depth profiling (CDP) in glow discharge optical emission spectrometry (GD-OES), based on the constant emission yield concept. The concept of emission yield (EY) is defined and ways of measuring it experimentally are discussed. The history of the development of quantitative CDP is reviewed, which shows that all of the different approaches depend on the assumption that the EY is essentially a matrix-independent quantity. Particular emphasis is placed on the dependence of the EY on the plasma parameters of current, voltage, power and pressure. In short, impedance changes (current voltage) can significantly affect the emission yield and should either be corrected mathematically or the impedance should be kept constant by pressure regulation in order to obtain reliable results from GDOES CDP. On the other hand, the effect of varying the pressure on the emission yield can be considered to be minor within the limits of practical operating conditions for most CDP applications. It is worth, however, bearing in mind that varying the discharge pressure has a significant effect on the plasma processes, and does affect the emission yield when these variations are large. The experimental results obtained for the emission yield are related to the results from theoretical model calculations published on the subject.     

Glow discharge excitation and matrix effects in the Zn–Al–Cu system in argon and neon

Matrix effects and other deviations from the standard model of glow discharge optical emission spectroscopy (GD-OES) have been investigated in the Zn–Al–Cu system in a Grimm-type discharge in argon and neon. In ionic spectra of the elements that can be ionized by asymmetric charge transfer with ions of the discharge gas, most observed deviations from the standard model can be explained by variations of the number density of ions of the discharge gas, caused by asymmetric charge transfer reactions with the matrix element. Similar mechanism, but involving metastables of the discharge gas, was observed for the Cu II spectrum in neon. Some matrix effects in atomic spectra of aluminium and possibly also copper suggest that three-body recombination of ions of the discharge gas, assisted by an analyte atom, is responsible for excitation of certain atomic levels of the analyzed elements. Excited atomic states of the analyzed elements have higher fractional populations in neon than argon, by factors that are similar for all three elements and the median of which is slightly less than 3. It is shown which lines are free of matrix effects and suitable for highly accurate analysis of Zn–Al–Cu alloys by GD-OES and how to optimize the calibration model. Neon can be a reasonable alternative to argon as the discharge gas for some applications.     

Effect of operation parameters on the sputtering and emission processes in radiofrequency glow discharge. A comparison with the direct-current mode

In this paper, a comparison of the direct current (DC) and radiofrequency (RF) operating modes in glow discharge optical emission spectrometry (GD-OES) is carried out using the same discharge chamber, based on the Marcus design, powering alternatively with DC or RF energy. The effect of discharge pressure, the DC bias voltages and the delivered power divided by the DC-bias voltage on the sputtering rates, emission intensities and emission yields achieved for conducting materials was investigated in order to characterize both discharge types. Our results show that the effect of plasma variables on sputtering rates and emission yields using a DC-GD based on the chamber described by Marcus, can be considered to follow trends similar to those of the well-known DC-Grimm source. However, if the effect of plasma variables are compared for a DC-GD and a RF-GD, both generated by the same source as designed by Marcus, the behaviour of the DC and RF operations of the source proved to have some differences. Thus, at a fixed delivered power, the sputtering rate in the DC-GD decreases noticeably with pressure while the reverse effect is observed in the RF-GD. Moreover, under selected operating conditions, using the tin emission line (Sn I 380.102 nm), lower sputtering rates and higher emission yields were observed for the RF-GD than for the DC-GD source. Extension of known theoretical expressions and concepts from analytical DC-GD to RF-GD-OES work appears rather involved and is not yet possible.     

Chemical analysis of thin films by means of SS-MS, GD-OES, and XPS demonstrated at Ir-Si thermoelectrica

Analytical methods with low detection limits were used for the investigation of Ir-Si thin films, the physical properties of which vary strongly with the chemical composition and the amount of impurities. It is demonstrated how to solve chemical characterization of different thermoelectric Ir-Si thin films by spark source mass spectrometry (SS-MS), glow discharge optical emission spectroscopy (GD-OES) and X-ray photoelectron spectroscopy (XPS). The combined use of the three different facilities allows the quantification of impurities of elements of the entire periodic system in the ppm range (down to 30 at.-ppm in dependence on the element) incorporated in thin film samples. Additional information about the in-depth distribution of elements or specifically bonded species can be achieved with a high depth resolution.     

Modifying argon glow discharges by hydrogen addition: effects on analytical characteristics of optical emission and mass spectrometry detection modes

An overview of the effects produced by the presence of hydrogen in a glow discharge (GD), generated either in argon or in neon, is given. Extensive work related to the addition of hydrogen to GDs, coupled with optical emission spectrometry (OES) and mass spectrometry (MS), has been published in the last few years in an attempt to explain the processes involved in the discharge of mixed gases. Although numerous experimental results have already been explained theoretically, a complete understanding of the effects brought about by mixing hydrogen with argon (or another discharge inert gas) has not been reported yet. The use of theoretical models implemented using a computer has allowed the importance of some collisional and radiative processes in the inert gas plasma when hydrogen is present to be evaluated. This review shows, however, that both experimental work and theoretical work are still needed. The influence of small quantities of hydrogen on discharge parameters, such as electrical current or dc bias voltage, on crater shapes and on sputtering rates is thoroughly reviewed along with the effect on the analytical signals measured by OES and MS. Also, hydrogen-effect corrections needed to carry out proper calibrations for direct solid quantitative analyses are discussed. Figure Hydrogen induced changes in the Ar glow discharge reactions.     

Development and fundamental investigation of Laser Ablation Glow Discharge Time-Of-Flight Mass Spectrometry (LA-GD-TOFMS)

Glow Discharge (GD) spectroscopy is a well known and accepted technique for the bulk and surface composition analysis, while laser ablation (LA) provides analysis with high spatial-resolution analysis in LIBS (laser-induced breakdown spectroscopy) or when coupled to inductively coupled plasma spectrometry (ICP-OES or ICP-MS). This work concerns the construction of a Laser Ablation Glow Discharge Time-Of-Flight Mass Spectrometry (LA-GD-TOFMS) instrument to study the analytical capabilities resulting from the interaction of a laser-generated sample plume with a pulsed glow discharge. Two ablation configurations were studied in detail. In a first approach, the laser-generated plume was introduced directly into the GD, while the second approach generated the plume inside the GD. The ablated material was introduced at different times with respect to the discharge pulse in order to exploit the efficient ionization in the GD plasma. For both LA-GD configurations, direct ablation into the afterglow of the pulsed glow discharge leads to an ion signal enhancement of up to a factor of 7, as compared to the ablation process alone under the same experimental conditions. The LA-GD enhancement was found to occur exclusively in the GD afterglow, with a maximum ablation S/N occurring in a few hundred microseconds after the termination of the glow discharge. The duration of the enhanced signal is about two milliseconds. Both the laser pulse energy and the position of the ablation plume (with respect to the sampling orifice) were found to affect the amount of mass entering the afterglow region and consequently, the enhancement factor of ionization.     

Quantitative depth profile analysis of metallic coatings by pulsed radiofrequency glow discharge optical emission spectrometry

In recent years particular effort is being devoted towards the development of pulsed GDs because this powering operation mode could offer important analytical advantages. However, the capabilities of radiofrequency (rf) powered glow discharge (GD) in pulsed mode coupled to optical emission spectrometry (OES) for real depth profile quantification has not been demonstrated yet. Therefore, the first part of this work is focussed on assessing the expected advantages of the pulsed GD mode, in comparison with its continuous mode counterpart, in terms of analytical emission intensities and emission yield parameters. Then, the capability of pulsed rf-GD-OES for determination of thickness and compositional depth profiles is demonstrated by resorting to a simple multi-matrix calibration procedure. A rf forward power of 50 W, a pressure of 600 Pa, 1000 Hz pulse frequency and 50% duty cycle were selected. The quantification procedure used was validated by analysing conductive layers of thicknesses ranging from a few tens of nanometer up to about 20 μm and varied compositions (hot-dipped zinc, galvanneal, back contact of thin film photovoltaic solar cells and tinplates).