SiOx interlayer to enhance the performance of InGaZnO-TFT with AlOx gate insulator

We have fabricated indium–gallium–zinc (IGZO) thin film transistor (TFT) using SiO_x interlayer modified aluminum oxide (AlO_x) film as the gate insulator and investigated their electrical characteristics and bias voltage stress. Compared with IGZO-TFT with AlO_x insulator, IGZO-TFT with AlO_x/SiO_x insulator shows superior performance and better bias stability. The saturation mobility increases from 5.6 cm²/V s to 7.8 cm²/V s, the threshold voltage downshifts from 9.5 V to 3.3 V, and the contact resistance reduces from 132 Ωcm to 91 Ωcm. The performance improvement is attributed to the following reasons: (1) the introduction of SiO_x interlayer improves the insulator surface properties and leads to the high quality IGZO film and low trap density of IGZO/insulator interface. (2) The better interface between the channel and S/D electrodes is favorable to reduce the contact resistance of IGZO-TFT.     

Effect of channel thickness on electrical performance of amorphous IGZO thin-film transistor with atomic layer deposited alumina oxide dielectric

We have investigated the electrical performance of amorphous indium–gallium–zinc oxide (α-IGZO) thin-film transistors with various channel thicknesses. It is observed that when the α-IGZO thickness increases, the threshold voltage decreases as reported at other researches. The intrinsic field-effect mobility as high as 11.1 cm²/Vs and sub threshold slope as low as ∼0.2 V/decade are independent on the thickness of α-IGZO channel, which indicate the excellent interface between α-IGZO and atomic layer deposited Al₂O₃ dielectric even for the case with α-IGZO thickness as thin as 10 nm. However, the source and drain series resistances increased with increasing of α-IGZO channel thickness, which results in the apparent field-effect mobility decreasing. The threshold voltage shift (ΔV_th) under negative bias stress (NBS) and negative bias illumination stress (NBIS) were investigated, also. The hump-effect in the sub threshold region under NBS and threshold voltage shift to negative position under NBIS were enhanced with decreasing of α-IGZO channel thickness, owing to the enhancement of vertical electrical field in channel.     

Investigation of the electrical properties and stability of HfInZnO thin-film transistors

In this study, amorphous HfInZnO (a-HIZO) thin films and related thin-film transistors (TFTs) were fabricated using the RF-sputtering method. The effects of the sputtering power (50–200 W) on the structural, surface, electrical, and optical properties of the a-HIZO films and the performance and NBIS stability of the a-HIZO TFTs were investigated. The films’ N_e increased and resistivity decreased as the sputtering power increased. The 100 W deposited a-HIZO film exhibited good optical and electrical properties compared with other sputtering powers. Optimization of the 100 W deposited a-HIZO TFT demonstrated good device performance, including a desirable μ_FE of 19.5 cm²/Vs, low SS of 0.32 V/decade, low V_th of 0.8 V, and high I_on/I_off of 10⁷, respectively. The 100 W deposited a-HIZO TFT with Al₂O₃ PVL also exhibited the best stability, with small V_th shifts of -2.2 V during NBIS testing. These high-performance a-HIZO thin films and TFTs with Al₂O₃ PVL have practical applications in thin-film electronics.     

The effect of post-metal annealing on the electrical performance and stability of two-step-annealed solution-processed In2O3 thin film transistors

In this work, solution-processed indium oxide (In₂O₃) thin film transistors (TFTs) were fabricated by a two-step annealing method. The influence of post-metal annealing (PMA) temperatures on the electrical performance and stability is studied. With the increase of PMA temperatures, the on-state current and off-state current (I_on/I_off) ratio is improved and the sub-threshold swing (SS) decreased. Moreover, the stability of In₂O₃ TFTs is also improved. In all, In₂O₃ TFT with post-metal annealing temperature of 350°С exhibits the best performance (a threshold voltage of 4.75 V, a mobility of 13.8 cm²/V, an I_on/I_off ratio of 1.8 × 10⁶, and a SS of 0.76 V/decade). Meanwhile, the stability under temperature stress (TBS) and positive bias stress (PBS) also show a good improvement. It shows that the PMA treatment can effectively suppress the interface trap and bulk trap and result in an obviously improvement of the In₂O₃ TFTs performance.     

Enhanced electrical stability of flexible indium tin oxide films prepared on stripe SiO2 buffer layer-coated polymer substrates by magnetron sputtering

The electrical stability of flexible indium tin oxide (ITO) films fabricated on stripe SiO₂ buffer layer-coated polyethylene terephthalate (PET) substrates by magnetron sputtering was investigated by the bending test. The ITO thin films with stripe SiO₂ buffer layer under bending have better electrical stability than those with flat SiO₂ buffer layer and without buffer layer. Especially in inward bending text, the ITO thin films with stripe SiO₂ buffer layer only have a slight resistance change when the bending radius r is not less than 8 mm, while the resistances of the films with flat SiO₂ buffer layer and without buffer layer increase significantly at r = 16 mm with decreasing bending radius. This improvement of electrical stability in bending test is due to the small mismatch factor α in ITO-SiO₂, the enhanced interface adhesion and the balance of residual stress. These results indicate that the stripe SiO₂ buffer layer is suited to enhance the electrical stability of flexible ITO film under bending.     

Suppression of bias stress-induced degradation of pentacene-TFT using MoOx interlayer

The bias stress effect in pentacene thin-film transistors (TFTs) with and without MoO_x interlayer was characterized. The device without MoO_x interlayer showed a large threshold voltage shift of 5.1 V after stressing with a constant gate-source voltage of −40 V for 10000 s, while at the same condition, the device with MoO_x interlayer showed a low threshold voltage shift of 1.9 V. The results can be attributed to the stable interface between MoO_x/pentacene and small contact resistance change for the device with MoO_x/Cu electrode. Pentacene-TFTs with MoO_x interlayer showed a high field-effect mobility of 0.61 cm²/V s and excellent bias stability, which could be a significant step toward the commercialization of OTFT technology.     

Superior performance characteristics for the poly(2,5-dimethoxyaniline)–poly(styrene sulfonic acid)-based electrochromic device

We have fabricated an electrochromic (EC) device with poly(2,5-dimethoxyaniline), PDMA, entrapped in poly(styrene sulfonic acid) (PSS) as an electrochromic layer. The device showed improved performances like stability, optical contrast, etc., over the device with a PDMA layer doped by H₂SO₄. In the process of fabrication of the EC device with a sandwich configuration, indium tin oxide (ITO)/PDMA–PSS||poly(ethyleneimine) (PEI)/orthophosphoric acid (H₃PO₄)/WO₃/ITO, electrochemical polymerization of 2,5-dimethoxyaniline (DMA) was performed with PSS as electrolyte and ITO coated glass as working electrode. The performance characteristics of EC device, like optical contrast, stability, switching time, etc., were followed by cyclic voltammetry, double potential step chronoamperometry and in-situ spectroelectrochemistry. The device was operated in between − 1 V and + 1 V, and absorption characteristics were followed by in-situ UV–visible spectroscopy. A visible contrast in color upon switching the potential from − 1 V to + 1 V was noticed for the device. The device was pale yellow at − 1 V and dark green at + 1 V. Incorporation of PSS into PDMA resulted enhancement in the performance of the complementary electrochromic device. The optical contrast of the device was improved by incorporating PSS into PDMA matrix. The device retained nearly 50% of their optical contrast after 10,000 double steps informing the superior performance of PDMA–PSS in the EC device.     

Electrical and optical properties of Si-doped indium tin oxides as transparent electrode and anti-reflection coating for solar cells

We have studied the electrical and optical properties of Si-doped indium tin oxides (ITSOs) as transparent electrodes and anti-reflection coatings for Si-based solar cells. The ITSO thin films were obtained by co-sputtering of ITO and SiO₂ targets under target power control. The resistivity of the ITSO thin films deposited at 0.625 in terms of power ratio (ITO/SiO₂) were 391 Ωcm. In this condition, the ITSO thin films showed very high resistivity compared to sputted pure ITO thin films (1.08 × 10⁻³ Ωcm). However, refractive index of ITSO thin films deposited at the same condition at 500 nm is somewhat lowered to 1.97 compared to ITO thin films (2.06). The fabricated graded refractive index AR coatings using ITO, ITSO, and SiO₂ thin films kept over 80% of transmittance regardless of their thickness varing from 97 nm to 1196 nm because of their low extinction coefficient. As the AR coating with graded refractive indices using ITO, ITSO, and SiO₂ layers was applied to general silicon-based solar cell, the current level increased nearly twice more than that of bare silicon solar cell without AR coating.     

ITO: Zr bi-layers deposited by reactive O2 and Ar plasma with high work function for silicon heterojunction solar cells

We report the influence of reactive oxygen (O₂) and argon (Ar) plasma based ITO:Zr bi-layers for silicon heterojunction (SHJ) solar cells. The purpose of reactive O₂ sputtered ITO:Zr was to improve the Hall mobility and work function while the Ar based ITO:Zr films play an important role to maintain good electrical characteristics. The thickness of reactive O₂ based ITO:Zr films was fixed at 15 nm while Ar based films was varied from 65 to 125 nm, respectively. ITO:Zr bi-layers with the thickness of 15/105 nm deposited by O₂ and Ar plasma, respectively, showed lowest resistivity of 2.358 × 10⁻⁴ Ω cm and high Hall mobility of 39.3 cm²/V · s. All ITO:Zr bi-layers showed an average transmittance of above 80% in the visible wavelength (380–800 nm) region. Work function of ITO:Zr bi-layers was calculated from the X-ray photoelectron spectroscopic (XPS) data. The ITO:Zr work function was enhanced from 5.3 eV to 5.16 eV with the variation of ITO:Zr bi-layers from 15/65 to 15/125 nm, respectively. Front barrier height in SHJ solar cells can be modified by using TCO films with high work function. The SHJ solar cells were fabricated by employing the ITO:Zr bi-layer as front anti-reflection coating. The SHJ solar cells fabricated on ITO:Zr bi-layer with the thickness of 15/105 nm showed the best photo-voltage parameters as; V_oc = 739 mV, J_sc = 39.12 mA/cm², FF = 75.97%, η = 21.96%.     

MoO3/Ag/MoO3 top anode structure for semitransparent inverted organic solar cells

In this study, we fabricated semitransparent polymeric solar cells with an inverted structure, with the structure being indium tin oxide (ITO)/cesium carbonate (Cs₂CO₃)/poly(3-hexylthiophene) (P3HT):1-(3-methoxycarbonyl)propyl-1-phenyl[6,6]C61(PCBM)/transparent multilayer. The structure of the transparent multilayer (DMD multilayer), which acted as the anode, was MoO₃ (1–40 nm)/Ag (10 nm)/MoO₃ (0–80 nm). The inner MoO₃ layer showed a great performance changes depending on the variation of thickness, while the outer MoO₃ layer showed relatively slight changes. The best performance was observed with the of anode DMD multilayer thickness of 6/10/40 nm and with the illumination from the ITO side in organic solar cell devices. High performance result was observed in high reflectance and low transmittance of the DMD layer.     

Structural and electrical properties of AlN films deposited using reactive RF magnetron sputtering for solar concentrator application

AlN is an interesting material with some excellent properties like high hardness (>11 GPa), high temperature stability (>2400 °C), good electrical resistivity (>10¹⁰ Ω cm), and good thermal conductivity (>100 W/m K). These properties make it useful in the field of photo voltaic systems. Cooling of solar cells in solar concentrator application is of major concern because high temperature reduces their efficiency. In the present work we deposited AlN coating, with and without an Al interlayer, on various substrates like Si, quartz, and copper using RF magnetron sputtering. Deposition conditions such as Al interlayer (deposition time = 5-20 min), Ar:N₂ ratio (N₂% = 0-75%) and substrate bias (0 and −50 V) were changed in order to study their effect on coating properties. Coating surface roughness increased from 0.05 to 0.15 μm with increase in Al interlayer thickness. The coating thickness decreased from 4.4 to 3.1 μm with increase in N₂ gas % and films grew in (0 0 2) orientation. Films deposited on copper using Al interlayer showed good electrical resistance of ∼10¹³ Ω. Films deposited on copper without Al interlayer showed presence of voids or micro cracks and poor electrical properties. AlN films deposited at −50 V bias show cracking and delamination.     

Enhancement of electrical stability of a-IGZO TFTs by improving the surface morphology and packing density of active channel

a-IGZO films were deposited on Si substrates by d.c sputtering technique with various working power densities (p_d) in the range of 0.74–2.22 W/cm². The correlation between material properties and their effects on electrical stability of a-IGZO thin-film transistor (TFTs) was studied as a function of p_d. At a p_d of 1.72 W/cm² a-IGZO film had smoothest surface roughness (0.309 nm) with In-rich and Ga-poor cation compositions as a channel. This structurally ordered TFTs exhibited a high field effect mobility of 9.14 cm²/Vs, a sub-threshold swing (S.S.) of 0.566 V/dec, and an on–off ratio of 10⁷. Additionally, the V_th shift in hysteresis loop is almost eliminated. It was shown that the densification of the a-IGZO film resulted in the reduction of its interface trap density (1.83 × 10¹² cm^?2), which contributes for the improvement in the electrical and thermal stability.     

Influence of thickness of functional layer on performance of organic salt-doped OLED with ITO/PVK:PBD:TBAPF6/Al structure

The effect of thickness of functional layer on the electrical and electroluminescence (EL) properties of single-layer OLED with ITO/PVK:PBD:TBAPF₆/Al structure were investigated where indium tin oxide (ITO) was used as anode, poly(9-vinylcarbazole) (PVK) as polymeric host, 2-(4-biphenylyl)-5-phenyl-1,3,4-oxadiazole (PBD) as electron-transporting molecule, tetrabutylammonium hexafluorophosphate (TBAPF₆) as organic salt dopant and aluminium (Al) as cathode. A unique transition phenomenon at high bias voltage in the devices was observed and the transition was reversible. The transition voltage and turn on voltage decreased with the decrease of functional layer thickness. The turn on voltage was approximately 5.5 V and 6.5 V for 55-nm-thick and 95-nm-thick devices, respectively. However, the current efficiency of 95-nm-thick device was higher than the 55-nm-thick device. More interestingly, the Commission Internationale d’Eclairage (C.I.E.) coordinates of EL spectra of 95-nm-thick device at bias voltage ranging from 7 V to 13 V located in the white light region even without any dye doping. The PL and EL spectra were found completely different. PBD electromer was proposed to dominate the EL spectrum, but the contribution from PVK–PBD electroplex cannot be completely ruled out.     

Improvement of performance of tetraphenylporphyrin-based red organic light emitting diodes using WO3 and C60 buffer layers

One of the porphyrin derivatives, meso-tetraphenylporphyrin (TPP), has been synthesized and examined as an emitter material (EM) for efficient fluorescent red organic light-emitting diodes (OLEDs). By inserting a tungsten oxide (WO₃) layer into the interface of anode (ITO) and hole transport layer N,N′-Di-[(1-napthyl)-N,N′-diphenyl]-(1,1′-biphenyl)-4,4′-diamine (NPB) and by using fullerene (C₆₀) in contact with a LiF/Al cathode, the performance of devices was markedly improved. The current density–voltage–luminance (J–V–L) characterizations of the samples show that red OLEDs with both WO₃ and C₆₀ as buffer layers have a lower driving voltage and higher luminance compared with the devices without buffer layers. The red OLED with the configuration ITO/WO₃ (3 nm)/NPB (50 nm)/TPP (60 nm)/BPhen (30 nm)/C₆₀ (5 nm)/LiF (0.8 nm)/Al (100 nm) achieved the high luminance of 6359 cd/m² at the low driving voltage of 8 V. At a current density of 20 mA/cm², a pure red emission with CIE coordinates of (0.65; 0.35) is observed for this device. Moreover, a power efficiency of 2.07 lm/W and a current efficiency of 5.17 cd/A at 20 mA/cm² were obtained for the fabricated devices. The study of the energy level diagram of the devices revealed that the improvement in performance of the devices with buffer layers could be attributed to lowering of carrier-injecting barrier and more balanced charge injection and transport properties.     

VO2 thin films based active and passive thermochromic devices for energy management applications

VO₂ thin films were fabricated by argon ion beam assisted non-reactive ac dual magnetron sputtering followed by carefully controlled thermal oxidation. This method is known to give high quality compact thin films with uniform high deposition rates. Thin films deposited on both bare glass and indium tin-oxide (ITO) coated glass substrates were studied, respectively, as passive and active thermochromic devices for their electrical and optical switching behaviors. Thin films varying in thicknesses from 65 to 250 nm were investigated. ITO film was used as an integrated heating device to activate the phase transition via an applied bias voltage. Such structures were found to bear several advantages from an application point of view.     

Microstructure evolution of room-temperature-sputtered ITO films suitable for silicon heterojunction solar cells

Thickness influence on structural, optical and electrical properties of sputtered indium tin oxide (ITO) with thickness ranging from 60 up to 430 nm films has been studied. At the increase of the film thickness crystallinity degree and grain size increased, whereas tensile structural distortion as well as resistivity decreased. It was observed that a microstructure evolution takes place: the initial amorphous layer evolved in polycrystalline phase, with a grain–subgrain surface morphology. Carrier concentration increased at the increase of the film thickness and a general relationship between electrical characteristics and structural distortion has been found. In thinner films larger tensile distortion allowed to include larger amount of interstitial O and/or Sn atoms in the lattice. An appreciable impact of the thickness was also observed on electro-optical properties in terms of changes in energy gap, resistivity and optical absorption. Silicon heterojunction solar cells have been produced and J_sc as high as 33.0 mA/cm² has been obtained.     

Improvement of Cu–CeO2 anodes for SOFCs running on ethanol fuels

Ethanol is considered to be an attractive green fuel for solid oxide fuel cells (SOFCs) due to several advantages. In this paper, we presented recent progress of our group in Cu–CeO₂ anodes for SOFCs with ethanol steam as a fuel. Cu–CeO₂–ScSZ (scandia stabilized zirconia)anodes with different ratios of copper versus ceria were fabricated and the impedance spectra of symmetric cells were measured to optimize the anode composition. Area specific resistance (ASR) of these anodes was examined to prove the thermal stability of them, and possible reasons for degradation were analyzed. Furthermore, a Ni–ScSZ interlayer was added between Cu–CeO₂–YSZ (yttria stabilized zirconia) anode and ScSZ electrolyte to improve the anode performance, and the three-layer structure was fabricated by acid leaching of nickel and wet impregnation method. The maximum power density of the single cell reached 604 mW cm^? 2 and 408 mW cm^? 2 at 800 °C in hydrogen and ethanol steam respectively, and the cell obtained stable output in ethanol steam over an operation period of 50 h.     

Impedance characteristics of ITO/Alq3/Al organic light-emitting diodes depending on temperature

Temperature-dependent impedance characteristics of ITO/Alq₃/Al organic light-emitting diodes were studied in the frequency range from 40 to 10⁸ Hz, and the temperature was varied from 10 to 300 K. At each temperature, the frequency-dependent complex impedance was measured under discrete bias voltages from −6 to +20 V, and the voltage-dependent impedance was measured at 10² Hz, 10³ Hz, 10⁴ Hz, and 10⁵ Hz. A Cole–Cole plot shows that there is one relaxation, and a parallel capacitor–resistor network in series with a contact resistance could be considered as an equivalent electrical circuit to this device. As the temperature decreases, a radius in the Cole–Cole plot increases, which indicates an increase of resistance of the device.     

ITO-free inverted organic solar cells fabricated with transparent and low resistance ZnO/Ag/ZnO multilayer electrode

Inverted organic solar cells (OSCs) based on poly (3-hexylthiophene) (P3HT):[6,6]-phenyl-C61 butyric acid methyl ester (PCBM) bulk heterojunctions (BHJ) were fabricated with optimized ZnO/Ag/ZnO multilayer and conventional indium–tin oxide (ITO) cathode electrodes and their performance was compared. The ZnO/Ag/ZnO multilayer films showed sheet resistances in the range 3.6–3.9 Ω/sq, while ITO exhibited 14.2 Ω/sq. On the one hand, the carrier concentration gradually decreased from 1.74 × 10²² to 4.33 × 10²¹ cm⁻³ as the ZnO thickness increased from 8 to 80 nm, respectively. The transmittance of the ZnO(40 nm)/Ag(19 nm)/ZnO(40 nm) films was ∼95% at 550 nm, which is comparable to that of ITO (∼96%). The multilayer films were smooth with a root mean square (RMS) roughness of 0.81 nm. OSCs fabricated with the ZnO(40 nm)/Ag(19 nm)/ZnO(40 nm) film showed a power conversion efficiency (2.63%) comparable to that of OSCs with a conventional ITO cathode (2.71%).     

Time-dependent performance of mixed-conducting SOFC cathodes

The time-dependent degradation of anode-supported Solid Oxide Fuel Cells (SOFCs) with La_0.58Sr_0.4Co_0.2Fe_0.8O_3−δ (LSCF) cathodes has been studied. Eight SOFCs have been tested over a period of 1000 h under different operation conditions to investigate the influence of different operation parameters on the degradation of the electrochemical performance. The cells were tested at 700 or 800 °C, at 0.3 or 0.6 A/cm² and with 21% or 5% O₂ at the cathode side and showed performance losses of 2–4% per 1000 h. While an elevated temperature and an elevated oxygen partial pressure had a negative influence on long-term performance, the current density did not have a clear effect. Material analysis of the cells showed a formation of SrZrO₃ at the interface of the Ce_0.8Gd_0.2O_2−δ interlayer and the yttria stabilized zirconia (8YSZ) electrolyte during sintering of the cathode. There are indications of a further formation of this phase during the electrochemical characterization obtained from X-ray diffraction analysis on LSCF–YSZ powder mixtures that were exposed to 800 °C for 200 h.