质子轰击钨靶表面时的电子发射产额与靶温度的相关性研究

在中国科学院近代物理研究所兰州重离子加速器国家实验室测量了能量为50~250 keV 的质子入射不同温度下钨靶表面的电子发射产额。实验结果发现,不同能量的质子引起的电子发射产额均随着靶温度的升高而降低;利用功函数对温度的依赖性定性地解释了该结果。在不同靶温度下,总电子发射产额与电子能损的比值随着质子能量的增加而逐渐变小;利用靶原子不同壳层中电子之间的电离竞争机制来解释实验结果。     

近程碰撞对He+离子诱发背向电子发射贡献比例的计算

用Monte Carlo方法模拟了高速He+离子入射到C，Cu和Al固体表面所诱发的电子发射.用这个程序计算了背向的电子发射产额，并且同时计算了近程碰撞对总的背向电子发射产额的贡献比例，对C，Cu和Al其值分别是05，055和0.42.对在近程碰撞中产生的高能δ电子（E＞10O eV）对背向电子发射行为的影响也进行了详尽地讨论，只有那些能量为几百个eV的δ电子对产额的贡献比例较大.对于C靶，δ电子对电子阻止本领最大值附近的二次电子发射行为会产生影响.计算所得到的电子发射产额与实验结果符合得很好. 关键词： 二次电子发射 Monte Carlo模拟 近程碰撞 δ电子     

高入射能量下的金属二次电子发射模型

基于高入射能量电子产生二次电子发射的物理过程, 分别对高入射能量电子产生的真二次电子和背散射电子的概率进行理论分析与建模. 利用Bethe能量损失模型和内二次电子逸出概率分布, 推导出高入射能量电子产生有效真二次电子发射的系数与入射能量的关系式; 根据高入射能量电子在材料内部被吸收的规律, 推导出高入射能量电子产生背散射电子的系数与入射能量之间的关系式. 结合两者得到高入射能量下金属的二次电子发射模型. 利用该模型计算得到典型金属材料Au, Ag, Cu, Al的二次电子发射系数, 理论计算结果与采用Casino软件模拟金属内部散射过程得到的数值模拟结果相符. 关键词： 二次电子发射 高入射能量 金属表面 散射过程     

Experimental study and Monte Carlo simulation of the correlation between electron emission and stopping power for swift proton impact on amorphous carbon target

It is usually well accepted that for swift protons, the induced backward and forward electron emission yield is proportional to the projectile electronic stopping power. This was observed in particular for thin amorphous carbon foils. However, this law was established from a non extensive set of experimental data and somewhat confirmed by rough macroscopic theories. We then developed a standard Monte Carlo simulation to predict the yield dependence on proton energy [0.5–10 MeV] and for a wide range of foil thickness. After evaluating the reliability of this simulation, we showed and explained why the law of proportionality cannot generally hold for forward electron emission. In particular, the ratio between forward yield and stopping power generally depends on foil thickness and proton energy. We performed a new experiment that confirmed our theoretical predictions. Received 9 March 2001     

Excitation of Autoionization States and Electronic Stopping Powers at Collisions of Slow Ions with a Solid

It has been shown that the excitation of autoionization states at collisions of keV ions with a solid is decisive for inelastic energy loss and, correspondingly, the electronic stopping power dE/dx. It has been proposed to estimate the electronic stopping power dE/dx using the relation of cross sections for the excitation of autoionization states to ionization cross sections. When ionization cross sections are unknown, scaling is used to calculate ionization cross sections at the excitation of the L and M shells. A threshold dependence of the electronic stopping power dE/dx on the energy of bombarding ions has been predicted.     

不同离子激发Au靶的多电离效应

重离子与固体表面相互作用时,会引起靶原子内壳层的电离,相应空穴退激过程中发射的X射线对研究重离子与固体表面的相互作用有着重要意义,可为相关研究提供基础数据.目前,在K和L壳层电离方面做了一些工作,而M壳层的研究较少,本文依托兰州重离子加速器国家实验室320 kV高电荷态离子综合研究平台,测量了不同能量的H~+, Ar~(8+), Ar~(12+), Kr~(13+)和Eu~(20+)离子与Au表面作用产生的特征X射线谱及其能移,计算了X射线的产额比值.结果表明:重离子引起了靶原子内壳层的多电离,多电离效应使Au的MX射线有不同程度的能移;多电离程度取决于入射离子能量、离子的原子序数和其外壳层的空穴数量.     

50~250 keV质子入射SiC和Si靶时的电子发射特性研究

在中国科学院近代物理研究所兰州重离子加速器国家实验室测量了能量范围为50~250 keV 的质子入射碳化硅靶和硅靶表面的电子发射产额。实验结果发现,两种半导体靶材的电子发射产额随质子入射能量变化趋势均与作用过程中电子能损随质子入射能量的变化趋势相似。通过分析电子发射的能量来源,发现实验中电子发射产额主要由动能电子发射产额贡献,势能电子发射产额可以忽略不计。两种靶材的电子发射产额均近似地正比于质子入射靶材过程中的电子能损,比例系数B随入射能量略有变化。     

Energy loss by keV ions in silicon

Using silicon photodiodes with an ultrathin passivation layer, the average total energy lost to silicon target electrons (electronic stopping) by incident low energy ions and the recoil target atoms they generate is directly measured. We find that the total electronic energy deposition and the ratio of the total nuclear to electronic stopping powers for the incident ions and their recoils each follow a simple, universal representation, thus enabling systematic prediction of ion-induced effects in silicon. We also observe a velocity threshold at 0.05 a.u. for the onset of electronic stopping.     

高速H2+离子轰击C靶诱发二次电子的发射行为与入射角的关系

运用Monte-Carlo方法结合半经验理论研究了高速H2+离子轰击C靶诱发二次电子的发射行为与入射角的关系。分别研究了电子发射产额与入射角以及发射统计性与入射角的关系。结果表明，由于H2+上的价电子的影响使得背向电子发射产额不遵守余弦倒数关系。斜入射时候的前向与背向电子产额的比值跟正入射时的情况不同。电子的发射统计跟入射角没有关系。标志偏离Poission分布的值 b，随入射能量的增加而增大。     

129Xeq+轰击N型和P型Si表面时的电子发射产额研究

在兰州重离子加速器国家实验室测量了1.8 MeV Xeq+离子分别轰击N型和P型Si两种靶材表面时的电子发射产额。实验中,通过改变入射离子的电荷态,研究了入射离子势能沉积对两种靶材表面电子发射产额的贡献。结果发现同一离子入射时,N型Si表面的电子发射产额高出P型Si表面的电子发射产额约12.5%;对于具有相同入射动能的Xeq+离子,两种靶材表面的电子发射产额均随着入射离子势能的增加而线性增加。此外,还测量了3.4 MeV Xeq+离子分别轰击以上两种靶材时的电子发射产额,得到了类似的结果。本文利用功函数分别从动能电子发射和势能电子发射两个角度对实验结果进行了分析讨论。The electron emissions from N-type Si and P-type Si induced by 1.8 MeV 129Xeq+are measured in the National Laboratory of Heavy Ion Research Facility in Lanzhou,The contribution to electron emission yield from potential energy of incident ions is studied through changing the charge state of incident ions.The results show that for the same incident ion,electron emission yield of N type Si surface is higher than that of P-type Si surface about 12.5%.For incident ions with the same kinetic energy,both electron emission yields of two targets increase linearly with incident ion energy.In addition,the electron emissions induced by 3.4 MeV 129Xeq+from N-type Si and P-type Si mentioned above are measured,which give similar results.The experimental results are analyzed and discussed using work function from two angles of the kinetic electron emission and the potential energy electron emission.     

Anisotropic energy distribution of sputtered atoms induced by low energy heavy ion bombardment

The theory of anisotropic sputtering published in Phys. Rev. B 71(2), 026101 (2005) and Radiat. Effects Defects Solids 159(5), 301 (2004) has been modified and used to calculate the sputtering yield energy distributions for copper, tungsten, and aluminum targets bombarded by low-energy argon ion. As usual, the electronic stopping is ignored in the analysis. The present theory (modified Sigmund’s theory) has been shown to fit the corresponding experimental results of sputtering yield energy distributions well, except for the cases where the larger ion incident angle and larger sputtering emission angles were considered. The larger discrepancy between the present theory and the experimental result in the latter cases is probably due to the influence of direct recoil atoms on the energy spectrum. Compared with Falcone’s analytical theory, the present theory can reproduce much better experimental results of sputtering phenomena. The fact clearly demonstrates the intrinsic relation between the ion–energy dependence of the total sputtering yield and the sputtering yield energy distribution and suggests the great importance of momentum deposited on the target surface in the physical sputtering     

Electronic stopping power calculation method for molecular dynamics simulations using local Firsov and free electron-gas models

Molecular dynamics simulations have proven to be accurate in predicting depth distributions of low-energy ions implanted in materials. Free parameters adjusted for every ion-target combination are conventionally used to obtain depth profiles in accordance with the experimental ones. We have previously developed a model for predicting depth profiles in crystalline Si without free parameters. The electronic stopping power was calculated using local total electron density. The model underestimated the stopping in the ?1 1 0? channeling direction. We have now taken a new approach to calculate the electronic stopping power. We use the local valence (3p²) electron density to account for the electronic energy loss between collisions and the Firsov model to account for the electronic energy loss during collision. The lowest electron densities are adjusted with a parametrization that is same for all ions in all implanting directions to correct the problems in the ?1 1 0? channeling direction.     

260～520 keV Krq+ (8≤q≤17)离子轰击Al靶产生的可见光辐射

低速高电荷态离子与金属表面相互作用,原子从靶材表面溅射,其中一部分处于激发态的溅射原子通过辐射退激产生可见光。在这一相互作用过程中,低速高电荷态离子从靶材表面捕获一个或多个电子进入其激发态,这些处于激发态的入射离子也会通过辐射退激产生可见光。研究表明,离子在靶材中的核阻止本领与溅射原子产额密切相关。为了更好地理解溅射原子的激发过程,认识低速高电荷态离子与金属相互作用过程中,溅射原子的激发概率与入射离子动能和势能之间的关联,研究了260～520 keV Krq+ (8≤q≤17)离子与Al靶相互作用过程中的可见光发射。给出了520 keV Kr13+ 与Al表面相互作用过程中,发射300～550 nm波长范围的发射光谱。实验结果包括溅射的Al原子在309.0和395.9 nm处的共振跃迁,Al+和Al2+分别在358.3和451.6 nm处的共振跃迁,以及Kr+在430.0,434.1,465.8和486.0 nm处的共振跃迁。还给出了谱线强度比值Y(309.0)/Y(395.9),Y(358.5)/Y(395.9),Y(452.8)/Y(395.9)随入射离子动能和势能的变化。结果表明：谱线强度比值均随入射离子动能的增加而增大,而比值Y(309.0)/Y(395.9)随势能的增加而减小。分析表明,在低速高电荷态离子与Al靶相互作用过程中,动能（电子阻止本领）和势能共同作用导致Al原子的激发,与激发态Al(4s)相比,电子布居较高激发态Al(3d)的概率随着离子电子阻止本领的增加而增大,而随着离子势能增加而减小。在低速高电荷态离子与金属表面相互作用过程中,入射离子在靶材中的核阻止本领影响溅射原子产额,而电子阻止本领与激发概率相关。在这一作用过程中,动能和势能共同决定溅射原子的激发概率,当动能和势能在同一数量级时,动能作用比势能作用小两个量级。     

微通道板离子壁垒膜及其对入射离子的阻止作用

给出了三代微光像管中微通道板离子壁垒膜对入射正离子阻止作用的描述,引进了核阻止本领、电子阻止本领和平均射程的概念。结合Tomas-Fermi屏蔽势进行了分析讨论和Monte-Carlo模拟计算,给出Al₂O₃和SiO₂薄膜对不同能量垂直入射时的核、电子阻止的定量结果。得出了Al₂O₃薄膜阻止本领比SiO₂阻止本领高的结论。证实了选用Al₂O₃离子壁垒膜的科学性和可行性。     

Electron-induced desorption of O+ ions from W,Mo and Cr

We have studied the electron-induced desorption (EID) of O⁺ ions from oxygen-covered polycrystalline W, Mo and Cr surfaces. As the incident electron energy is increased, desorption begins at about 25 eV, and increases dramatically at the binding energy major low-lying substrate core levels. In the range of electron energy studied, below about 200 eV, there are also other variations in ion yield not associated with known core levels. The peak ion kinetic energy is 7.8, 5.3 and 3.4 eV for W, Mo and Cr respectively, and is independent of incident electron energy. These measurements imply that the desorption is initiated by a core level ionization event, although the subsequent electronic transitions leading to desorption apparently differ from those occurring on metallic oxide surfaces.     

Relations Between Focusing Power of Space-Charge Lenses and External Electromagnetic Fields

Under different external electromagnetic fields,the electron densities of the electron cloud in a self-sustaining space-charge lens are measured with the radio-frequency method and the energy distributions of the ions produced in ionization are measured with the stopping field method.From them the relations between the focusing power of space-charge lenses and the external electromagnetic fields are determined.The available region of the Lebedev-Morozov formula is discussed.     

基底对离子束与层状二维电子气作用的影响

采用线性化量子流体动力学（Quantum Hydrodynamics QHD）模型和Poisson方程相结合,研究了离子束与存在基底的双层二维电子气平面相互作用时的静电激发现象。选择恰当边界条件,推导出相互作用过程中的感应电子气密度、感应电势及阻止本领的一般表达式。结果表明,随着基底介电常数的增加,两个平面内的感应电子气密度以及空间感应电势振荡的波长明显变长。同时,由于两个电子气平面间的耦合作用,阻止本领随速度变化曲线出现明显的双峰结构,随着介电常数的增大,双峰结构逐渐消失。     

基底对离子束与层状二维电子气作用的影响

采用线性化量子流体动力学（Quantum Hydrodynamics QHD）模型和Poisson方程相结合，研究了离子束与存在基底的双层二维电子气平面相互作用时的静电激发现象。选择恰当边界条件，推导出相互作用过程中的感应电子气密度、感应电势及阻止本领的一般表达式。结果表明，随着基底介电常数的增加，两个平面内的感应电子气密度以及空间感应电势振荡的波长明显变长。同时，由于两个电子气平面间的耦合作用，阻止本领随速度变化曲线出现明显的双峰结构，随着介电常数的增大，双峰结构逐渐消失。     

高能原电子能量与金属的有效真二次电子发射系数的关系

 提出有效真二次电子发射系数的概念,并从理论上论述了高能原电子的能量与金属的有效真二次电子发射系数的关系，然后用实验数据证明了该理论的正确性，最后对结果进行了讨论。得到了如下结论：不同入射能量的高能原电子轰击同一个金属发射体时， 它们的有效真二次电子发射系数与高能原电子入射能量之积近似为一个常量，有效真二次电子发射系数与高能原电子入射能量成反比。     

Cross sections of electron capture and electron capture ionization versus the impact parameter in collisions of a proton with multielectron atoms

The absolute differential cross sections of scattering of hydrogen atoms resulting from an electron capture and an electron capture ionization are measured for collisions of 4.5- and 11-keV protons with argon and xenon atoms. The range of scattering angles is 0°–2°. From the scattering differential cross section found experimentally, the probabilities of single-electron capture and electron capture ionization as a function of the impact parameter are calculated. The dependences of the incident particle scattering angle on the impact parameter (deviation function) for interactions with Ar and Xe atoms are calculated in terms of classical mechanics using the Moliére—Yukawa potential to describe the interaction of atomic particles. Analysis is given to the probabilities of electron capture and electron capture ionization versus the impact parameter and to the distribution of the electron density on different electron shells in a target atom versus a distance to the core. It is concluded that only electrons from the outer shell of the target atom are involved in the process of electron capture ionization. The cross section of electron capture ionization is calculated in the proton energy range 5–20 keV.