GaN基发光二极管外延中p型AlGaN电子阻挡层的优化生长

本文利用金属有机物化学气相沉积(MOCVD)方法系统地研究了p-AlGaN层掺杂机理及优化设计生长. 明确了生长温度、压力及TMAl的流量对AlGaN层Al组分的影响关系,并给出了各自不同的机理与作用. 研究发现,Al组分介于10%—30%之间能够很好地将电子限定在量子阱区域并保持高的材料晶体质量. 发展了一种新的生长技术来克服p-AlGaN层掺入效率低下和空穴注入不足的问题. 优化条件下生长的p型AlGaN电子阻挡层很大地提升了InGaN/GaN基LED的输出光功率. 关键词： 氮化镓基 LED Al组分 电子阻挡层     

400nm高性能紫光LED的制作与表征(英文)

利用金属有机物化学气相沉积技术在蓝宝石衬底表面制备了带有p-AlGaN电子阻挡层的400 nm高性能紫光InGaN多量子阱发光二极管。制作了3种紫光LED,分别带有不同p-AlGaN电子阻挡层结构:Al摩尔分数为9%的p-AlGaN电子阻挡层;Al摩尔分数为11%的p-AlGaN电子阻挡层;Al摩尔分数为20%的10对p-AlGaN/GaN超晶格电子阻挡层。带有高浓度Al电子阻挡层的紫光LED的光输出功率高于低浓度Al电子阻挡层的紫光LED。带有10对p-AlGaN/GaN超晶格电子阻挡层的紫光LED的光输出功率获得了极大的提高,在20 mA注入电流时测试得到的光输出功率为21 mW。此外,该LED同时显示了在高注入电流下接近线性的I-L特性曲线和在LED芯片表面均匀的发光强度分布。     

量子垒生长速率对InGaN基绿光LED性能的影响

利用MOCVD技术在图形化Si(111)衬底上生长了InGaN/GaN绿光LED外延材料。在GaN量子垒的生长过程中,保持NH3流量不变,通过调节三乙基镓(TEGa)源的流量来改变垒生长速率,研究了量子垒生长速率对LED性能的影响。使用二次离子质谱仪(SIMS)和荧光显微镜(FLM)分别对量子阱的阱垒界面及晶体质量进行了表征,使用电致发光测试系统对LED光电性能进行了表征。实验结果表明,垒慢速生长,在整个测试电流密度范围内,外量子效率(EQE)明显提升。我们认为,小电流密度下,EQE的提升归结为量子阱晶体质量的改善;而大电流密度下,EQE的提升则归结为阱垒界面陡峭程度的提升。     

反对称n-AlGaN层对GaN基双蓝光波长发光二极管性能的影响

采用数值分析方法对在InGaN/GaN混合多量子阱活性层和n-GaN之间引入n-AlGaN层的GaN基双蓝光波长发光二极管进行模拟分析.结果发现,与传统的具有p-AlGaN电子阻挡层的双蓝光波长发光二极管相比,这种反对称n-AlGaN层能有效改善电子和空穴在混合多量子阱活性层中的分布均匀性及减少电子溢出,实现电子空穴在各个量子阱中的平衡辐射,从而减弱了双蓝光波长发光二极管的效率衰减.此外,通过改变Al组分可以提高双蓝光波长发光二极管发射光谱的稳定性:当Al组分为0.16时,双蓝光波长发光二极管的光谱在小电流下比较稳定,而Al组分为0.12时,光谱在大电流下比较稳定.     

不规则H形量子势垒增强AlGaN基深紫外发光二极管性能

针对AlGaN基多量子阱中有效的平衡载流子注入问题,研究了有源区势垒层中Al组分调制形成的非规则H形量子势垒对AlGaN基深紫外发光二极管(LED)器件性能的影响及载流子的输运行为。研究发现,与多量子阱中常用的单Al组分势垒相比,加入Al组分较高的双尖峰势垒可以有效地提高内量子效率和光输出功率。进一步研究表明,电子在有源区因凸起的尖峰势垒而得到了有效的阻挡,减少了电子的泄露,而空穴获得更多的动能从而穿过较高的势垒进入有源区。因此,采用非对称H形量子势垒的深紫外LED器件中载流子输运实现了较好的平衡,量子阱中的载流子复合速率远高于普通的深紫外发光二极管。     

硅衬底InGaN/GaN基蓝光发光二极管droop效应的研究

InGaN/GaN基阱垒结构LED当注入的电流密度较大时, LED的量子效率随注入电流密度增大而下降, 即droop效应.本文在Si (111)衬底上生长了 InGaN/GaN 基蓝光多量子阱结构的LED,通过将实验测量的光电性能曲线与利用ABC模型模拟的结果进行对比, 探讨了droop效应的成因.结果显示:温度下降会阻碍电流扩展和降低空穴浓度, 电子在阱中分布会越来越不平衡,阱中局部区域中因填充了势能越来越高的电子而溢出阱外, 从而使droop效应随着温度的降低在更小的电流密度下出现且更为严重, 不同温度下实验值与俄歇复合模型模拟的结果在高注入时趋势相反.这此结果表明,引起 droop效应的主因不是俄歇非辐射复合而是电子溢出,电子溢出的本质原因是载流子在阱中分布不均衡.     

含有量子点的双波长LED的光谱调控

本文通过对含有高In组分量子点的双波长LED进行了模拟计算, 并对器件的能带结构、载流子浓度、复合速率和辐射光谱进行了研究. 通过对器件结构的调整与对比, 发现蓝绿双波长LED的绿光量子阱中加入高In组分量子点后可以拓宽辐射光谱, 使LED光谱具有更高的显色指数, 为实现无荧光粉的白光LED提供指导. 量子点对载流子具有很强的束缚能力, 并且载流子在量子点处具有更短的寿命, 载流子优先在量子点处复合, 量子点处所对应的黄光与量子阱润湿层所对应的绿光的比例随量子点浓度的增大而增大, 载流子浓度较低时以量子点处的黄光辐射为主, 载流子浓度变大后, 量子点复合逐渐达到饱和, 绿光辐射开始占据主导. 对间隔层厚度和间隔层掺杂浓度的调节可以很方便地调控载流子的分布, 从而实现对含有量子点的双波长LED两个活性层辐射速率的调控. 结果表明, 通过对量子点浓度、间隔层厚度、间隔层掺杂浓度的控节可以很好地实现对LED辐射光谱的调控作用. 关键词： GaN 量子点 光谱调控 双波长LED     

量子阱层和垒层具有不同Al组分的270/290/330nm AlGaN基深紫外LED光电性能

为了研究AlGaN量子阱层和垒层中Al组分不同对AlGaN基深紫外发光二极管(LED)光电性能的影响,本文利用MOCVD生长、光刻和干法刻蚀工艺制备了AlGaN量子阱层和垒层具有不同Al组分的270/290/330nm深紫外LED,通过实验和数值模拟计算方法发现,量子阱层和垒层中具有低Al组分紫外LED的AlGaN材料具有较低的位错密度、较高的光输出功率和外量子效率。通过电流-电压(I-V)曲线拟合出的较大的理想因子(3.5)和能带结构图表明,AlGaN深紫外LED的电流产生是隧穿机制占据主导作用,这是因为高Al组分AlGaN量子阱中强极化场造成了有源层区域较大的能带弯曲和电势降。     

GaN/In_xGa_(1-x)N型最后一个量子势垒对发光二极管内量子效率的影响

GaN/In_xGa_(1-x)N型最后一个量子势垒结构能有效提高发光二极管(LED)器件内量子效率,缓解LED效率随输入电流增大而衰减的问题.本文综述了该结构及其结构变化——In组分梯度递增以及渐变、GaN/In_xGa_(1-x)N界面极化率改变等对改善LED器件性能的影响及优势,归纳总结了不同结构的GaN/In_xGa_(1-x)N型最后一个量子垒的工作机理,阐明极化反转是该结构提高LED性能的根本原因.在综述该结构发展的基础之上,通过APSYS仿真计算,进一步探索和深入分析了该结构中In_xGa_(1-x)N层的In组分及其厚度变化对LED内量子效率的影响.结果表明:In组分的增加有助于在GaN/In_xGa_(1-x)N界面产生更多的极化负电荷,增加GaN以及电子阻挡层处导带势垒高度,减少电子泄漏,从而提高LED的内量子效率;但GaN/In_xGa_(1-x)N型最后一个量子势垒中In_xGa_(1-x)N及GaN层厚度的变化由于会同时引起势垒高度和隧穿效应的改变,因而In_xGa_(1-x)N和GaN层的厚度存在一个最佳比值以实现最大化的减小漏电子,提高内量子效率.     

一种高电流密度下效率不降低的绿光有机电致发光器件

为了提高有机电致发光器件(OLED)在高电流密度下的发光效率, 在以C545T掺杂Alq₃为发光层的有机小分子绿光器件中的发光层与电子传输层之间插入超薄LiF绝缘层.结果表明, 器件的外量子效率随着电流密度的增加始终没有降低, 直至600 mA/cm²时达到最大值 4.79%, 是相同电流密度下的参考器件的外量子效率的7倍.     

量子垒高度对深紫外LED调制带宽的影响

AlGaN基深紫外LED由于具有高调制带宽和小芯片尺寸,在紫外光通信领域受到越来越多的关注.本研究通过改变生长AlGaN量子垒层的Al源流量,生长了三种具有不同量子垒高度的深紫外LED,研究了量子垒高度对深紫外LED光电特性和调制特性的影响.研究发现,随着量子垒高度的增加,深紫外LED的光功率出现先增加后减小的趋势,量...     

Efficiency enhancement of an InGaN light-emitting diode with a p-AlGaN/GaN superlattice last quantum barrier

In this study,the efficiency droop of an InGaN light-emitting diode(LED)is reduced significantly by using a pAlGaN/GaN superlattice last quantum barrier.The reduction in efficiency droop is mainly caused by the decrease of electron current leakage and the increase of hole injection efficiency,which is revealed by investigating the light currents,internal quantum efficiencies,energy band diagrams,carrier concentrations,carrier current densities,and radiative recombination efficiencies of three LED structures with the advanced physical model of semiconductor device(APSYS).     

Enhanced performance of AlGaN-based ultraviolet light-emitting diodes with linearly graded AlGaN inserting layer in electron blocking layer

The conventional stationary Al content Al GaN electron blocking layer(EBL) in ultraviolet light-emitting diode(UV LED) is optimized by employing a linearly graded Al Ga N inserting layer which is 2.0 nm Al_(0.3) Ga_(0.7) N/5.0 nm Alx Ga_(1-x) N/8.0 nm Al_(0.3) Ga_(0.7) N with decreasing value of x. The results indicate that the internal quantum efficiency is significantly improved and the efficiency droop is mitigated by using the proposed structure. These improvements are attributed to the increase of the effective barrier height for electrons and the reduction of the effective barrier height for holes,which result in an increased hole injection efficiency and a decreased electron leakage into the p-type region. In addition,the linearly graded AlGaN inserting layer can generate more holes in EBL due to the polarization-induced hole doping and a tunneling effect probably occurs to enhance the hole transportation to the active regions, which will be beneficial to the radiative recombination.     

Effect of localized states on internal quantum efficiency of III‐nitride LEDs

A model is suggested accounting for effects of localized electron and hole states formed by composition fluctuations in the InGaN active region of a III‐nitride LED on non‐radiative carrier recombination at threading dislocations. The model enables explanation of the abnormal temperature dependence of internal quantum efficiency (IQE) of a green LED structure recently observed at low current densities. The theoretical predictions are in quantitative agreement with experiment in the temperature range between 200 K and 453 K. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

p-GaN插入层调控InGaN基黄绿双波长LED发光光谱

采用MOCVD技术在硅衬底上生长了含有7个黄光量子阱和1个绿光量子阱的混合有源区结构的InGaN基黄绿双波长LED外延材料,研究了电子阻挡层前p-GaN插入层厚度对黄绿双波长LED载流子分布及外量子效率(EQE)的影响。通过LED变温电致发光测试系统对LED光电性能进行了表征。结果表明,100 K小电流时随着电流密度的增大,三组样品的绿光峰与黄光峰相对强度的比值越来越大,且5.5 A·cm^-2的电流密度下,随着温度从300 K逐步降低至100 K,三组样品的绿光峰与黄光峰相对强度的比值也越来越大,说明其载流子都在更靠近p型层的位置发生辐射复合。三组样品的p-GaN插入层厚度为0,10,30 nm时,EQE峰值依次为29.9%、29.2%和28.2%,呈现依次减小的趋势,归因于p-GaN插入层厚度越大,p型层越远离有源区,空穴注入也越浅。电子阻挡层前p-GaN插入层可以有效减小器件EL光谱中绿光峰随着电流密度增加时峰值波长的蓝移(33 nm),实现了对低温发光光谱的调控。     

量子垒结构对Si衬底GaN基绿光LED光电性能的影响

在Si衬底上外延生长了3种不同量子垒结构的绿光外延片并制作成垂直结构芯片,3种量子垒结构分别为Ga N、In0.05Ga0.95N/Al0.1Ga0.9N/In0.05Ga0.95N、In0.05Ga0.95N/Ga N/In0.05Ga0.95N,对应的3种芯片样品为A、B、C,研究了3种样品的变温电致发光特性。垒结构的改变虽然对光功率影响很小,但是在光谱性能上会引起显著改变,结果如下:在低温(13 K)大电流下,随着电流密度的增大,样品的EL谱峰值波长蓝移更为显著,程度依次为BA≈C;在高温(300 K)小电流下,随着电流密度的增大,样品EL谱的峰值波长蓝移程度的大小依次为ABC。在同一电流下,随着温度的升高,样品在大部分电流下的EL谱峰值波长出现"S"型波长漂移,在极端电流下又表现出不同的漂移情况。这些现象与局域态、应力、压电场、禁带宽度等因素有关。     

Pivotal role of ballistic and quasi-ballistic electrons on LED efficiency

Significant progress in the power conversion efficiency and brightness of InGaN-based light emitting diodes (LEDs) has paved the way for these devices to be considered for LED lighting. In this realm, however, the efficiency must be retained at high injection levels in order to generate the lumens required. Unfortunately, LEDs undergo a monotonic efficiency degradation starting at current densities even lower than 50 A/cm² which would hinder LED insertion into the general lighting market. The physical origins for the loss of efficiency retention are at present a topic of intense debate given its enormous implications. This paper reviews the current status of the field regarding the mechanisms that have been put forward as being responsible for the loss of efficiency, such as Auger recombination, electron overflow (spillover), current crowding, asymmetric injection of electrons and holes, and poor transport of holes through the active region, the last one being applicable to multiple quantum well designs. While the Auger recombination received early attention, increasing number of researchers seem to think otherwise at the moment in that it alone (if any) cannot explain the progressively worsening loss of efficiency reduction as the InN mole fraction is increased. Increasing number of reports seems to suggest that the electron overflow is one of the major causes of efficiency degradation. The physical driving force for this is likely to be the relatively poor hole concentration and transport, and skewed injection favoring electrons owing to their relatively high concentration. Most intriguingly there is recent experimental convincing evidence to suggest that quasi-ballistic electrons in the active region, which are not able to thermalize within the residence time and possibly longitudinal optical phonon lifetime, contribute to the carrier overflow which would require an entirely new thought process in the realm of LEDs.     

Performance improvement of InGaN blue light-emitting diodes with several kinds of electron-blocking layers

The performance of InGaN blue light-emitting diodes(LEDs) with different kinds of electron-blocking layers is investigated numerically.We compare the simulated emission spectra,electron and hole concentrations,energy band diagrams,electrostatic fields,and internal quantum efficiencies of the LEDs.The LED using AlGaN with gradually increasing Al content from 0% to 20% as the electron-blocking layer(EBL) has a strong spectrum intensity,mitigates efficiency droop,and possesses higher output power compared with the LEDs with the other three types of EBLs.These advantages could be because of the lower electron leakage current and more effective hole injection.The optical performance of the specifically designed LED is also improved in the case of large injection current.     

不同掺杂类型的GaN间隔层和量子阱垒层对双波长LED作用的研究

采用软件理论分析的方法对不同掺杂类型的GaN间隔层和量子阱垒层在InGaN/GaN多量子阱双波长发光二极管中对发光光强、内量子效率、电子空穴浓度分布、溢出电流等作用进行模拟分析. 分析结果表明,p型掺杂的GaN间隔层与量子阱垒层的引入同不掺杂和n型掺杂两种类型比较,可以大大减少溢出电子流,极大地提高各量子阱内空穴浓度,提高双波长发光二极管的发光强度,极大的改善内量子效率随电流增大而下降问题. 关键词： GaN 掺杂类型 数值模拟 双波长发光二极管