Efficient spin filtering in a disordered semiconductor superlattice in the presence of Dresselhaus spin-orbit coupling

The influence of the Dresselhaus spin-orbit coupling on spin polarization by tunneling through a disordered semiconductor superlattice was investigated. The Dresselhaus spin-orbit coupling causes the spin polarization of the electron due to transmission possibilities difference between spin up and spin down electrons. The electron tunneling through a zinc-blende semiconductor superlattice with InAs and GaAs layers and two variable distance In_xGa_(1−x)As impurity layers was studied. One hundred percent spin polarization was obtained by optimizing the distance between two impurity layers and impurity percent in disordered layers in the presence of Dresselhaus spin-orbit coupling. In addition, the electron transmission probability through the mentioned superlattice is too much near to one and an efficient spin filtering was recommended.     

Experimental confirmation by galvanomagnetic methods of a complex transport model in In0.53Ga0.47As layers deposited by MBE on SI-InP

At low temperatures In_0.53Ga_0.47As samples show an increase of carrier concentration, which can be explained in terms of a two carriers transport model. This type of problem exists since the beginning of the semiconductor era, dating back to monocrystalline germanium.We propose that in all the investigated layers, there are X atoms or charged dislocations in the region of the first monolayers, which are built in during epitaxial growth. The layers were intentionally undoped. They form an impurity band in which low mobility carriers dominate over the localised electron scattering due to the s-d exchange interaction. These carriers do not freeze out at liquid helium temperature and give rise to two transport media for electrons; a conduction band at higher temperatures and an impurity band at lower temperatures. The electron which fall down onto the previously ionised X atoms, then move by thermally activated hopping. We show that the two carriers model for In_0.53Ga_0.47As epitaxial layers are confirmed by the carrier concentration-temperature, carrier concentration-magnetic field, resistivity-magnetic field behaviour, and also by YKA theory also. The differences between the two transport models are so distinctive that observed phenomena may exist. This paper presents experimental results, which constitute comprehensive evidence for the complicated structure of the semiconductor epitaxial layers on the sample of n-type In_0.53Ga_0.47As/InP layer with n=2.2×10¹⁵/cm³.     

Manganese-related luminescence in GaInAs/AlInAs multiple quantum wells grown on InP by molecular beam epitaxy

Two Mn-related luminescence peaks have been observed in a series of nominally undoped Ga_0.47In_0.53As/Al_0.48In_0.52As multiple quantum wells (MQW) grown lattice-matched on InP substrates by molecular beam epitaxy. These two peaks correspond to on-center and on-edge impurity states, respectively. The origin of the Mn impurities is outdiffusion from the Fe-doped semiinsulating InP substrate into the epitaxial layer. The binding energy of Mn acceptors, determined to be 53±3 meV in bulk-like Ga_0.47In_0.53As, increases to 80±5 meV for the on-center Mn state in a 58 Å MQW. The strong well-width dependence of the binding energy is explained in terms of the unique behavior of the Mn impurity in III–V semiconductors. The Mn in Ga_0.47In_0.53As and Ga_0.47In_0.53As/Al_0.48In_0.52As MQWs behaves predominantly as a deep impurity.On leave from: A. F. Ioffe Physicotechnical Institute, Leningrad, USSR     

Type-I and type-II Wannier-Stark effect in InGaAs/InGaAs superlattices

The formation of minibands is demonstrated in photocurrent experiments on shallow In_0.53Ga_0.47As/In_0.40Ga_0.60 As superlattices grown by low-pressure metal-organic vapor-phase epitaxy. Field-dependent variations of the spectral shape are attributed to Wanner-Stark localization. Both type-I transitions between electrons and heavy holes and type-II transitions involving light holes confined in the In_0.40Ga_0.60 As layers are observed and distinguished by their characteristic field dependence.     

Incorporation behaviour of manganese in MBE grown Ga0.47In0.53As

Acceptor doping of MBE grown Ga_0.47In_0.53As on InP:Fe substrates utilizing manganese is investigated as an alternative for overcoming problems related to beryllium doping. The incorporation behaviour of manganese is analyzed in detail with respect to its application in optoelectronic device structures. Special emphasis is put on low-level and maximum-level doping relevant for use in buffer and contact layers, respectively. The dependence of activation energy and the degree of ionization on acceptor concentration is determined. At high doping levels the free-hole concentration is markedly lower than the doping concentration. It is attributed to the diffusion of acceptor species across the heterointerface into the substrate. Manganese diffusion is demonstrated to be an important effect for the interpretation of the measurement results. Manganese doping is applied in p⁺/n/p^–-layer structures for junction field effect transistor applications. The intended abruptness of acceptor profiles is deteriorated by diffusion of manganese in the Ga_0.47In_0.53As material. The degraded device characteristics obtained are attributed to the acceptor diffusion behaviour established.     

Ion-irradiated In0.53Ga0.47As photoconductive antennas for THz generation and detection at 1.55 μm wavelength

We present a detailed study of the photoconductive antennas made from heavy-ion-irradiated In_0.53Ga_0.47As material. The optical and transport properties of ion-irradiated In_0.53Ga_0.47As material are characterized. The terahertz waveforms emitted and detected by ion-irradiated In_0.53Ga_0.47As photoconductive antennas excited by 1.55 μm wavelength femtosecond laser pulses are reported and the effect of the carrier lifetime on the terahertz signal characteristics emitted by such devices is analysed. The performances of ion-irradiated In_0.53Ga_0.47As photoconductive antennas excited by 1.55 μm and also by 0.8 μm wavelength femtosecond laser pulses are compared to those of similar low-temperature-grown GaAs photoconductive antennas. To cite this article: J. Mangeney, P. Crozat, C. R. Physique 9 (2008).     

InP-based InGaAs/InAlGaAs digital alloy quantum well laser structure at 2 μm

The structural and optical characteristics of InP-based compressively strained InGaAs quantum wells have been significantly improved by using gas source molecular beam epitaxy grown InAs/In 0.53 Ga 0.47 As digital alloy triangular well layers and tensile In 0.53 Ga 0.47 As/InAlGaAs digital alloy barrier layers.The x-ray diffraction and transmission electron microscope characterisations indicate that the digital alloy structures present favourable lattice quality.Photoluminescence (PL) and electroluminescence (EL) measurements show that the use of digital alloy barriers offers better optical characteristics than that of conventional random alloy barriers.A significantly improved PL signal of around 2.1 μm at 300 K and an EL signal of around 1.95 μm at 100 K have been obtained.     

Improvement of photoluminescence and electroluminescence characteristics of MBE-grown In0.53Ga0.47As/In0.53(Ga0.6Al0.4)0.47As quantum well laser structure with InGaAlAs digital alloys by thermal annealing

We investigated the effect of rapid thermal annealing (RTA) on the photoluminescence (PL) and electroluminescence of the In_0.53Ga_0.47As/In_0.53(Ga_0.6Al_0.4)_0.47As multiple quantum well (MQW) laser structure with InGaAlAs barrier layers provided by the digital-alloy technique. The SiO₂- (Si₃N₄-) capped samples followed by the RTA exhibited a significant improvement of PL intensity without any appreciable shifts in PL peak energy for settings of up to 750 °C (800 °C) for 45 s. This improvement is attributed to the annealing of nonradiative defects in InAlAs layers of digital-alloy InGaAlAs and partially those near the heterointerfaces of the digital-alloy layers. The InGaAs/InGaAlAs MQW laser diodes fabricated on the samples annealed at 850 °C show a hugely improved lasing performance. Received: 2 September 2002 / Accepted: 3 September 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +82-62/970-2204, E-mail: ytlee@kjist.ac.kr     

Spin inverter and polarizer curved nanowire driven by Rashba and Dresselhaus spin–orbit interactions

We propose in theory a curved nanowire structure that can both serve as a spin inverter and a spin polarizer driven by a periodic Rashba spin–orbit coupling (SOC) and a uniform Dresselhaus SOC. The curved section of the U-shaped quasi-one dimensional nanowire with an arc of radius R and circumferential length $\pi R$ is divided into segments of equal length initially having only its inherent homogeneous Dresselhaus SOC. Then a Rashba-type SOC is applied at every alternating segment. By tuning the Rashba SOC strength and the incident electron energy, this device can flip the spin at the output of an incoming spin-polarized electron. On the other hand, this same device acts as a spin filter for an unpolarized input for which an outgoing electron with a non-zero polarization can be achieved without the application of an external magnetic field. Moreover, the potential modulation caused by the periodic Rashba SOC enables this device to function as an attenuator for a certain range of incident electron energies that can make the probability current density drop to 10⁻⁴ of its otherwise magnitude in other regimes.     

Electron g-factor in a gated InAs-inserted-channel In0.53Ga0.47As/In0.52Al0.48As heterostructure

We report on electron g-factor in an InAs-inserted In_0.53Ga_0.47As/In_0.52Al_0.48As heterostructure. The gate voltage dependence of g-factor is obtained from the coincidence method. The obtained g-factor values are surprisingly smaller than the g-factor value of bulk InAs, and it is close to the bare g-factor value of In_0.53Ga_0.47As. The large change in g-factor is observed by applying the gate voltage. The obtained gate voltage dependence is not simply explained by the energy dependence of g-factor.     

InGaAs/InP heterojunction-channel tunneling field-effect transistor for ultra-low operating and standby power application below supply voltage of 0.5 V

An In_0.53Ga_0.47As/InP heterojunction-channel tunneling field-effect transistor (TFET) with enhanced subthreshold swing (S) and on/off current ratio (I_on/I_off) is studied. The proposed TFET achieves remarkable characteristics including S of 16.5 mV/dec, on-state current (I_on) of 421 μA/μm, I_on/I_off of 1.2 × 10¹² by design optimization in doping type of In_0.53Ga_0.47As channel at low gate (V_GS) and drain voltages (V_DS) of 0.5 V. Comparable performances are maintained at V_DS below 0.5 V. Moreover, an extremely fast switching below 100 fs is accomplished by the device. It is confirmed that the proposed TFET has strong potentials for the ultra-low operating power and high-speed electron device.     

Low-density band-filling in strained InAs quantum wells

We study the low-temperature photoluminescence (PL) of strained InAs single quantum wells (SQWs) embedded in a Ga_0.47In_0.53As matrix grown on InP substrates by modified solid-source molecular beam epitaxy. The spectra are interpreted in the frame of a two-level rate equation model describing the carrier dynamics in the structures. We show that band-filling occurs in these QWs for an excitation power as low as 30 Wcm^–2. Moreover, the spectra reveal that the band-filling results from the rapid population of the hole subband. This observation highlights the low in-plane heavy-hole mass in the compressively strained film. Our results therefore demonstrate the high potential of InAs/Ga_0.47In_0.53As QW nonlinear optical devices operating in the mid-IR wavelength range.     

Dresselhaus spin-orbit coupling induced spin-polarization and resonance-split in n-well semiconductor superlattices

Using the transfer matrix method, we investigate the electron transmission over multiple-well semiconductor superlattices with Dresselhaus spin-orbit coupling in the potential-well regions. The superlattice structure enhances the effect of spin polarization in the transmission spectrum. The minibands of multiple-well superlattices for electrons with different spin can be completely separated at the low incident energy, leading to the 100% spin polarization in a broad energy windows, which may be an effective scheme for realizing spin filtering. Moreover, for the transmission over n-quantum-well, it is observed that the resonance peaks in the minibands split into n-folds or (n−1)-folds depending on the well-width and barrier-thickness, which is different from the case of tunneling through n-barrier structure.     

单边掺杂InAlAs/InGaAs单量子阱中二维电子气的磁输运特性

研究了双子带占据的In_0.52Al_0.48As/In_0.53Ga_{0 .47}As单量子阱中磁电阻的Shubnikov-de Haas(SdH)振荡效应和霍耳效应，获得了不 同子带电子的浓度、迁移率、有效质量和能级位置.低磁感应强度(B＜1.5T)下由迁移率谱和 多载流子拟合相结合的方法得到的各子带电子浓度与通过SdH振荡得到的结果一致.在d ²ρ/dB²-1/B的快速傅里叶变换 关键词： InAlAs/InGaAs单量子阱 SdH振荡 二维电子气 磁致子带间散射     

赝形InxGa1-xAs/In0.52Al0.48As异质结构中二维电子气的回旋共振光谱研究

采用回旋共振光谱方法，同时获得了具有较高电子气浓度的赝形In_0.80Ga_0.20As/In_0.53Ga_0.47As/In_0.52Al_0.48AsHEMT结构中最低两个子能带的费密面附近电子有效质量、 散射时间和迁移率.观察到该系统中能带非抛物性和波函数穿透所导致的电子回旋有效质量的显著增大效应，以及合金无序势和电离杂质散射所引起的电子散射时间和迁移率明显的子带依赖性. 关键词：     

Electromodulation spectroscopy of In0.53Ga0.47As/In0.53Ga0.23Al0.24As quantum wells

In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As quantum wells (QWs) of various widths have been grown by molecular beam epitaxy on the InP substrate and investigated by electromodulation spectroscopy, i.e. photoreflectance (PR) and contactless electroreflectance (CER). The optical transitions related to the QW barrier and the QW ground and excited states have been clearly observed in PR and CER spectra. The experimental QW transition energies have been compared with theoretical predictions based on an effective mass formalism model. A good agreement between experimental data and theoretical calculations has been observed when the conduction band offset for the In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As interface equals 60%. In addition, it has been concluded that the conduction band offset for the In_0.53Ga_0.23Al_0.24As/InP interface is close to zero. The obtained results show that InGa(Al)As alloys are very promising materials in the band gap engineering for structures grown on InP substrate.     

XPS data for sputter-cleaned In0.53Ga0.47As,GaAs, and InAs surfaces

Core level binding energies and Auger parameters were determined for In, Ga, and As in the three compounds In_0.53Ga_0.47As, GaAs, and InAs. The surfaces were cleaned by 1.5 keV Ar ion bombardment. Under this condition the radiation-induced defects are small. In the case of GaAs the Ga and As3d levels become comparable with available data for chemically cleaned surfaces. The high Ga deficiency of chemically cleaned In_0.53Ga_0.47As surfaces could not be observed. Sputter cleaned surfaces seem to be closer to the bulk composition.     

Comparison of tunneling times in isotropic and anisotropic media

We present a comparative analysis of the tunneling times of electromagnetic (EM) waves propagating in isotropic and anisotropic media. First, suitable expressions for the tunneling times in a layered periodic material, with anisotropic properties originating from its structure, are derived, followed by numerical calculations performed for a new type of anisotropic semiconductor metamaterial. In the first case, we have considered a layered structure which contains two differently doped In_0.53Ga_0.47As semiconductor layers. The second structure under investigation is made of alternately placed layers of doped In_0.53Ga_0.47As and undoped Al_0.48Ga_0.52As. The investigation of the dwell time as a function of incident wave frequency has revealed the existence of two peaks, one of which may be interpreted as a consequence of anisotropy, while the other one corresponds to the peak related to the absorption and the group delay. Both of these two peaks are affected by variations of layers?? doping densities. Furthermore, at increased incident angles of incoming EM waves, the dwell time peak occurs at the upper boundary of the frequency interval, for which the structure exhibits negative refractive index.     

Intermixing behavior in InGaAs/InGaAsP multiple quantum wells with dielectric and InGaAs capping layers

The influence of the InGaAs capping layer on the intermixing behavior of dielectric-capped In_0.53Ga_0.47 As/In_0.81Ga_0.19As_0.37P_0.63 multiple quantum wells (MQWs) was investigated by measuring the change in the photoluminescence spectra after rapid thermal annealing. The magnitude of the energy shift in the transition energy from the first electronic sub-band to the first heavy- and light-hole sub-bands of the MQWs is large when SiO₂ and InGaAs hybrid capping layers are employed, but it is rather small when Si₃N₄ and InGaAs hybrid capping layers are employed. This result indicates that the InGaAs capping layer holds promise for applications involved in the fabrication of integrated photonic devices, but only when it is incorporated with the SiO₂ capping layer. The reason why the InGaAs capping layer behaves differently under the SiO₂ and Si₃N₄ capping layers is also discussed. Received: 4 December 1999 / Accepted: 26 September 2000 / Published online: 10 January 2001     

Novel concept for THz signals generation in heterostructures

We demonstrate by a Monte Carlo simulation that the reflection of quasi‐ballistically accelerated electrons at the interfaces of an In_0.52Al_0.48As/In_0.53Ga_0.47As/In_0.52Al_0.48As double‐heterojunction structure is able to generate current oscillations at frequencies in the THz range. The possibility of taking advantage of this mechanism to generate THz signals has been demonstrated in structures with well dimension close to the electron ballistic transport length in In_0.53Ga_0.47As.