基于图像熵的高动态范围场景的自动曝光算法

自动曝光控制是通过控制曝光量使图像亮度最优化的过程,由于图像亮度与曝光值有着直接的关系,因而图像亮度在自动曝光算法中被广泛应用.虽然熵已用于各种图像处理应用,但是很少应用在自动曝光中.基于图像熵提出一种新的自动曝光算法,不同于传统的主要依赖于图像亮度的算法.首先根据图像熵值大小来判断光照条件,通过图像熵大小的比较,把图像的各区域划分为感兴趣区域与不感兴趣区域.然后由图像熵值大小采用分配权重方法对不同区域分配权重,最后进行准确地自动曝光.由于该算法主要基于图像熵值的大小,所以曝光效果不受图像中对象位置影响,使得该算法更灵活.实验结果表明,该算法对高动态范围场景可以准确地检测出各种光照条件,提高相机系统输出图像的动态范围,同时还增加了自动曝光的准确性.     

TDX-200TEM物镜磁路缺陷对物镜性能影响研究

基于TDX-200透射电子显微镜(Transmission Electron Microscope,TEM),利用ANSYS软件仿真物镜磁路存在空隙、凹陷、凸起缺陷时物镜轴上的磁场分布,在此基础上利用MEBS软件仿真物镜激励、球差系数等性能参数,分析了各磁路缺陷对物镜分辨率的影响。结果表明,在相同加速电压下,相对于空隙缺陷、凸起缺陷对物镜分辨率的影响,凹陷缺陷对物镜分辨率的影响最大。在200k V加速电压下,当物镜存在直径为0.5mm的半圆形凹陷环缺陷时,实际分辨率相对于理想分辨率的变化量可达到9.68%。     

彩色数字相机快速自动曝光方法EI北大核心CSCD

彩色数字相机的曝光准确度直接影响了图像的色彩表现及人眼视觉的感受效果。提出了一种基于人眼视觉感观特性的相机自动曝光方法。通过对图像清晰度、色彩饱和度以及亮度等因素的客观评价,建立了曝光估计函数。根据统计原理并结合经验公式,对曝光估计值与曝光步长增量之间的函数关系进行标定,确立了曝光增量函数。根据当前帧图像的不同亮度属性,结合曝光增量函数,实时计算下一帧所需要的理想曝光值。大量实验表明,该方法对于不同场景、不同光照条件下图像的曝光量都有良好的调节效果,稳健性较强并具有较高的调节效率。     

自动实时激光全息无损检测系统

介绍一种自动激光全息无损检测系统。该系统由计算机控制自动曝光，并对全息干版进行自动冲洗和对测量数据进行处理，解决了一次曝光激光全息实时检测中全息干版无法精确复位的问题。计算机控制真空加载，缺陷大小及位置由计算机打印输出，一次最大测量面积为０５ｍ×１２ｍ，最小分辨缺陷尺寸为３ｍｍ。     

自动曝光相机与物理教学

本文通过对自动曝光相机的原理分析，介绍了光度学，光学仪器原理，ＲＣ电路，光敏元件等在照相机领域的应用。阐明了普通物理与科技产品的联系。     

2.5D空间光滤波器设计与制备

纯相位迭代全息图可以用来设计空间光滤波器.由于介质与空气存在折射率差,空间光在经过全息干板时,会产生相位变化.文章以每个像素光刻胶的高度调制相位,设计出了 2.5D灰度全息空间光滤波器.文章还利用电子束光刻机进行灰度曝光,制备不同高度的光刻胶,通过干法刻蚀将图案刻蚀到硅片上.对电子束曝光工艺、显影参数、刻蚀工艺等进行了...     

彩膜曝光机自动补偿功能在高精细产品中的应用研究

薄膜晶体管-液晶显示行业(TFT-LCD)高精细产品需求越来越多,尤其当8.5代及以上大世代线生产手机等小尺寸产品时,彩膜曝光机的曝光均一性及叠层(Overlay)精度难以保证的问题突出,影响大世代线高精细产品的开发及生产。通过对彩膜曝光机自动补偿功能的研究,发现使用曝光机的间距(Gap)自动补偿,将差值自动补正到每个区域(Shot)中,使每个区域曝光间距更接近实际间距,使区域间间距差异变小,可以保证曝光均一性;另外,通过使用曝光机的新型光路自动补偿系统,根据每枚基板整体形变和黑矩阵(BM)工艺的区域形变的实际形变量进行更有效的补偿,得到更匹配BM的区域形状,可以提高叠层精度。当彩膜曝光机可以保证曝光均一性和叠层精度,则可为大世代线开发和生产更多小尺寸高精细产品提供支持。     

微光凝视成像曝光自适应研究

为实现高分视频卫星微光条件下对目标进行长周期凝视曝光成像,设计了适应凝视跟踪稳像姿态变化的自适应曝光周期算法.建立卫星对地实时凝视跟踪数学模型,搭建矢量映射的速度匹配曝光成像关系,利用蒙特卡洛方法对卫星三轴姿态角和姿态角速度控制准确度在微光成像曝光时间内引起的像移量进行统计计算,分析了一定姿态控制准确度下满足高分卫星微光成像的曝光周期.最后,利用灵巧验证卫星进行微光成像曝光周期自适应稳像姿态的在轨试验.结果表明,卫星姿态控制准确度分别为0.08°与0.0088°/s和0.04°与0.003°/s时,对应的成像曝光时间分别为18ms和55.2ms,通过对微光成像的目标点进行分析,曝光过程中成像目标点的实际偏差像元量小于1个像元,此偏差对成像质量影响较小,成像影像的信噪比高.     

全息光栅干涉条纹三维锁定系统的设计

全息曝光系统中干涉条纹的稳定性直接影响光栅掩模质量。研究了参考干涉条纹的特性,提出一种光栅相位、倾斜度和周期的检测方法。为提高光栅曝光系统的稳定性,设计了一套全息光栅干涉条纹三维锁定系统。利用摄像机对参考干涉条纹进行检测,利用微电机和压电陶瓷对光路进行微调,可实现对光栅相位、倾斜度和周期的有效控制。实验结果表明,三维锁定系统可有效提高干涉条纹的稳定性,缩短光栅曝光前的静台稳定时间,提高光栅曝光对比度,可为大口径全息光栅曝光质量的提高提供技术支持。     

X射线CCD标定及模拟

 在北京同步辐射光源4B7B实验站上,采用透射光栅配X射线电荷耦合元件(CCD)的方法对单色光进行了检验,在优化高次谐波抑制方法后,开展了X射线CCD的灵敏度标定实验研究;在标定数据处理过程中,提出了等效曝光时间的概念,修正了快门开合造成的曝光时间误差。标定实验获得了100~1 500 eV能区CCD的灵敏度,补充了300~600 eV能区CCD灵敏度标定数据,验证了简化模型的正确性。     

Passive automatic exposure mechanism

In this paper, we will propose a passive automatic exposure mechanism. Different from general automatic exposure mechanism, the passive exposure mechanism directly searches suitable exposure images through the content of images. As exposure is one of the main factors to successfully take pictures, how to find an accurate exposure value is an important issue. Passive automatic exposure is the new trend and key issue of image processing. We will experiment and prove that the method we propose is effective.     

Size measurement uncertainties of near-monodisperse,near-spherical nanoparticles using transmission electron microscopy and particle-tracking analysis

Particle-tracking analysis (PTA) in combination with systematic imaging, automatic image analysis, and automatic data processing is validated for size measurements. Transmission electron microscopy (TEM) in combination with a systematic selection procedure for unbiased random image collection, semiautomatic image analysis, and data processing is validated for size, shape, and surface topology measurements. PTA is investigated as an alternative for TEM for the determination of the particle size in the framework of the EC definition of nanomaterial. The intra-laboratory validation study assessing the precision and accuracy of the TEM and PTA methods consists of series of measurements on three gold reference materials with mean area-equivalent circular diameters of 8.9 nm (RM-8011), 27.6 nm (RM-8012), and 56.0 nm (RM-8013), and two polystyrene materials with modal hydrodynamic diameters of 102 nm (P1) and 202 nm (H1). By obtaining a high level of automation, PTA proves to give precise and non-biased results for the modal hydrodynamic diameter in size range between 30 and 200 nm, and TEM proves to give precise and non-biased results for the mean area-equivalent circular diameter in the size range between 8 and 200 nm of the investigated near-monomodal near-spherical materials. The expanded uncertainties of PTA are about 9 % and are determined mainly by the repeatability uncertainty. This uncertainty is two times higher than the expanded uncertainty of 4 % obtained by TEM for analyses on identical materials. For the investigated near-monomodal and near-spherical materials, PTA can be used as an alternative to TEM for measuring the particle size, with exception of 8.9 nm gold, because this material has a size below the detection limit of PTA.     

一种基于亮度直方图的自动曝光控制方法

自动曝光控制是现代相机和摄像机必备功能之一。提出一种基于亮度直方图的自动曝光控制算法。基于人类视觉系统(HVS)的视觉注意机制,可认为直方图中大而陡峭的峰值区域对应于图像中的不感兴趣区域。算法寻找直方图中最大的两个峰值区域,并依据峰值区域的大小确定它们中像素亮度的加权值,从而计算图像的加权亮度均值。像素亮度的加权值与其所属峰值区域的大小之间的关系由一组二次型曲线描述,二次型曲线的参量是由图像的背景亮度决定,其中背景亮度由自动曝光系统参量计算得到。在实际应用中采用了模糊逻辑确定最大的两个峰值区域的加权值。实验结果表明该算法对各种场景均能进行有效的自动曝光控制。     

激光全息照相实验技术的改进

激光全息照相实验过程中,需要在一个相对无干扰的环境下,对感光底片进行曝光以得到高质量的照片.因此,研究制作了一个可以在十分钟和更长时间内自由控制曝光开关的定时器,这样可以最大限度的减少实验误差,使实验成功率更高.     

Preparation and in vitro evaluation of an ultrasound-triggered drug delivery system: 10-hydroxycamptothecin loaded PLA microbubbles

10-Hydroxycamptothecin (HCPT) loaded PLA microbubbles, used as an ultrasound-triggered drug delivery system, were fabricated by a double emulsion-solvent evaporation method. The obtained microbubbles were characterized by scanning electron microscope (SEM), transmission electron microscope (TEM), X-ray diffraction (XRD), differential scanning calorimetry (DSC) and confocal laser scanning microscope (CLSM). In addition, the effect of diagnostic ultrasound exposure on BEL-7402 cells combined with HCPT-loaded PLA microbubbles was evaluated using cytotoxicity assay, CLSM and flow cytometry (FCM). It was found that the HCPT-loaded PLA microbubbles showed smooth surface and spherical shape, and the drug was amorphously dispersed within the shell and the drug loading content reached up to 1.69%. Nearly 20% of HCPT was released upon exposure to diagnostic ultrasound at frequency of 3.5 MHz for 10 min. Moreover, HCPT fluorescence in the cells treated only with the HCPT-loaded PLA microbubbles was discernible, but less intense, while those treated with the microbubbles in conjunction with ultrasound exposure was evident and intense, indicating an increased cellular uptake of HCPT by ultrasound exposure. Cytotoxicity test on BEL-7402 cells indicated that the HCPT-loaded PLA microbubbles combined with ultrasound exposure were more cytotoxic than the microbubbles alone. The results suggest that the combination of drug loaded PLA microbubbles and diagnostic ultrasound exposure exhibit an effective intracellular drug uptake by tumor cells, indicating their great potential for antitumor therapy.     

Gamma prime and TCP phases and mechanical properties of thermally exposed nickel-base superalloy

The effect of long-term thermal exposure and casting superheat on microstructure, topologically close-packed (TCP) phases, γ?′ precipitation and mechanical properties of an experimental Ni-base superalloy were studied. The investigated alloys were produced by investment casting process under two levels of superheat. After solution heat treatment, at 1180°C for 2?h followed by air cooling; the two alloys under investigation were isothermally exposed at 845°C for 24, 200, 1000, and 1500?h. The long-term thermal exposure conditions have a significant impact on the precipitation and morphology of TCP and γ?′ phases. The σ phase precipitated as needle and platelet shapes, whereas the μ phase formed in plate and agglomerated shapes. The μ phase has high concentration of Cr, Mo, W, and Co, while the σ phase has high percentages of Ni and Ti. The μ phase was precipitated after thermal exposure of 200?h in the case of high superheat specimen and after 1000?h in low superheat specimen. The η phase found was also a thick plate-like shape in the microstructure of both alloys in the interdendritic zones. The optimum size and volume fraction of γ?′ precipitates were obtained after being thermally exposed for 200 and 1000?h for high and low superheat alloys, respectively. Consequently, the highest hardness level was achieved at the optimum conditions of γ?′ precipitates in high and low superheat alloys.     

Single exposure photography applied to a slow flow field

A speckle photography technique has been applied to measuring the velocity profiles of laminar and turbulent flow through pipes of circular cross-section. A single exposure photography technique has been used to visualize slow fluid flow. The fluids used were seeded with tracer particles whose size range from 20 to about 120 μm in diameter. A mathematical expression representing the recorded intensity is presented. A single exposure with a long exposure time was taken on a holographic film material. The recorded intensity was represented by the convolution product of the image formed and a rectangular function representing a one-dimensional continuous motion. The analysis shows that the intensity distribution of the Fourier spectrum of the diffracted image follows a sinc² function on a noise background representing the scattered light of the tracer particles.     

Effects on the evolution of microstructure and properties of low-silicon cast aluminum alloys in service

ABSTRACT

The microstructure evolution and property change of four kinds of low silicon cast aluminum alloy exposed to heat for 0–50?h at 200°C were studied by means of Brinell hardness test, tensile property test, friction and wear property test and XRD analysis. The results show that with increasing thermal exposure time, the tensile strength of each group of samples decreased and the amount of wear increased. The tensile strength of samples with more Si content decreased slowly. When the time increased to 50?h, the increase of wear loss was the largest. The hardness of samples after thermal exposure increases compared with that before thermal exposure. The residual stress of (311) diffraction crystal surface of AlSi3.5Mg0.66 under different thermal exposure time was measured. The type of residual stress changed from residual tensile stress to residual compressive stress after thermal exposure. There is an abnormal phenomenon that the hardness of the sample increased and the amount of wear increased, and it is evident that the distribution of residual stress was inhomogeneous after thermal exposure. It is found that with increasing thermal exposure time to 50?h, the average lattice distortion ε of the low-index crystal plane and the high-index crystal plane in the aluminum alloys gradually increased.     

Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle

The most serious problems for the matrix projection exposure using a liquid crystal display (LCD) panel in place of a reticle are largely solved by a new breakthrough method. LCD matrix exposure is effective for small volume productions of print circuits, screen masks, micromachine parts, and other items. Since no reticles are needed, all reticle costs are saved, and turnaround times required for changing the patterns are greatly shortened. However, in the conventional method, pattern widths and positions were strictly restricted depending on the geometric size and pitch of the liquid crystal cells. In this paper, a new concept appointing the cell brightness grades continuously using an analogue interface LCD panel is proposed. Calculating the image intensity distributions for various appointments of cell brightness balances to print same wide patterns, it is clarified that the pattern widths and positions are not much different if the pattern widths are wider than 2 cell pitches of the LCD panel. Maximum width and position variations are less than ± 10% even when the patterns are printed at arbitrary positions, of course including halfway ones. The calculated results are proved by experiments using an analogue LCD panel with a cell pitch of 15 μm. Though the cell size are 13 × 10 μm², and different in x and y directions, almost same wide line-and-space patterns are successfully printed at all positions by only one exposure. It is not necessary to shift the reticle for overlapping exposures to print smooth patterns. Oblique patterns and complicated Chinese character patterns are also printed at arbitrary positions. The new breakthrough technology will make the LCD matrix exposure promising for wide uses of printing various rough patterns easily at small costs.     

闪光机照射量及其角分布的参量依赖关系

 系统研究了电子束能量、发射度、击靶半径和电子束横向分布对闪光机靶前1m处X-射线的照射量及其角分布的影响。研究结果表明, 电子束能量、发射度、击靶半径的影响很大, 在闪光机的总体设计中必须加以认真考虑。