SiO2/Si衬底上石墨烯的制备与结构表征

在分子束外延(MBE)设备中,利用直接沉积C原子的方法在覆盖有SiO₂的Si衬底(SiO₂/Si)上生长石墨烯,并通过Raman光谱和近边X射线吸收精细结构谱等实验技术对不同衬底温度(500℃,600℃,700℃,900℃,1100℃,1200℃)生长的薄膜进行结构表征.实验结果表明,在衬底温度较低时生长的薄膜是无定形碳,在衬底温度高于700℃时薄膜具有石墨烯的特征,而且石墨烯的结晶质量随着衬底温度的升高而改善,但过高的衬底温度会使石墨烯质量降低.衬底温度为1100℃时结晶质量最好.衬底温度较低时C原子活性较低,难以形成有序的C-sp²六方环.而衬底温度过高时(1200℃),衬底表面部分SiO₂分解,C原子与表面的Si原子或者O原子结合而阻止石墨烯的形成,并产生表面缺陷导致石墨烯结晶变差.     

Cobalt-assisted large-area epitaxial graphene growth in thermal cracker enhanced gas source molecular beam epitaxy

Large-area epitaxial graphene films were grown on cobalt by thermal cracker enhanced gas source molecular beam epitaxy. Growth conditions including growth temperature and growth time play important roles in the resulting morphology of as-grown films. High-quality graphene films can be achieved in a small growth window. Fast cooling rate was not required in this process due to direct growth mechanism under atomic carbon growth condition. Large-area graphene films with high single-layer and bi-layer coverage of 93% were confirmed by Raman spectroscopy and transmission electron microscopy.     

Theoretical study of vacancies and adatoms in white graphene

The stability of the B and N atomic vacancies and divacancies in an h-BN monolayer deformed by 2 and 4% along one of the axes has been investigated. It has been established that the N atomic vacancies are most stable; their concentration is insignificant and does not affect the properties of white graphene. The number of vacancies depends on the mobility of N and B atoms on the layer surface; therefore, the probability of recombination with the vacancies has been estimated. It has been revealed that the energy barrier for the migration of the B and N adatoms is about 0.23 and 1.23 eV, respectively. In view of such a low barrier for the B adatom, this type of adatoms will quite rapidly move over the surface and recombine with vacancies, in contrast to the N adatoms. Therefore, only nitrogen atom vacancies can exist in the h-BN monolayer grown by the methods, where the adatoms could possibly appear on the surface.     

First-principles study of carbon atoms adsorbed on MgO(100) related to graphene growth

We have performed density functional theory calculations to understand the initial growth of graphene by studying the adsorption of carbon atoms on the oxide substrates such as magnesium oxide. For adsorption behaviors of carbon atoms on the MgO(100) surface, their adsorption geometries and binding energies are calculated. The binding of a carbon atom is the most stable at the on-top oxygen site on MgO(100). Such strong C–O binding is analyzed by examining the projected density of states. Then, we also increase the number of carbon atoms on MgO(100) to investigate their adsorption behaviors. Due to strong binding between carbon atoms, adsorbed carbon atoms form chain-like or graphene-like structures on the surface. Combined with relatively strong C–O binding, this result may explain the graphene growth on MgO(100) observed in available experiments.     

6H-SiC(0001)表面graphene逐层生长的分子动力学研究

利用经典分子动力学方法和模拟退火技术分析研究了6H-ＳiC（0001）表面graphene的逐层生长过程及其形貌结构特点．研究表明,经过高温蒸发表面硅原子后,6H-ＳiC（0001）表面的碳原子能够通过自组织过程生成稳定的局部单原子层graphene结构．这种过程类似于6H-ＳiC（0001）表面graphene的形成,其生长和结构形貌演化主要取决于退火温度和表面碳原子的覆盖程度． 研究发现,当退火温度高于1400K时,6H-ＳiC（0001）表面碳原子能形成局部的单原子层graphene结构．这一转变温 关键词： graphene 碳化硅 分子动力学     

Physicochemical processes in multiphase systems on metal surfaces containing nano-carbon: Segregation,dissolution, graphene nucleation,and growth

A carbon phase equilibria on the surface of metals during graphene nucleation and initial graphite growth is considered thermodynamically. Three phases are shown to be necessarily taken into account: C atoms dissolved in a metal substrate bulk, C atoms chemisorbed on the surface, and graphene (polycondensed carbon phase). Applicability of the Gibbs phase rule to this particular case is analyzed, with surface tension taken into account as an independent thermodynamic degree of freedom. A specific role of boundary atoms of graphene islands, which can be considered (with some limitations) as an independent quasi-1D phase is revealed.     

双层h-BN/Graphene结构稳定性及其掺杂特性的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法研究了双层h-BN/Graphene的稳定性及其掺杂特性.研究发现,双层h-BN/Graphene能带结构在K点处有一个小的带隙,在费米能处有类Graphene的线性色散关系.通过施加应变和掺杂来调节带隙,发现掺杂后费米能级附近引入的新能级,主要是N原子的贡献,掺杂后的Na原子和N,C之间存在电荷转移,材料转变为金属性.电荷的转移、载流子密度的增加,在电子元器件中有重要的应用前景.     

Adsorptions and diffusions of carbon atoms on the surface and in the subsurface of Co （200）： A first-principles density-functional study

First-principles calculations based on density functional theory are used to investigate the adsorptions and diffusions of carbon atoms on the surface and in the subsurface of Co(200). The preferred site for the carbon atom on the surface is the hollow site, and the preferred site in the subsurface is the octahedral site. There is charge transfer from the surface to the adsorbed carbon atom, and for the most favorable adsorbed structure the charge transfer is largest. Moreover, the energy barriers for the diffusions of carbon atoms on the surface and from the surface into the subsurface and then back to the surface are calculated in detail. The results indicate that the energy barrier for the diffusion of carbon atoms on the surface is comparable to that from the subsurface to the surface. The results imply that both the direct surface nucleation and the surface segregation from Co bulk can be observed in the chemical vapor deposition growth of graphene on Co(200)substrate, which can gain a new insight into the growth mechanism of graphene.     

过渡金属掺杂的扶手椅型氮化硼纳米带的磁电子学特性及力-磁耦合效应

基于密度泛函理论的第一性原理计算方法,研究了多种过渡金属(TM)掺杂扶手椅型氮化硼纳米带(ABNNR-TM)的结构特点、磁电子特性及力-磁耦合效应.计算的结合能及分子动力学模拟表明ABNNRTM的几何结构是较稳定的,同时发现对于不同的TM掺杂,ABNNRs能表现出丰富的磁电子学特性,可以是双极化磁性半导体、一般磁性半导体、无磁半导体或无磁金属.双极化磁性半导体是一种重要的稀磁半导体材料,它在巨磁阻器件和自旋整流器件上有重要的应用.此外,力-磁偶合效应研究表明:ABNNR-TM的磁电子学特性对应力作用十分敏感,能实现无磁金属、无磁半导体、磁金属、磁半导体、双极化磁性半导体、半金属等之间的相变.特别是呈现的宽带隙半金属对于发展自旋电子器件有重要意义.这些结果表明:可以通过力学方法来调控ABNNR-TM的磁电子学特性.     

Epitaxial growth of a graphene single crystal on the Ni(111) surface

The thermally controlled synthesis of graphene from propylene molecules on the Ni(111) surface in ultrahigh vacuum is studied by scanning tunneling microscopy and density functional theory. It is established that the adsorption of propylene on Ni(111) atomic terraces at room temperature results in the dehydration of propylene molecules with the formation of single-atomic carbon chains and in the complete dissociation of propylene at the edges of atomic steps with the subsequent diffusion of carbon atoms below the surface. The annealing of such a sample at 500°С leads to the formation of multilayer graphene islands both from surface atomic chains and by the segregation of carbon atoms collected in the upper nickel atomic layers. The process of formation of an epitaxial graphene monolayer until the complete filling of the nickel surface is controllably observed. Atomic defects seen on the graphene surface are interpreted as individual nickel atoms incorporated into graphene mono- or bivacancies.     

Raman analysis of bilayer graphene film prepared on commercial Cu(0.5 at% Ni) foil

This study reports the Raman analysis of bilayer graphene films prepared on commercial dilute Cu(0.5 at% Ni) foils using atmospheric pressure chemical vapor deposition. A bilayer graphene film obtained on Cu foil is known to have small areas of bilayer (islands) with a significant fraction of non‐Bernal stacking, while that obtained on Cu/Ni is known to grow over a large area with Bernal stacking. In the Raman optical microscope images, a wafer‐scale monolayer and large‐area bilayer graphene films were distinguished and confirmed with Raman spectra intensities ratios of 2D to G peaks. The large‐area part of bilayer graphene film obtained was assisted by Ni surface segregation because Ni has higher methane decomposition rate and carbon solubility compared with Cu. The Raman data suggest a Bernal stacking order in the prepared bilayer graphene film. A four‐point probe sheet resistance of graphene films confirmed a bilayer graphene film sheet resistance distinguished from that of monolayer graphene. A relatively higher Ni surface concentration in Cu(0.5 at% Ni) foil was confirmed with time‐of‐flight secondary ion mass spectrometry. The inhomogeneous distribution of Ni in a foil and the diverse crystallographic surface of a foil (confirmed with proton‐induced X‐ray emission and electron backscatter diffraction, respectively) could be a reason for incomplete wafer‐scale bilayer graphene film. The Ni surface segregation in dilute Cu(0.5 at% Ni) foil has a potential to impact on atmospheric pressure chemical vapor deposition growth of large‐area bilayer graphene film. Copyright © 2015 John Wiley & Sons, Ltd.     

铜箔上生长的六角氮化硼薄膜的扫描隧道显微镜研究

利用扫描隧道显微镜研究了采用化学气相沉积法在铜箔表面生长出的高质量的六角氮化硼薄膜. 大范围的扫描隧道显微镜图像显示出该薄膜具有原子级平整的表面, 而扫描隧道谱则显示, 扫描隧道显微镜图像反映出的是该薄膜样品的隧穿势垒空间分布. 极低偏压的扫描隧道显微镜图像呈现了氮化硼薄膜表面的六角蜂窝周期性原子排列, 而高偏压的扫描隧道显微镜图像则呈现出无序和有序排列区域共存的电子调制图案. 该调制图案并非源于氮化硼薄膜和铜箔衬底的面内晶格失配, 而极有可能来源于两者界面处的氢、硼和/或氮原子在铜箔表面的吸附所导致的隧穿势垒的局域空间分布.     

Magnetic-like field inducing negative Dirac mass in graphene on hexagonal boron nitride

The tight-binding electrons in graphene grown on top of hexagonal boron nitride (h-BN) substrate are studied. The two types of surfaces on the h-BN substrate give rise to Dirac fermions having positive and negative masses. The positive and negative masses of the Dirac fermions lead to the gapped graphene to behave as a “pseudo” ferromagnet. A very large (pseudo) tunneling magnetoresistance is predicted when the Fermi level approaches the gap region. The energy gap due to the breaking of sublattice symmetry in graphene on h-BN substrate is analogous to magnetic-induced energy gap on surface of topological insulators. We point out that positive and negative masses may correspond to signs of magnetic-like field perpendicular to graphene sheet acting on pseudo magnetic dipole moment of electrons, leading to pseudo-Larmor precession and Stern–Gerlach magnetic force.     

介电层表面直接生长石墨烯的研究进展

作为21世纪备受瞩目的材料,石墨烯兼具优异的电、热、光与力学性质,具有十分广阔的研究价值与应用价值.目前主要通过在金属基底上生长获得石墨烯,并将其转移至目标介电层基底上以构筑电子器件.转移过程不可避免地引入了褶皱、裂纹、破损以及聚合物/金属残留,严重损害了石墨烯的性能.因而直接在介电基底上制备高质量的石墨烯薄膜具有重要意义.本文总结了近年来在介电衬底上直接生长石墨烯的研究进展:阐述了金属辅助法、等离子体增强法以及热力学或动力学调控法等多种生长手段;介绍了多种介电/绝缘基底包括SiO_2/Si,Al_2O_3,SrTiO_3,h-BN,SiC,Si_3N_4以及玻璃表面生长石墨烯的特点与性能,分析了其可能的生长机理.根据拉曼谱图、薄层电阻、透光率、载流子迁移率等评估指标,将多种方法得到的石墨烯质量进行了总结与比较,并提出了直接在介电衬底上生成石墨烯的研究难点与趋势.     

Bilayer graphene on h-BN substrate: investigating the breakdown voltage and tuning the bandgap by electric field

By performing density functional theory calculations we show that it is possible to make the electronic bandgap in bilayer graphene supported on hexagonal boron nitride (h-BN) substrates tunable. We also show that, under applied electric fields, it is possible to insert states from h-BN into the bandgap, which generate a conduction channel through the substrate making the system metallic. In addition, we verify that the breakdown voltage strongly depends on the number of h-BN layers. We also show that both the breakdown voltage and the bandgap tuning are independent of the h-BN stacking order.     

Graphene traps for cesium atoms

A significant increase in the surface concentration of cesium atoms intercalated under graphene islands on rhodium has been revealed when annealing the adsorbed layer in a ultrahigh vacuum. Heating leads to a decrease in the area of graphene islands due to the solution of carbon atoms in the metal bulk. At the same time, the edge carbon atoms in the islands, which are coupled with the surface by chemisorptive forces, prevent the leakage of the alkali metal from under the islands. This leads to the significant compression of cesium and to an increase in its surface concentration under the islands by a factor of almost 10. The desorption of cesium is observed only after the complete thermal destruction of graphene islands.     

Role of edge atoms of graphene islands on metals in nucleation,growth, alkali metal intercalation

Physics of the Solid State - The effect of edge carbon atoms in graphene islands grown on a metal surface on the kinetics of nucleation, growth and dissolution of these islands, as well as of a...     

石墨烯-六方氮化硼面内异质结构的扫描隧道显微学研究

石墨烯-六方氮化硼面内异质结构因可调控石墨烯的能带结构而受到广泛关注. 本文介绍了在超高真空体系内, 利用两步生长法在两类对石墨烯分别有强和弱电子掺杂的基底, 即Rh(111)和Ir(111)上制备石墨烯-六方氮化硼单原子层异质结构. 通过扫描隧道显微镜及扫描隧道谱对这两种材料的形貌和电子结构进行研究发现: 石墨烯和六方氮化硼倾向于拼接生长形成单层的异质结构, 而非形成各自分立的畴区; 在拼接边界处, 石墨烯和六方氮化硼原子结构连续无缺陷; 拼接边界多为锯齿形型, 该实验结果与密度泛函理论计算结果相符合; 拼接界面处的石墨烯和六方氮化硼分别具有各自本征的电子结构, 六方氮化硼对石墨烯未产生电子掺杂效应.     

Mechanism of silicon epitaxy on porous silicon layers

The mechanism of silicon epitaxy on porous Si(111) layers is investigated by the Monte Carlo method. The Gilmer model of adatom diffusion extended to the case of arbitrary surface morphology is used. Vacancies and pendants of atoms are allowed in the generalized model, the activation energy of a diffusion hop depends on the state of the neighboring positions in the first and second coordination spheres, and neighbors located outside the growing elementary layer are also taken into account. It is shown that in this model epitaxy occurs by the formation of metastable nucleation centers at the edges of pores, followed by growth of the nucleation centers along the perimeter and the formation of a thin, continuous pendant layer. Three-dimensional images of surface layers at different stages of epitaxy were obtained. The dependence of the kinetics of the epitaxy process on the amount of deposited silicon is determined for different substrate porosities. Pis’ma Zh. éksp. Teor. Fiz. 67, No. 7, 512–517 (10 April 1998)     

金属Ni原子对石墨烯生长结构的影响

基于Material Studio软件平台,利用分子动力学方法,对Ni原子与石墨烯层状结构相互作用和晶体结构变化过程进行模拟分析,得到如下结论：低浓度Ni原子会吸附在石墨烯表面层沿边缘生长,活性从中心向边缘逐渐降低,高浓度的Ni原子会溶解到内层石墨烯中.当石墨烯层数增加,附着在表层石墨烯的Ni原子生长排列范围扩大,且在石墨烯表面形成的点阵排列被破坏,附着在内层石墨烯的Ni原子比表层石墨烯Ni原子排列更散乱,同时石墨烯生长结构逐渐出现弯曲;随着层数增多和Ni原子浓度增加,石墨烯的拉伸强度也随之增加,石墨烯生长缺陷的偏转角度也随之增大.通过计算以上结构的径向分布函数(RDF),验证了石墨烯长程有序到短程有序的结构变化过程.