双层h-BN/Graphene结构稳定性及其掺杂特性的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法研究了双层h-BN/Graphene的稳定性及其掺杂特性.研究发现,双层h-BN/Graphene能带结构在K点处有一个小的带隙,在费米能处有类Graphene的线性色散关系.通过施加应变和掺杂来调节带隙,发现掺杂后费米能级附近引入的新能级,主要是N原子的贡献,掺杂后的Na原子和N,C之间存在电荷转移,材料转变为金属性.电荷的转移、载流子密度的增加,在电子元器件中有重要的应用前景.

First-principles study on the structure stability and doping performance of double layer h-BN/Graphene

Using the firs-principles method based on density functional theory, we study the stability and doping performance of double h-BN/Graphene structure, here the exchange correlation potential is expressed through the local density approximation and the interactions between ions and electrons are described by the projective-augmented wave method. Because double layer h-BN/Graphene represents a kind of epitaxial semiconductor system, which can be applied to tunnel pressure sensor, the research is very meaningful. In order to improve the application of this special double layer structures, we often carry out the dopings of some atoms. Unlike previous research work, in which the dopings of the metals Au, Co, Mn and other atoms were took into account, we now mainly consider the dopings of the active metal atoms, such as the dopings of Li, Na, and K atoms. The band structure, electronic density of states, as well as the charge density and stability are studied on the double h-BN/Graphene structure after alkali metal doping. At the same time, bonding and electronic properties of double h-BN/Graphene are discussed under the different biaxial strain conditions. The results show that for the dopings of Li and K atoms, the structure deformation is very large, and the band structure of double h-BN/Graphene can show a small band gap at the K point in the first Brillouin zone, taking on a linear dispersion relation the same as that of the perfect graphene. We can tune the band gap by applying external strain and dopings of atoms, and find a new level appearing near the Fermi level after doping, which is mainly due to the contribution of N atoms. In addition, there exists charge transfer between Na atom and N and C atoms, and the material is converted into metal. We find obvious charge overlapping in the vicinity of Na atoms, these charge overlaps appearing around the Na and C atoms indicate the existence of covalent bond and this covalent bond also appears around the Na atoms and N atoms. We prove the existence of the chemical bonds by adopting the Bader charge analysis, which suggests that the C atoms in the lower graphene layer obtain 0.11 e and dopant atoms around the three N atoms obtain 0.68 e. We infer that the increasing of Na atom doping can increase the charge transfer, so the method of changing the substrate to increase the graphene layer charge density is very conducive to the application of graphene in electronic devices. Because the double h-BN/Graphene has been successfully synthesized, our calculations provide a theoretical basis for the further development and application of technology. We can expect that Na atom doped double h-BN/Graphene can be well applied to the future electronic devices.