p型掺杂1.3μm InAs/GaAs量子点激光器的最大模式增益特性的研究

对p型掺杂13 μm InAs/GaAs量子点激光器的最大模式增益进行了实验和理论分析.实验上,测量了不同腔长激光器阈值电流密度与总损耗的对应关系,拟合出的最大模式增益为175 cm^-1,与相同结构非掺杂量子点激光器的最大模式增益一致.同时理论分析表明,p型掺杂对InAs/GaAs量子点激光器的最大模式增益并无影响,并且最大模式增益的计算结果与实验值相符.具有较小高度或高宽比的量子点能达到更高的最大模式增益,而较高的最大模式增益对p型掺杂13 μm InAs/GaAs自组织量子点激光器在光通信系统中的应用具有重要意义. 关键词： 最大模式增益 p型掺杂 InAs/GaAs量子点激光器     

Mn离子注入InAs/GaAs量子点结构材料的光电性质研究

用高能离子注入(160keV)的方法对InAs/GaAs量子点结构进行掺杂，研究了不同退火工艺处理后量子点的光致发光和电学性能.相对于长时间退火，快速退火处理后的量子点发光通常较强.在相同的退火条件下，量子点发光峰位随着Mn注入剂量的增加，先是往高能量端快速移动，而后发光峰又往低能方向移动.后者可能是由于Mn原子进入InAs量子点，释放了InAs量子点中的应变所致.对于高注入剂量样品和长时间退火样品，变温电阻曲线在40 K附近会出现反常行为. 关键词： 离子注入 InAs/GaAs量子点 光致发光 团簇     

InAs/GaAs表面量子点的压电调制反射光谱研究

运用压电调制反射光谱(PzR)方法测量了在以GaAs(311)B为衬底的In_0.35Ga_0.65As模板上生长的InAs表面量子点结构的反射谱.在77K温度下，观察到了来自样品各个组成结构(包括表面量子点本身、被覆盖层覆盖的量子点、In_0.35Ga_0.65As模板以及GaAs衬底等)的调制信号.来自表面量子点本身的调制信号是多个清晰的调制峰.用一阶和三阶微分洛伦兹线形对PzR谱中对应结构的实验数据进行了拟合，精确确定了与样品的各个组成结构相对应的调制峰的能量位置.对不同样品PzR谱的差异进行了定性的说明. 关键词： 压电调制光谱 InAs/GaAs 表面量子点 洛伦兹线形拟合     

脉冲激光原位辐照对InAs/GaAs(001)量子点生长的影响

在InAs/GaAs(001)量子点生长过程中, 当InAs沉积量为0.9 ML时, 利用紫外纳秒脉冲激光辐照浸润层表面, 由于高温下In原子的不稳定性, 激光诱导的原子脱附效应被放大, 样品表面出现了原子层移除和纳米孔. 原子力显微镜测试表明纳米孔呈现以[110]方向为长轴(尺寸: 20-50 nm)、[110]方向为短轴(尺寸: 15-40 nm)的表面椭圆开口形状, 孔的深度为0.5-3 nm. 纳米孔的密度与脉冲激光的能量密度正相关. 脉冲激光的辐照对量子点生长产生了显著的影响: 一方面由于纳米孔的表面自由能低, 沉积的InAs优先迁移到孔内, 纳米孔成为量子点优先成核的位置; 另一方面, 孔外的区域因为In原子的脱附, 量子点的成核被抑制. 由于带有纳米孔的浸润层表面具有类似于传统微纳加工技术制备的图形衬底对量子点选择性生长的功能, 该研究为量子点的可控生长提供了一种新的思路.     

各向异性量子点单光子发射的高偏振度特性

研究了线偏振脉冲光场激发下,单个各向异性InGaAs量子点的高偏振光发射. 给出其偏振因子与两个正交本征态之间的交叉弛豫之间的关系式. 分析表明，交叉弛豫随激发场强度增大，并导致偏振因子随激发场入射脉冲面积减小. 关键词： 量子点 单光子发射 偏振度     

InAs/GaAs自组织量子点的DLTS谱

将DLTS用于对InAs/GaAsQD结构样品的测量,测定了QD能级发射载流子的热激活能;获得了QD能级俘获电子过程伴随有多声子发射(MPE)、QD能级存在一定程度的展宽、以及在某些特定的生长条件下,存在亚稳生长构形的实验证据.结果表明:DLTS在QD体系的研究中有其特有的功能     

量子点操控的光子探测和圆偏振光子发射

半导体量子点是研究光子与电子态相互作用的优选固态体系,并在光子探测和发射两个方向上展现出独特的技术机遇.其中基于量子点的共振隧穿结构被认为在单光子探测方面综合性能最佳,但受到光子数识别、工作温度两个关键性能的制约.利用腔模激子态外场耦合效应,有望获得圆偏振态可控的高频单光子发射.本文介绍作者提出的量子点耦合共振隧穿（QD-cRTD）的光子探测机理,利用量子点量子阱复合电子态的隧穿放大,将QD-cRTD光子探测的工作温度由液氦提高至液氮条件,光电响应的增益达到10⁷以上,并具备双光子识别能力;同时,由量子点能级的直接吸收,原型器件获得了近红外的光子响应.在量子点光子发射机理的研究方面,作者实现了量子点激子跃迁和微腔腔模共振耦合的磁场调控,在Purcell效应的作用下增强激子自旋态的自发辐射速率,从而增强量子点中左旋或右旋圆偏振光的发射强度,圆偏度达到90%以上,形成一种光子自旋可控发射的新途径.     

InGaAs/GaAs量子链的光学特性研究

研究了InGaAs/GaAs量子链的稳态和瞬态光谱特性,特别是载流子的动力学过程.实验发现荧光寿命有很强的探测能量依赖关系,荧光寿命随发光能量的增加而减小;实验还发现,当激发功率较小时,荧光寿命随激发功率增大而增大,当激发功率足够大时,荧光寿命趋于饱和.这些结果清楚地表明,在量子链结构中,参与发光的载流子之间存在明显的耦合和输运现象,进一步分析表明,这种输运主要是由于载流子沿量子链方向的耦合造成的.发光的偏振特性研究进一步证实了载流子沿量子链方向输运过程. 关键词： InGaAs/GaAs 量子点 量子链     

1.3μm GaAs基量子点垂直腔面发射激光器结构设计与分析

结合垂直腔面发射激光器（VCSEL）原理以及量子点增益特点，计算了不同结构VCSEL的腔内损耗和量子点的模式增益.分析了激光器阈值特性以及氧化限制层对光损耗的影响.设计了含 氧化限制层的13μm量子点VCSEL结构. 关键词： 量子点 垂直腔面发射激光器 增益     

InAs 单量子点中级联辐射光子的关联测量

利用分子束外延生长InAs单量子点样品,温度为5 K时,测量了单量子点中单、双激子自发辐射的荧光(PL)光谱.研究了单、双激子发光强度随激发功率的变化及对应发光峰的偏振特性和精细结构劈裂.基于Hanbury-Brown Twiss(HBT) 实验,测量了单、双激子间发光光谱的关联函数,证实了其发光过程为级联发射过程. 关键词： InAs 单量子点 单、双激子 荧光光谱 级联辐射     

Resonant photoluminescence from modulation-doped InAs –GaAs quantum dots

Resonant luminescence studies of InAs quantum dots (QDs) embedded in a GaAs matrix grown by molecular beam epitaxy are presented, showing marked differences for modulation-doped and undoped QDs and indicating that the doping leads to different exciton formation and carrier relaxation mechanisms. The LO-phonon assisted relaxatioin of excitons between sub-levels is identified for the modulation-doped QDs.     

STEM-study of 1.3 μm InAs/InGaAs quantum dot structures

We investigated InAs-Dots-in-a-well structures emitting near 1.3 μm by bright field and Z-contrast mode in a scanning transmission electron microscope. The chemically sensitive Z-contrast mode is found to give direct information on the actual position of the InAs-Dots inside the embedding well, while the bright field mode monitors the strain fields. Comparing a series of structures, we found that the most symmetric design is realized by an nominally asymmetric growth. These symmetric structures exhibit the best performance with respect to photoluminescence spectra and laser threshold current density.     

The preferential formation site of dislocations in InAs/GaAs quantum dots

In this paper, taking elastic anisotropy into consideration, we use a dislocation position dependent model to calculate the preferential formation site of the pure edge and 60° mixed dislocation segment in different shaped InAs/GaAs quantum dots (QDs). From the result, it is clear that for the pure edge dislocations the most energy favorable position is always the base center of the quantum dots. While as to the 60° mixed dislocations, the positions near to the edge of the quantum dot base are the energy favorable area and the exact position is changed with different aspect ratio of the quantum dot.     

等离子体增强InAs单量子点荧光辐射的研究

通过测量光致发光(PL)谱、PL时间分辨光谱及不同激发功率下PL发光强度,研究了低温(5 K)下等离子体对InAs单量子点PL光谱的增强效应.采用电子束蒸发镀膜技术在InAs量子点样品表面淀积了5 nm厚度的金膜,形成纳米金岛膜结构.实验发现,金岛膜有利于量子点样品发光强度的增加,最大PL强度增加了约5倍,其主要物理机理是金岛膜纳米结构提高了量子点PL光谱的收集效率.     

脉冲激发三能级体系半导体量子点的单光子发射效率

研究了脉冲激发下单个半导体量子点中单光子发射的统计特性.在旋转波近似条件下，由系统粒子数演化主方程并结合量子回归理论推导了二阶相关函数的运动方程，利用此方程讨论了二阶相关函数随输入脉冲面积的关系.在窄脉冲宽度的脉冲激发下，单光子的发射概率p和效率η都随着强度的增强而产生振荡.研究表明，采用窄脉冲宽度，当输入脉冲面积在π附近时可以得到较高的单光子发射效率. 关键词： 半导体量子点 单光子发射 三能级系统     

Photoluminescence and lasing properties of InAs/GaAs quantum dots grown by metal-organic chemical vapour deposition

Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low growth rate QD sample has a larger PL intensity and a narrower PL line width than the high growth rate sample. During rapid thermal annealing, however, the low growth rate sample shows a greater blueshift of PL peak wavelength. This is caused by the larger InAs layer thickness which results from the larger 2-3 dimensional transition critical layer thickness for the QDs in the low-growth-rate sample. A growth technique including growth interruption and in-situ annealing, named indium flush method, is used during the growth of GaAs cap layer, which can flatten the GaAs surface effectively. Though the method results in a blueshift of PL peak wavelength and a broadening of PL line width, it is essential for the fabrication of room temperature working QD lasers.     

Numerical investigation on threading dislocation bending with InAs/GaAs quantum dots

The threading dislocations (TDs) in GaAs/Si epitaxial layers due to the lattice mismatch seriously degrade the performance of the lasers grown on silicon. The insertion of InAs quantum dots (QDs) acting as dislocation filters is a pretty good alternative to solving this problem. In this paper, a finite element method (FEM) is proposed to calculate the critical condition for InAs/GaAs QDs bending TDs into interfacial misfit dislocations (MDs). Making a comparison of elastic strain energy between the two isolated systems, a reasonable result is obtained. The effect of the cap layer thickness and the base width of QDs on TD bending are studied, and the results show that the bending area ratio of single QD (the bending area divided by the area of the QD base) is evidently affected by the two factors. Moreover, we present a method to evaluate the bending capability of single-layer QDs and multi-layer QDs. For the QD with 24-nm base width and 5-nm cap layer thickness, taking the QD density of 10¹¹ cm^-2 into account, the bending area ratio of single-layer QDs (the area of bending TD divided by the area of QD layer) is about 38.71%. With inserting five-layer InAs QDs, the TD density decreases by 91.35%. The results offer the guidelines for designing the QD dislocation filters and provide an important step towards realizing the photonic integration circuits on silicon.     

Investigation of populated InAs/GaAs quantum dots by photoluminescence and photoreflectance

We studied self-assembled InAs/GaAs quantum dots by contrasting photoluminescence and photoreflectance spectra from 10 K to room temperature. The photoluminescence spectral profiles comprise contributions from four equally separated energy levels of InAs quantum dots. The emission profiles involving ground state and excited states have different temperature evolution. Abnormal spectral narrowing occurred above 200 K. In the photoreflectance spectra, major features corresponding to the InAs wetting layer and GaAs layers were observed. Temperature dependences of spectral intensities of these spectral features indicate that they originate from different photon-induced modulation mechanisms. Considering interband transitions of quantum dots were observed in photoluminescence spectra and those of wetting layer were observed in photoreflectance profiles, we propose that quantum dot states of the system are occupied up to the fourth energy level which is below the wetting layer quantum state.     

Extremely low density self-assembled InAs/GaAs quantum dots

The self-assembled InAs/GaAs quantum dots (QDs) with extremely low density of 8×106 cm-2 are achieved using higher growth temperature and lower InAs coverage by low-pressure metal-organic chemical vapour deposition (MOVCD). As a result of micro-photoluminescence (micro-PL), for extremely low density of 8×106 cm-2 InAs QDs in the micro-PL measurements at 10 K, only one emission peak has been achieved. It is believed that the InAs QDs have a good potential to realize single photon sources.     

Single InAs/InP quantum dot spectroscopy in 1.3–1.55 μm telecommunication band

We present an optical spectroscopy and photon correlation measurement at telecommunication wavelengths performed on single InAs/InP quantum dots. Two main approaches brought high optical quality: an application of a ‘double-cap’ growth method to metalorganic chemical vapor deposition, and fabrication of a small mesa structure using low-damage wet chemical etching. Sharp and discrete exciton transition lines have been observed on the single quantum dots, which widely cover the spectral range of 1.3–1.55 μm. Using a pulsed excitation source and gated single-photon detection modules, we observed a photon antibunching behavior for an isolated exciton emission line, indicating nonclassical light emission near the wavelength of 1.3 μm.