Ultra-thin Oxide Films on SiO2: An STM Study of Their Thermal Stability in the Presence of Au Deposit |
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| Authors: | Jun Wang C E J Mitchell R G Egdell J S Foord |
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| Institution: | 1. Physical and Theoretical Chemistry Laboratory, South Parks Road, Oxford OX1 3QZ, UK;
2. Inorganic Chemistry Laboratory, South Parks Road, Oxford OX1 3QR, UK |
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| Abstract: | The annealing of Au particles deposited onto the ultrathin layers of SiO 2 on Si(111) has been studied in real time with a high temperature scanning tunnelling microscopy. Annealing did not create significant changes to the morphology of the surface until the surface was heated up to more than 920 K when the gold particles started to display a preference for the step edge. Further heating caused the decomposition of the oxide layer with the formation of voids on the surface in the surface step edge area. Comparison between the gold assisted oxide decomposition and pure oxide decomposition indicates that the two decomposition routes proceed with different mechanisms. |
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| Keywords: | Scanning tunnelling microscopy Silicon oxide Gold Surface diffusion Surface structure Morphology Roughness and topology Oxidation Decomposition |
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