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氢化物气相外延生长的GaN膜中的应力分析
引用本文:刘战辉,修向前,张李骊,张荣,张雅男,苏静,谢自力,刘斌,单云.氢化物气相外延生长的GaN膜中的应力分析[J].光谱学与光谱分析,2013,33(8):2105-2108.
作者姓名:刘战辉  修向前  张李骊  张荣  张雅男  苏静  谢自力  刘斌  单云
作者单位:1. 南京信息工程大学物理与光电工程学院,江苏 南京 210044
2. 江苏省光电信息功能材料重点实验室,南京大学电子科学与工程学院,江苏 南京 210093
3. 南京晓庄学院生物化工与环境工程学院,江苏 南京 211171
基金项目:国家重点基础研究发展规划项目,国家高技术研究发展规划项目,国家自然科学基金项目,江苏省自然科学基金项目
摘    要:对在c面蓝宝石上用氢化物气相外延法(HVPE)生长的六方相纤锌矿结构的GaN膜中的应力进行了分析。高分辨X射线衍射(002)面和(102)面摇摆曲线扫描(半高宽数值分别为317和358角秒)表明生长的GaN膜具有较好的晶体质量。利用高分辨X射线衍射技术准确测量了制备的GaN膜的晶格常数,并计算得到GaN膜中面内双轴应变和面外双轴应变分别为3.37×10-4和-8.52×10-4,等静压应变为-7.61×10-5。拉曼光谱和激光光致发光谱测试表明HVPE-GaN外延膜具有较好的光学特性,利用拉曼光谱的E2模式特征峰和激光光致发光谱中近带边发射峰的频移定量计算了外延膜中的面内双轴压应力和等静压应力。两种方法得到的面内双轴压应力较为相符。

关 键 词:氮化镓  氢化物气相外延  拉曼光谱  激光光致发光谱  应力    
收稿时间:2012-09-20

Strain in GaN Epi-Layer Grown by Hydride Vapor Phase Epitaxy
LIU Zhan-hui,XIU Xiang-qian,ZHANG Li-li,ZHANG Rong,ZHANG Ya-nan,SU Jing,XIE Zi-li,LIU Bin,SHAN Yun.Strain in GaN Epi-Layer Grown by Hydride Vapor Phase Epitaxy[J].Spectroscopy and Spectral Analysis,2013,33(8):2105-2108.
Authors:LIU Zhan-hui  XIU Xiang-qian  ZHANG Li-li  ZHANG Rong  ZHANG Ya-nan  SU Jing  XIE Zi-li  LIU Bin  SHAN Yun
Institution:1. School of Physics and Optoelectronic Engineering, Nanjing University of Information Science & Technology, Nanjing 210044, China2. Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China3. School of Biochemical and Environmental Engineering, Nanjing Xiaozhuang University, Nanjing 211171, China
Abstract:In the present paper, strain in GaN epitaxial layer grown by hydride vapor phase epitaxy (HVPE) was investigated by means of high-resolution X-ray diffraction (HRXRD), Raman spectra and photoluminescence (PL) measurements. Both the biaxial in-plane and out-of-plane strains (of the order of ~10-4 and 10-4, respectively) and the hydrostatic strain component (of the order of ~10-5) were extracted from HRXRD measurements. These values agreed well with the ones computed from the blue-shift of E2 Raman mode and the near-band-edge PL peak. The results showed that strains in GaN layer were superposed by the biaxial strain and hydrostatic strain.
Keywords:GaN  Hydride vapor phase epitaxy  Raman spectra  Photoluminescence  Strain
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