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Temperature dependence of the current-voltage characteristics of the Al/Rhodamine-101/p-Si(1 0 0) contacts
Authors:? Karata?  M Çakar
Institution:a University of Kahramanmara? Sütçü ?mam, Faculty of Sciences and arts, Department of Physics, Kahramanmara?, Turkey
b Yüzüncü Y?l University, Faculty of Sciences and arts, Department of Physics, Van, Turkey
c University of Kahramanmara? Sütçü ?mam, Faculty of Sciences and arts, Department of Chemistry, Kahramanmara?, Turkey
d Atatürk University, Faculty of Sciences and arts, Department of Physics, 25240 Erzurum, Turkey
Abstract:The current-voltage (I-V) characteristics of Al/Rhodamine-101/p-Si/Al contacts have been measured at temperatures ranging from 280 to 400 K at 20 K intervals. A barrier height (BH) value of 0.817 eV for the Al/Rh101/p-Si/Al contact was obtained at the room temperature that is significantly larger than the value of 0.58 eV of the conventional Al/p-Si Schottky diode. While the barrier height Φb0 decreases the ideality factors (n) become larger with lowering temperature. The high values of n depending on the sample temperature may be ascribed to decrease of the exponentially increase rate in current due to space-charge injection into Rh101 thin film at higher voltage. Therefore, at all temperatures, it has been seen that the I-V characteristics show three different regions, the ohmic behavior at low voltages, and the space charge limited current with an exponential distribution of traps at high voltages.
Keywords:73  61  Ph  73  40  Lq  73  40  Ns  73  40  Ei  73  30  +y
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