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A New theory for evaluating the number density of inclusions in films
Authors:Zhi Lin Xia  Zheng Xiu Fan
Institution:a Shanghai Institution of Optics and Fine Mechanics, Shanghai 201800, China
b Graduate School, Chinese Academy of Sciences, Beijing 100080, China
Abstract:A new formulation derived from thermal characters of inclusions and host films for estimating laser induced damage threshold has been deduced. This formulation is applicable for dielectric films when they are irradiated by laser beam with pulse width longer than tens picoseconds. This formulation can interpret the relationship between pulse-width and damage threshold energy density of laser pulse obtained experimentally. Using this formulation, we can analyze which kind of inclusion is the most harmful inclusion. Combining it with fractal distribution of inclusions, we have obtained an equation which describes relationship between number density of inclusions and damage probability. Using this equation, according to damage probability and corresponding laser energy density, we can evaluate the number density and distribution in size dimension of the most harmful inclusions.
Keywords:47  53  +n  45  70  Vn  68  35  Dv  68  55  Ln
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