Thickness dependence of X-ray absorption and photoemission in Fe thin films on Si(0 0 1) |
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Authors: | Xingyu Gao Dongchen Qi Swee Ching Tan AT S Wee Xiaojiang Yu Herbert O Moser |
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Institution: | 1. Physics Department, National University of Singapore, 2 Science Drive 3, Singapore 117542, Republic of Singapore;2. Singapore Synchrotron Light Source, National University of Singapore, 5 Research Link, Singapore 117603, Republic of Singapore |
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Abstract: | To investigate the initial growth of Fe films on Si(0 0 1) and the Fe/Si interface, Fe films at various thicknesses have been systematically studied by soft X-ray absorption spectroscopy (XAS) and X-ray photoemission spectroscopy (XPS). The Fe L edge XAS spectrum shows a strong thickness dependence with broader line-width for thinner films. Detailed analysis of the Fe absorption signal as a function of the thickness shows that the broad linewidth of Fe L edge XAS spectra is mostly contributed by the first Fe layer at the Fe/Si interface. In contrast to XAS, Fe 2p photoemission spectra for these films are identical. However, valence band photoemission also shows a strong thickness dependence. Comparing the valence band photoemission spectra of the thin Fe/Si(0 0 1) films with that of pure Si and the thickest Fe film, the difference spectra at all thicknesses show almost identical shape indicating the same origin: the Fe/Si interface. Thus, it is mainly the first Fe layer at Fe/Si layer that is reactive with the Si substrate changing its electronic structure. |
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Keywords: | 73 61 78 70 Dm 79 60 Dp 75 50 Bb |
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