Photoemission oscillation in epitaxially grown van der Waals β-In2Se3/WS2 heterobilayer bubbles

Thin films of millimeter-scale continuous monolayer WS₂ have been grown on SiO₂/Si substrate, followed by the deposition of β-In₂Se₃ crystals on monolayer WS₂ to prepare In₂Se₃/WS₂ van de Waals heterostructures by a two-step chemical vapor deposition (CVD) method. After the growth of In₂Se₃ at elevated temperatures, high densities of In₂Se₃/WS₂ heterostructure bubbles with monolayer to multilayer β-In₂Se₃ crystals atop are observed. Fluorescence of the resultant β-In₂Se₃/WS₂ heterostructure is greatly enhanced in intensity upon the formation of bubbles, which are evidenced by the Newton's rings in optical image owing to constructive and destructive interference. In photoluminescence (PL) mapping images of monolayer β-In₂Se₃/monolayer WS₂ heterobilayer bubble, significant oscillatory behavior of emission intensity is demonstrated due to constructive and destructive interference. However, oscillatory behaviors of peak position are also observed and come from a local heating effect induced by an excitation laser beam. The oscillatory mechanism of PL is further verified by changing the exterior pressure of bubbles placed in a home-made vacuum chamber. In addition, redshifted in peak position and broadening in peak width are observed due to strain effect during decreasing the exterior pressure of bubbles.     

Influence of oxygen on the growth of cubic boron nitride thin films by plasma-enhanced chemical vapour deposition

Cubic boron nitride thin films were deposited on silicon substrates by low-pressure inductively coupled plasma-enhanced chemical vapour deposition. It was found that the introduction of O₂ into the deposition system suppresses both nucleation and growth of cubic boron nitride. At a B₂H₆ concentration of 2.5\% during film deposition, the critical O₂ concentration allowed for the nucleation of cubic boron nitride was found to be less than 1.4\%, while that for the growth of cubic boron nitride was higher than 2.1\%. Moreover, the infrared absorption peak observed at around 1230--1280~cm^-1, frequently detected for cubic boron nitride films prepared using non-ultrahigh vacuum systems, appears to be due to the absorption of boron oxide, a contaminant formed as a result of the oxygen impurity. Therefore, the existence of trace oxygen contamination in boron nitride films can be evaluated qualitatively by this infrared absorption peak.     

In situ infrared spectroscopic study of cubicboron nitride thin film delamination

This paper investigates the procedure of cubic boron nitride （cBN） thin film delamination by Fourier-transform infrared （IR） spectroscopy. It finds that the apparent IR absorption peak area near 1380cm^-1 and 1073 cm^-1 attributed to the B-N stretching vibration of sp2-bonded BN and the transverse optical phonon of cBN, respectively, increased up to 195% and 175% of the original peak area after film delamination induced compressive stress relaxation. The increase of IR absorption of sp2-bonded BN is found to be non-linear and hysteretic to film delamination, which suggests that the relaxation of the turbostratic BN （tBN） layer from the compressed condition is also hysteretic to film delamination. Moreover, cross-sectional transmission electron microscopic observations revealed that cBN film delamination is possible from near the aBN（amorphous BN）/tBN interface at least for films prepared by plasma-enhanced chemical vapour deposition.     

立方氮化硼薄膜的最新研究进展

立方氮化硼(cBN)作为一种在自然界中并不存在的人造材料具有优异的理化特性. 在超硬刀具、高温电子器件和光学保护膜等领域有着广泛的应用前景,已经成为材料科学的研究热点之一. 但是气相生长高质量cBN薄膜仍然还有许多难点需要攻克. 在综述近几年cBN薄膜研究所取得的一些突破性进展后,结合研究现状提出今后可能的主要研究方向. 关键词： 立方氮化硼薄膜 压缩应力 异质外延 掺杂