Magnetic Properties of Co-Doped TiO2 Films Grown on TiN Buffered Silicon Substrates

Co-doped TiO2 thin films are grown on TiN buffered silicon substrates by the pulsed laser deposition method and then hydrogenated. Transmission electron microscopy and high-angle annular dark-field scanning transmission electron microscopy measurements have shown that the TiN buffer layer can suffer a 400℃ deposition temperature and prevent the growth of silicon dioxide on silicon. After that, the room temperature ferromagnetism behaviors are observed in the hydrogenated samples, which are measured by the alternating gradient magnetometer. X- ray photoelectron spectroscopy and x-ray absorption fine structure measurements have revealed the existence of cobalt clusters. According to the material analysis, the magnetic behavior after hydrogenation is suggested to be induced by the enhancement of cobalt dusters.     

超薄膜磁性材料上XY模型的临界现象

采用经典XY模型，阐明了三角格子上层状超薄膜磁性材料的相变和临界现象.并用Monte-Carlo方法对该模型的内部能量、比热、chirality等热力学量进行了计算.使用finite-size scaling 分析法对临界现象的性质进行了论述.通过上述分析和计算，发现该模型在反强磁性层与强磁性层内的chirality在一定范围内随温度的变化急剧增加，这是一种新的chirality相变；而在另一范围内存在Kosterliz-Thouless相变和通常的chirality相变.这种新的chirality相变的 关键词： 层状XY模型 临界现象 Monte-Carlo模拟 磁性薄膜     

Modeling of trap-assisted tunneling on performance of charge trapping memory with consideration of trap position and energy level

In this work, the trap-assisted tunneling(TAT) mechanism is modeled as a two-step physical process for charge trapping memory(CTM). The influence of the TAT mechanism on CTM performance is investigated in consideration of various trap positions and energy levels. For the simulated CTM structure, simulation results indicate that the positions of oxide traps related to the maximum TAT current contribution shift towards the substrate interface and charge storage layer interface during time evolutions in programming and retention operations, respectively. Lower programming voltage and retention operations under higher temperature are found to be more sensitive to tunneling oxide degradation.     

CoxTi1-xO2-δ体材中氢退火引起的铁磁性及结构相变

利用固相反应法在700℃-1000℃不同的温度下、空气中烧结Co3O4和TiO2混合物,制备了(Co3O4)x/3(TiO2)1-x(0相似文献   

ZnCoO稀磁半导体的室温磁性

采用固相反应法，将ZnO和Co₂O₃粉末按不同的成分配比混合，制备了稀磁半导体Zn_1-xCo_xO (x=0.02,0.06,0.10)材料.并使用H₂气氛退火技术对样品进行了处理，得到了具有室温铁磁性的掺Co氧化锌稀磁半导体.利用全自动X射线衍射仪、X射线光电子能谱仪、高分辨透射电子显微镜和超导量子干涉器件磁强计对样品的结构、晶粒的尺寸、微观形貌以及磁性等进行了测量和标度. 关键词： 稀磁半导体 氧化锌 掺杂 固相反应法     

Schottky barrier MOSFET structure with silicide source/drain on buried metal

In this paper, we propose a novel Schottky barrier MOSFET structure, in which the silicide source/drain is designed on the buried metal (SSDOM). The source/drain region consists of two layers of silicide materials. Two Schottky barriers are formed between the silicide layers and the silicon channel. In the device design, the top barrier is lower and the bottom is higher. The lower top contact barrier is to provide higher {on-state} current, and the higher bottom contact barrier to reduce the off-state current. To achieve this, ErSi is proposed for the top silicide and CoSi₂ for the bottom in the n-channel case. The 50~nm n-channel SSDOM is thus simulated to analyse the performance of the SSDOM device. In the simulations, the top contact barrier is 0.2e~V (for ErSi) and the bottom barrier is 0.6eV (for CoSi₂. Compared with the corresponding conventional Schottky barrier MOSFET structures (CSB), the high on-state current of the SSDOM is maintained, and the off-state current is efficiently reduced. Thus, the high drive ability (1.2mA/μm at V_ds=1V, V_gs=2V) and the high I_on/I_min ratio (10⁶) are both achieved by applying the SSDOM structure.     

Critical properties of XY model on two-layer Villain－ferromagnetic lattice

We investigate phase transitions of the XY model on a two-layer square lattice which consists of a Villain plane (J) and a ferromagnetic plane (I), using Monte Carlo simulations and a histogram method. Depending on the values of interaction parameters (I,J), the system presents three phases: namely, a Kosterlitz－Thouless (KT) phase in which the two planes are critical for I predominant over J, a chiral phase in which the two planes have a chiral order for J predominant over I and a new phase in which only the Villain plane has a chiral order and the ferromagnetic plane is paramagnetic with a small value of chirality. We clarify the nature of phase transitions by using a finite size scaling method. We find three different kinds of transitions according to the values of (I,J): the KT transition, the Ising transition and an XY-Ising transition with ν=0.849(3). It turns out that the Ising or XY-Ising transition is associated with the disappearance of the chiral order in the Villain plane.     

Vacuum Annealing Induced Room-Temperature Ferromagnetism in Co0.1Ti0.9O2-δ Films Prepared by Sol-Gel Method

The Co-doped TiO2 films （Co0.1Ti0.9O2-δ） are prepared on silicon substrates by sol-gel method and post annealing. TheCo0.1Ti0.9O2-δ film annealed in air is non-ferromagnetic at room temperature. After further annealed in a vacuum, the room-temperature ferromagnetism （RTFM） is observed. Experimental evidences show that the RTFM in the Co0.1Ti0.9O2-δ film may come from the Co-doped TiO2 matrix and is related to the oxygen vacancies created by vacuum annealing.     

CoxTi1－xO2－δ体材中氢退火引起的铁磁性及结构相变

利用固相反应法在700℃—1000℃不同的温度下、空气中烧结Co₃O₄ 和TiO₂混合物，制备了(Co₃O₄)_x/3(TiO2)_1-x(03，说明Co₃O₄与TiO₂反应形成了CoT iO₃；同时，在700 ℃低温和900 ℃以上的高温烧结样品中分别观察到了单相的 锐钛矿和金红石相结构.经高低温烧结的样品在500 ℃氢退火后，CoTiO₃相消失 ，锐钛矿相的Co_xTi_1-xO_2-δ形成.X射线光电子能谱(X PS)分析显示，氢退火样品中的Co以+2氧化价态存在，同时没有观察到金属态的Co，这说明 氢退火样品中的室温铁磁性不是源于金属Co颗粒的形成，而是与钙钛矿结构的CoTiO_{3< /sub>相的消失和锐钛矿型的CoxTi1-xO2-δ相的形成 有关.(Co3O4)x/3(TiO2)1-x( 0x}Ti_1-xO_2-δ相的本征铁磁性，伴随着结构相变而产生的Co离子之间的铁磁交换相互作用或 许是样品室温铁磁性产生的根本原因. 关键词： 室温铁磁性 结构相变 锐钛矿 氢退火     

Critical properties of XY model dimensional layered magnetic on two- films

Using Monte Carlo simulations, we have investigated the classical $XY$ model on triangular lattices of ultra-thin film structures with middle ferromagnetic layers sandwiched between two antiferromagnetic layers. The internal energy, the specific heat, the chirality and the chiral susceptibility are calculated in order to clarify phase transitions and critical phenomena. From the finite-size scaling analyses, the values of critical exponents are determined. In a range of interaction parameters, we find that the chirality steeply goes up as temperature increases in a temperature range; correspondingly the value of a critical exponent for this change is estimated.