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研制了一台实用型放电泵浦的351 nm XeF(B-X)准分子激光器,激光器采用新型开关电源、结构紧凑型张氏电极及放电火花预电离的激光腔结构,通过优化储能电容和放电电容量及比值,选取合理的工作气体压力和配比,优化了激光器性能,提高了激光器输出参数:单脉冲能量153 mJ,平均功率12.9 W,转换效率最高达到0.88%,重复频率1~80 Hz,能量不稳定度小于4%,近场光斑尺寸7 mm×22 mm。激光器已应用到常规抗蚀剂曝光的印刷电路板(PCB)激光投影成像照明系统的实验中。 相似文献
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Laser-induced damage and periodic stripe structures of a CaF2 single crystal by an ArF excimer laser
The laser-induced damage threshold of a calcium fluoride(CaF2)single crystal was obtained by a 193 nm ArF excimer laser.The damage morphology of the crystal was analyzed.The results showed that the surface of CaF2 single crystal broke along the natural cleavage plane under ArF excimer laser irradiation,some fragments fell off,and Newton’s rings were observed on the curved fragments.Laser-induced periodic stripe structures(LIPSS)appeared on the surface layer beneath the fragments that peeled off.The spacing of LIPSS was measured,and the formation mechanism of LIPSS was analyzed based on the interference model. 相似文献
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