Influence of magnetic layer thickness on[Fe_(80)Ni_(20) O/SiO_2]_n multilayer thin films

In the present work, a series of [Fe80Ni20–O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of Fe80Ni20–O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the Fe80Ni20–O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of Fe80Ni20–O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.     

透明导电Cd2SnO4薄膜的光学特性研究

报道了射频反应性溅射Cd-Sn合金靶沉积的Cd_2SnO_4(简称CTO)薄膜在0.2～6.0μm波长范围内的透射和反射谱及其光致发光谱的测量结果,并由此对CTO膜光学性质进行了较详细的理论分析和讨论.     

形变充氢多晶纯钴中缺陷的正电子湮没研究

用正电子寿命和多普勒线形参数测量技术,研究了形变和形变充氢多晶钴试样的缺陷性质及其回复行为。观察到形变样品阴极充氢后,氢致缺陷为一定量的位错和空位以及少量的空位团。没有观察到微空洞和微裂纹的产生。单空位的回复温度范围为73—260℃,位错和空位团的退火发生在350—670℃温度范围。测得空位的迁移激活能为E_v^m=1.09±0.07eV。 关键词：     

退火温度对CuNps@ZnO纳米复合薄膜结构与光学性能的影响

使用磁控溅射结合惰性气体冷凝的方法制备了Cu纳米粒子,通过将Cu纳米粒子沉积与ZnO离子束溅射原位复合的方法制得了CuNps@ZnO纳米复合薄膜,并研究了退火温度对CuNps@ZnO纳米粒子复合薄膜的结构和光学性能的影响.通过对样品的表征发现所得产物中存在着低温条件下难以形成的立方相、岩盐结构的ZnO.并且,样品的微观形貌、结晶性和光学性能随着退火温度的变化而发生显著地变化.     

射频反应性溅射沉积的Cd2SnO4薄膜物理性质与缺陷特性研究

在Ar+O₂混合气氛中射频反应性溅射Cd-Sn合金靶制备了透明导电Cd₂SnO₄(简称CTO)薄膜。用X射线衍射测量了CTO膜的结构。实验结果表明,这种薄膜的电学和光学性质依赖于混合气体中的氧浓度、衬底温度以及沉积后的热处理。获得的CTO膜最低电阻率为1.74×10^-6Ω·cm,可见光光谱区最高透射率为95％。对于氧浓度为6％、衬底温度为400℃时沉积的CTO膜,经热处理后,其光隙能由热处理前的2.37eV增大为2.6 关键词：     

STUDIES ON INFRARED AND PHOTOLUMINESCENCE PROPERTIES OF CdIn2O4 FILMS DEPOSITED BY RF REACTIVE SPUTTERING

Transparent and conductive CdIn₂O₄(CIO) thin films were prepared successfully by rf reactive sputtering from a Cd-In alloy target in an Ar+O₂ atmosphere. The measurement of transmission and reflection spectra, at wavelengths between 0.2 and 6.0μm, and photoluminescence spectrum of the films are reported. The optical properties of the films are analyzed and discussed in detail. Two reasonable methods for calculating the effective mass of the free carrier in the films are presented.     

STUDIES ON INFRARED AND PHOTOLUMINESCENCE PROPERTIES OF CdIn2O4 FILMS DEPOSITED BY RF REACTIVE SPUTTERING

Transparent and conductive CdIn₂O₄(CIO) thin films were prepared successfully by rf reactive sputtering from a Cd-In alloy target in an Ar+O₂ atmosphere. The measurement of transmission and reflection spectra, at wavelengths between 0.2 and 6.0μm, and photoluminescence spectrum of the films are reported. The optical properties of the films are analyzed and discussed in detail. Two reasonable methods for calculating the effective mass of the free carrier in the films are presented.