排序方式: 共有30条查询结果,搜索用时 78 毫秒
1.
2.
3.
把GeC/GaP双层膜用作ZnS衬底的长波红外(8~11.5μm波段)增透保护膜系。采用射频磁控溅射法,以高纯Ar为工作气体、单晶GaP圆片为靶制备了GaP薄膜;用射频磁控反应溅射法在高纯Ar和CH4的混合气体中,以单晶Ge圆片为靶制备了GeC薄膜。分别用柯西(Cauchy)公式和乌尔巴赫(Urbach)公式表示折射率和吸收系数,对薄膜的红外透射率曲线进行最小二乘法拟合,得到了它们的厚度及折射率、吸收系数等光学常数。GaP膜的折射率与块体材料的相近,在波长10μm处约为2.9;GeC膜的折射率较小,在波长10μm处约为1.78。用所得到的薄膜折射率,通过计算机膜系自动设计软件在ZnS衬底上设计并制备出了GeC/GaP双层增透保护膜系,当GaP膜厚较大时,由于吸收增大膜系增透效果较差;当GaP膜厚较小时,膜系有较好的增透效果。 相似文献
4.
5.
Chemical Structure of HfO2/Si Interface with Angle-Resolved Synchrotron Radiation Photoemission Spectroscopy 下载免费PDF全文
Interracial chemical structure of HfO2/Si (100) is investigated using angle-resolved synchrotron radiation photoemission spectroscopy (ARPES). The chemical states of Hf show that the Hf 4f binding energy changes with the probing depth and confirms the existence of Hf-Si-O and Hf Si bonds. The Si 2p spectra are taken to make sure that the interracial structure includes the Hf silicates, Hf silicides and SiOx. The metallic characteristic of the Hf-Si bonds is confirmed by the valence band spectra. The depth distribution model of this interface is established. 相似文献
6.
偶氮四唑叠氮基甲脒AFZT的爆轰性能表现优异,在高能炸药领域中具有广阔的应用前景.本文采用基于密度泛函理论的第一性原理方法计算了AFZT在0~50 GPa压力下的晶体结构、电子性质以及氢键相互作用,并分析了这些性质在压力下的变化规律.在压力的作用下,AFZT晶体在5 GPa下发生了结构转变并伴随着电子结构中带隙值的突变,其带隙先减小后增大再减小,总态密度的峰值随着压力的增加而减小.结构中叠氮甲脒阳离子上的N8-N9与N9-N10键在压力下表现得最稳定,N-H…N类型的氢键在所有相互作用中占据主导地位.此外,AFZT结构沿不同晶轴压缩的难易程度与此方向上氢键相互作用分布的疏密有关,并且其氢键主要沿xz平面分布而在y轴上分布极少,这导致了它沿y轴方向最易被压缩. 相似文献
7.
开放体系优化ZnSe多晶原料化学计量比 总被引:1,自引:1,他引:0
本文采用开放体系对两单质加反应促进剂I2合成的ZnSe多晶原料进行了提纯.以高纯氩气为保护气体,提纯温度分别为500 ℃、550 ℃和800 ℃.能谱分析(EDS)和热重图谱(TG)结果表明:800 ℃处理后的ZnSe多晶原料,其化学计量比与理想化学计量比非常接近,而且升华开始温度提高到了850 ℃以上.运用化学气相输运(CVT)法进行晶体生长结果进一步表明,以800 ℃处理后的ZnSe多晶为原料时,消除了单质Se在生长区沉积对晶体成核生长的影响,达到了CVT法晶体生长对原料的要求.此外,以混合气体(H210;+Ar 90;)作为保护气时,在同等条件下处理后的ZnSe多晶原料,其化学计量比更加接近理想化学计量比,较氩气保护下的处理效果要好. 相似文献
8.
9.
10.
Charge transport and bipolar switching mechanism in a Cu/HfO_2/Pt resistive switching cell 下载免费PDF全文
Bipolar resistance switching characteristics are investigated in Cu/sputtered-HfO_2/Pt structure in the application of resistive random access memory(RRAM).The conduction mechanism of the structure is characterized to be SCLC conduction.The dependence of resistances in both high resistance state(HRS) and low resistance state(LRS) on the temperature and device area are studied.Then,the composition and chemical bonding state of Cu and Hf at Cu/HfO_2 interface region are analyzed by x-ray photoelectron spectroscopy(XPS).Combining the electrical characteristics and the chemical structure at the interface,a model for the resistive switching effect in Cu/HfO_2/Pt stack is proposed.According to this model,the generation and recovery of oxygen vacancies in the HfO_2 film are responsible for the resistance change. 相似文献