计入衍射几何因子和多重性因子的立方GaN相含量的测定

以回摆法衍射峰的积分强度为基础,提出了X射线衍射分析单晶体时的多重性因子和衍射几何因子的概念,推导出普遍适用的相含量计算公式.利用双晶X射线多功能四圆衍射仪测绘GaN/GaAs(001)外延层中立方相（002）面、{111}面和六角相{100}面的极图和倒易空间Mapping,分析了六角相和立方相微孪晶的各晶面在极图中的分布特征及计算相含量时的多重性因子和衍射几何因子,并根据立方相(002)、立方相微孪晶{111}、六角相{101}和{100}衍射峰的积分强度,求得外延层中立方相微孪晶和六角相的含量.     

GaN基紫外探测器的研究与制备

报道了用MOCVD方法在GaAs衬底上制作p-GaN/InGaN/n-GaN结构紫外探测器.我们对器件进行了测试分析.根据器件光伏信号强度和相位的测量结果,我们得到了该器件的能带结构图.我们还发现Ni/Au电极与p-GaN之间的接触表现出肖特基接触的特性.该探测器在入射光波长为375nm处的响应度大约为7.4×10-3A/W.     

Effects of GaN cap layer thickness on an AlN/GaN heterostructure

In this study, we investigate the effects of GaN cap layer thickness on the two-dimensional electron gas (2DEG) electron density and 2DEG electron mobility of AlN/GaN heterostructures by using the temperature-dependent Hall measurement and theoretical fitting method. The results of our analysis clearly indicate that the GaN cap layer thickness of an AlN/GaN heterostructure has influences on the 2DEG electron density and the electron mobility. For the AlN/GaN heterostructures with a 3-nm AlN barrier layer, the optimized thickness of the GaN cap layer is around 4 nm and the strained a-axis lattice constant of the AlN barrier layer is less than that of GaN.