Deposition of SiOx barrier films by O2/TMDSO RF-PECVD

This paper reports that the SiOx barrier films are deposited on polyethylene terephthalate substrate by plasmaenhanced chemical vapour deposition （PECVD） for the application of transparent barrier packaging. The variations of 02/Tetramethyldisiloxane （TMDSO） ratio and input power in radio frequency （RF） plasma are carried out to optimize barrier properties of the SiOx coated film. The properties of the coatings are characterized by Fourier transform infrared, water vapour transmission rate （WVTR）, oxygen transmission rate （OTR）, and atomic force microscopy analysers. It is found that the 02/TMDSO ratio exceeding 2：1 and the input power over 200 W yield SiOx films with low carbon contents which can be good to the barrier （WVTR and OTR） properties of the SiOx coatings. Also, the film properties not only depend on oxygen concentration of the inlet gas mixtures and input power, but also relate to the surface morphology of the coating.     

微量水对碳纳米管形貌的影响及其机理研究

利用介质阻挡放电等离子体化学气相沉积技术,在蒸镀有25nm Ni催化剂层的Si基片上,以CH₄和H₂作为反应气体,在973K下制备了碳纳米管,并研究了微量水的引入对碳纳米管形貌的影响.场发射扫描电子显微镜结果表明,不加水时,制备出的碳纳米管直径不均匀,分布在40—90nm之间,呈链节状的结构;加入少量水时,制备出的碳纳米管直径比较均匀,集中在70nm左右,表面为瘤状结构;当水的流量进一步增加时,得到的碳纳米管表面光滑,出现了枝状结构.原位测量了加水前后等离子体区的发射光谱,分析了微量水的引入对于碳纳米管形貌变化的影响机理. 关键词： 碳纳米管 介质阻挡放电 水 发射光谱     

双辉光放电静电场数值模拟及场分布边角效应分析

根据双辉光放电3个电极极板上的电势,利用边界元积分方程建立以面电荷密度为未知量的离散方程,通过求解线性方程组计算3个电极极板上面电荷的不均匀分布.由极板上的不均匀面电荷分布计算在真空状态下空间任意一点的电势和电场的空间分布,利用数值解对真空状态下双辉光离子渗金属实验装置场分布边角效应进行了分析.     

A Novel Atmospheric Pressure Plasma Fluidized Bed and Its Application in Mutation of Plant Seeds

An atmospheric pressure plasma fluidized bed (APPFB) is designed to generate plasma using a dielectric barrier discharge (DBD) with one liquid electrode. In the APPFB system, the physical properties of DBD discharge and its application in plant-seed mutating are studied fundamentally. The results show that the generated plasma is a typical glow discharge free from filament and arc plasma, and the macro-temperature of the plasma fluidized bed is nearly at room temperature. There are no obvious changes in the pimientos when their seeds are treated by APPFB, but great changes are found for coxcombs.     

Silicon Dioxide Coating Deposited by PDPs on PET Films and Influence on Oxygen Transmission Rate

A silicon dioxide film is deposited on the polyethyleneterephtMate （PET） by a penning discharge plasma source at ambient temperature in a high vacuum chamber. Hexamethyldisiloxane and oxygen are adopted as precursor and reactive reagent to grow a nano-scale silicon dioxide layer on polymer surfaces. For the chemical structure analysis X-ray photoelectron spectroscopy is performed to demonstrate the content of Si, 0 and C elements. It is noticed that a higher silicon concentration is contained if Ar plasma is used for pretreatment. X-ray diffraction analysis shows that a micro-crystal silicon dioxide is formed by peak patterns at 25,84° and 21.8°. The barrier properties examined by oxygen transmission rate show that the permeation parameter of the 12-μm-thick PET film drastically decreases from 135 cc/m^2 per day for the control one to O. 713 cc/m^2 per day for the as-deposited one after Ar plasma treatment. The surface morphology related to the barrier properties of SiOx-coated polymers os also investigated by scanning electron microscopy and atomic force microscopy.